• 한국전기전자재료학회논문지
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• 제20권7호
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• pp.611-614
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• 2007

The changes in the work $function({\Phi}_w)$ in the MgO protective layers after $plasma(Ar,\;H_2)$ treatment have been studied using ${\Upsilon}-focused$ ion beam $({\Upsilon}-FIB)$ system. The ${\Phi}_w$ was determined as follows: Ar-plasma $treatment({\Phi}_w=4.52eV)$, $H_2-plasma$ $treatment({\Phi}_w=5.65eV)$, and non-plasma $treatment({\Phi}_w=4.64eV)$. The results indicated that the H-plasma could not make any effective physical etching due to the small masses of hydrogen atoms and molecules while the hydration of H-plasma could grow some contaminating materials on the surface of MgO.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1211-1214
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• 2005

One of the important problems in recent AC-PDP technology is high efficiency. In this research, we have been investigated electro-optical characteristics of MgO protective layer after radio frequency(RF) plasma treatment using Ar, $O_2$, and $H_2$ gases. The breakdown voltage order was $O_2$ > Ar > Nontreatment > $H_2$. Also, brightness order was $O_2$ > Ar > Non-treatment > $H_2$. In this experiment, the best result was obtained after $O_2-plasma$ treatment.

• 전자공학회논문지
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• 제51권6호
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• pp.71-77
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• 2014

본 연구에서는 radio frequency(rf) 마그네트론 스퍼터링 기술을 이용하여 Corning 유리 기판에 증착된 InGaZnO (IGZO) 박막의 광 투과도 특성에 고 에너지 전자빔 조사(high-energy electron beam irradiation (HEEBI))이 미치는 영향을 연구하였다. 저온에서 증착된 IGZO 박막은 공기 중 과 상온 조건에서 0.8 MeV의 전자빔 에너지와 $1{\times}10^{14}-1{\times}10^{16}electrons/cm^2$ dose를 사용하여 HEEBI 처리 되었다. IGZO 박막의 광 투과도는 utraviolet visible near-infrared spectrophotometer (UVVIS)로 측정되었다. HEEBI 처리 된 IGZO/유리 이중층의 총 광 투과도에서 HEEBI 처리된 IGZO 단일막 만의 광 투과도를 분리하는 방법을 상세히 연구하였다. 실험 결과로부터 $1{\times}10^{14}electrons/cm^2$의 적절한 dose로 처리된 HEEBI가 IGZO 박막의 투명도를 극대화시킴을 알 수 있었다. 또한 이렇게 적절한 dose로 처리된 HEEBI가 광학 밴드갭($E_g$)을 3.38 eV에서 3.31 eV로 감소시킴을 알 수 있었다. 이러한 $E_g$의 감소는 적절한 dose로 공기 중 상온에서 처리된 HEEBI가 진공 중 고온에서 처리된 열적 annealing 효과와 유사함을 제시하고 있다.

• 세라미스트
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• 제10권3호
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• pp.86-90
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• 2007

Novel photochromic oxide glasses are presented in this section. These glasses are based on phosphate formers containing both tungsten and antimony atoms. Exposure to visible continuous or pulsed laser beam results in an intense photochromic effect witch is shown to occur in the volume of the glass and results in a broad absorption band in the visible and near infrared. This effect was not identified to be related with a structural change and is assumed to be entirely electronic. A change in the absorption coefficient is observed in function of tungsten content, exposure time and increases with beam power. These glasses have been investigated regarding the possibility of holographic data storage using visible lasers sources. Changes in both refractive index and the absorption coefficient were measured using a holographic setup. The modulation of the optical constants is reversible by heat treatment.

• Nuclear Engineering and Technology
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• 제51권5호
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• pp.1406-1416
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• 2019

In this research, a multi-slit prompt-gamma camera was developed to locate the distal dose falloff of the proton beam spots in spot scanning proton therapy. To see the performance of the developed camera, therapeutic proton beams were delivered to a solid plate phantom and then the prompt gammas from the phantom were measured using the camera. Our results show that the camera locates the 90% distal dose falloff (= d90%), within about 2-3 mm of error for the spots which are composed $3.8{\times}10^8$ protons or more. The measured location of d90% is not very sensitive to the irradiation depth of the proton beam (i.e., the depth of proton beam from the phantom surface toward which the camera is located). Considering the number of protons per spot for the most distal spots in typical treatment cases (i.e., 2 Gy dose divided in 2 fields), the camera can locate d90% only for a fraction of the spots depending on the treatment cases. However, the information of those spots is still valuable in that, in the multi-slit prompt-gamma camera, the distal dose falloff of the spots is located solely based on prompt gamma measurement, i.e., not referring to Monte Carlo simulation.

• 한국진공학회지
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• 제7권s1호
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• pp.30-36
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• 1998

The plasma-spray technique is currently the most frequently used method to produce calcium phosphate coatings. Hydroxyapatite(HAp), one form of calcium phosphate, is preferred by its ability to form a direct bond with living bone, resulting in improvements of implant fixation and faster bone healing. Recently, concerns have been raised regarding the viable use and long-term stability of plasma-spray HAp coatings due to its nature of comparatively thick, porous, and poor bonding strength to metal implants. Thin layers (maximum of few microns) of calcium phosphate were formed by an e-beam evaporation with and without ion bombardments. The Ca/P ration of film was controlled by either using the evaporants having the different ration of Ca/P with addition of CaO, or adjusting the ion beam assist current. The Ca/P ration had great effects on the structure formation after heat treatment and the dissolution bahavior. The calcium phosphate films produced by IBAD exhibited high adhesion strength.

