• Korean Journal of Optics and Photonics
• /
• v.10 no.5
• /
• pp.386-390
• /
• 1999

Erasable polarization holographic grating was recorded with two-wave mixing in PCN which was side-chain liquid crystalline polymalonic esters containing two symmetrical 4-cyanoazobenzene as photoresponsive groups. The diffraction efficiency of recorded grating was measured and the characteristics of recording, decay in a dark room and erasing by circularly polarized light were investigated. As the results, birefringence, $\Delta$n of PCN was measured $6.5{\times}10^{-2}$, which was 0~100 times higher than those of crystals such as Fe:$LiNbO_3$, Ce:$BaTiO_3$ crystals. Dark decay rates was $4.3{\times}10^{-5}$ %/hour, which showed the possibility of application as data storage media.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.50 no.1
• /
• pp.6-10
• /
• 2001

In this study, we investigated the optical properties of sub-wavelength a-Si thin film transmission gratings, especially the polarization effect, the phase difference and the birefringence by using linearly polarized He-Ne laser beam (632.8nm). The a-Si transmission grating of the thickness $of < 0.1 \mum$ with four-type period($\Lambda = 0.4 \mum and 0.6 \mum$ for sub-wavelength and $\Lambda = 1.0 \mum and 1.4 \mum$ for above-wavelength) on quartz substrates have been fabricated using 50 KeV Ga+ Focused-Ion-Beam(FIB) Milling and $CF_4$Reactive-Ion-Etching(RIE) method. Finally, we obtained the trating array of a-Si thin film with a period $0.4 \mum, 0.6 \mum, 1.0 \mum, 1.4 \mum$ which have nearly equal finger spacing and width, sucessfully. Especially, for gratings with $\Lambda = 0.6 \mum(linewidth=0.25 \mum, linespace=0.35\mum), the \etamax at \theta_в=17.0^{\circ}$ is estimated to be 96%. As the results, we believe that the sub-wavelength grating arrayed a-Si thin film has the applicability as the optical device and components.

• Korean Journal of Optics and Photonics
• /
• v.14 no.3
• /
• pp.321-326
• /
• 2003

We constructed grating- tuned external cavity semiconductor lasers using Littman and Littrow configuration, for which the wavelengths are tuned by rotation of the grating. This wavelength tunable semiconductor laser is one of the main devices of WDM optical communication. In Littman configuration, the wavelength range of about 60 nm (The C- and L-band range of 1,530~1,590 nm) was obtained by changing the incidence angle of the grating about $\pm$1$^{\circ}$ from the incidence angle of 70$^{\circ}$. In the 40 nm tuning range, the output power variation was less than 1.25 ㏈ and the side mode suppression ratio(SMSR) was 32 ㏈. In Littrow configuration (The incidence angle and the first order diffraction angle is the same, i.e. $\alpha$=$\delta$), the wavelength tuning range was about 80 nm for the same conditions used in Littman configuration except the incidence angle ($\alpha$=49$^{\circ}$). In 60 nm tuning range, the output power variation was less than 1.5 ㏈ and SMSR was 35 ㏈.

• Korean Journal of Optics and Photonics
• /
• v.19 no.1
• /
• pp.20-24
• /
• 2008

A color filter was proposed and demonstrated by incorporating a subwavelength patterned 1-dimensional grating in poly silicon. It was produced by employing the laser interference lithography method, providing much wider effective area compared to the conventional e-beam lithography. A $SiO_2$ layer was introduced on top of the silicon grating layer as a mask for the etching of the silicon, facilitating the etching of the silicon layer. It was theoretically found that the selectivity of the filter was also improved thanks to the oxide layer. The parameters for the designed device include the grating pitch of 450 nm, the grating height of 100 nm and the oxide-layer height of 200 nm. As for the fabricated filter, the spectral pass band corresponded to the blue color centered at 470 nm and the peak transmission was about 40%. Within the effective area of $3{\times}3mm^2$, the variation in the relative transmission efficiency and in the center wavelength was less than 10% and 2 nm respectively. Finally, the influence of the angle of the incident beam upon the transfer characteristics of the device was investigated in terms of the rate of the relative transmission efficiency, which was found to be equivalent to 1.5%/degree.

