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전기전자재료학회논문지
v.9
no.1
$N_2O$ 가스를 사용하여 PECVD로 성장된 Oxynitride 막의 특성 최현식;이철인;장의구 - Principles of Plasma Discharges and Material Processing M. A. Lieberman
- 석사학위논문, Nuclear Engineering, Hanyang Univ. Measurement of electron characteristics in RF plasma Y. Choi
- 석사 학위논문, Mechanical Engineering, Hanyang Univ. Measurement of charge on dust particles in a DC glow discharge plasma T. Kang
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