• 제목/요약/키워드: Deposition Equipment

검색결과 192건 처리시간 0.031초

TCP-CVD 장비를 활용한 광도파로용 Core-SiO2 증착 (Deposition of SiO2 Thin Film for the Core of Planar Light-Wave-Guide by Transformer Coupled Plasma Chemical-Vapor-Deposition)

  • 김창조;신백균
    • 한국진공학회지
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    • 제19권3호
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    • pp.230-235
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    • 2010
  • 본 논문에서는 TCP-CVD를 이용하여 실리콘 산화막 형성에서 산화막의 특성에 영향을 미치는 전력, 가스 유량, 기판 바이어스 등의 공정조건에 따른 증착률과 굴절률을 제어하고자 한다. 그 결과 기판온도 300 [$^{\circ}C$], $SiH_4$ : $O_2$=50 : 100 [sccm], TCP power 1 [kW], 기판 바이어스 200 [W]를 인가한 조건에서 매우 우수한 균일도(<1 [%]) 및 증착률(0.28 [${\mu}m$/min])과 굴절률 (1.4610-1.4621)을 나타내는 안정된 $SiO_2$ 산화박막을 제조할 수 있었다.

영교차율과 가우시안 혼합모델을 이용한 박막증착장비의 세라믹 히터 결함 검출 (Fault Detection for Ceramic Heater in CVD Equipment using Zero-Crossing Rate and Gaussian Mixture Model)

  • 고진석;무향빈;임재열
    • 반도체디스플레이기술학회지
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    • 제12권2호
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    • pp.67-72
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    • 2013
  • Temperature is a critical parameter in yield improvement for wafer manufacturing. In chemical vapor deposition (CVD) equipment, crack defect in ceramic heater leads to yield reduction, however, there is no suitable ceramic heater fault detection system for conventional CVD equipment. This paper proposes a short-time zero-crossing rate based fault detection method for the ceramic heater in CVD equipment. The proposed method measures the output signal ($V_{pp}$) of RF filter and extracts the zero-crossing rate (ZCR) as feature vector. The extracted feature vectors have a discriminant power and Gaussian mixture model (GMM) based fault detection method can detect fault in ceramic heater. Experimental results, carried out by measured signals provided by a CVD equipment manufacturer, indicate that the proposed method detects effectively faults in various process conditions.

신경회로망을 이용한 ITO 박막 성장 공정의 모형화 (Modeling of Indium Tin Oxide(ITO) Film Deposition Process using Neural Network)

  • 민철홍;박성진;윤능구;김태선
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.741-746
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    • 2009
  • Compare to conventional Indium Tin Oxide (ITO) film deposition methods, cesium assisted sputtering method has been shown superior electrical, mechanical, and optical film properties. However, it is not easy to use cesium assisted sputtering method since ITO film properties are very sensitive to Cesium assisted equipment condition but their mechanism is not yet clearly defined physically or mathematically. Therefore, to optimize deposited ITO film characteristics, development of accurate and reliable process model is essential. For this, in this work, we developed ITO film deposition process model using neural networks and design of experiment (DOE). Developed model prediction results are compared with conventional statistical regression model and developed neural process model has been shown superior prediction results on modeling of ITO film thickness, sheet resistance, and transmittance characteristics.

Development Status of Equipment for Mass Production of AMOLED Panels Using 'Super Grain Silicon' Technology

  • Hong, Jong-Won;Na, Heung-Yeol;Chang, Seok-Rak;Lee, Ki-Yong;Kim, Sang-Soo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1136-1139
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    • 2009
  • Recently, various Ni doping systems and thermal annealing systems have been developed for fabrication of polycrystalline silicon film using SGS (super grain silicon) for medium and largesize AMOLED panels. In this study, we compare the potential of Ni doping systems including ALD (atomic layer deposition), AMD (atmospheric metal deposition), in-line sputter, and crystallization annealing systems including batch type furnace, inline furnace, and RTA (rapid thermal annealing) developed for the SGS method. Additional requirements for those systems to be used for mass production of large AMOLED TVs are suggested based on evaluation results for both poly-Si films and TFT backplanes.

