Fabrication of carbon nanostructures using electron beam lithography and pyrolysis for biosensing applications

전자빔 리소그래피와 열처리를 이용한 탄소 나노구조물의 제작 및 바이오센싱 응용연구

  • 이정아 (한국표준과학연구원) ;
  • 이광철 (한국표준과학연구원, 나노소자연구단) ;
  • 박세일 (한국표준과학연구원, 나노소자연구단) ;
  • 이승섭 (한국과학기술원, 기계공학과)
  • Published : 2008.11.05

Abstract

We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

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