• 제목/요약/키워드: Electron effect

검색결과 4,644건 처리시간 0.031초

Focused Electron Beam-Controlled Graphene Field-Effect Transistor

  • Kim, Songkil
    • 한국전기전자재료학회논문지
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    • 제33권5호
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    • pp.360-366
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    • 2020
  • Focused electron beams with high energy acceleration are versatile probes. Focused electron beams can be used for high-resolution imaging and multi-mode nanofabrication, in combination with, molecular precursor delivery, in an electron microscopy environment. A high degree of control with atomic-to-microscale resolution, a focused electron beam allows for precise engineering of a graphene-based field-effect transistor (FET). In this study, the effect of electron irradiation on a graphene FET was systematically investigated. A separate evaluation of the electron beam induced transport properties at the graphene channel and the graphene-metal contacts was conducted. This provided on-demand strategies for tuning transfer characteristics of graphene FETs by focused electron beam irradiation.

$Si/Si_{1-x}Ge_x$Quantum Well 디바이스에서의 전자이동도 및 저온 자기저항효과 (Electron mobility and low temperature magnetoresistance effect in $Si/Si_{1-x}Ge_x$ quantum well devices)

  • 김진영
    • 한국진공학회지
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    • 제8권2호
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    • pp.148-152
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    • 1999
  • the low temperature magnetoresistance effect, electron mobilities, and 2 Dimensional electron Gases (2DEG) properties were investigated in $Si/Si_{1-x}Ge_x$ quantum well devices. N-type $Si/Si_{1-x}Ge_x$ structures were fabricated by utilizing a gas source Molecular Beam Epitaxy (GSMBE). Thermal oxidation was carried out in a dry O atmosphere at $700^{\circ}C$ for 7 hours. Electron mobilities were measured by using a Hall effect and a magnetoresistant effect at low temperatures down to 0.4K. Pronounced Shubnikov-de Haas (SdH) oscillations were observed at a low temperature showing two dimensional electron gases (2DEG) in s tensile strained Si quantum well. The electron sheet density (ns) of $1.5\times10^{12}[\textrm{cm}^{-2}]$ and corresponding electron mobility of 14200 $[\textrm{cm}^2V^{-1}s^{-1}]$ were obtained at a low temperature of 0.4K from $Si/Si_{1-x}Ge_x$ structures with thermally grown oxides.

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Study on Anomalous Electron Diffusion in the Hall Effect Thruster

  • Kwon, Kybeom;Walker, Mitchell L.R.;Mavris, Dimitri N.
    • International Journal of Aeronautical and Space Sciences
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    • 제15권3호
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    • pp.320-334
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    • 2014
  • Over the last two decades, numerous experimental and numerical efforts have examined physical phenomena in plasma discharge devices. The physical mechanisms that govern the anomalous electron diffusion from the cathode to the anode in the Hall Effect Thruster (HET) are not fully understood. This work used 1-D numerical method to improve our understanding and gain insight into the effect of the anomalous electron diffusion in the HET. To this end, numerical solutions are compared with various experimental HET performance measurements and the effects of anomalous electron diffusion are analyzed. The relationships between the anomalous electron diffusion and important parameters of the HET are also studied quantitatively. The work identifies the cathode mass flow rate fraction, radial magnetic field distribution, and discharge voltage as significant factors that affect anomalous electron diffusion. Additionally, the study demonstrates a computational process to determine the radial magnetic field distribution required to achieve specific thruster performance goals.

