• Title/Summary/Keyword: Doped Cu

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Effect of Mullite Generation on the Strength Improvement of Porcelain (Mullite 생성이 도자기 강도개선에 미치는 영향)

  • Choi, Hyo-Sung;Pee, Jae-Hwan;Kim, Yoo-Jin;Cho, Woo-Seok;Kim, Kyeong-Ja
    • Journal of the Korean Ceramic Society
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    • v.48 no.2
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    • pp.168-172
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    • 2011
  • Alumina powder was added in a general porcelain (Backja) with clay, feldspar and quartz contents to promote the mullite ($3Al_2O_3{\cdot}2SiO_2$) generation in the porcelain. Low melting materials ($B_2O_3(450^{\circ}C)$, $MnO_3(940^{\circ}C)$, CuO($1080^{\circ}C$)) were doped at ~3 wt% to modify the sinterability of porcelain with a high alumina contents and promote the mullite generation. Green body was made by slip casting method with blended slurry and then, they were fired at $1280^{\circ}C$ for 1hr by a $2^{\circ}C/min$. Densifications of samples with high alumina contents (20~30 wt%) were impeded. As the doping contents of low melting materilas increased, the sinterability of samples was improved. The shrinkage rate and bulk density of samples were improved by doping with low melting materials. Mullite phase increased with increasing the low melting contents in the phase analyses. This means lots of alumina and quartz were transformed into mullite phase by low melting contents doping. In the results, high bending strength of samples with high alumina contents was accomplished by improving the densification and mullite generation in the porcelain.

비진공법을 이용한 CIGS광흡수층의 합성과 특성평가

  • Gwon, Yeong-Eun;Park, Jun-Tae;Im, Gi-Hong;Choe, Hyeon-Gwang;Jeon, Min-Hyeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.312.1-312.1
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    • 2014
  • Chalcopyrite계 화합물 반도체인 $Cu(InGa)Se_2$ (CIGS)는 직접천이형 에너지 밴드갭과 전파장 영역에 대하여 높은 광흡수계수($1{\times}$[10]^5/cm)를 가지므로 두께 $1{\sim}2{\mu}m$인 박막형태으로 고효율의 태양전지 제조가 가능하다. 또한, 박막공정의 저가 가능성을 나타내면서 전세계적으로 많은 연구와 관심을 받고 있고, 현재 상용화되어 있는 결정질실리콘 태양전지를 대체할만한 재료로 주목 받고 있다. 일반적으로, CIGS박막형 태양전지 구성은는 유리를 기판으로 하여 5개의 단위 박막인 Mo 후면전극, p형 반도체 CIGS 광흡수층, n형 반도체 CdS 버퍼층, doped-ZnO 상부 투명전극, $MgF_2$ 반사방지막으로 이루어진다. 이들 중에서 태양전지의 에너지 변환효율에 결정적인 영향을 미치는 구성된다. CIGS 광흡수층의 제조는 크게 진공법과 비진공방법으로 나뉜다. 현재까지 보고된 문헌에 따르면 CIGS 박막형 태양전지의 경우에 동시증발법으로 20.3%의 에너지 변환효율을 보였지만,는데, 이는 진공장비 특성상 공정단가가 높고 대면적화가 어렵다는 단점을 가진다. 따라서, 비진공법을 이용하여 광흡수층 제작하는 것이 기술적으로 진보할 여지가 크다고 볼 수 있다. 반면 현재 상용화되어 있는 결정질실리콘 태양전지를 대체할만한 방법으로 주목 받고 있는 비진공을 이용한 저가공정은 최근 15.5%의 에너지 변환효율이 보고 되었다. 비진공법에는 전계를 이용한 증착법 및 스프레이법으로 나뉘며, 이들 광흡수층 재료의 화학적 합성은 III족 원소인 In, Ga의 함량비에 따라 광흡수층의 에너지 밴드갭(1.04~1.5 eV) 조절이 가능하다. 따라서, 본 연구에서는 비진공법에 사용되는 CIGS재료의 화학적 합성조건을 변화시켜 III족 원소의 조성비 조절을 시도하였다. CIGS 분말 시료의 입자 형태와 크기를 FE-SEM을 이용하여 관찰하였고, 화합물의 성분비를 EDX 및 XRD 분석을 통해 Ga 함량에 따른 구조적 차이를 비교해 보았다.

