• 제목/요약/키워드: Diamond Thin Films

검색결과 204건 처리시간 0.027초

Synthesis of Diamond Thin Film by Helicon Plasma Chemical Vapor Deposition

  • Hyun, Jun-Won;Kim, Yong-Kin
    • Transactions on Electrical and Electronic Materials
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    • 제1권1호
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    • pp.1-5
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    • 2000
  • Diamond films have been achieved on Si(100) substrates using helicon plasma chemical vapor deposition(HPCVD), Gas mixtures with methane and hydrogen have been used. The growth characteristics were investigated by means of X-ray photoelectroton spectroscopy, Atomic force microscopy and X-ray diffraction. We obtained a plasma density as high as 10$\^$10/~10$\^$11/ cm$\^$-3/ by helicon source. The smooth(100) faces of submicron diamond crystallites were found to exhibit pyramidal shaped architecture, The XPS spectrum for the nucleation layer indicates the presence of diamond at 285.4 eV, close to the reported value of 285.5 eV for diamond , XRD results demonstrates the existence of polycrystalline diamond as the diamond (111) and (220) peaks.

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The Effect of Initial DC Bias Voltage on Highly Oriented Diamond Film Growth on Silicon

  • Dae Hwan Kang;Seok Hong Min;Ki Bum Kim
    • The Korean Journal of Ceramics
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    • 제3권1호
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    • pp.13-17
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    • 1997
  • It is identified that the diamond films grown o bias-treated (100) silicon showed different surface morphologies and film textures according to the initial applied dc bias voltage at the same growth condition. The highly oriented diamond film (HODF) was successfully grown on -200 V bias-treated silicon substrate in which the heteroepitaxial relation of $(100)_{dimond}//(100)_{si}\; and\; [110]_{diamond}//[110]_{si}$ was identified. On the contrary, the heteroepitaxial relation was considerably disturbed in the samples bias-voltage was a key factor in growing the highly oriented diamond film on (100) silicon substrate. Considering the experimental results, we proposed a new model about heteroepitaxial diamond growth on silicon, in which 9 diamond unit cell are matched with 4 silicon cells and the bond covalency of both atoms is satisfied via the intermediate layer at the interface as well.

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도핑되지 않은 다이아몬드 박막의 전기전도 경로와 전도기구 연구 (Studies on the Conducion path and Conduction Mechanism in undeped polycrystalline Diamond Film)

  • 이범주;안병태;이재갑;백영준
    • 한국재료학회지
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    • 제10권9호
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    • pp.593-600
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    • 2000
  • 본 연구에서는 도핑하지 않은 다이아몬드 박막에서의 전류전도 경로를 체계적으로 규명하고 다이아몬드 박막의 전도기구에 대해 조사하였다. 도핑되지 않은 다결정 다이아몬드 박막에서 두께와 측정방향에 따른 교류 임피던스법에 의해 측정된 저향값이 기존의 표면전도 모델과는 일치하지 안니하였다. 다이아몬드 박막에 구리를 전기도금한 결과 구리는 결정립계에만 불연속적으로 도금되었고 다이아몬드 박막 위에 은을 증착한 후 전지에칭을 한 결과 결정립계가 우선 에칭이 되어 전류가 결정립계를 통하여 흐름을 확인하였다. 또, 리본형 다이아몬드 박막의 표면을 절연층으로 형성시킨 후 박막 내부의 결정립계를 통하여 전류가 흘러 전기도금이 되는 것으로부터 다결정 다이아몬드 박막의 주요 전기전도 경로는 결정립계임을 확인하였다. 높은 전기전도도를 보여주는 다이아몬드 박막은 전도 활성화 에너지가 45meV 정도이었고 dangling bond 밀도는 낮았다. 그러나 산소 열처리나 수소플라즈마처리가 Si passivation 이론과는 반대로 dangling bond 밀도를 증가시키면서 전기전도성을 떨어뜨렸다. 이 결과들과 표면의 탄소화학결합을 연결시켜 높은 전도성을 야기시키는 결합은 H-C-C-H 결합임을 추론하였다.

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Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films

  • Ko, Minjung;Jun, Yee Sle;Lee, Na Rae;Kang, Suhee;Moon, Kyoung Il;Lee, Caroline Sunyong
    • 한국세라믹학회지
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    • 제56권3호
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    • pp.317-324
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    • 2019
  • Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 × 10-2 ㎂/㎠, and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.

NDLC 박막 위에 Ion Beam 배향한 TN-LCD의 전기광학특성 (EO Characteristics of the ion Beam Aligned TN-LCD on the NDLC Thin Film Surface)

  • 박창준;황정연;강형구;안한진;김경찬;김종복;백홍구;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1054-1057
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    • 2004
  • The nitrogenated diamond-like carbon (NDLC) exhibits high electrical resistivity and thermal conductivity that are similar to the properties shown by diamond-like carbon (DLC) films. These diamond-like transparent properties in NDLC come in a material consisting of $sp^2$-bonded carbon versus the $sp^3$-carbon of DLC. The diamond-like properties and nondiamond-like bonding make NDLC an attractive candidate for applications. Liquid crystal (LC) alignment capabilities with ion beam exposure on NDLC thin films and electro-optical (EO) performances of the ion-beam-aligned twisted nematic liquid crystal display (TN-LCD) with oblique ion beam exposure on the NDLC thin film surface were studied. An excellent uniform alignment of the nematic liquid crystal (NLC) alignment with the ion beam exposure on the NDLC thin films was observed. In addition, it can be achieved that the good EO properties of the ion-beam-aligned TN-LCD. Finally, we will present the residual DC property of the ion-beam-aligned TN-LCD on the NDLC thin film surface.

