• 한국광학회지
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• 제3권4호
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• pp.227-233
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• 1992

분할디스크형 글라스레이저 증폭기를 개발하기 위하여 이를 해석 설계할 수 있는 시뮬레이션 코드를 작성했다. 레이저매질에서의 열부하를 감소시키고, 플래시램프의 방사스펙트럼과 레이저글라스의 흡수 스펙트럼 간의 결합효율을 높이기 위해서는 전류밀도를 2000-4000A/$\textrm{cm}^{2}$로 유지하여 단파장에서의 방사에너지를 줄여야 한다. 디스크 증폭기에서 같은 부피를 갖는 매질을 3등분하여 냉각표면적을 3배로 늘렸을 때 온도상승치는 30% 정도로 떨어졌다. 단면펌핑 분할 디스크형 증폭기의 설계에서는 각 글라스 간의 $Nd^{3+}$ 도핑율에 차등을 주어야 하고 플래시램프 앞에 있는 매질의 흡수계수 $\alpha$ 와 두께 d의 곱인 $\alpha$d가 0.26 전후가 적절하다는 것을 알았다.

• Corrosion Science and Technology
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• 제3권4호
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• pp.140-147
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• 2004

High temperature oxidation of Fe-19Cr and Fe-19Cr-0.2Ti alloys is studied at 1173-1373 K in 16.5 kPa $O_2$ - balances $N_2$ atmosphere aimed at clarifying the effect of titanium addition. Oxidation rate of Fe-19Cr alloy was accelerated with titanium. For both alloys chromium rich $(Fe,\;Cr)_2O_3$ was formed as a major oxidation product. On Fe-19Cr-0.2Ti alloy, a thin layer composed of spinel type oxide and titanium oxide was also formed and an internal oxidation of titanium was observed. Titanium was concentrated at the oxide surface and internal oxidation zone but a small amount of titanium was also found in the intermediate corundum type $(Fe,\;Cr)_2O_3$ layer. Crystals of corundum type $(Fe,\;Cr)_2O_3$ formed on Fe-19Cr alloy are coarse but that formed on Fe-19Cr -0.2Ti alloys were fine and columnar. Reason for the difference in oxidation kinetics and crystal structure will be discussed relating to the distribution of aliovalent titanium in corundum type $(Fe,\;Cr)_2O_3$ oxide layer.

• 전기화학회지
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• 제3권3호
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• pp.141-145
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• 2000

전도성이 뛰어난 피롤고분자 피막을 전기화학적으로 중합하고 이를 Gr/ppy(Polypyrrole),X.O.(xylenol orange)형의 수식된 전극을 제작하여 U(VI)의 포집에 이용하였다. 사전피막제인 NBR(nitrile butadiene rubber)을 사용하였을 때 중합속도는 $3.22\times10^{-3}s^{-1}$로 이를 사용하지 않았을 때 보다 1.6배 느린 반응이었다. 포집된 U(VI)의 양은 ppy $1.70Ccm^{-2}$ 당에 $1.55\times10^{-4}g$ 이었으며, 인공해수 중에서 matrix효과는 $6.8\%$로 나타났다. ppy전극이 Gr/ppy, $X.O^{4-}UO^+$형으로 수식됨에 따라서 피막자체의 임피던스가 증가하여 ppy만일 때의 확산에 지배적인 전도과정에서 피막자체의 전자전도와 이온도핑과정이 함께 영향을 받는 결과를 보였다. ppy전극을 X.O.로 수식하여 U(VI)를 포집함에 따라 전기이중층의 용량은 각각 56과 130여 배로 증가하였다.

