• Korean Journal of Optics and Photonics
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• v.10 no.2
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• pp.174-177
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• 1999

The propagation loss of silica slab waveguides were measured by immersing slab waveguides into a index matching liqiud. Index matching liqiud was used for out-coupling the light from arbitrary points of slab waveguide. The measured value of propagation loss are 0.04 dB/cm and 0.09 dB at 1300 nm and 633 nm respectively.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.13 no.12
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• pp.2505-2510
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• 2009

The SiOC films were deposited with the variation of flow rate ratios by chemical vapor deposition. It was researched the reason of decreasing the dielectric constant in SiOC film and the relationship between the dielectric constant and the thickness. The thickness of the deposited films tends to in proportion to the refractive index and the sample with the lowest dielectric constant decreased the thickness. The refractive index was decreased after annealing because of the decreasing of the film's thickness by annealing process.

• Korean Journal of Materials Research
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• v.26 no.8
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• pp.430-437
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• 2016

Aluminum oxide ($Al_2O_3$) thin films were grown by atomic layer deposition (ALD) using a new Al metalorganic precursor, dimethyl aluminum sec-butoxide ($C_{12}H_{30}Al_2O_2$), and water vapor ($H_2O$) as the reactant at deposition temperatures ranging from 150 to $300^{\circ}C$. The ALD process showed typical self-limited film growth with precursor and reactant pulsing time at $250^{\circ}C$; the growth rate was 0.095 nm/cycle, with no incubation cycle. This is relatively lower and more controllable than the growth rate in the typical $ALD-Al_2O_3$ process, which uses trimethyl aluminum (TMA) and shows a growth rate of 0.11 nm/cycle. The as-deposited $ALD-Al_2O_3$ film was amorphous; X-ray diffraction and transmission electron microscopy confirmed that its amorphous state was maintained even after annealing at $1000^{\circ}C$. The refractive index of the $ALD-Al_2O_3$ films ranged from 1.45 to 1.67; these values were dependent on the deposition temperature. X-ray photoelectron spectroscopy showed that the $ALD-Al_2O_3$ films deposited at $250^{\circ}C$ were stoichiometric, with no carbon impurity. The step coverage of the $ALD-Al_2O_3$ film was perfect, at approximately 100%, at the dual trench structure, with an aspect ratio of approximately 6.3 (top opening size of 40 nm). With capacitance-voltage measurements of the $Al/ALD-Al_2O_3/p-Si$ structure, the dielectric constant of the $ALD-Al_2O_3$ films deposited at $250^{\circ}C$ was determined to be ~8.1, with a leakage current density on the order of $10^{-8}A/cm^2$ at 1 V.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.98-98
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• 1999

Highly transparent and conducting tin-doped indium oxide (ITO) films were deposited on polycarbonate substrate by ion-assited deposition. Low substrate temperature (<10$0^{\circ}C$) was maintained during deposition to prevent the polycarbonate substrate from be deformed. The influence of ion beam energy, ion current density, and tin doping, on the structural, electrical and optical properties of deposited films was investigated. Indium oxide and tin-doped indium oxide (9 wt% SnO2) sources were evaporated with assisting ionized oxygen in high vacuum chamber at a pressure of 2$\times$10-5 torr and deposition temperature was varied from room temperature to 10$0^{\circ}C$. Oxygen gas was ionized and accelerated by cold hallow-cathode type ion gun at oxygen flow rate of 1 sccm(ml/min). Ion bea potential and ion current of oxygen ions was changed from 0 to 700 V and from 0.54 to 1.62 $\mu$A. The change of microstructure of deposited films was examined by XRD and SEM. The electrical resistivity and optical transmittance were measured by four-point porbe and conventional spectrophotometer. From the results of spectrophotometer, both the refractive index and the extinction coefficient were derived.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.222-222
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• 2011