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Effect of Cerium Doping on Superconducting Properties of YBCO Film Prepared by TFA-MOD Method (MOD-TFA공정에 의한 YBCO박막 제조 시 cerium첨가효과에 관한 연구)

  • Yi, Keum-Young;Kwon, Youn-Kyung;Kim, Byeong-Joo;Ahn, Ji-Hyun;Lee, Jong-Beom;Kim, Hye-Jin;Lee, Hee-Gyoun;Hong, Gye-Won;Yoo, Jai-Moo;Ri, Hyung-Chul
    • Progress in Superconductivity
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    • v.8 no.1
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    • pp.87-92
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    • 2006
  • The effects of Ba and Ce addition has been investigated in YBCO prepared by trifluoroacetate(TFA) metalorganic depostition(MOD) method. Precursor solutions with cation ratios of Y:Ba:Cu:Ce=1:2+x:3:x(x=0, 0.05, 0.1 and 1.5) have been prepared by adding an excess amount of cerium and barium. Coated film was calcined at lower temperature under a moisture-containing oxygen atmosphere. Superconducting YBCO films have been obtained by performing conversion heat treatment at temperature of $780{\sim}810^{\circ}C$ under a moisture-containing Ar(1,000 ppm oxygen) atmosphere. It has been shown that the critical current($I_c$) of YBCO film was degraded by doping of Ba and Ce atoms. But $I_c$ was increased as the amount of doped Ba and Ce content increased from 5% to 15 %. It was observed that there was little increase of a flux pinning force with Ba and Ce addition in YBCO film prepared by TFA-MOD process.

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Thermal Degradation of BZO Layer on the CIGS Solar Cells

  • Choi, Pyungho;Kim, Sangsub;Choi, Byoungdeog
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.458-458
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    • 2013
  • We investigated a study on the thermal degradation of boron doped zinc-oxide (BZO) layer which used as a transparent conducting layer on the Cu (In1-xGax) Se2 (CIGS) based thin film solar cells. Devices were annealed under the temperature of $100^{\circ}C$ or 100 hours and then Hall measurement was carried out to characterize the parameters of mobility (${\mu}Hall$), resistivity (${\rho}$), conductivity (${\sigma}$) and sheet resistance (Rsh). The initial values of ${\mu}Hall$, ${\rho}$, ${\sigma}$ and Rsh were $29.3cm^2$/$V{\cdot}s$, $2.1{\times}10^{-3}{\Omega}{\cdot}cm$, $476.4{\Omega}^{-1}{\cdot}cm^{-1}$ and $19.1{\Omega}$/${\Box}$ respectively. After the annealing process, the values were $4.5cm^2$/$V{\cdot}s$, $12.8{\times}10^{-3}{\Omega}{\cdot}cm$, $77.9{\Omega}^{-1}{\cdot}cm^{-1}$ and $116.6{\Omega}$/${\Box}$ respectively. We observed that ${\mu}Hall$ and ${\sigma}$ were decreased, and ${\rho}$ and Rsh were increased. In this study, BZO layer plays an important role of conducting path for electrons generated by incident light onthe CIGS absorption layer. Therefore, the degradation of BZO layer characterized by the parameters of ${\mu}Hall$, ${\rho}$, ${\sigma}$ and Rsh, affect to the cell efficiency.

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Figures of Merit of (K,Na,Li)(Nb,Ta)O3 Ceramics with Various Li Contents for a Piezoelectric Energy Harvester

