• Bulletin of the Korean Chemical Society
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• v.34 no.5
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• pp.1397-1400
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• 2013

The influence of electron beam irradiation on photocatalytic activity of $TiO_2$ thin films was investigated. $TiO_2$ thin films were prepared by anodization of Ti foil, and they were then subjected to an 1 MeV electron beam. Changes in physical properties and photocatalytic activity of $TiO_2$ before and after e-beam irradiation were investigated. The crystallinity of the synthesized materials was investigated by X-ray diffraction, and the oxidation states of both titanium and oxygen were determined by X-ray photoelectron spectroscopy (XPS). The density of donor ($N_d$) and flat band potential ($E_{fb}$) were investigated by Mott-Schottky analysis, and photocurrent was measured under a 1kW Xenon lamp illumination. After e-beam irradiation, significant change of Ti oxidation state was observed. $Ti^{3+}/Ti^{4+}$ ratio increased mainly due to the surface reduction by electron, and photocurrent was observed to increase with e-beam irradiation.

• Korean Journal of Materials Research
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• v.11 no.9
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• pp.792-796
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• 2001

For electron beam lithography and SEM(scanning electron microscopy) applications, miniaturized electrostatic lenses called a microcolumn have been fabricated. In this paper, we report the fabrication technique for 20~30$\mu\textrm{m}$ apertures of electron lenses based on silicon and Mo membrane using an active Q-switched Nd:YAG laser. Experimental conditions of laser micromachining for silicon and Mo membrane are improved. The geometrical structures, such as the diameter and the preciseness of the micron-size aperture are dependent upon the total energy of the laser pulse train, laser pulse width, and the diameter of laser spot.

• Journal of the Korean Society for Heat Treatment
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• v.36 no.4
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• pp.193-197
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• 2023

Transparent and conducting titanium (Ti) doped indium oxide (TIO) thin films were deposited on the poly-imide (PI) substrate with radio frequency magnetron sputtering and then electron irradiation was conducted on the TIO film's surface to investigate the effect electron irradiation on the crystallization and opto-electrical properties of the films. All x-ray diffraction (XRD) pattern showed two diffraction peaks of the In₂O₂ (431) and (444) planes with regardless of the electron beam irradiation energy. In the AFM analysis, the surface roughness of as deposited films was 3.29 nm, while the films electron irradiated at 700 eV, show a lower RMS roughness of 2.62 nm. In this study, the FOM of as deposited TIO films is 6.82 × 10^-3 Ω^-1, while the films electron irradiated at 500 eV show the higher FOM value of 1.0 × 10^-2 Ω^-1. Thus, it is concluded that the post-deposition electron beam irradiation at 500 eV is the one of effective methods of crystallization and enhancement of opto-electrical performance of TIO thin film deposited on the PI substrate.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.229-229
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• 2012

Adhesion of Copper film on the aluminum oxide layer formed by anodizing an aluminum plate was enhanced by applying ion beam mixing method. Forming an conductive metal layer on the insulating oxide surface without using adhesive epoxy bonds provide metal-PCB(Printed Circuit Board) better thermal conductivities, which are crucial for high power electric device working condition. IBM (Ion beam mixing) process consists of 3 steps; a preliminary deposition of an film, ion beam bombardment, and additional deposition of film with a proper thickness for the application. For the deposition of the films, e-beam evaporation method was used and 70 KeV N-ions were applied for the ion beam bombardment in this work. Adhesions of the interfaces measured by the adhesive tape test and the pull-off test showed an enhancement with the aid of IBM and the adhesion of the ion-beam-mixed films were commercially acceptable. The mixing feature of the atoms near the interface was studied by scanning electron microscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.26-34
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• 1998