• 한국전기전자재료학회논문지
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• 제24권4호
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• pp.303-308
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• 2011

The Gallium-doped ZnO(GZO) film deposited at a temperature of $200^{\circ}C$ and a pressure of 10 mtorr has an optical transmittance of 89.0% and a resistivity of $2.0\;m{\Omega}{\cdot}cm$ because of its high crystallinity. Effect of $Al_2O_3$ oxide buffer layers on the optical and electrical properties of sputtered ZnO films were intensively investigated for developing the electrodes of opto-electronic devices which demanded high optical transmittance and low resistivity. The use of $Al_2O_3$ buffer layer could increase optical transmittance of GZO film to 90.7% at a wavelength of 550 nm by controlling optical spectrum. Resistivity of deposited GZO films were much dependent on the deposition condition of $O_2/(Ar+O_2)$ flow rate ratio during the buffer layer deposition. It is considered that the $Al_2O_3$ buffer layer could increase the carrier concentration of the GZO films by doping effect of diffused Al atoms through the rough interface.

• 한국세라믹학회지
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• 제29권8호
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• pp.609-616
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• 1992

This study has been investigated on the milling of Aluminium Distearate (ADS) powder and characteristics of the ADS-doped UO2 pellets. As-received ADS powder of the agglomerated particles has not shown any milling effect because of heat generated during planetary milling. But the use of coolant to effectively remove heat generated during milling has been found an effective way in breaking up the agglomerates of ADS powder. The green density of the UO2 pellet decreases with the amount of ADS powder doped. Therefore, in order to get the sintered density of 95% pellet decreases with the amount of ADS powder doped. Therefore, in order to get the sintered density of 95% theoretical density, the 200 ppm ADS-doped UO2 pellet has to be pressed under higher compacting pressure of 3500~4000 kgf/$\textrm{cm}^2$ compared with the ADS-undoped UO2 pellet pressed under around 3000 kgf/$\textrm{cm}^2$. The ADS-dpoed UO2 pellet with even relatively low sintered density of 10.27 g/㎤ exhibits open porosity of 1% while open porosity of the ADS-undoped UO2 pellet is reduced to around 1% only after its sintered density increases to 10.43g/㎤. It is, therefore, concluded that doping of ADS powder significantly contributes to the decrease in open porosity of the UO2 pellet. The dilatometry of the ADS doped UO2 pellet shows the sintering rate curve with the bimodal mode, which could be attributed to a phase reaction between UO2 and ADS. The X-ray diffraction analysis indicates that there occurs not any new phase formed but the shift of the peaks. It would be expected that a phase reaction resulting in solid solution would happen in the temperature range of 130$0^{\circ}C$ to 150$0^{\circ}C$ between UO2 and ADS.

• Carbon letters
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• 제27권
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• pp.64-71
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• 2018

$TiO_2$-doped activated carbon fibers (ACFs) were successfully prepared as capacitive deionization (CDI) electrode materials by facile ultrasonication-assisted process. ACFs were treated with titanium isopropoxide (TTIP) and isopropyl alcohol solutions of different concentrations and then calcinated by ultrasonication without heat-treatment. The results show that a certain amount of anatase $TiO_2$ was present on the ACF surface. The specific capacitance of the $TiO_2$-doped ACF electrode was remarkably improved (by 93.8% at scan rate of $50mV\;s^{-1}$) over that of the untreated ACF electrode, despite decreases in the specific surface area and total pore volume upon $TiO_2$ doping. From the CDI experiments, the salt adsorption capacity and charge efficiency of the sample with TTIP percent concentration of 15% were found to considerably increase by 71.9 and 57.1%, respectively. These increases are attributed to the improved wettability of the electrode, which increases the number of surface active sites and facilitates salt ion diffusion in the ACF pores. Additionally, the Ti-OH groups of $TiO_2$ act as electrosorption sites, which increases the electrosorption capacity.

• 한국정보통신학회논문지
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• 제16권5호
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• pp.982-988
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• 2012

