• Title/Summary/Keyword: Deposition system

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The ZnS Film Deposition Technology for Cd-free Buffer Layer in CIGS Solar Cells

  • Lee, Jae-Hee;Hwang, Do-Weon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.218-218
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    • 2011
  • The CIGS Solar Cells have the highest conversion efficiency in the film-type solar cells. They consist of p-type CuInSe2 film and n-type ZnO film. The CdS films are used as buffer layer in the CIGS solar cells since remarkable difference in the lattice constant and energy band gap of two films. The CdS films are toxic and make harmful circumstances. The CdS films deposition process need wet process. In this works, we design and make the hitter and lamp reflection part in the sputtering system for the ZnS films deposition as buffer layer, not using wet process. Film thickness, SEM, and AFM are measured for the uniformity valuation of the ZnS films. We conclude the optimum deposition temperature for the films uniformity less than 1.6%. The ZnS films deposited by the sputtering system are more dense and uniform than the CdS films deposited by the Chemical Bath Deposition Method(CBD) for the CIGS Solar Cells.

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Selective Chemical Vapor Deposition of $\beta$-SiC on Si Substrate Using Hexamethyldisilane/HCl/$H_2$ Gas System

  • Yang, Won-Jae;Kim, Seong-Jin;Chung, Yong-Sun;Auh, Keun-Ho
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.09a
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    • pp.91-95
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    • 1998
  • Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/H2 gas system during the deposition. the schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

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SOLID STATE CESIUM ION BEAM SPUTTER DEPOSITION

  • Baik, Bong-Koo;Choi, Dong-Jun;Han, Dong-Won;Kim, Yong-Hwan;Kim, Seong-In
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.474-477
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    • 1996
  • The solid state cesium ion beam sputter deposition system has been developed for negative carbon ion beam deposition. The negative carbon ion beams are effectively produced by cesium ion bombardment. The C-ion beam current and deposition energy can be independently controlled for the deposition of a-D films. This system is very compact, reliable and high flux without any gas discharge or plasma and has been successfully used in the studies of the ion beam deposited amorphous diamond(a-D)

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Detergency and soil Redeposition in a Drycleaning System -The Effect of Surfactant Type and Their Mixture- (드라이클리닝 시스템에서의 세척성과 재오염성 -계면활성제의 종류와 혼합이 미치는 영향-)

  • 김주연;박정희
    • Journal of the Korean Society of Clothing and Textiles
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    • v.23 no.7
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    • pp.1030-1039
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    • 1999
  • The effect of surfactant mixture 9on detergency and soil redeposition in a dry-cleaning system was investigated employing Aerosol OT as an anionic surfactant and Span 80 as a nonionic surfactant. The effect of charge system on soil deposition was also investigated in order to determine the optimum condition at which soil redeposition is minimum,. Soil deposition instead of soil redeposition on cotton, polyester and wool fabrics was measured employing petroleum solvent and perchloroethylene as organic solvents. The results were as follows. 1. Surface tension or interfacial tension was not changed by the addition of any surfactant or surfactant mixtures. In petroleum solvent however interfacial tension between solrent and water decreased when surfactants were added and increased when surfactants were mixed,. 2. The maximum amount of water solubilization increased as the mole fraction of Aerosol OT increased and more water was solubilized in petroleum solvent than in perchloroethylene. 3. The detergency of cotton was greater and the soil deposition rate was lower in Span 80 solution than in Aerosol OT solution. The soil deposition on cotton fabric decreased when water was solubilized in Aersol OT solution 4. The detergency and soil deposition rate of polyester fabric did not change by the surfactant type of the addition of surfactant mixture and soil deposition rate increased bywater solubilization. 5. Soil deposition on wool fabric was very high when Arosol OT was employed in perchloroethylene and the soil deposition did not change greatly by water solubilization.

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Development of Estimation Equations for Solid Deposition in Sewer Systems due to Rainfall (강우로 인한 관거 내 고형물 퇴적량 산정식 개발)

  • Lee, Jae-Soo;Lee, Se-Won
    • Journal of Korea Water Resources Association
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    • v.41 no.9
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    • pp.885-894
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    • 2008
  • The deposition of solids in combined sewer systems results in a loss of flow capacity that may restrict flow and cause a local flooding and enhanced solids deposition. In order to solve these problems and proper pipe management, estimations of solid loads on land surface in a drainage basin and solid deposition in sewer system due to rainfall are needed but these tasks are very difficult and very expensive. In this study, procedures for estimating solid loads on surface in a drainage basin were applied and analyzed in Gunja drainage basin in Korea. Also, this paper presents the development and application of estimation equation for solid deposition in sewer system due to rainfall based on the solid deposition estimated using MOUSE model. As results, the comparison between estimated and measured solid deposition is difficult due to the absent of measured data, but the estimated values using developed equations show applicability compared with the results of MOUSE model and the application of the other basin. The developed estimation equations can be used usefully for the management of combined sewer system.

Characteristics of Bi-superconducting Thin Films Prepared by Co- and Layer-by-Layer Deposition

  • Yang, Sung-Ho;Park, Yong-Pil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.10a
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    • pp.40-44
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    • 2000
  • $Bi_2Sr_2Ca_nCu_{n+1}O_y$($n{\geq}0$; BSCCO)thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.