  • Go, Su Hwan;Kim, Dae Su;Han, Seung Ho;Kang, Hyung-Won;Lee, Hyeung-Gyu;Cheon, Chae Il
    • Journal of the Korean Ceramic Society
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    • v.54 no.6
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    • pp.530-534
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    • 2017
  • The figures of merit in the on-resonance and off-resonance conditions ($FOM_{on}$ and $FOM_{off}$) for the piezoelectric energy harvester (PEH) were measured and compared in $[(K_{0.485}Na_{0.515})_{1-X}Li_X](Nb_{0.99}Ta_{0.01})O_3$ (x = 0.04 ~ 0.09) (KNLNT) ceramics with various Li contents. The crystal structure of CuO-doped KNLNT ceramics changes from orthorhombic to tetragonal around the Li fraction of 0.065. The stable temperature range for the tetragonal phase widens to both higher and lower temperatures as Li is substituted. The piezoelectric charge constant ($d_{33}$), electromechanical coupling factor ($k_p$) and mechanical quality factor ($Q_m$) have maximum values at the Li fraction between 0.055 and 0.065 where the phase boundary lies between the orthorhombic and tetragonal phases. Both $FOM_{on}$ and $FOM_{off}$ have peak values around the phase boundary but the peak compositions are not exactly coincided. The optimal Li fraction in the KNLNT ceramic for a PEH application was found to be between 0.055 and 0.065.

N- and P-doping of Transition Metal Dichalcogenide (TMD) using Artificially Designed DNA with Lanthanide and Metal Ions

  • Kang, Dong-Ho;Park, Jin-Hong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.292-292
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    • 2016
  • Transition metal dichalcogenides (TMDs) with a two-dimensional layered structure have been considered highly promising materials for next-generation flexible, wearable, stretchable and transparent devices due to their unique physical, electrical and optical properties. Recent studies on TMD devices have focused on developing a suitable doping technique because precise control of the threshold voltage ($V_{TH}$) and the number of tightly-bound trions are required to achieve high performance electronic and optoelectronic devices, respectively. In particular, it is critical to develop an ultra-low level doping technique for the proper design and optimization of TMD-based devices because high level doping (about $10^{12}cm^{-2}$) causes TMD to act as a near-metallic layer. However, it is difficult to apply an ion implantation technique to TMD materials due to crystal damage that occurs during the implantation process. Although safe doping techniques have recently been developed, most of the previous TMD doping techniques presented very high doping levels of ${\sim}10^{12}cm^{-2}$. Recently, low-level n- and p-doping of TMD materials was achieved using cesium carbonate ($Cs_2CO_3$), octadecyltrichlorosilane (OTS), and M-DNA, but further studies are needed to reduce the doping level down to an intrinsic level. Here, we propose a novel DNA-based doping method on $MoS_2$ and $WSe_2$ films, which enables ultra-low n- and p-doping control and allows for proper adjustments in device performance. This is achieved by selecting and/or combining different types of divalent metal and trivalent lanthanide (Ln) ions on DNA nanostructures. The available n-doping range (${\Delta}n$) on the $MoS_2$ by Ln-DNA (DNA functionalized by trivalent Ln ions) is between $6{\times}10^9cm^{-2}$ and $2.6{\times}10^{10}cm^{-2}$, which is even lower than that provided by pristine DNA (${\sim}6.4{\times}10^{10}cm^{-2}$). The p-doping change (${\Delta}p$) on $WSe_2$ by Ln-DNA is adjusted between $-1.0{\times}10^{10}cm^{-2}$ and $-2.4{\times}10^{10}cm^{-2}$. In the case of Co-DNA (DNA functionalized by both divalent metal and trivalent Ln ions) doping where $Eu^{3+}$ or $Gd^{3+}$ ions were incorporated, a light p-doping phenomenon is observed on $MoS_2$ and $WSe_2$ (respectively, negative ${\Delta}n$ below $-9{\times}10^9cm^{-2}$ and positive ${\Delta}p$ above $1.4{\times}10^{10}cm^{-2}$) because the added $Cu^{2+}$ ions probably reduce the strength of negative charges in Ln-DNA. However, a light n-doping phenomenon (positive ${\Delta}n$ above $10^{10}cm^{-2}$ and negative ${\Delta}p$ below $-1.1{\times}10^{10}cm^{-2}$) occurs in the TMD devices doped by Co-DNA with $Tb^{3+}$ or $Er^{3+}$ ions. A significant (factor of ~5) increase in field-effect mobility is also observed on the $MoS_2$ and $WSe_2$ devices, which are, respectively, doped by $Tb^{3+}$-based Co-DNA (n-doping) and $Gd^{3+}$-based Co-DNA (p-doping), due to the reduction of effective electron and hole barrier heights after the doping. In terms of optoelectronic device performance (photoresponsivity and detectivity), the $Tb^{3+}$ or $Er^{3+}$-Co-DNA (n-doping) and the $Eu^{3+}$ or $Gd^{3+}$-Co-DNA (p-doping) improve the $MoS_2$ and $WSe_2$ photodetectors, respectively.

