• Title/Summary/Keyword: Deposition chamber

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The study on the $SiO_2$ film non-uniformity by Plasma Enhanced Chemical Vapor Deposition (PECVD로 증착된 $SiO_2$의 non-uniformity 특성 연구)

  • Ham, Yong-Hyun;Kwon, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.73-73
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    • 2008
  • In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

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Development of advanced laser processing for the fabrication of HTS metallic tapes for power applications (전력용 고온초전도 금속테이프 제작을 위한 첨단 레이저공정 개발)

  • Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 1997.11a
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    • pp.688-691
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    • 1997
  • Good quality superconducting $YBa_2Cu_30_{7-{\delta}}$(YBCO) thin films were grown on Hastelloy (Ni-Cr-Mo alloys) with yttria-stabilized zirconia(YSZ) buffer layers by in situ pulsed laser deposition in a multi-target processing chamber. Generally, Hastelloy exhibits excellent resistance to corrosion, fatigue, thermal shock, impact, and erosion. However, it is difficult to make films on flexible metallic substrates due to interdiffusion problems between metallic substrates and superconducting overlayers. To overcome this difficulty, it is necessary to use YSZ buffer layer since it will not only limit the interdiffusion process but also minimize the surface microcrack formation due to smaller mismatch between the film and the substrate. In order to enhance the crystallinity of YBCO films on metallic substrates, YSZ buffer layers were grown at various temperatures different from the deposition temperature of YBCO films. On YSZ buffer layer grown at higher temperature than that for depositing YBCO film, the YBCO thin film was found to be textured with c-axis orientation by x-ray diffraction and had a zero-resistance critical temperature of about 85K.

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MATERIAL AND ELECTICAL CHARACTERISTICS OF COPPER FILMS DEPOSITED BY MATAL-ORGANIC CHEMICAL TECHNIQUE

  • Cho, Nam-Ihn;Park, Dong-Il;Nam, H. Gin
    • Journal of Surface Science and Engineering
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    • v.29 no.6
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    • pp.803-808
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    • 1996
  • Material and electrical characteristies of copper thin films prepared by metal organic chemical vapor deposition (MOCVD) have been investigated for interconnection applications in ultra large scale integration circuits (ULSI). The copper films have been deposited a TiN substrates using a metal organic precursor, hexafluoro acetylacetonate trimethyvinylsilane copper, VTMS(hfac)Cu (I). Deposition rate, grain size, surface morphology, and electrical resistvity of the copper films have been measuredfrom samples prepared at various experimental conditions, which include substrate temperature, chamber pressure, and carrier gas flow rate. Results of the experiment showed that the electrical property of the copper films is closely related to the crystallinity of the films. Lowest electrical resistivity, $2.4{\mu}{\Omega}.cm$ was obtained at the substrate temperature of $180^{\circ}C$, but the resistivity slightly increased with increasing substrate temperature due to the carbon content along the copper grain boundaries.

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Field Emission Characteristics of Nitrogen-Doped and Micro-Patterned Diamond-Like Carbon Films Prepared by Pulsed Laser Deposition

  • Shin, Ik-Ho;Lee, Taek-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2000.01a
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    • pp.133-134
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    • 2000
  • Effect of nitrogen doping on field emission characteristics of patterned Diamond-like Carbon (DLC) films was studied. The patterned DLC films were fabricated by the method reported previously[1]. Nitrogen doping in DLC film was carried out by introducing $N_2$ gas into the vacuum chamber during deposition. Higher emission current density of $0.3{\sim}0.4$ $mA/cm^2$ was observed for the films with 6 at % N than the undoped films but the emission current density decreased with further increase of N contents. Some changes in CN bonding characteristics with increasing N contents were observed. The CN bonding characteristics which seem to affect the electron emission properties of these films were studied by Raman spectroscopy, x-ray photoemission spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). The electrical resistivity and the optical band gap measurements showed consistence with the above analyses.

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Diagnosis on Plasma Utilized for the Deposition of SiON Thin Films (SiON 박막 증착에 사용된 플라즈마에 대한 진단)

  • 김기현;김현석;성만영;김상식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.1
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    • pp.11-18
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    • 2003
  • In this study we attempted to diagnose the states and properties of plasma generated while depositing SiON thin films using PECVD (Plasma enhanced chemical vapor deposition). The temperature and density of electron gases formed in a PECVD chamber were measured by Langmuir probe method. Their values were also estimated under some assumptions we made in this work. Comparison between experimental and theoretical values of the temperature and density of electron gases was made. The experimental and estimated results revealed that, as RF Power gets higher, the electron density linearly increases, but that the electron temperature does not vary.