Titanium dioxide (TiO2) has a number of applications in optics and electronics due to its superior properties, such as physical and chemical stability, high refractive index, good transmission in vis and NIR regions, and high dielectric constant. Atomic layer deposition (ALD), also called atomic layer epitaxy, can be regarded as a special modification of the chemical vapor deposition method. ALD is a pulsed method in which the reactant vapors are alternately supplied onto the substrate. During each pulse, the precursors chemisorb or react with the surface groups. When the process conditions are suitably chosen, the film growth proceeds by alternate saturative surface reactions and is thus self-limiting. This makes it possible to cover even complex shaped objects with a uniform film. It is also possible to control the film thickness accurately simply by controlling the number of pulsing cycles repeated. We have investigated the ALD of TiO2 at 100$^{\circ}C$ using precursors titanium tetra-isopropoxide (TTIP) and H2O on -O, -OH terminated Si surface by in situ X-ray photoemission spectroscopy. ALD reactions with TTIP were performed on the H2O-dosed Si substrate at 100$^{\circ}C$, where one cycle was completed. The number of ALD cycles was increased by repeated deposition of H2O and TTIP at 100$^{\circ}C$. After precursor exposure, the samples were transferred under vacuum from the reaction chamber to the UHV chamber at room temperature for in situ XPS analysis. The XPS instrument included a hemispherical analyzer (ALPHA 110) and a monochromatic X-ray source generated by exciting Al K${\alpha}$ radiation (h${\nu}$=1486.6 eV).

• Journal of the Korean Ceramic Society
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• v.38 no.11
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• pp.1037-1041
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• 2001

Silicon diosixde thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) method, at a low temperature (32$0^{\circ}C$) and from (SiH$_4$+$N_2$O) gas mixtures. The effects of deposition parameters on properties of SiO$_2$thick films were investigated by variation of $N_2$O/SiH$_4$flow ratio and RF power. As the $N_2$O/SiH$_4$flow ratio decreased, deposition rate increased from 2.9${\mu}{\textrm}{m}$/h to maximum 10.1${\mu}{\textrm}{m}$/h. As the RF power increased from 60 W to 120 W, deposition rate increased (5.2~6.7 ${\mu}{\textrm}{m}$/h) and refractive index approached at thermally grown silicon dioxide (n=1.46).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.223-223
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• 2009

In this paper, designed and simulated Power Splitter (PS) integrated Mach-Zehnder interferometer (MZI) based planar type optical waveguide devices (which is called here a PS-MZI). The PS-MZI optical waveguide sensor was preceded by a Y-junction, which splits the input power between the sensor, and a reference branch, to minimize the effect of optical power variations. The PS-MZI optical waveguide sensor induced changing phases of the incident beam, which had fallen upon the waveguide through computer simulation, according to the small changes in the index of refraction, thus beam intensity was changed. The waveguide were optimized at a wavelength of 1550 nm and fabricated according to the design rule of 0.45 delta%, which is the difference of refractive index between the core and clad. The fabrication of PS-MZI optical waveguide sensor was performed by a conventional planar lightwave circuit (PLC) fabrication process. The PS-MZI optical waveguide that was fabricated to be applied as a biosensor revealed a low insertion loss and a low polarization-dependent loss. After having etched the over-clad at the sensor part in the MZI optical waveguide that was fabricated, Ti deposition was made on the adhesion layer, and then Au thin-film deposition was carried out thereon. In addition, its optical properties were measured by having changed the index of refraction oil at the sensing part of the MZI. To apply the planar type PS-MZI optical waveguide as a biosensor, a detection test for Staphylococcus aureus was conducted according to changes in concentration, having adopted Ti-alkoxide as ligand. The detection result of the S. aureus by the PS-MZI optical waveguide sensor was possible to the level of $10^1$ CFU/ml.

• Korean Journal of Optics and Photonics
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• v.9 no.3
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• pp.162-167
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• 1998

$SiO_xF_y$ optical thin films of lower refractive indices than glass substrates were fabricated by the CF$_4$ ion beam assisted deposition method and the optical, structural and chemical properties of them were investigated. Refractive index of $SiO_xF_y$ films was varied from 1.455 to 1.394 by decreasing the anode voltage or from 1.462 to 1.430 by increasing the current density of end-Hall ion source. FT-IR and XPS analyses show that as the F concentration increases, the Si-O bond at $1080m^{-1}$ shifts to higher wavenumber, the OH bonds are reduced drastically, and the fluorine atoms at the air-film interface are desorbed out by reacting with $H_2O$ in the atmosphere. $SiO_xF_y$ thin films are amorphous by the XRD analysis and have the compressive stress below 0.3 GPa. As an application of $SiO_xF_y$ thin films a two-layer antireflection coating was fabricated using a $SiO_xF_y$ film as a low refractive index layer and a Si film as an absorbing one.