• Korean Journal of Optics and Photonics
• /
• v.23 no.4
• /
• pp.135-142
• /
• 2012

We have developed a measurement method of the refractive index profile of an optical fiber by using diffraction phase microscopy. In the microscope system, the reference light was extracted directly from the probe light that passed through the sample by means of pinhole filtering with a diffraction grating. The spatial interference pattern produced by the probe light and the reference light was processed to generate the phase image of the sample fiber. The index profile was obtained by the inverse Abel transform of the phase profile. In order to remove the background phase that originated from the index difference between the cladding and the surrounding medium, the background phase was calculated from the phase data of the cladding to make a core phase profile that can be directly transformed to the index profile of the core without the full phase image that includes the entire cladding part.

• Korean Journal of Optics and Photonics
• /
• v.6 no.4
• /
• pp.331-336
• /
• 1995

The steady-state absorption saturation of the photodarkend SDG was investigated. The absorption saturation intensity was observed to increase for the photodarkened sample. The diffraction efficiency of the permanent grating due to photodarkening was also measured using the backward DFWM technique. For the low backward pump intensity, the diffraction efficiency was proportional to the intensity of the pump beam. The origin of increasing diffraction efficiency is attributed to the difference in absorption between the permanent gratings created by photodarkening. ening.

• Journal of the Optical Society of Korea
• /
• v.10 no.3
• /
• pp.105-111
• /
• 2006

A novel image quality evaluation method, which is based on combination of the rigorous grating diffraction theory and the ray-optic method, is proposed. It is applied for design optimization and, tolerance analysis of optical imaging systems implementing diffractive optical elements (DOE). The evaluation method can predict the quality and resolution of the image on the image sensor plane through the optical imaging system. Especially, we can simulate the effect of diffraction efficiencies of DOE in the camera lenses module, which is very effective for predicting different color sense and MTF performance. Using this method, we can effectively determine the fabrication tolerances of diffractive and refractive optical elements such as the variations' in profile thickness, and the shoulder of the DOE, as well as conventional parameters such as decenter and tilt in optical-surface alignments. A DOE-based 2M-resolution camera lens module designed by the optimization process based on the proposed image quality evaluation method shows ${\sim}15%$ MTF improvement compared with a design without such an optimization.

• Journal of the Korean Vacuum Society
• /
• v.7 no.s1
• /
• pp.140-148
• /
• 1998

We prepared $C_3N_4$ films by rf plasma enhanced chemical vapor deposition(PCVD) and alternating $C_3N_4$/TiN composite films by dc magnetron sputtering. X-ray diffraction (XRD) and transmission electron diffraction (TED) revealed that the structure of the films is amorphous or polycrystalline, depending on deposition conditions and heat treatment. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) spectroscopy confirmed the presence of $sp_3\; and sp _2$ hybridized C atoms bonded with N atoms in the tetrahedral and hexagonal configurations, respectively. Graphite-free $C_3N_4$ films were obtained by PCVD under optimal conditions. To prepare well crystallized $C_3N_4$ films by magnetron sputtering, we introduced negatively biased gratings in the sputtering system. CN films deposited at grating voltages (Vg) lower than 400V are amorphous. Crystallites of cubic and $\beta$-$C_3N_4$ were formed at increased voltages.

• Korean Journal of Optics and Photonics
• /
• v.10 no.5
• /
• pp.391-395
• /
• 1999

We present the measurement of the diffraction efficiency and response time of the photorefractive grating recorded in $LiNbO_3$ photorefractive crystal doped with 4%-mole MgO. Two laser sources were used in the experiments; frequency-doubled Q-switched Nd:YAG laser ($\lambda$=532 nm) and cw Ar-ion laser ($\lambda$=514.5 nm). The same optical geometry was also used in both experiments in order to maintain the experimental consistency. Using the two-wave mixing scheme in both experiments we measured the maximum diffraction efficiency in the range of beam intensity of 1.6~100 W/ $\textrm{cm}^2$, and the response times for both cases of recording and erasing. Two sets of results obtained from the experiments are compared and analyzed.

• Proceedings of the Optical Society of Korea Conference
• /
• 2007.07a
• /
• pp.275-276
• /
• 2007

A multiplex recording and reading technique in photopolymer are presented In order to record the polarization gratings, polarization-sensitive materials, in which linear birefringence is induced by irradiating the polarized light, are necessary. We checked orthogonal and independence of laser. The value of the photoinduced linear polarization had effect on diffraction properties in the holographic gratings. The grating strengths of two polarization are investigated and the relevant parameters for equal diffraction intensity readout are optimized.