• 제목/요약/키워드: ECMD

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Cu 배선의 평탄화를 위한 ECMD에 관한 연구 (Electro-chemical Mechanical Deposition for Planarization of Cu Interconnect)

  • 정석훈;서헌덕;박범영;박재홍;박성민;정문기;정해도;김형재
    • 한국전기전자재료학회논문지
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    • 제18권9호
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    • pp.793-797
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    • 2005
  • This study introduces Electro-chemical Mechanical Deposition(ECMD) lot making Cu interconnect. ECMD is a novel technique that has ability to deposit planar conductive films on non-planar substrate surfaces. Technique involves electrochemical deposition(ECD) and mechanical sweeping of the substrate surface Preferential deposition into the cavities on the substrate surface nay be achieved through two difference mechanisms. The first mechanism is more chemical and essential. It involves enhancing deposition into the cavities where mechanical sweeping does not reach. The second mechanism involves reducing deposition onto surface that is swept. In this study, we demonstrate ECMD process and characteristic. We proceeded this experiment by changing of distribution of current density on divided water area zones and use different pad types.

Cu 배선의 평탄화를 위한 ECMD에 관한 연구 (Electro-chemical Mechanical deposition for the planarization of Cu film)

  • 정석훈;서헌덕;박범영;이현섭;정재우;박재홍;정해도
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.649-650
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    • 2005
  • 반도체는 고집적화, 고속도화, 저전력화를 목적으로 발전하고 있다. 이를 위하여 design rule의 감소, 새로운 물질과 프로세스의 적용 등 많은 연구가 이루어지고 있으며, RC delay time을 줄이기 위한 Cu 와 저유전율 재료의 적용이 그 대표적인 예라 할 수 있다. Cu 배선은 기존의 Al 배선에 비하여 높은 전자이동 (electro-migration)과 응력 이동 (stress-migration) 저항을 가짐으로써 전기적인 성능 (electrical performance) 에서 이점을 가지고 있다. 반도체에서의 Cu 배선 구조는 평탄화된 표면 및 배선들 사이에서의 좋은 전기적인 절연성을 가져야 하며, 이는 디싱(dishing)과 에로젼(erosion)의 중요한 인자가 된다. 기존의 평탄화 공정인 Cu CMP(Chemical Mechanical Polishing)에 있어서 이러한 디싱, 에로전과 같은 결함은 선결되어져야 할 문제로 인식되고 있다. 따라서 본 연구에서는 이러한 결합들을 감소시키기 위한 새로운 평탄화 방법으로 Cu gap-filling 을 하는 동시에 평탄화된 표면을 이루는 ECMD(Electro-Chemical Mechanical Deposition) 공정의 전기적 기계적 특성을 파악하였다.

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식사의 철분밀도에 따른 남녀 대학생의 식품섭취 패턴 및 철분 영양상태의 차이 (Comparisons of Food Intake Patterns and Iron Nutritional Status by Dietary Iron Density Among College Students)

  • 현태선;연미영;한영희;황석연;구혜진;김선영
    • 대한영양사협회학술지
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    • 제9권1호
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    • pp.71-80
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    • 2003
  • Food intake patterns and iron nutritional status of male and female college students were studied based on dietary iron density. Dietary data were collected using the method of 24-hour recalls for 3 consecutive days from 106 students, and fasting blood were drawn to measure iron nutritional status indicators such as total iron binding capacity, serum iron, hematocrit, hemoglobin, and red blood cell count. Mean daily iron intakes of male and female students were 13.3㎎ and 10.0㎎, which were 107% and 63% of the RDA, respectively. However, dietary iron density were similar between male and female students as 5.9㎎/1,000㎉ and 5.7㎎/1,000㎉, respectively. The diets were divided into two groups according to iron density; high iron density group (6㎎/1,000㎉ or more) and low iron density group (less than 6㎎/1,000㎉). The students in high density group had lower intakes of energy, especially fat, than those in low density group. Female students in high density group showed significantly higher intakes of iron, and non-heme iron and folate than those of low density group. The students in high density group consumed more rice, hamburger, and eggs, while those in low density group consumed more Ra-myon and alcoholic beverages. The students in high density group consumed greater proportions of iron from plant-origin foods. Vegetables, legumes and seasonings were the food groups that female students in high density group consumed significantly more than those in low density group. Also the percentages of female students with iron deficiency were higher in low density group. These results suggest that diet with high iron density is important to improve iron nutritional status of women, and further research about the effective way to increase iron density in our diet is needed.

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