본 연구에서는 이중게이트(Double Gate; DG) MOSFET에서 문턱전압과 스켈링 이론의 관계를 관찰하였다. 기존 MOSFET의 경우 채널크기에 스켈링 이론을 적용하여 전류 및 스위칭주파수를 해석하였다. 이에 본 연구에서는 이중게이트 MOSFET에서 문턱전압의 경우 스켈링 이론의 적용가능성을 관찰하기 위하여 문턱전압의 변화를 스켈링 인자에 따라 관찰하고 분석하였다. 이를 위하여 이미 검증된 포아송방정식의 해석학적 전위분포를 이용하였으며 이때 가우스함수의 전하분포를 사용하였다. 분석결과 문턱전압이 스켈링 인자에 따라 크게 변화하였으며 변화정도는 도핑농도의 스켈링에 따라 변화한다는 것을 관찰하였다. 특히 이중게이트의 특성상 채널두께 및 채널길이에 스켈링 이론을 적용할 때 가중치를 이용한 변형된 스켈링 이론을 적용함으로써 이중게이트 MOSFET에 가장 타당한 스켈링 이론에 대하여 설명할 것이다.

• Current Photovoltaic Research
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• 제3권4호
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• pp.130-134
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• 2015

The high efficiency cell research processes through the KF post deposition treatment (PDT) of the $Cu(In,Ga)Se_2(CIGS)$ thin film has been very actively progress. In this study, it CIGS thin film deposition process when KF PDT 300 to the processing temperature, 350, $400^{\circ}C$ changed to soda-lime glass (SLG) efficiency of the CIGS thin film characteristics, and solar cell according to Na presence of diffusion from the substrate the effects were analyzed. As a result, the lower the temperature of KF PDT and serves to interrupt the flow of current K-CIGS layer is not removed from the reaction surface, FF and photocurrent is decreased significantly. Blocking of the Na diffusion from the glass substrate is significantly increased while the optical voltage, photocurrent and FF is a low temperature (300, $350^{\circ}C$) in the greatly reduced, and in $400^{\circ}C$ tend to reduce fine. It is the presence of Na in CIGS thin film by electron-induced degradation of the microstructure of CIGS thin film is expected to have a significant impact on increasing the hole recombination rate a reaction layer is formed of the K elements in the CIGS thin film surface.

• 한국산학기술학회논문지
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• 제11권3호
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• pp.827-834
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• 2010

발광층에 도펀트가 도핑된 다층 유기발광다이오드 소자 구조에서의 발광 메카니즘을 검증하기 위해 전기적인 특성요인들을 수치해석 하였다. 본 논문에 적용한 유기발광다이오드 소자는 ITO/NPB/$Alq_3$:C545T(%)/$Alq_3$/LiF/Al으로 이루어져 있으며 도펀트인 C545T의 도핑 농도를 변화시킨 4종류의 소자 구조에 대해 특성 변화를 검토하였다. 그 결과 도펀트의 도핑 농도 변화에 따라서 전압-전류 특성이 변화되어짐을 확인하였고, 이는 참고 문헌에 제시되어 있는 전압-전류밀도 실험 데이터와 매우 잘 일치되었다. 또한 도펀트를 도핑시킨 소자 구조들에서 전압-휘도 특성이 대폭 향상되어 발광효율이 3배정도 향상되었다. 이와 같은 guest-host system이 적용된 유기발광다이오드 소자의 동작 메카니즘을 분석하기 위하여 소자 내부에서의 전계분포, 전하분포, 재결합율 등의 전기적인 항목들에 대한 특성의 변화를 관찰하였다.

• 한국전기전자재료학회논문지
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• 제27권10호
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• pp.662-667
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• 2014

B-doped Si nanoparticles were synthesized by using inductive coupled plasma and specially designed double tube reactor, and their microstructures were investigated. 0~10 sccm of $B_2H_6$ gas was injected during the synthesis of Si nanoparticles from $SiH_4$ gas. Highly crystalline Si nanoparticles were synthesized, and their crystallinity did not change with increase of $B_2H_6$ flow rates. From SEM measurement, their particle sizes were approximately 30 nm regardless of $B_2H_6$ flow rates. From SIMS analysis, almost saturation of B in Si nanoparticles was detected only when 1 sccm of $B_2H_6$ was injected. When $B_2H_6$ flow rate exceeded 5 sccm, higher concentration of B than solubility limit was detected even if any secondary phase was not detected in XRD or HR-TEM results. Due to their high electronic conductivity, those heavily B-doped Si nanoparticles can be a potential candidate for an active material in Li-ion battery anode.