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Chemical structure evolution of low dielectric constant SiOCH films during plasma enhanced plasma chemical vapor deposition and post-annealing procedures

  • Xu, Jun;Choi, Chi-Kyu
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2002년도 추계학술대회 발표 논문집
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    • pp.34-46
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    • 2002
  • Si-O-C-H films with a low dielectric constant were deposited on a p-type Si(100) substrate using a mixture gases of the bis-trimethylsilyl-methane (BTMSM) and oxygen by an inductively coupled plasma chemical vapor deposition (ICPCYD). High density plasma of about $~10^{12}\textrm{cm}^{-3}$ is obtained at low pressure (<400 mTorr) with rf power of about 300W in ICPCVD where the BTMSM and $O_2$ gases are fully dissociated. Fourier transform infrared (FTIR) spectra and X-ray photoelectron spectroscopy (XPS) spectra show that the film has $Si-CH_3$ and OH-related bonds. The void within films is formed due to $Si-CH_3$ and OH-related bonds after annealing at $500^{\circ}C$ for the as-deposition samples. The lowest relative dielectric constant of annealed film at $500^{\circ}C$ is about 2.1.

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Resistance Switching Enhancement in Multi-step Deposition by Multi-deposition and Multi-anneal

  • Kim KyongRae;Ko Han-kyoung;Lee Taeho;Park In-Sung;Ahn Jinho
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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    • pp.151-154
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    • 2005
  • In this paper, we present the enhanced performance of resistive RAM devices with multi-step deposited and annealed oxides. By using multi-step deposition and low temperature multi-step annealins, forming-free Re-RAM is achieved with lower operation voltages and larger resistive ratio than those of conventional Re-RAM with typical single deposited oxide.

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A comprehensive study of spin coating as a thin film deposition technique and spin coating equipment

  • Tyona, M.D.
    • Advances in materials Research
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    • 제2권4호
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    • pp.181-193
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    • 2013
  • Description and theory of spin coating technique has been elaborately outlined and a spin coating machine designed and fabricated using affordable components. The system was easily built with interdisciplinary knowledge of mechanics, fluid mechanics and electronics. This equipment employs majorly three basic components and two circuit units in its operation. These include a high speed dc motor, a proximity sensor mounted at a distance of about 15 mm from a reflective metal attached to the spindle of the motor to detect every passage of the reflective metal at its front and generate pulses. The pulses are transmitted to a micro-controller which process them into rotational speed (revolution per minute) and displays it on a lead crystal display (LCD) which is also a component of the micro-controller. The circuit units are a dc power supply unit and a PWM motor speed controlling unit. The various components and circuit units of this equipment are housed in a metal casing made of an 18 gauge black metal sheet designed with a total area of 1, $529.2cm^2$. To illustrate the use of the spin-coating system, ZnO sol-gel films were prepared and characterized using SEM, XRD, UV-vis, FT-IR and RBS and the result agrees well with that obtained from standard equipment and a speed of up to 9000 RPM has been achieved.

침적 입자를 고려한 유동해석을 통한 신형 탈황설비용 GGH 요소 최적화 (Optimization of the Gas-Gas Heater Element for Desulfurization Equipment through Fluid Analysis of considering Deposition Particles)

  • 오부진;류봉조;이영신;김종호;백수곤
    • 한국소음진동공학회논문집
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    • 제20권7호
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    • pp.611-619
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    • 2010
  • The paper deals with the proper design of GGH(gas-gas heater) panel elements of desulfurization equipments in a thermoelectric power plant. When fossil fuels such as coal, petroleum et cetera are burnt to ashes, sulfur oxide compounds are produced, and calcareous sludges are deposited at GGH panel elements. In this case, operation of a power plant equipments is interrupted, and a tremendous economic loss comes into existence. One of the purposes of the paper is to find flow velocity distributions and regions of depositions when calcareous sludges pile up on the GGH panel elements through the fluid analysis. In the fluid analysis, flow velocity and position distributions of particles between GGH panel elements are demonstrated according to time variation for ammonia and calcium hydroxide particles.

플라즈마 장비 센서정보의 Auto/Cross-Correlated 시계열 모델링 (Auto/Cross-Correlated Time Series Modeling of Plasma Equipment Sensor Information)

  • 김기태;김병환
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 심포지엄 논문집 정보 및 제어부문
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    • pp.99-101
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    • 2006
  • Auto-Cross Correlated time series (ACTS) model was constructed by using the backpropagation neural network. The performance of ACTS model was evaluated with sensor information collected from a large volume, industrial plasma-enhanced chemical vapor deposition system. A total of 18 sensor information were collected. The effect of inclusion of past and future information were examined. For all but three sensor information with a large data variance demonstrated a prediction error less than 3%. By integrating ACTS model into equipment software, process quality can be more stringently monitored while improving device throughput.

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