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붕소가 도핑된 다이아몬드전극을 이용한 오존발생기의 전기화학적 특성 (Eletrochemical Characteristics of Ozone Generator using Boron-doped Diamond Electrode)

  • 오원균;김규식;;;박수길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.585-588
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    • 2001
  • Thin. Boron-doped conducting diamond films are expected to be excellent electrodes for industrial electrolysis. Boron-doped conducting diamond films were used as anode for generating ozone gas by electrolysis of acidic solution. In this work, we have studied ozone generating system using Boron-doped Diamond electrode. Electrochemical cell and ozone generating system were designed for decreasing the temperature of the system. which was elevated during the reaction. by circulation of electrolyte in the system. In order to determine the ozone generation properties of diamond electrode. experimental conditions, electrolyte concentration, temperature, flow rate and reaction time were varied diversely. As a result, we could confirm that ozone gas was generated successfully and the performance of diamond electrode was stable while $PbO_2$ electrode was disintegrated. Actually we are found that ozone amount increased by lowering the temperature of electrolyte.

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붕소가 도핑된 다이아몬드전극을 이용한 오존발생기의 전기화학적 특성 (Eletrochemical Characteristics of Ozone Generator using Boron-doped Diamond Electrode)

  • 오원균;김규식;;;박수길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.585-588
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    • 2001
  • Thin, Boron-doped conducting diamond films are expected to be excellent electrodes for industrial electrolysis. Boron-doped conducting diamond films were used as anode for generating ozone gas by electrolysis of acidic solution. In this work, we have studied ozone generating system using Boron-doped Diamond electrode. Electrochemical cell and ozone generating system were designed for decreasing the temperature of the system, which was elevated during the reaction. by circulation of electrolyte in the system. In order to determine the ozone generation properties of diamond electrode, experimental conditions, electrolyte concentration, temperature, flow rate and reaction time were varied diversely. As a result, we could confirm that ozone gas was generated successfully and the performance of diamond electrode was stable while PbO$_2$ electrode was disintegrated. Actually we are found that ozone amount increased by lowering the temperature of electrolyte.

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$CH_4-H_2-O_2$계로부터 성장된 Diamond 박막의 Raman spectra (Raman spectra of Diamond thin film grown from $CH_4-H_2-O_2$ system)

  • 구효근;박승태;최종규;박상현;박재철
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1490-1492
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    • 1994
  • Diamond thin films were deposited on Si substrate from $CH_4-H_2-O_2$ system by MWPECVD at the condition of power of 800W, pressure of 80torr, $H_2$ flow rate of $75{\sim}81sccm$, $O_2$ flow rate of $0{\sim}3.8sccm$, $CH_4$ flow rate of $4.8{\sim}9sccm$, substrate temp, of $950{\sim}1010^{\circ}C$ and deposition time of 5hr. The deposited films were characterized by SEM, XRD and Raman spectroscopy. The growth rates of thin films and particles was measured. Good quality were synthesized at 40% of oxygen concentration which 6% of fixed metane concentration, and at 50%. Its deposition rates were $2.4{\mu}m/h$ respectively. As oxygen concentration increased, it was known that the broad peak of $1350 cm^{-1}$ was shifted to $1332cm^{-1}$ due to etching of carbon component.

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전처리 공정에 따른 보론 첨가 다이아몬드 박막의 성장 거동 (Study on the growth of boron-doped diamond films in relation to pretreatment processes)

  • 유미영;이송현;송풍근
    • 한국표면공학회지
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    • 제57권1호
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    • pp.1-7
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    • 2024
  • The study investigated the impact of substrate pretreatment on depositing high-quality B-doped diamond (BDD) thin films using the HFCVD method. Films were deposited on Si and Nb substrates after sanding and seeding. Despite identical sanding conditions, BDD films formed faster on Nb due to even diamond seed distribution. Post-deposition, film average roughness (Ra) remained similar to substrate Ra, but higher substrate Ra led to decreased crystallinity. Nb substrate with 0.83 ㎛ Ra exhibited faster crystal growth due to dense, evenly distributed diamond seeds. BDD film on Nb with 0.83 ㎛ Ra showed a wide, stable potential window (2.8 eV) in CV results and a prominent 1332 cm-1 diamond peak in Raman spectroscopy, indicating high quality. The findings underscore the critical role of substrate pretreatment in achieving high-quality BDD film fabrication, crucial for applications demanding robust p-type semiconductors with superior electrical properties.