• 한국자동차공학회논문집
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• 제10권6호
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• pp.90-99
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• 2002

The main purpose of this study lies on the development of micro dilution tunnel based on the Sierra Dilution chamber model. As a primary examination, characteristics of flow and temperature distributions during the steady dilution process in dilution chamber are observed with numerical analysis. The penetration of dilution air through porous tube as well as wall temperature and temperature gradient inside porous tube are examined. The thermophoretic velocity in terms of temperature behavior inside porous tube are defined and examined. Based on the ratio of penetration and thermophoretic velocities, all part of porous tube are shown to be safe from the particulate depositions. However, The inlet portion of porous tube in addition to the portion of impinging of dilution air are marginally safe from the particulate depositions. Generally the safer design against particulate deposition is required in provision f3r steady dilution process and for transient process as well.

• Journal of Advanced Marine Engineering and Technology
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• 제33권5호
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• pp.637-645
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• 2009

The main purpose of this study lies on the improvement of micro dilution tunnel based on the typical porous tube type chamber. The characteristics of flow and temperature fields for steady state has been obtained by numerical analysis using FLUENT. Three different geometrical variations of the porous tube; a) increase of thickness at center, b) step increase of thickness at center and downstream, c) tapered increase of thickness, have been proposed. Accordingly results are obtained and compared in terms of penetration velocity and velocity ratio to therrmophoretic velocity for improvement against particulate deposition inside the tube. The penetration velocity and velocity ratio distributions in the upstream portion and portion of impinging of dilution air are apparently shown to be improved for the case of the step and tapered change of porous tube. The tapered change of tube thickness addition are shown to be the most effective among three geometrical changes. In addition, the considerable improvement against deposition are shown that its thickness should be at least 2mm.

• 한국연소학회:학술대회논문집
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• 한국연소학회 1999년도 제19회 KOSCO SYMPOSIUM 논문집
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• pp.201-207
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• 1999

The combustion characteristics for the low NOx 50 kW-class gas turbine combustor have been experimentally investigated. In order to achieve the premixing and the lean burn combustion, the geometries of the primary zone including premixed chamber were modified from conventional combustor. The centerline profiles of CO and NO concentration, and temperature were measured for the premixed combustors with or without dilution holes in the liner. The effects of the pilot fuel injection rate and air dilution on flame stabilization and pollutant (CO, NO) emission are discussed in detail.

• 한국표면공학회지
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• 제44권2호
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• pp.39-43
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• 2011

Amorphous silicon thin film was deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). Each films were prepared in different dilution in the chamber gas. As a result, silicon crystallites and crystal volume fraction was increased with raising the hydrogen dilution in the gas and optical band gap was decreased. Increasement of the hydrogen contents in the chamber affected on surface roughness. In this study, thickness and surface roughness of the a-Si thin film by different hydrogen dilution was investigated by various techniques.

• Biotechnology and Bioprocess Engineering:BBE
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• 제11권1호
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• pp.54-60
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• 2006

In this paper, we describe a bio-fluidic device for adaptive sample pretreatment, in order to optimize the conditions under which absorbance assays can be conducted. This device can be successfully applied to the measurement of Escherichia coli (E. coli) concentrations using adaptive dilution, with which the dilution ratio can be adjusted during the dilution. Although many attempts have been previously made to miniaturize complex biochemical analyses at the chip scale, very few sample pretreatment processes have actually been miniaturized or automated at this point. Due to the lack of currently available on-chip pretreatments, analytical instruments tend to suffer from a limited range of analysis. This occasionally hinders the direct and quantitative analysis of specific analyses obtained from real samples. In order to overcome these issues, we exploit two novel strategies: dilution with a programmable ratio, and to-and-fro mixing. The bio-fluidic device consists of a rectangular chamber constructed of poly(dimethylsiloxane) (PDMS). This chamber has four openings, an inlet, an outlet, an air control, and an air vent. Each of the dilution cycles is comprised of four steps: detection, liquid drain, buffer injection, and to-and-fro mixing. When using adaptive sample pretreatment, the range in which E. coli concentrations can be measured is broadened, to an optical density (O.D.) range of $0.3{\sim}30$. This device may prove useful in the on-line monitoring of cell concentrations, in both fermenter and aqueous environments.

• 한국미생물·생명공학회지
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• 제20권5호
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• pp.607-613
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• 1992

침강조의 중앙에 깔대기 모양의 판을 설치하고 방해판 아래 다시 공기 방울과 CO2 가스의 별도 배출구를 설치하여 상부로의 난류를 방지하므로 침강 효율이 그게 향상되도록 settler를 고안하였다. 이 settler를 설치한 탑형 발효조에서 응집성효모 S.uvarum의 에탄올 생산성을 검토한 결과 방해판을 설치하지 않은 단순한 원통형 settler에 비하여 1.5배 증대되었다. 또한 탑형 발효조에서 살펴본 균체 순환율이 에탄올 생산성에 미치는 영향을 살펴본 결과 균체 순환울 1-5 사이에서는 에탄올 생산성의 변화가 거의 없었으나 6 이상에서는 균체가 유출되므로 에탄올 생산성이 감소하였다.

