• Title/Summary/Keyword: Device degradation

검색결과 478건 처리시간 0.026초

항온항습 환경에 노출된 Al2O3 ALD 박막의 특성 평가 (Characteristics Evaluation of Al2O3 ALD Thin Film Exposed to Constant Temperature and Humidity Environment)

  • 김현우;송태민;이형준;전용민;권정현
    • 반도체디스플레이기술학회지
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    • 제21권2호
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    • pp.11-14
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    • 2022
  • In this work, we evaluated the Al2O3 film, which was deposited by atomic layer deposition, degraded by exposure to harsh environments. The Al2O3 films deposited by atomic layer deposition have long been used as a gas diffusion barrier that satisfies barrier requirements for device reliability. To investigate the barrier and mechanical performance of the Al2O3 film with increasing temperature and relative humidity, the properties of the degraded Al2O3 film exposed to the harsh environment were evaluated using electrical calcium test and tensile test. As a result, the water vapor transmission rate of Al2O3 films stored in harsh environments has fallen to a level that is difficult to utilize as a barrier film. Through water vapor transmission rate measurements, it can be seen that the water vapor transmission rate changes can be significant, and the environment-induced degradation is fatal to the Al2O3 thin films. In addition, the surface roughness and porosity of the degraded Al2O3 are significantly increased as the environment becomes severer. the degradation of elongation is caused by the stress concentration at valleys of rough surface and pores generated by the harsh environment. Becaused the harsh envronment-induced degradation convert amorphous Al2O3 to crystalline structure, these encapsulation properties of the Al2O3 film was easily degraded.

장치와 태스크 간 입출력 데이터 교환의 예측성 향상 방안 (METHODOLOGY TO ENHANCE THE PREDICTABILITY OF I/O DATA EXCHANGE BETWEEN DEVICE AND TASKS)

  • 구철회;양군호;최성봉
    • Journal of Astronomy and Space Sciences
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    • 제24권4호
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    • pp.451-456
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    • 2007
  • 장치로부터 발생된 데이터는 소프트웨어에서 사용되기 위해 최대한 정확한 시간에 데이터의 완결성을 가지고 해당 태스크에 전달되어야 한다. 이 과정에서 구조적인 위험성과 성능 저하가 발생할 원인이 잠재되어 있다. 이 논문은 장치와 태스크 사이에서 I/O 데이터 교환이 발생할 시 충돌에 의해서 발생가능한 데이터 손실을 예방할 수 있는 방안을 기술한다. 이 논문에서 기술하는 방안에 대한 메커니즘의 예시도를 제안하고 그 효과 및 장단점을 고찰하였다.

중첩전압(직류+교류 60Hz)에서 산화아연 피뢰기 소자의 누설전류 특성 (The characteristic of leakage current in ZnO surge arrestor elements with mixed direct and 60Hz voltage)

  • 이복희;박건영;강성만;최휘성;오성균
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.186-188
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    • 2003
  • The ZnO surge arrester is the protective device for limiting surge voltages on equipment by diverting surge current and returning the device to its original status. The occurrence of overvoltage appears in any phase to AC power supply system and it appears in mixing AC and impulse voltages, moreover because HVDC power supply system uses converter in semiconductor, it makes mixed DC and high harmonics voltages. In this study, the various mixed AC and DC voltages was made for investigating the degradation effect of ZnO arrester according to mixed voltage. As a result, the increase of DC component to mixed voltages causes the increase of resistive component of total leakage current to ZnO block. In changing V-I curve for mixed voltages, the cross-over point acts a factor as making the proper capacitor size of an equivalent circuit for ZnO block.

