The study on the $SiO_2$ film non-uniformity by Plasma Enhanced Chemical Vapor Deposition
(PECVD로 증착된 $SiO_2$ 의 non-uniformity 특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.11a
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- pp.73-73
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- 2008