전자빔 리소그래피에서의 근접효과 보정을 이용한 패턴 제작에 관한 연구 (A Study on Pattern Fabrication using Proximity Effect Correction in E-Beam Lithography)

  • 오세규;김동환;김승재
    • 반도체디스플레이기술학회지
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    • 제8권2호
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    • pp.1-10
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    • 2009
  • This study describes the electron beam lithography pattern fabrication using the proximity effect correction. When electron beam exposes into electron beam resist, the beam tends to spread inside the substance (forward scattering). And the electron beam reflected from substrate spreads again (back scattering). These two effects influence to distribution of the energy and give rise to a proximity effect while a small pattern is generated. In this article, an electron energy distribution is modeled using Gaussian shaped beam distribution and those parameters in the model are computed to solidify the model. The proximity effect is analyzed through simulations and appropriate corrections to reducing the proximity effect are suggested. It is found that the proximate effect can be reduced by adopting schemes of dose adjustment, and the optimal dose is determined through simulations. The proposed corrected proximity effect correction is proved by experiments.

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Biobarrier를 이용한 PCE의 환원적 탈염소화시 전자공여체의 영향 (Effect of electron donor for reductive dechlorination of PCE using biobarrier)

  • 황보현욱;신원식;김영훈;송동익
    • 한국지하수토양환경학회:학술대회논문집
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    • 한국지하수토양환경학회 2003년도 추계학술발표회
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    • pp.391-394
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    • 2003
  • The applicability of in situ microbial filter or biobarrier technology for the remediation of soil and groundwater contaminated with chlorinated solvents was investigated. The efficiency and rates of reductive dechlorination of chlorinated solvents are known to be highly dependent on hydrogen concentration. In this study, the effect of electron donors on the reductive dechlorination of PCE was investigated using vermicompost (worm casting) and peat as permeable reactive barrier medium The effect of organic acids (lactate, butyrate and benzoate), yeast extract and vitamin $B_{l2}$ on the reductive dechlorination was investigated. Compared to the control (no electron donor added), addition of electron donors stimulated the dechlorinated rate. Among the electron donor treatments, lactate/benzoate amendment exhibited the highest dechlorination rate. Since vermicompost and peat are inexpensive and biodegradable and have high sorption capacity, they could be successfully used as biobarrier media, especially when electron donors (for example, lactate/benzoate) are added.d.

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마이크로 칼럼의 전자 방출원 위치 오차의 영향 (Effect of the Off-axis distance of the Electron Emitting Source in Micro-column)

  • 이응기
    • 반도체디스플레이기술학회지
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    • 제9권1호
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    • pp.17-21
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    • 2010
  • Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

Numerical Calculation Study on the Generalized Electron Emission Phenomenon

  • Kim, Hee-Tae;Yu, Soon-Jae
    • Journal of Information Display
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    • 제10권4호
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    • pp.158-163
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    • 2009
  • There are two kinds of well-known electron emissions from metal: field and thermionic emission. For thermionic emission, electrons come out of a metal due to the thermal energy, whereas for field emission, electrons tunnel out of a metal through the strong electric field. In this study, the most general electron emission caused by the temperature and electric field with a free electron gas model was considered. The total current density of electron emission comes from the field emission effect, where the electron energy is lower than vacuum, and from the thermionic-emission effect, where the electron energy is higher than vacuum. The total current density of electron emission is shown as a function of the temperature for a constant electric field, and as a function of the electric field for a constant temperature.

전자 주입층이 유기EL소자 효율에 미치는 영향 (The Effect of Electron Injection Layer in Organic Electroluminescence Device Efficiency)

  • 최경훈;손병청;김영관
    • 한국응용과학기술학회지
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    • 제19권4호
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    • pp.297-301
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    • 2002
  • We investigated the effect of electron injection layer on the performance of organic light emitting devices (OLEDs). As an electron injection layer, the quinolate metal complexes were used. We optimized the device efficiency by varying the thickness of the quinolate metal complexes layer. The device with 1 nm of the quinolate metal complexes layer showed significant enhancement of the device performance and device lifetime. We also compared the effect of 8-hydroxyquinolinolatolithium (Liq) with that of bis(8-quinolinolato)-zinc ($Znq_{2}$) and 8-hydroxyquinolinolatosodium (Naq) as an electron injection layer. As a result, Liq is considered as a better materials for the electron injection layer than $Znq_{2}$ and Naq.