• JSTS:Journal of Semiconductor Technology and Science
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• 제3권1호
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• pp.1-12
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• 2003

This paper describes a study on the abnormal behavior of the electrical characteristics of the (n)GaAs/Ti/Pt/Au Schottky contacts prepared by the two techniques of electron beam deposition and rf sputtering and after an annealing treatment. The samples were characterized by I-V and C-V measurements carried out over the temperature range of 150 - 350 K both in the as prepared state and after a 300 C, 30 min. anneal step. The variation of ideality factor with forward bias, the variation of ideality factor and barrier height with temperature and the difference between the capacitance barrier and current barrier show the presence of a thin interfacial oxide layer along with barrier height inhomogenieties at the metal/semiconductor interface. This barrier height inhomogeneity model also explains the lower barrier height for the sputtered samples to be due to the presence of low barrier height patches produced because of high plasma energy. After the annealing step the contacts prepared by electron beam have the highest typical current barrier height of 0.85 eV and capacitance barrier height of 0.86 eV whereas those prepared by sputtering (at the highest power studied) have the lowest typical current barrier height of 0.67 eV and capacitance barrier height of 0.78 eV.

• Nuclear Engineering and Technology
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• 제49권8호
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• pp.1600-1609
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• 2017

The accelerator-driven subcritical system (ADS) is driven by a neutron source from spallation reactions introduced by the injected proton beam. Part of the neutron source has energy as high as a few hundred MeV to a few GeV. The effects of high-energy source neutrons ($E_n$ > 20 MeV) are usually approximated by energy cut-off treatment in practical core calculations, which can overestimate the predicted proton beam current in the ADS design. This article intends to quantize this effect and propose a way to solve this problem. To evaluate the effects of high-energy neutrons in the subcritical core, two models are established aiming to cover the features of current experimental facilities and industrial-scale ADS in the future. The results show that high-energy neutrons with $E_n$ > 20 MeV are of small fraction (2.6%) in the neutron source, but their contribution to the source efficiency is about 23% for the large scale ADS. Based on this, a neutron source efficiency correction factor is proposed. Tests show that the new correction method works well in the ADS calculation. This method can effectively improve the accuracy of the prediction of the proton beam current.

• 한국식품과학회지
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• 제29권4호
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• pp.771-775
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• 1997

본 연구는 병원성 Escherichia coli O157:H7 균주에 의한 식중독을 미연에 예방하고자 우육에 본 균주를 오염, 동결시켜 전자선에 의한 살균효과를 조사하였다. $37^{\circ}C$에서는 배양 16시간째에 최대균수를 나타내었고 $4^{\circ}C$에서는 균주의 증식이 거의 없었다. E. coli O157:H7 균주는 대수기나 정지기 모두가 $0^{\circ}C$ (chilled)와 $-18^{\circ}C$ (frozen)에서 배양시 약 $10^{7}\;CFU/mL$의 균수를 나타내었고 $-18^{\circ}C$에서는 $20^{\circ}C$ 보다 균주의 사멸율이 높았다. 동결육에 오염된 E. coli O157:H7 균주의 방사선 감수성은 $D_{(10)}$ 값이 0.45 kGy, 불활성화계수가 $3{\sim}5\;kGy$에서 $6.67{\sim}11.11$로 각각 나타났다. 본 결과로서 전자선 조사는 동결육에 오염된 E. coli O157:H7 균주의 제거방법으로 매우 효과가 있었다.

• 한국표면공학회지
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• 제47권4호
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• pp.186-191
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• 2014

Double layer films which consisted of aluminum(Al) and magnesium(Mg) have been prepared by e-beam deposition. The structure, alloy phase, and corrosion resistance of the prepared films were investigated before and after heat treatment. The first (bottom) layer fixed with Al, and the thickness ratio between Al and Mg layers has been changed from 1 : 1 to 5 : 1, respectively. Total thickness of Al-Mg film was fixed at $3{\mu}m$. The cold-rolled steel sheet was used as a substrate. Heat treatment was fulfilled in an nitrogen atmosphere at the temperature of $400^{\circ}C$ for 2, 3 and 10 min. Surface morphology of as-deposited Al-Mg film having Mg top layer showed plate-like structure. The morphology was not changed even after heat treatment. However, cross-sectional morphology of Al-Mg films was drastically changed after heat treatment, especially for the samples heat treated for 10 min. The morphology of as-deposited films showed columnar structure, while featureless structure of the films appeared after heat treatment. The x-ray diffraction data for as-deposited Al-Mg films showed only pure Al and Mg peaks. However, Al-Mg alloy peaks such as $Al_3Mg_2$ and $Al_{12}Mg_{17}$ appeared after heat treatment of the films. It is believed that the formation of Al-Mg alloy phase affected the structure change of Al-Mg film. It was found that the corrosion resistance of Al-Mg film was increased after heat treatment.