Formation of Alumian gradient coatings by Ion Beam Assistant Deposition

  • Xue-Jianming
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.118-122
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    • 1998
  • $Al_2O_x$(0$Al_2O_3$ gradient coatings were formed by evaporating pure aluminium(99.9%) in $O_2$ environment with an IBAD facility, 12keV $Ar^+$ was used to irradiate the coatings simultaneously during the deposition. Sample's composition and depth profile were analysed by RBS and AES measurement, and their microhardness and porosity property were also measured in the experiment. Results show that, the oxygen concentration in the deposited coatings has a nearly linear relationship with the inputting gas flow before $O_2$ partial pressure in the target chamber reaches $1.2\times10^{-3}$ mbar under which stoichiometric $Al_2O_3$ could be formed; and sample's microhardness and porosity property is affected significantly by the oxygen concentration in the coatings.

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Laser Ablated Carbon Thin Film from Carbon Nanotubes and Their Property Studies

  • Sharon, Maheshwar;Rusop, M.;Soga, T.;Afre, Rakesh A.
    • Carbon letters
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    • v.9 no.1
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    • pp.17-22
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    • 2008
  • A carbon nanotube (CNT) of diameter ~20 nm has been synthesized by spray pyrolysis of turpentine oil using Ni/Fe catalyst. Pellet of CNTs has been used as a target to produce semiconducting carbon thin film of band gap 1.4 eV. Presence of oxygen pressure in the pulse laser deposition (PLD) chamber helped to control the $sp^3/sp^2$ ratio to achieve the desired band gap. Results are discussed with the help of Raman spectra, SEM TEM micrographs and optical measurements suggest that semiconducting carbon thin film deposited by PLD technique has retained its nanotubes structure except that its diameter has increased from 20 nm to 150 nm.

Characteristics of Polyimides Humility Sensor Fabricated by using Electrophoretic Deposition (전기영동법에 의해 제작된 폴리이미드 박막의 습도 특성)

  • 조동헌;정병기;한상옥;김종석;박강식
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.05a
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    • pp.67-70
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    • 1994
  • On this study, we fabricated humudity sensor with polyimide thin film from the nonaqueous emulsion by the electrophoretic deposition as a function of film thickness. then evaluated performance of the sensor with increasing relative humidity if constant temperature constant humidity chamber, which is electronically controlled. we designed upper electrode of the sensor to brush type to make moisture particles permeate into the polymer bulk. sensing properties of the sensor on % RH shows proportion on the low %RH. Fer the 30V-30S- 200$^{\circ}C$ sample, percentage changing of capacitance on from 30 %RH to 90 %RH is 45.8 %, and increasing rate per 1 % RH of capacitance is 11.25 pF

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The development of power supply for dry scrubber (건식 세정기용 전원장치 개발)

  • 김수석;원충연;최대규;최상돈
    • The Transactions of the Korean Institute of Power Electronics
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    • v.6 no.5
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    • pp.394-399
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    • 2001
  • In this Paper, the development of the power supply for dry scrubber is discussed. 1500w, 100kHz power supply Is designed and tested. The main power stage is used for the FB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of power supply are verified by simulation and experimental results.

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A Study on the Fabrication of P(VDF- TrFE) Organic Thin Films and Piezoelectric Characteristics (P(VDF-TrFE) 유기 박막의 제조와 압전특성에 관한 연구)

  • Park, Su-Hong
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.57 no.4
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    • pp.395-399
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    • 2008
  • The purpose of this paper is to investigate the fabrication of P(VDF-TrFE) organic thin films through the vapor deposition method and the piezoelectric properties of the organic thin films thus produced. Vapor deposition was performed under the following conditions: the working temperature, and the pressure of reaction chamber were $300^{\circ}C$, and $2.0{\times}10^{-5}$ Torr, respectively. The molecular structure and crystallinity of the evaporated organic thin films were evaluated by using a FT-IR (Fourier-Transform Infrared spectroscopy) and XRD (X-ray diffractometry), The results showed that crystallinity increased with an increase in the substrate temperature. When the P(VDF-TrFE) organic thin films were fabricated by increasing the substrate temperature, its piezoelectric coefficient($d_{33}$) increased.