Conveyer 이동 속도를 달리한 전자선 조사가 돈육의 냉장 중 산화와 미생물적 안정성에 미치는 영향 (Effect of Different Conveyer Speed of Electron Beam Irradiation on the Oxidative and Microbiological Stability of Ground Pork during Refrigeration)

  • 황기
    • 한국축산식품학회지
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    • 제23권1호
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    • pp.50-55
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    • 2003
  • 신선 돈육을 준비하여 두 가지의 conveyer 이동 속도(10과 20 Hz)로 전자선을 조사(3.0 과 5.0 kGy)한 후 저장 중 돈육의 지방 산화와 일반 세균 그리고 중온균의 증식 억제를 비교하여 측정하였다. 본 실험 결과를 종합하여 볼 때 전자선의 처리는 확실하고 뚜렷한 살균 효과가 있는 것으로 밝혀졌으며 대체적으로 3.0 보다는 5.0 kGy 처리육의 살균 효과가 훨씬 우수하였다. 지방의 산화는 전자선 조사에 의해서 촉진되는 것으로 확인되었기 때문에 전자선을 돈육에 활용하려면 전자선 처리에 의한 지방의 산화를 억제해야 하는 필요성이 절실하게 대두되고 있다. 전자선의 conveyer이동 속도를 10에서 20 Hz로 증가시켰을 때 살균 효과가 감소한다는 사실은 의외의 결과이나 전자선의 조사가 대조구에 비해 일반세균과 중온균의 증식은 억제하였다. 한편 conveyer 이동 속도를 10에서 20 Hz로 증가시킨 경우 돈육의 산화가 억제된다는 사실은 매우 고무적이며 전자선 처리에 의한 살균 효과를 식육에서 극대화하기 위하여는 본 실험에서 확인된 전자선 주사 속도의 증가에 의한 항산화 작용 이외에 더 추가적으로 탈기 변형 포장 방법 등을 도입하여 산화를 더욱 억제하여야 할 것으로 생각된다.

Effect of Target Angle and Thickness on the Heel Effect and X-ray Intensity Characteristics for 70 kV X-ray Tube Target

  • Kim, Gyehong;Lee, Rena
    • 한국의학물리학회지:의학물리
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    • 제27권4호
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    • pp.272-276
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    • 2016
  • To investigate the optimum x-ray tube design for the dental radiology, factors affecting x-ray beam characteristics such as tungsten target thickness and anode angle were evaluated. Another goal of the study was to addresses the anode heel effect and off-axis spectra for different target angles. MCNPX has been utilized to simulate the diagnostic x-ray tube with the aim of predicting optimum target angle and angular distribution of x-ray intensity around the x-ray target. For simulation of x-ray spectra, MCNPX was run in photon and electron using default values for PHYS:P and PHYS:E cards to enable full electron and photon transport. The x-ray tube consists of an evacuated 1 mm alumina envelope containing a tungsten anode embedded in a copper part. The envelope is encased in lead shield with an opening window. MCNPX simulations were run for x-ray tube potentials of 70 kV. A monoenergetic electron source at the distance of 2 cm from the anode surface was considered. The electron beam diameter was 0.3 mm striking on the focal spot. In this work, the optimum thickness of tungsten target was $3{\mu}m$ for the 70 kV electron potential. To determine the angle with the highest photon intensity per initial electron striking on the target, the x-ray intensity per initial electron was calculated for different tungsten target angles. The optimum anode angle based only on x-ray beam flatness was 35 degree. It should be mentioned that there is a considerable trade-off between anode angle which determines the focal spot size and geometric penumbra. The optimized thickness of a target material was calculated to maximize the x-ray intensity produced from a tungsten target materials for a 70 keV electron energy. Our results also showed that the anode angle has an influencing effect on heel effect and beam intensity across the beam.