• 한국가스학회지
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• 제26권5호
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• pp.35-40
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• 2022

태양광 전지 제조 설비인 PCVD(Plasma Chemical Vapor Deposition)는 NH₃, SIH₄, O₂를 Chamber에 주입하여 생성된 Plasma를 Wafer에 증착시키는 설비이다. PCVD설비에서 Gas 이동과 주입이 Gas Cabinet에서 이루어지며, 내부에는 MFC, Regulator, Valve, Pipe 등이 복잡하게 연결되어 많은 누출 점이 존재한다. 폭발 상한값(UEL) 33.6%, 폭발 하한값(LEL) 15%의 NH₃ 누출 시 폭발을 예방하기 위해서는 NH₃ 농도가 폭발 범위에서 벗어날 수 있는 희석능력이 있어야 한다. 본 연구는 기존 PCVD의 Gas Cabinet에 대한 NH₃ Gas 누출 시 희석능력을 3D와 수치로 확인할 수 있는 CFD 분석 기법을 활용하여 분석하였다. 그 결과 중희석에 해당되며 설비 개선을 통해 고환기가 가능하다는 결론을 얻었다.

• Journal of Korean Society for Atmospheric Environment
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• 제21권E3호
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• pp.75-85
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• 2005

A mathematical sensitivity analysis of the flow-through dynamic flux chamber technique, which has been utilized usually for various trace gas flux measurement from soil and water surface, was performed in an effort to provide physical and mathematical understandings of parameters essential for the NO flux calculation. The mass balance equation including chemical reactions was analytically solved for the soil NO flux under the steady state condition. The equilibrium concentration inside the chamber, $C_{eq}$, was found to be determined mainly by the balance between the soil flux and dilution of the gas concentration inside the chamber by introducing the ambient air. Surface deposition NO occurs inside the chamber when the $C_{eq}$ is greater than the ambient NO concentration ($C_{0}$) introducing to the chamber; NO emission from the soil occurs when the $C_{eq}$ is less than the ambient NO concentration. A sensitivity analysis of the significance of the chemical reactions of NO with the reactive species (i.e. $HO_{2},/CH_{3}O_{2},/O_{3}$) on the NO flux from soils was performed. The result of the analysis suggests that the NO flux calculated in the absence of chemical reactions and wall loss could be in error ranges from 40 to $85\%$ to the total flux.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.632-635
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• 2001

Microcrystalline Si films have been deposited by using five W-wire filaments of 0.5 mm diameter for hot-wire chemical vapor deposition (HWCVD). We compared the HWCVD grown films with the film exposed to transformer couple plasma system for the modification of seed layer. W-wire filament temperature was maintained below 1600$^{\circ}C$ to avoid metal contamination by thermal evaporation at the filament. Deposition conditions were varied with H$_2$dilution ratio, with and without plasma treatment. From the Raman spectra analysis, we observed that the film crystallization was strongly influenced by the H$_2$dilution ratio and weakly depended on the distance between the wire and a substrate. We were able to achieve the crystalline volume fraction of about 70% with an SiH$_4$/H$_2$ratio of 1.3%, a wire temperature of 1514$^{\circ}C$, a substrate separation distance of 4cm, and a chamber pressure of 38 mTorr. We investigated the influence of ${\mu}$c-Si film properties by using a plasma treatment. This article also deals with the influence of the H$_2$dilution ratio in crystallization modification.

• 한국분무공학회지
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• 제3권1호
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• pp.19-26
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• 1998

The effect of mixture component makes a nelay time and a long total combustion period $\tau_{p\;max}$. The flame propagation delay $\tau_{df}$ was determined by the record of current ion. The pressure release delay $\tau_{dp}$ and $\tau_{p\;max}$ were determined by the indicated pressure diagram in constant volume of the combustion chamber. The results are as follows: 1) The ignition delay $\tau_t$ time takes the minimum value around $\Phi=1.15$. 2) $\tau_{df}$ and $\tau_t$ time increased according to the increases of the concentrated dilution gases, because the adiabatic flame temperature decreased due to the increases of the heat capacity. But dilution gases have little effect on flame nucleus formation delay 3) The relation between $\tau_t$ time and reciprocal laminar burning velocity is almost linear. 4) The increase of the propagation length is accompanied with increased ratio of the $\tau_{df},\;\tau_{dp},\;\tau_{t},\;\tau_{p\;max}$.