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Electromigration Behavior of Eutectic SnPb Solder

공정 조성의 SnPb 솔더에서의 Electromigration 거동

  • Published : 2003.01.01

Abstract

Electromigration characteristics of eutectic SnPb solder were studied using thin stripe-type test structures. Significant changes in the microstructure were observed after electromigration test, in which the temperature and the current density were varied from 80 to 100 $^{\circ}C$ and from 4.6${\times}$10$^4$A/$\textrm{cm}^2$ to 8.7${\times}$10$^4$A/$\textrm{cm}^2$. While voids or local thinning were found near the cathode end, hillocks were mainly observed near the anode end. From resistance measurements, it was calculated that the activation energy of the eutectic SnPb solder for electromigration was 0.77 eV. The dominant migrating element along the electron flow at 100$^{\circ}C$ was Pb.

Keywords

References

  1. 전기전자재료학회논문지 v.14 no.1 0.12㎛ 설계 규칙을 갖는 DRAM 셀 주요 레이어의 OPC 및 SPM 박기천;오용호;임성우;고춘수;이재철
  2. 전기전자재료학회논문지 v.11 no.12 와이어 본딩시 본딩 패드 리프트 불량에 관한 연구 김경섭;장의구;신영의
  3. International Technology Roadmap for Semiconductors(1999 Edition) Semiconductor Industry Association
  4. J. Phys. D: Appl. Phys. v.32 Electromigration in integrated circuit conductors J. R. Lloyd https://doi.org/10.1088/0022-3727/32/17/201
  5. 전기전자재료학회논문지 v.11 no.12 MOCVD 방법으로 증착된 TaN와 무전해도금된 Cu 박막 계면의 열적 안정성 연구 이은주;황응림;오재응;김정식
  6. J. Appl. Phys. v.88 no.10 Electromigration in Sn Pb solder strips as a function of alloy composition C. Y. Liu;Chih. Chen;K. N. Tu https://doi.org/10.1063/1.1319327
  7. J. Korean. Phys. Soc. v.35 The microstructure and porperties of solder joints J. W. Morris, Jr.
  8. Proceedings of the Surface Mount Internaltoinal Conference and Exposition S. Brandenburg;S. Yeh
  9. J. Appl. Phys. v.89 no.6 Electromigration of eutectic SnPb interconnects for flip chip technology T. Y. Lee;K. N. Tu;S. M. Kuo;D. R. Frear https://doi.org/10.1063/1.1342023
  10. Appl. Phys. Lett. v.75 no.1 Microstructure-electromigration correlation in a thin stripe of eutectic SnPb solder stressed between Cu electrodes C. Y. Liu;Chih Chen;C. N. Liao;K. N. Tu https://doi.org/10.1063/1.124276