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The Crystal and Molecular Structure of p-Phenylenediamine Dihydroperchlorate (p-Phenylenediamine Dihydroperchlorate의 결정 및 분자구조)

  • Ahn Choong Tai
    • Journal of the Korean Chemical Society
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    • v.21 no.5
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    • pp.320-329
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    • 1977
  • p-Phenylenediamine dihydroperchlorate, $C_6H_4N_2H_4{\cdot}2HC1O_4$, crystallizes in space group $P\={1}$ with $a=4.79{\pm}0.02,\;b=9.03{\pm}0.02,\;c=7.12{\pm}0.03{\AA},\;{\alpha}=109.4{\pm}0.2,\;{\beta}=79.6{\pm}0.2,\;r=104.6{\pm}0.2^{\circ},\;Z=1$. The structure has been solved by the Patterson and Fourier methods. The refinement by block-diagonal least-squares cycles gives R = 0.13 for 387 observed reflexions collected on equi-inclination Weissenberg photographs with CuK${\alpha}$ radiation. There are two different types of five hydrogen bonds. The first type consists of one trifurcated N${\cdot}{\cdot}{\cdot}$O hydrogen bond and the second of two normal N${\cdot}{\cdot}{\cdot}$O hydrogen bonds, both of which exist between the amino group and the perchlorate, groups. A p-phenylenediamine group is approximately planar within an experimental error and bonded to twelve perchlorates: ten perchlorates forming hydrogen bonds and two being contacted with the van der Waals forces. A perchlorate group is surrounded by six p-phenylenediamines and four perchlorates; among the six p-phenylenediamines, five of them are hydrogen-bonded, and the rest contacted with the van der Waals force.ce anaysis of our samples and investigated the variarions in the values of parameters obtained through fitting the theoretical impedance to the experimental impedance. The characters of the dielectric constant and the impedance showed abnormal variations for the 0.2 at K-doped NSBN ceramics, which we were able to interpret in terms of the variations in the number A-site vacancies with the K doping ratio. From these results, A-site vacancies are thought to be space charges that influence the ferroelectric properties of NSBN ceramics.

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Control of Graphene's Electrical Properties by Chemical Doping Methods

  • Lee, Seung-Hwan;Choi, Min-Sup;La, Chang-Ho;Yoo, Won-Jong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.119-119
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    • 2011
  • This study examined the synthesis of large area graphene and the change of its characteristics depending on the ratio of CH4/H2 by using the thermal CVD methods and performed the experiments to control the electron-hole conduction and Dirac-point of graphene by using chemical doping methods. Firstly, with regard to the characteristics of the large area graphene depending on the ratio of CH4/H2, hydrophobic characteristics of the graphene changed to hydrophilic characteristics as the ratio of CH4/H2 reduces. The angle of contact also increased to 78$^{\circ}$ from 58$^{\circ}$. According to the results of Raman spectroscopy showing the degree of defect, the ratio of I(D)/I(G) increases to 0.42% from 0.25% and the surface resistance also increased to 950 ${\Omega}$ from 750 ${\Omega}$/sq. As for the graphene synthesis at the high temperature of 1,000$^{\circ}$ by using CH4/H2 in a Cu-Foil, the possibility of graphene formation was determined as a function of the ratio of H2 included in the fixed quantity of CH4 as per specifications of every equipment. It was observed that the excessive amount of H2 prevented graphene from forming, as extra H-atoms and molecules activated the reaction to C-bond of graphene. Secondly, in the experiment for the electron-hole conduction and the Dirac-point of graphene using the chemical doping method, the shift of Dirac-point and the change in the electron-hole conduction were observed for both the N-type (PEI) and the P-type (Diazonium) dopings. The ID-VG results show that, for the N-type (PEI) doped graphene, Dirac-point shifted to the left (-voltage direction) by 90V at an hour and by 130 V at 2 hours respectively, compared to the pristine graphene. Carrier mobility was also reduced by 1,600 cm2/Vs (1 hour) and 1,100 cm2/Vs (2 hours), compared to the maximum hole mobility of the pristine graphene.