This paper presents a characterization method for faults of circuit patterns on MCM(Multichip Module) or PCB(Printed Circuit Board) substrates with electron beams of a SEM(Scanning Electron Microscope) by inducing voltage contrast on the signal line. The experimentation employes dual potential electron beams for the fault characterization of circuit patterns with a commercial SEM without modifying its structure. The testing procedure utilizes only one electron gun for the generation of dual potential electron beams by two different accelerating voltages, one for charging electron beam which introduces the yield of secondary electron $\delta$ < 1 and the other for reading beam which introduces $\delta$ > 1. Reading beam can read open's/short's of a specific net among many test nets, simultaneously discharging during the reading process for the next step, by removing its voltage contrast. The experimental results of testing the copper signal lines on glass-epoxy substrates showed that the state of open's/short's had generated the brightness contrast due to the voltage contrast on the surface of copper conductor line, when the net had charged with charging electron beams of 7KV accelerating voltages and then read with scanning reading electron beams of 2KV accelerating voltages in 10 seconds. The experimental results with Au pads of a IC die and Au plated Cu pads of BGA substrates provided the simple test method of circuit lines with 7KV charging electron beam and 2KV reading beam. Thus the characterization method showed that we can test open and short circuits of the net nondestructively by using dual potential electron beams with one SEM gun.

• Radiation Oncology Journal
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• v.10 no.1
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• pp.107-113
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• 1992

Increasing frequency of skin cancer, mycosis fungoides, Kaposi's sarcoma etc, it need to treatment dose planning for total skin electron beam (TSEB) therapy. Appropriate treatment planning for TSEB therapy is needed to give homogeneous dose distribution throughout the entire skin surface. The energy of 6 MeV electron from the 18 MeV medical linear accelerator was adapted for superficial total skin electron beam therapy. The energy of the electron beam was reduced to 4.2 MeV by a $0.5\;cm\times90\;cm{\times}180\;cm$ acryl screen placed in a feet front of the patient. Six dual field beam was adapted for total skin irradiation to encompass the entire body surface from head to toe simultaneously. The patients were treated behind the acryl screen plate acted as a beam scatterer and contained a parallel-plate shallow ion chamber for dosimetry and beam monitoring. During treatment, the patient was placed in six different positions due to be homogeneous dose distribution for whole skin around the body. One treatment session delivered 400 cGy to the entire skin surface and patients were treated twice a week for eight consecutive weeks, which is equivalent to TDF value 57. instrumentation and techniques developed in determining the depth dose, dose distribution and bremsstrahlung dose are discussed.

• The Journal of Korean Society for Radiation Therapy
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• v.12 no.1
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• pp.112-116
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• 2000

Purpose : The vertex scalp is always tangentially irradiated during total skin electron beam(TSEB) This study was discuss to the dose distribution at the vertex scalp and to evaluate the use of an electron reflector. positioned above the head as a means of improving the dose uniformity. Methods and Materials Vetex dosimetry was performed using ion-chamber and TLD. Measurements were 6 MeV electron beam obtained by placing an acrylic beam speller in the beam line. Studies were performed to investigate the effect of electron scattering on vertex dose when a lead reflector $40{\times}40cm$ in area, was positioned above the phantom. Results : The surface dose at the vertex, in the without of the reflector was found to be less than $37.8\%$ of the skin dose. Use of the lead reflector increased this value to $62.2\%$ for the 6 MeV beam. Conclusion : The vertex may be significantly under-dosed using standard techniques for total skin electron beam. Use of an electron reflector improves the dose uniformity at the vertex and may reduce or eliminate the need for supplemental irradiation.

• Journal of Korean Society of Environmental Engineers
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• v.32 no.3
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• pp.248-255
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• 2010

