• 한국진공학회지
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• 제6권S1호
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• pp.133-136
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• 1997

In this paper multi-arc plasma plating film equipment Bulat-6 and its technical characteristics were analyzed in detail. This machine is the first of its kind in China. Influential factors and reducing methods on microdroplets of titanium were investigated. By method of electromagnetic field control and ion beam enhanced deposition excellent titanium nitride film could be obtained. Bicrohardness and adhesion were 250Mpa and 6.5Kg respectively.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1673-1675
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• 2006

As the manufacturing capacity needs for large size LCD TV shifts very fast into next generation, processing and test equipment makers face more difficult challenges in accommodating productivity, reliability and lead time of panel makers as well as the prerequisite of high process quality. In this paper, AKT will discuss its new innovative productivity solutions in PECVD (Plasma Enhanced Chemical Vapor Deposition), as the key thin film process system, and EBT (Electron Beam Test), as the key array test system, for the huge glass size with surface dimension larger than 2 meter by 2 meter.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2008년도 하계종합학술대회
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• pp.377-378
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• 2008

Morphology is one of important issues when developing a layer of CVD-W. we need to control the process more precisely that is filling gaps between BL(bit line)and DC(direct contact). Whereas we are facing to difficulties like not-filling contacts due to marginal problems in deposition and etching process. This paper is for investigating a method to resolve morphology problem with strengthening the condition of seasoning.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.17-20
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• 1994

PTCRl(positive temperature coefficient of resistivity) thermistors in the thin file BaTiO$_3$ system were deposited by radio frequency (13.56 MHz) and dc radio frequency (13.56MHz) and dc magnerton sputter equipment. R-T(resistivity -temperature) properties was investigated as a function of substrate and the temperature variation. The specimens make a comperison between the thin films and the bulk in the resistivity variation. Substrate temperature. deposition time. and forward power are deposited at the 400$^{\circ}C$, 10 hours, and 210 watt. respectively. The aim of this work is to obtain lower than bulk specimen resistivity in thin films BaTiO$_3$ system thermistor by RF/DC magnetron sputter equipment.

• 반도체디스플레이기술학회지
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• 제23권1호
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• pp.52-55
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• 2024

In this paper, a state change study was conducted through Frequency Domain Reflectometry (FDR) technology for the process chamber of plasma equipment for semiconductor manufacturing. In the experiment, by direct connecting the network analyzer to the RF matcher input of the 300 mm plasma enhanced chemical vapor deposition (PECVD) chamber, S11 was measured in a situation where plasma was not applied, and the frequency domain reacting to the chamber state change was searched. Response factors to changes in the status, such as temperature, spacing of the heating chuck, internal pressure difference, and process gas supply state were confirmed. Through this, the frequency domain in which a change in the reflection value was detected through repeated experiments. The reliability of the measured micro-displacement was verified through reproducibility experiments.

• 한국생산제조학회지
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• 제23권4호
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• pp.392-397
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• 2014

Recently, there is an increase in the need for precision linear stages with vacuum compatibility in such areas as lithography equipment for wafer or mask manufacturing, mask mastering equipment for optical data storage and electron beam equipment. A simple design, high stiffness and low cost can be achieved by using ball bearings. However, a ball bearing have friction and wear problems just as in ambient air. In order to decrease the friction, a special finish, a diamond-like carbon (DLC) film coating, is applied to the surface of a guide rail by sputtering deposition. This paper presents the result of an experimental investigation on the control performance of a ball bearing-guided linear motion stage under two environmental conditions: in air and vacuum. A comparison between the results with and without the DLC coating was also considered in the experimental investigation.

• 세라미스트
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• 제9권6호
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• pp.24-29
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• 2006

Electron beam physical vapor deposition (EB-PVD) process has currently been applied to thermal barrier coatings (TBCs) for aircraft engines. Due to unique columnar structure, EB-PVD TBCs have advantages in resistances to thermal shock and thermal cycle for their applications, compared to films prepared by plasma spray By the EB-PVD equipment, we successfully obtained yttria-stabilized zirconia (YSZ) layer which has columnar and feather like structure including a large amount of nano size pores and gaps. The EB-PVD technique has been developed for coating functional perovskite type oxides such as (La, Sr)MnO3. Electrode properties have been improved by interface and structural control.