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에너지 효율성을 고려한 랩터 코드 기반의 스크린 미러링 (Raptor Codes-based Screen Mirroring for Energy Efficiency)

  • 고윤민;송황준
    • 정보과학회 컴퓨팅의 실제 논문지
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    • 제23권2호
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    • pp.134-139
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    • 2017
  • 기존의 스크린 미러링 시스템들은 패킷 손실에 취약하며 제한적인 모바일 기기의 에너지를 효율적으로 사용하지 못하는 단점을 가지고 있다. 이를 극복하기 위해 본 연구에서는 패킷 손실에 강인하고 에너지 효율적인 스크린 미러링 시스템을 제안한다. 제안하는 시스템은 패킷 손실로 인한 스크린 미러링 영상의 품질 저하를 완화하기 위해 전방오류정정 기술의 한 종류인 랩터 코드를 적용한다. 그리고 모바일 기기의 효율적인 에너지 사용을 위해 스크린 미러링 데이터에 대한 트래픽 셰이핑을 적용하고, 랩터 인코딩 매개 변수를 조절한다. 제안하는 시스템은 싱글 보드 컴퓨터를 사용하여 실제로 구현 되었으며, WiFi Direct 네트워크 상에서 성능을 검증하였다.

Dual-Gate Surface Channel 0.1${\mu}{\textrm}{m}$ CMOSFETs

  • Kwon, Hyouk-Man;Lee, Yeong-Taek;Lee, Jong-Duk;Park, Byung-Gook
    • Journal of Electrical Engineering and information Science
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    • 제3권2호
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    • pp.261-266
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    • 1998
  • This paper describes the fabrication and characterization of dual-polysilicon gated surface channel 0.1$\mu\textrm{m}$ CMOSFETs using BF2 and arsenic as channel dopants. We have used and LDD structure and 40${\AA}$ gate oxide as an insulator. To suppress short channel effects down to 0.1$\mu\textrm{m}$ channel length, shallow source/drain extensions implemented by low energy implantation and SSR(Super Steep Retrograde) channel structure were used. The threshold voltages of fabricated CMOSFETs are 0.6V. The maximum transconductance of nMOSFET is 315${\mu}$S/$\mu\textrm{m}$, and that of pMOSFET is 156 ${\mu}$S/$\mu\textrm{m}$. The drain saturation current of 418 ${\mu}$A/$\mu\textrm{m}$, 187${\mu}$A/$\mu\textrm{m}$ are obtained. Subthreshold swing is 85mV/dec and 88mV/dec, respectively. DIBL(Drain Induced Barrier Lowering) is below 100mV. In the device with 2000${\AA}$ thick gate polysilicon, depletion in polysilicon near the gate oxide results in an increase of equivalent gate oxide thickness and degradation of device characteristics. The gate delay time is measured to be 336psec at operation voltage of 2V.

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Zr과 ZrNi로 구성된 고체연료의 노화 연구 Part 2: 화학반응식 추출 및 성능모사 (Aging of Solid Fuels Composed of Zr and ZrNi Part 2: Kinetics Extraction for Full Simulation)

  • 한병헌;박윤식;;류재용;여재익
    • 한국추진공학회지
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    • 제24권2호
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    • pp.14-27
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    • 2020
  • 본 연구는 점화제와 지연제에 대한 시차 주사 열량 측정법을 통하여 반응 속도식 및 발열량을 추출하여 노화에 따른 반응 특성을 분석하기 위한 정밀 수치계산을 수행하였다. 연소 실험을 수행하여 수분이 관여된 노화에서 점화제와 지연제에서 명확한 연소 중단을 확인하였다. 이 결과를 수치계산과 비교하여 노화가 점화제와 지연제 전반에 성능 감소 및 오작동 요인으로 작용됨을 확인하였다.

SONOS 비휘발성 기억소자의 향상된 프로그램/소거 반복 특성 (The Improved Electrical Endurance(Program/Erase Cycles) Characteristics of SONOS Nonvolatile Memory Device)

  • 김병철;서광열
    • 한국전기전자재료학회논문지
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    • 제16권1호
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    • pp.5-10
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    • 2003
  • In this study, a new programming method to minimize the generation of Si-SiO$_2$interface traps of SONOS nonvolatile memory device as a function of number of porgram/erase cycles was proposed. In the proposed programming method, power supply voltage is applied to the gate. forward biased program voltage is applied to the source and the drain, while the substrate is left open, so that the program is achieved by Modified Fowler-Nordheim(MFN) tunneling of electron through the tunnel oxide over source and drain region. For the channel erase, erase voltage is applied to the gate, power supply voltage is applied to the substrate, and the source and dram are left open. Also, the asymmetric mode in which the program voltage is higher than the erase voltage, is more efficient than symmetric mode in order to minimize the degradation characteristics or SONOS devices because electrical stress applied to the Si-SiO$_2$interface is reduced due to short program time.