This study was carried out to assess the feasibility of the electron beam irradiation as a mean of red tide control in coastal water. Prorocentrum minimum, Prorocentrum micans, Cochlodinium polykrikoides, Heterosigma akashiwo, Alexnadrium catenella were selected and cultured for experiments, and red tide occurring in Tongyeong(2007. 8. 15) was also tested under the same conditions. The irradiation dose were 1 kGy, 2 kGy, 4 kGy and 8 kGy. The result showed 50~65% extinction in red tide cells was observed right after irradiation dose of 1 kGy and 86~97% within 1 day after irradiation, compared with control. Chlorophyll-a concentration of red tide was reduced by 50~64% immediately and it was drastically reduced up to 86~97% 1 day after irradiation. When the culture was irradiated at 1 kGy, 28~47% of s-protein was released immediately, and 77~138% was released 1day after irradiation. 77~212% of s-carbohydrate was excreted after 1 day while 16~45% of s-carbohydrate was excreted immediately. A transmission electron microscope(TEM) observation for the irradiated red tide revealed that the cell was destroyed and intracellular biopolymeric substance was leached out from the damaged cell as a result of electron beam irradiation. These results imply that electron beam irradiation is enable to control red tide by flocculation with extracellular biopolymer. The paralytic shellfish poisoning(PSP) toxin contents produced by Alexandrium catenella was decreased 48% by 1 kGy of electron beam irradiation compared with the unirradiated cells. As a result, electron beam irradiation was effective for detoxication as well as destruction of red tide.

• Radiation Oncology Journal
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• v.1 no.1
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• pp.29-36
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• 1983

The treatment of tumors along curved surfaces with stationary electron beams using cone collimation may lead to non-uniform dose distributions due to a varying air gap between the cone surface and patient. For large tumors, more than one port may have to be used in irradiation of the chest wall, often leading to regions of high or low dose at the junction of the adjacent ports. Electron-beam arc therapy may elimination many of these fixed port problems. When treating breast tumors with electrons, the energy of the internal mammary port is usually higher than that of the chest wall port. Bolus is used to increase the skin dose or limit the range of the electrons. We invertiaged the effect of various arc beam parameters in the isodose distributions, and combined into a single arc port for adjacent fixed ports of different electron beam eneries. The higher fixed port energy would be used as the arc beam energy while the beam penetration in the lower energy region would be controlled by a proper thickness of bolus. We obtained the results of following: 1. It is more uniform dose distribution of electron to use rotation than stationary irradiation. 2. Increasing isocenter depth on arc irradiation, increased depth of maximum dose, reduction in surface dose and an increasing penetration of the linear portion of the curve. 3. The deeper penetration of the depth dose curve and higher X-ray background for the smaller field sized. 4. If the isocenter depth increase, the field effect is small. 5. The decreasing arc beam penetration with decreasing isocenter depth and the isocenter depth effect appears at a greater depth as the energy increases. 6. The addition of bolus produces a shift in the penetration that is the same for all depths leaving the shape of the curves unchanged. 7. Lead strips 5 mm thick were placed at both ends of the arc to produce a rapid dose drop-off.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.487-487
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• 2011

Recently graphene has emerged as a fascinating 2D system in condensed-matter physics as well as a new material for the development of nanotechnology. The unusual electronic band structure of graphene allows it to exhibit a strong ambipolar electric field effect with high mobility. These properties lead to the possibility of its application in high-performance transparent conducting films (TCFs). Compared to indium tin oxide (ITO) electrodes, which have a typical sheet resistance of ${\sim}60{\Omega}$/sq and ~85 % transmittance in the visible range (400?900 nm), the CVD-grown graphene electrodes have a higher/flatter transmittance in the visible to IR region and are more robust under bending. Nevertheless, the lowest sheet resistance of the currently available CVD graphene electrodes is higher than that of ITO. Here, we report an ingenious strategy, irradiation of MeV electron beam (e-beam) at room temperature under ambient condition, for obtaining size-homogeneous gold nanoparticle decorated on graphene. The nano-particlization promoted by MeV e-beam irradiation was investigated by transmission electron microscopy, electron energy loss spectroscopy elemental mapping, and energy dispersive X-ray spectroscopy. These results clearly revealed that gold nanoparticle with 10 ~ 15 nm in mean size were decorated along the surface of the graphene after 1.5 MeV-e-beam irradiation. A chemical transformation and charge transfer for the metal gold nanoparticle were systematically explored by X-ray photoelectron spectroscopy and Raman spectroscopy. This approach advances the numerous applications of graphene films as transparent conducting electrodes.