• 대한방사선기술학회지:방사선기술과학
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• 제39권3호
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• pp.337-344
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• 2016

본 연구에서는 3차원(3-dimensional, 3D) 프린팅 기술로 출력된 팬톰에 대한 X선 투과성을 평가하고자 하였다. 3D 프린팅 방식은 용융적층조형(fused deposition modeling, FDM) 방식을 이용했으며 소재는 아크릴로나이트릴 뷰타다이엔 스타이렌(acrylonitrile butadiene styrene, ABS)을 사용하였다. 팬톰은 원통 모양으로 설계하였으며 전산화단층영상장비(computed tomography, CT)에서 획득한 단면영상으로 균일도를 측정하였다. X선 투과성 평가는 3D 출력된 팬톰 내부에 이온챔버를 삽입하여 실시하였다. 그 결과, 평균 균일도가 2.70 HU이었으며 기존 폴리메틸 메타크릴레이트(poly methyl methacrylate, PMMA) CT 팬톰과 3D 프린터로 출력된 팬톰에서 측정된 X선 투과성의 상관관계는 0.976로 높은 상관관계가 있는 것으로 나타났다. 향후 3D 프린팅 기술을 이용한 방사선정도관리 팬톰 제작에 기초자료로 활용할 수 있으리라 기대한다.

• 한국재료학회지
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• 제8권2호
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• pp.131-134
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• 1998

$SiO_{2}$ 기판과 dimethylethylamine alane(DMEAA)을 반응소스로 하여 알루미늄을 증착시켜 증착전 전처리 가스 종류와 수소 플라즈마 처리에 따른 증착속도의 차이와 미세구조에 대하여 연구하였다. TiN기판에 증착된 알루미늄의 증착속도는 증착전 수소 가스에 의한 전처리한 경우 아르곤이나 헬륨에 의한 전처리에 비해 빠른 증착속도를 나타내었다. 이르곤 플라즈마 전처리나 플라즈마 전처리 하지 않고 $SiO_{2}$기판에 알루미늄을 증착하였을 경우에 비해 수소 플라즈마 전처리에 의해 알루미튬증착시 잠복기(incubation time)가 감소하였으며 치밀한 미세조직을 얻을 수 있었다.

• 융합정보논문지
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• 제12권2호
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• pp.149-156
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• 2022

본 논문에서는 광센서의 주요 구성요소인 도체를 상압플라즈마 공정 기술을 이용하여 티타늄(Ti: Titanium) 박막을 형성하고자 하였다. 이를 위해 기존의 상압플라즈마 장비를 개조하였으며, CF4 가스를 이용하여 sputter용 4인치 크기의 Ti 타겟을 식각하여 그 부산물이 글라스 소재의 샘플에 코팅되는 방법을 이용하였다. 이러한 부산물이 약 2cm까지 형성되었으며, 색깔에 따라 총 15영역으로 구분할 수 있었다. SEM(Scanning Electron Microscopy) 및 EDS(Energy Dispersive Spectrometer), 4-point probe 장비를 이용하여 표면 형상 및 구성 원소를 분석하였으며, 또한, 전기적인 특성을 측정하였다. 증착률 및 Ti 비율을 고려한다면, 타겟에서 약 4.5mm에서 5mm 정도에 샘플을 위치시켜 코팅하면 전체적으로 균일한 박막이 형성되지만, 이 박막에 상당량의 플루오린이 함유되어 있어 박막의 전기적인 특성에 큰 영향을 미치는 것을 알 수 있었다. 따라서 플루오린을 제거하거나 증착시 최소화하는 방안에 대해 추가 실험 및 연구를 진행해야 할 것이다.