노화효과를 고려한 저전력 셀프 튜닝 디지털 시스템의 설계 (Design of a Low Power Self-tuning Digital System Considering Aging Effects)

  • 이진경;김경기
    • 대한임베디드공학회논문지
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    • 제13권3호
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    • pp.143-149
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    • 2018
  • It has become ever harder to design reliable circuits with each nanometer technology node; under normal operation conditions, a transistor device can be affected by various aging effects resulting in performance degradation and eventually design failure. The reliability (aging) effect has traditionally been the area of process engineers. However, in the future, even the smallest of variations can slow down a transistor's switching speed, and an aging device may not perform adequately at a very low voltage. Therefore, circuit designers need to consider these reliability effects in the early stages of design to make sure there are enough margins for circuits to function correctly over their entire lifetime. However, such an approach excessively increases the size and power dissipation of a system. As the impact of reliability, new techniques in designing aging-resilient circuits are necessary to reduce the impact of the aging stresses on performance, power, and yield or to predict the failure of a system. Therefore, in this paper, a novel low power on-chip self-tuning circuit considering the aging effects has been proposed.

Device Characteristics and Hot Carrier Lifetime Characteristics Shift Analysis by Carbon Implant used for Vth Adjustment

  • Mun, Seong-Yeol;Kang, Seong-Jun;Joung, Yang-Hee
    • Journal of information and communication convergence engineering
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    • 제11권4호
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    • pp.288-292
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    • 2013
  • In this paper, a carbon implant is investigated in detail from the perspectives of performance advantages and side effects for the thick n-type metal-oxide-semiconductor field-effect transistor (n-MOSFET). Threshold voltage ($V_{th}$) adjustment using a carbon implant significantly improves the $V_{th}$ mismatch performance in a thick (3.3-V) n-MOS transistor. It has been reported that a bad mismatch occurs particularly in the case of 0.11-${\mu}m$ $V_{th}$ node technology. This paper investigates a carbon implant process as a promising candidate for the optimal $V_{th}$ roll-off curve. The carbon implant makes the $V_{th}$ roll-off curve perfectly flat, which is explained in detail. Further, the mechanism of hot carrier injection lifetime degradation by the carbon implant is investigated, and new process integration involving the addition of a nitrogen implant in the lightly doped drain process is offered as its solution. This paper presents the critical side effects, such as Isub increases and device performance shifts caused by the carbon implant and suggests an efficient method to avoid these issues.

Time Delay and Integration(TDI)을 사용하는 위성 영상 기기의 고도 및 촬영각 변화에 대한 성능 특성 (Performance Characteristics for the Variation of Altitude and Tilt Angle in the Satellite Imager Using Time Delay and Integration(TDI))

  • 조영민
    • 대한원격탐사학회지
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    • 제18권2호
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    • pp.91-96
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    • 2002
  • 고정 검출 시간(Integration Time)을 갖고 Time Delay and Integration(TDI) Charge Coupled Device (CCD) 검출기를 사용하는 위성 영상 기기에서 위성의 고도 및 촬영각의 변화에 대한 영상 기기의 기하 성능 특성을 TDI 불일치와 관련하여 분석하였다. 본 분석을 통하여 고도 저하에 따른 기하 성능 저하를 보완할 수 있는 방법으로서 경사 촬영을 통한 TDI 불일치 제거를 제안하였고 저하된 고도에서 TDI 일치로 최적 성능을 줄 수 있는 최적 경사 촬영각을 구하였다. 본 결과는 임의의 범위의 가변 검출 시간을 갖는 TDI CCD 위성 영상 기기에도 적용 가능하다.