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Characteristics of Laser Aided Direct Metal Deposition Process for Tool Steel (공구강을 이용한 레이저 직접 금속조형 공정의 적층 특성)

  • 장윤상
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.327-330
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    • 2004
  • Laser aided direct metal deposition (LADMD) process offers the ability to make a metal component directly from 3-D CAD dimensions. A 3-D object can be formed by repeating laser cladding layer by layer. The key of the build-up mechanism is the effective control of powder delivery and laser power to be irradiated into the melt-pool. A feedback control system using optical sensors is introduced to control laser power and powder mass flow rate. Using H13 tool steel and $CO_2$ laser system, comprehensive analysis are executed to test the efficiency of the system. In addition, the dimensional characteristics of directed deposited material are investigated with the parameters of deposition thickness, laser power, traverse speed and powder mass flow rate.

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Solid State Cesium Ion Beam Sputter Deposition

  • Baik, Hong-Koo
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1996.06a
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    • pp.5-18
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    • 1996
  • The solid state cesium ion source os alumino-silicate based zeolite which contains cerium. The material is an ionic conductor. Cesiums are stably stored in the material and one can extract the cesiums by applying electric field across the electrolyte. Cesium ion bombardment has the unique property of producing high negative ion yield. This ion source is used as the primary source for the production of a negative ion without any gas discharge or the need for a carrier gas. The deposition of materials as an ionic species in the energy range of 1.0 to 300eV is recently recognized as a very promising new thin film technique. This energetic non-thermal equilibrium deposition process produces films by “Kinetic Bonding / Energetic Condensation" mechansim not governed by the common place thermo-mechanical reaction. Under these highly non-equilibrium conditions meta-stable materials are realized and the negative ion is considered to be an optimum paeticle or tool for the purpose. This process differs fundamentally from the conventional ion beam assisted deposition (IBAD) technique such that the ion beam energy transfer to the deposition process is directly coupled the process. Since cesium ion beam sputter deposition process is forming materials with high kinetic energy of metal ion beams, the process provider following unique advantages:(1) to synthesize non thermal-equilibrium materials, (2) to form materials at lower processing temperature than used for conventional chemical of physical vapor deposition, (3) to deposit very uniform, dense, and good adhesive films (4) to make higher doposition rate, (5) to control the ion flux and ion energy independently. Solid state cesium ion beam sputter deposition system has been developed. This source is capable of producing variety of metal ion beams such as C, Si, W, Ta, Mo, Al, Au, Ag, Cr etc. Using this deposition system, several researches have been performed. (1) To produce superior quality amorphous diamond films (2) to produce carbon nitirde hard coatings(Carbon nitride is a new material whose hardness is comparable to the diamond and also has a very high thermal stability.) (3) to produce cesiated amorphous diamond thin film coated Si surface exhibiting negative electron affinity characteristics. In this presentation, the principles of solid state cesium ion beam sputter deposition and several applications of negative metal ion source will be introduced.

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Improvement of Deposition Performance of Ultrasonic Spray Pyrolysis Deposition System through Atomizer Shape Modification (분무장치 형상 변경을 통한 초음파 열분해 증착 시스템의 증착 성능 개선)

  • Kim, Kyu-Eon;Lee, Jae-Hoo;Jeon, Jae-Keon;Park, Sung-Hwan;Lee, Chibum
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.4
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    • pp.469-474
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    • 2015
  • In ultrasonic spray pyrolysis deposition, a precursor solution is evaporated by an ultrasonic atomizer, then gas-carried into a furnace where the solute is separated from the water vapor. After condensation, polymerization, and nucleation, the solute oxide forms a thin film. To improve the deposition efficiency, the ultrasonic atomizer was studied to optimize the evaporated gas flow. The vat cover was redesigned, using three versions with different inlet factors being tested through a computational fluid dynamic analysis as well as a water evaporation experiment. The atomization rate with a hemispherical cover with a $30^{\circ}$ inlet was found to be 2.4 times higher than that with the original. This improvement was verified with fluorine-doped tin oxide spray pyrolysis deposition. The film obtained with the modified vat cover was 2.4 times thicker than that obtained with the original vat cover.

EFFECTS OF GRID SPACER WITH MIXING VANE ON ENTRAINMENTS AND DEPOSITIONS IN TWO-PHASE ANNULAR FLOWS

  • KAWAHARA, AKIMARO;SADATOMI, MICHIO;IMAMURA, SHOGO;SHIMOHARAI, YUTA;HIRAKATA, YUDAI;ENDO, MASATO
    • Nuclear Engineering and Technology
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    • v.47 no.4
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    • pp.389-397
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    • 2015
  • The effects of mixing vanes (MVs) attached to a grid spacer on the characteristics of air-water annular flows were experimentally investigated. To know the effects, a grid spacer with or without MV was inserted in a vertical circular pipe of 16-mm internal diameter. For three cases (i.e., no spacer, spacer without MV, and spacer with MV), the liquid film thickness, liquid entrainment fraction, and deposition rate were measured by the constant current method, single liquid film extraction method, and double liquid film extraction method, respectively. The MVs significantly promote the re-deposition of liquid droplets in the gas core flow into the liquid film on the channel walls. The deposition mass transfer coefficient is three times higher for the spacer with MV than for the spacer without MV, even for cases 0.3-m downstream from the spacer. The liquid film thickness becomes thicker upstream and downstream for the spacer with MV, compared with the thickness for the spacer without MV and for the case with no spacer.