• 품질경영학회지
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• 제38권1호
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• pp.101-107
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• 2010

In 2008, a review was made to analyze the effect of the certification of ISO 9001 quality management system in the almost same methods used for a similar review in 2001. Based on the two reviews, this research is to compare and contrast the changes made in between. The results show that the overall satisfaction for the certification has increased over 7 years, along with other beneficial changes, such as decreased cost and increased productivity. However, there has been no significant change in the establishment of the quality management system and in the level of customer satisfaction. ISO 9001 quality management system construction appears which effects variously on the all enterprises management, therefore this is very important strategy for preparing the keen enterprises competition.

• 품질경영학회지
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• 제51권1호
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• pp.131-154
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• 2023

Purpose: The purpose of this paper is to design an integrated informatization system that can manage quality & KPI by integrating management systems in the aerospace and defense industry, and study the effect on KPI when applied to related companies. Methods: The 7 management systems required for integration in the AS&D industry were studied, and an empirical analysis was conducted for H company in South Korea for the application of e-QMS integrated informatization & KPI system based on security environment and open quality. Results: The results of this study were analyzed to have an effect on the improvement of customer satisfaction and the positive improvement of quality failure cost in the aerospace and defense industry. And it was analyzed that it works to continuously comply with ethical management and environmental laws and prevent safety accidents. Conclusion: The greatest significance of this study is that it attempted to build an e-QMS integrated system in the aerospace and defense industry. Considering that the case of integrated management system and integrated operation of KPI in related industries has not been introduced in the existing literature, the results of this study will be shared as a meaningful preceding study in the era of digital quality information. In addition, the fact that the open-quality quality innovation methodology emphasizing measurement(M), tracking(T), and connection(C) was actually applied in an AS&D company and its effectiveness was objectively proven. It is expected that it will be a good paper for follow-up research.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
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• pp.22-25
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• 2004

In this study, BST thin films were etched with inductively coupled $CF_4/(Cl_2+Ar)$ plasmas. The etch characteristics of BST thin films as a function of $CF_4/(Cl_2+Ar)$ gas mixtures were analyzed using quadrupole mass spectrometry (QMS) and optical emission spectroscopy (OES). The maximum etch rate of the BST thin films was 53.6 nm/min because small addition of $CF_4$ to the $Cl_2/Ar$ mixture increased chemical effect. The optimum condition appears to be under a 10 % $CF_4/(Cl_2+Ar)$ gas mixture in the present work.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.187-190
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• 2004

In this study, PST thin films were etched with inductively coupled $Cl_2/(Cl_2+Ar)$ plasmas. The etch characteristics of PST thin films as a function of $Cl_2/(Cl_2+Ar)$ gasmixtures were analyzed by using quadrupole mass spectrometer (QMS). Systematic studies were carried out as a function of the etching parameters, including the RF power and the working pressure. The maximum PST film etch rate is 56.2 nm/min, because a small addition of $Cl_2$ to the $Cl_2/Ar$ mixture increased the chemical effect. It was proposed that sputter etching is the dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products.

• 품질경영학회지
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• 제32권2호
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• pp.37-58
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• 2004

This study examines the effects of ISO 9001:2000 Quality Management System(QMS). Before accrediting it, it is affected by the top management leadership and corporate culture. After finishing the accreditation, some companies form quality culture, but some companies do not. That affects the corporate performance. If quality culture forms, companies performance will be good. But if not, companies performance will be bad. The accreditation of ISO QMS is not the end goal for the companies but forming the quality culture will enhance the corporate performance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2008년도 제35회 하계학술대회 초록집
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• pp.195-195
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• 2008

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제37회 하계학술대회 초록집
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• pp.302-302
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• 2009

• 한국진공학회지
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• 제18권3호
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• pp.197-202
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• 2009

사중극 질량분석기(Quadrupole Mass Spectrometer, QMS) 이온전류의 안정성은 진공공정 가스를 모니터링 하는데 중요한 요소 중 하나이다. 진공챔버에 질소가스를 주입하여 압력을 일정하게 유지하면서 시간에 따른 이온전류의 변화를 모니터링 하였다. 진공챔버는 측정하기 전에 잡음신호를 줄이기 위해 ${\sim}3{\times}10^{-9}\;Torr$ 까지 배기하였고, 두개의 이온소스를 측정했다; 하나는 오염된 것으로 갈색 또는 검은색을 띄고 있고 다른 하나는 새 것이다. 질소 압력 $1{\times}10^{-5}\;Torr$에서, 오염된 이온소스의 이온 전류는 시간이 지남에 따라 더 빨리 감소했다. 대략 5.5 시간이 지난 후, 감소율은 새 것이 ${\sim}46%$이고 오염된 것은 ${\sim}84%$였다. 필라멘트 재질이 이온 전류감소에 미치는 영향을 관찰하기 위해서 텅스텐 선의 반을 산화이트륨($Y_2O_3$)으로 코팅하여 필라멘트를 제작하였다. 유사한 이온전류 감소현상이 재질이 다른 두 필라멘트에서 나타났는데 이것은 필라멘트 재질에 의한 온도의 변화 즉 baking 효과로는 이온전류 감소의 원인을 개선할 수 없다는 것을 의미한다. 전반적으로 이온전류의 감소율은 필라멘트 재질보다 이온소스의 오염과 더 밀접하게 관계되어 있다.

• 산업경영시스템학회지
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• 제34권2호
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• pp.85-91
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• 2011

The objective of this research is to analyze the effects of quality management system constructed by ISO 9001 certificates through BSC perspectives. Evaluation of quality management system based on BSC framework can consider short-term financial performance as well as nonfinancial performance characteristics, which will derive future financial results. This results show that QMS has an indirect effect on business performance through quality performance and customer satisfaction, which are internal business process and customer perspective, rather than have direct effects on financial performance. Finally we suggest implications of this study and future research direction.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 추계학술대회 논문집 전기물성,응용부문
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• pp.98-100
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• 2004

In this study, PST thin films were etched with inductively coupled $Cl_2/(Cl_2+Ar)$ plasmas. The etch characteristics of PST thin films as a function of $Cl_2/(Cl_2+Ar)$ gasmixtures were analyzed by using quadrupole mass spectrometer (QMS). Systematic studies were carried out as a function of the etching parameters, including the RF power and the working pressure. The maximum PST film etch rate is 56.2 nm/min, because a small addition of $Cl_2$ to the $Cl_2$/Ar mixture increased the chemical effect. It was proposed that sputter etching is the dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products.