• Journal of Satellite, Information and Communications
• /
• v.9 no.2
• /
• pp.12-17
• /
• 2014

In this paper, modified EDNMOS device with DPS (double polarity source) structure are suggested to realize stable and robust ESD (electrostatic discharge) protection performance of high voltage operating microchip. This DPS structure inserts the P+ diffusion layer on N+ source side, which in intended to block lateral extension of the electron rich region from N+ source side. Based on our simulation results, the inserted P+ diffusion layer effectively prevents the formation of deep electron channeling induced by high electron injection. As a result, our proposed DPS_EDNMOS devices could overcome the double snapback effect of conventional Std_EDNMOS device.

• Journal of Information Display
• /
• v.2 no.3
• /
• pp.48-53
• /
• 2001

Carbon nanotube emitters, prepared by screen printing, have demonstrated a great potential towards low-cost, largearea field emission displays. Carbon nanotube paste, essential to the screen printing technology, was formulated to exhibit low threshold electric fields as well as an emission uniformity over a large area. Two different types of triode structures, normal gate and undergate, have been investigated, leading us to the optimal structure designing. These carbon nanotube FEDs demonstrated color separation and high brightness over 300 $cd/m^2$ at a video-speed operation of moving images. Our recent developments are discussed in details.

• Journal of the Korean Vacuum Society
• /
• v.15 no.5
• /
• pp.499-505
• /
• 2006

Field emission of GaN and GaP nanowires, synthesized by thermal chemical vapor deposition, and their emission stabilities under oxygen and argon environments were investigated. The field emission current of GaN nanowires was seriously deteriorated under oxygen environment, while that of GaP was not. Both wires did not show any noticeable change under argon environment. The existence of oxide outer shell layers in the GaP nanowires was proposed to be a main reason for this emission stability behavior. Field emission energy distributions of electrons from these nanowires revealed that field emission mechanism of the semiconductor nanowires were different from that of carbon nanotubes.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2005.05b
• /
• pp.41-45
• /
• 2005

In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma(ICP). In results at several dependences of 20~100 mTorr Xenon pressure, 50~200W RF power and horizontal distribution were especially mentioned. When Xe pressure was 20mTorr and RF power was 200W, the electron temperature and density were respectively 3.58eV and $3.56{\times}10^{12}cm^{-3}$. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.58 no.11
• /
• pp.2236-2241
• /
• 2009

In this study, the electron behavior was investigated numerically in order to obtain guidelines for design and operation of a new plasma source by a magnetic neutral loop discharge (NLD). The optimum plasma production was investigated by using a 3-dimensional simulation model which enables the electron behavior calculation from source region to downstream region. The results showed that the high-density plasma produced around the magnetic neutral loop (NL) is transferred from the NL region to the downstream region along magnetic force lines. Also the avaraged electron energy is increased with the normalized RF electric field (F), which can be used to characterize the plasma production efficiency of NLD system. Considering the relation between F and plasma production, in-depth plasma control can be achieved at a given specific process condition.

• Journal of the Korean Magnetics Society
• /
• v.21 no.6
• /
• pp.231-236
• /
• 2011

X-ray Free Electron Laser (XFEL) has been known to be a dream X-ray source opening an epoch in X-ray science with the characteristics of femtosecond pulse, perfect transverse coherence, and ultra-high brightness. Here we introduce the XFEL source shortly and report the status of the worldwide XFEL facilities, and then the experimental instrumentations for XFEL are reviewed in their conceptual classification scheme. Scientific examples and applications proposed in the research area of magnetism for XFEL are briefly mentioned. Finally are summarized the facility overview and the scientific proposals for PAL-XFEL project.

• The Journal of Korean Society for Radiation Therapy
• /
• v.17 no.2
• /
• pp.161-166
• /
• 2005

Purpose : Electron is used for the treatment of skin cancer, breast cancer, and head and neck cancer in clinic. Our study is performed to check the isodose distribution in source surface distance(SSD)and source bolus distance(SBD)setup, nipple influence to isodose distribution of electron, junctional area isodose variation of photon and electron field. Materials and Methods : The electron dose distribution measures the diameter for 20 cm hemisphere paraffin phantom 2 made. It inserted the film between 2 paraffin phantom and it investigated it got radiation and dose distribution curve. Results : The 8% of isodose difference is with the surface distance(SSD)and source bolus distance(SBD)setup. The electon when the nipple exists inside the field, as nipple size it cuts the bolus and when it puts out and there is a possibility of getting the dose distribution which is homogeneous. When in the junction of electron and photon it uses the bolus it uses in the electron field whole, there is a possibility of getting the dose distribution which is homogeneous. Conclusion : The dose distribution decrease from the SBD setup. To reduce the influence of nipple, corresponding volume of bolus should be removed. And bolus covering all the electron field reduced hot and cold spot of junctional area of photon. In the future becomes the research which sees an effective electron therapy.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2001.07a
• /
• pp.81-81
• /
• 2001

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.104.2-104.2
• /
• 2013

A residual gas analyzer (RGA) system has been developed in this laboratory. Characteristics of the RGA system parts such as ion source, quadrupole mass filter and sensitivity are introduced. Some efforts have been made to improve performance of the two types of ion sources, open ion source (OIS) and closed ion source (CIS). A metal mesh was placed onto the electron beam entrance of the CIS anode tube to block the filament field penetration. Sensitivity of the CIS ion sources with and without the mesh was compared by mass spectra of SF6 gas (97% He base) introduced into the CIS anode through a needle valve. About ten-times improvement in the RGA sensitivity was observed for the CIS with the mesh in the electron entrance. Computer simulation showed an axi-symmetric anode potential distribution and improved focusing of the electron beam inside the anode tube with the mesh.

• Transactions of the Korean Society of Pressure Vessels and Piping
• /
• v.18 no.2
• /
• pp.61-68
• /
• 2022

Accurate evaluation of residual stress is important for stress corrosion cracking assessment. In this paper, electron beam welding experiment is simulated via finite element analysis and the sensitivity of the parameters related to the combined heat source model is investigated. Predicted residual stresses arecompared with measured residual stresses. It is found that the welding efficiency affects the size of the tensile residual stress area and the magnitude of maximum longitudinal residual stress. It is also found that the parameter related to the ratio of energy distributed to the two-dimensional heat source has little effect on the size of tthe tensile residual stress area, but affects the size of the longitudinal residual stress in the center of the weld.