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Promoter Effect on Ni/YSZ Anode Catalyst of Solid Oxide Fuel Cell for Suppressing Coke Formation in the Methane Internal Reforming (고체산화물 연료전지용 Ni/YSZ 음극 촉매에서의 메탄 내부개질 반응 시 탄소 침적 억제를 위한 첨가제 영향)

  • Kim, Hye-Roung;Choi, Ji-Eun;Youn, Hyun-Ki;Chung, Jong-Shik
    • Korean Chemical Engineering Research
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    • v.46 no.4
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    • pp.813-818
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    • 2008
  • Various additives were added in small amounts on Ni/YSZ anode of SOFC (solid oxide fuel cell) in order to improve reactivity and to inhibit deactivation due to coke deposition during methane reforming using a low mole ratio steam ($H_2O/CH_4=1.5$) at $800^{\circ}C$. Ni/YSZ catalysts added with various perovskites did not show any improvement but exhibited a gradual decrease in the methane conversion. K-doped Ni/YSZ showed a steady increase and maintenance of the conversion up to 42 hours, after which there was an abrupt deactivation of catalyst owing to potassium loss by volatilization. Addition of 5% of $K_2Ti_2O_5$ on Ni/YSZ showed a stable maintenance of the conversion without K loss, and was able to prevent coke formation during a long time operation. Deactivation of catalyst during the reaction was mainly caused by the accumulation of graphidic carbon on the catalyst surface.

Strain induced/enhanced ferromagnetism in $Mn_3Ge_2$thinfilms

  • Dung, Dang Duc;Feng, Wuwei;Thiet, Duong Van;Sin, Yu-Ri-Mi;Jo, Seong-Rae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.135-135
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    • 2010
  • In Mn-Ge equilibrium phase diagram, many Mn-Ge intermetallic phases can be formed with difference structures and magnetic properties. The MnGe has the cubic structure and antiferromagnetic(AFM) with Neel temperature of 197 K. The calculation predicted that the $MnGe_2$ with $Al_2Cu$-type is hard to separate between the paramagnetic(PM) states and the AFM states because this compound displays PM and AFM configuration swith similar energy. Mn-doped Ge showed the FM with Currie temperature of 285 K for bulk samples and 116 K for thin films. In addition, the $Mn_5Ge_3$ compound has hexagonal structure and FM with Curie temperature around 296K. The $Mn_{11}Ge_8$ compound has the orthorhombic structure and Tc is low at 274 K and spin flopping transition is near to 140 K. While the bulk $Mn_3Ge_2$ exhibited tetragonal structure ($a=5.745{\AA}$;$c=13.89{\AA}$) with the FM near to 300K and AFM below 150K. However, amorphous $Mn_3Ge_2$ ($a-Mn_3Ge_2$) was reported to show spin glass behavior with spin-glass transition temperature (Tg) of 53 K. In addition, the transition of crystalline $Mn_3Ge_2$ shifts under high pressure. At the atmospheric pressure, $Mn_3Ge_2$ undergoes the magnetic phase transition from AFM to FM at 158 K. The pressure dependence of the phase transition in $Mn_3Ge_2$ has been determined up to 1 GPa. The transition was found to occur at 1 GPa and 155 K with dT/dP=-0.3K/0.1 GPa. Here report that Ferromagnetic $Mn_3Ge_2$ thin films were successfully grown on GaAs(001) and GaSb(001) substrates using molecular beam epitaxy. Our result revealed that the substrate facilitates to modify magnetic and electrical properties due to tensile/compressive strain effect. The spin-flopping transition around 145 K remained for samples grown on GaSb(001) while it completely disappeared for samples grown on GaAs(001). The antiferromagnetism below 145K changed to ferromagnetism and remained upto 327K. The saturation magnetization was found to be 1.32 and $0.23\;{\mu}B/Mn$ at 5 K for samples grown on GaAs(001) and GaSb(001), respectively.

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