• The Korean Journal of Food And Nutrition
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• v.20 no.3
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• pp.245-252
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• 2007

This study investigated the effects of conjugated linoleic acid(CLA) on the fat deposition, triglyceride levels and the expression of stearoyl-CoA desaturase 1(SCD1) in the livers of male ICR mice that were fed with either soybean oil or beef tallow supplemented with CLA. Mice weighing $25{\sim}30$ g were divided into four groups; soybean oil(SBO), and SBO supplemented with 1% CLA(SBOC), beef tallow(BT) and BT supplemented with 1% CLA(BTC). Each group consisted of 10 mice that were fed the experimental diets for 4 weeks. The experimental diets consisted of 64% carbohydrate, 20% protein, and 16% fat in terms of their contributions to total calories. All other nutrients were identical in the diets. Triglyceride measurements were completed using a kit. Fatty acid compositions were analyzed in the liver using gas chromatography. The levels of SCD1 expression were analyzed by RT-PCR in the liver. No significant differences were found for food intake level, body weight and food efficiency among the experimental groups. However, the weights of epididymal fat pads and plasma triglyceride levels were significantly lower in SBOC and BTC(p<0.05) compared to the SBO and BT groups. These effects were similar in the CLA supplemented groups. The expression level of SCD1 gene and ${\Delta}9$ desaturase index were not significantly different, regardless of the fat used for CLA supplementation. Based on these results, addition of CLA showed decreasing effects on the fat depots weight and the concentration of triglyceride regardless of the fat sources. The SCD1 gene expression and ${\Delta}9$ desaturase index were not influenced by the types of fats with respect to the CLA effects.

• Proceedings of the Korea Water Resources Association Conference
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• 2016.05a
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• pp.69-69
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• 2016

하천은 크게 하도와 홍수터 그리고 제방으로 나눌 수 있으며, 국내에서는 다른 국가들과 다르게 대하천사업 이후 하천의 홍수터에 생태공원이나 체육시설 등과 같은 다양한 친수시설들을 조성하여 활용하고 있다. 하지만 최근 이상기후로 인해 홍수의 발생빈도 및 강도가 증가하고 있으며 여름철 집중호우에 의한 하천의 홍수위 상승은 이러한 친수시설의 침식과 퇴적 등과 같은 침수피해를 가중시키는 원인이 되기도 한다(Ku et al., 2013). 따라서 이와 같은 홍수피해를 예측하기 위해서는 홍수터를 포함한 복단면에서의 수치해석이 선행되어야 하며, 일반적으로 2차원 수치해석이 바람직한 것으로 제안되고 있다(Sato et al., 1989). 또한 하천에서의 2차원 수치해석 결과를 이용하여 침식과 퇴적에 관한 친수시설 안정성 평가 지수를 산정할 수 있으며, 산정된 지수를 통해 홍수터에서의 홍수피해를 예측할 수 있다. 다른 국가에서는 국내와 다르게 홍수터에 대한 활용이 거의 없기 때문에 홍수에 따른 홍수터에서의 위험도를 평가한 연구는 거의 없는 실정이며, 한국에서도 홍수터에서의 홍수위험도 평가에 대한 연구는 Song et al.(2016)이 다른 국가에서 활용하고 있는 제내지에서의 홍수위험도 평가 지수를 홍수터에 도입하여 실제 태풍에 의한 홍수위험도를 간접적으로 평가한 연구 정도가 대부분이라고 볼 수 있다. 따라서 본 연구에서는 Einstein-Krone 공식(1962)을 이용하여 침식과 퇴적을 동시에 고려할 수 있는 Transient Erosion and Deposition Index(TEDI)와 Steady Erosion and Deposition Index(SEDI)를 개발하였다. 또한 개발된 지수를 실제 자연하천에 적용하여 태풍 사상에서의 산정된 지수를 통해 홍수터 안정성을 평가하였다.