• 한국지능시스템학회논문지
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• 제25권3호
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• pp.254-259
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• 2015

본 논문은 BCI(Brain Computer Interface)기반의 정상상태시각유발전위(SSVEP : Steady-State Visual Evoked Potential)를 사용하여 무선 로봇 제어를 위한 시스템을 제안하였다. CPSD(Cross Power Spectral Density)를 사용하여 전극의 신호를 분석하였다. 또한 분류를 위해서 LDA(Linear Discriminant Analysis)와 SVM(Support Vector Machine)을 사용하였다. 그 결과 피험자들의 평균 분류율은 약 70%로 나타났다. 로봇제어의 경우 뇌파의 값을 분류하여 나타난 결과 값으로 로봇이 움직일 수 있도록 구현하였고, 블루투스 통신을 이용하여 로봇제어를 수행하였다.

• 치과방사선
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• 제17권1호
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• pp.27-49
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• 1987

Using ³H-proline as a radioactive tracer, the relationship between the ultrastructural differentiation and the site of protein synthesis has been investigated in developing red blood corpuscles. The general ultra-structure of erythropoietic cells in differentiation after 60 minutes of in vitro labeling has confirmed the results from previous investigations by Bessis, M., Thiery, J. and others. In dividing nuclei more than two-thirds of the labeling were present at the interface between heterochromatin and euchromatin. In less differentiated cells most of the grains in interphase cells was localized over the nucleus. As the cells continued to develope beyond a stage where cytoplasmic density was clearly increased over other cell lines in bone marrow, the majority of grains localized over the cytoplasmic area was decreased in more mature cells, as judged by the density of cytoplasm, and the structural changes in mitochondria, Golgi complex and polysomal configurations. These results show; 1) that the cytoplasm of erythroblast series does not change under in vitro conditions employed in the study; 2) that protein synthesis in the nucleus occurs largely at the interface between euchromatin and heterochromatin in active nuclei; and 3) that cytoplasmic synthesis of proteins continues to take place well into the normoblast stage solong as the physically visible polysomes are present in maturing red blood corpuscles.

• 한국전기전자재료학회논문지
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• 제23권10호
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• pp.814-819
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• 2010

Porous carbon electrodes with wooden materials are manufactured by molding carbonized wood powder. Electrical properties of the interface for electrolyte and porous carbon electrode are investigated from viewpoint of NaCl electrolyte concentration, capacitance and complex impedance. Density of porous carbon materials is 0.47~0.61 g/$cm^3$. NaCl electrolytic absorptance of the porous carbon materials is 5~30%. As the electrolyte concentration increased, capacitance is increased and electric resistance is decrease with electric double layer effect of the interface. The electric current of the porous carbon electrode compared in the copper and the high density carbon electrode was improved on a large scale, due to a increase in surface area. The circuit current increased as the distance between of the porous carbon electrode and the zinc electrode decreased, due to increase in electric field. Experimental results indicated that the current properties of galvanic cell could be improved by using porous carbon electrode.

• 한국전기전자재료학회논문지
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• 제27권9호
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• pp.547-550
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• 2014

In this study, the electrical characteristics of the nickel (Ni)/carbon nanotube (CNT)/$SiO_2$ structures were investigated in order to analyze the mechanism of CNT in MOS device structures. We fabricated 4H-SiC MOS capacitors with or without CNTs. CNT was dispersed by isopropyl alcohol. The capacitance-voltage (C-V) and current-voltage (I-V) are characterized. Both devices were measured by Keithley 4200 SCS. The experimental flatband voltage ($V_{FB}$) shift was positive. Near-interface trap charge density ($N_{it}$) and negative oxide trap charge density ($N_{ox}$) value of CNT embedded MOS capacitors was less than that values of reference samples. Also, the leakage current of CNT embedded MOS capacitors is higher than reference samples. It has been found that its oxide quality is related to charge carriers and/or defect states in the interface of MOS capacitors.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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• pp.103.1-103.1
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• 2011

실리콘 이종접합 태양전지에서 계면 결함 밀도는 효율을 결정하는데 가장 중요한 요인으로 작용한다. 계면 결함은 캐리어의 재결합 위치로 작용하여, 계면 결함 밀도가 증가하면 재결합 속도가 증가하게 된다. 흡수층으로 사용되는 실리콘 웨이퍼 (결정질 실리콘)를 가능한 깨끗하게 세정함으로써, 또한 emitter로 쓰이는 비정질 실리콘을 낮은 데미지로 증착하여 계면 결함 밀도를 감소 시킬 수 있다. 이러한 계면 결함 밀도의 감소가 어떠한 변화로 인해 태양전지 특성에 영향을 주는지 시물레이션을 통해 알아보았다. n-type 웨이퍼에 p-type 비정질 실리콘을 emitter로 하여 TCO/p/i/n-type wafer/i/n/TCO/metal의 구조를 적용했고, wafer 전면과 i로 쓰인 무첨가된 비정질 실리콘 간의 계면 결함 밀도를 변수로 적용했다. 그 결과, 계면 결함 밀도가 감소함에 따라 재결합이 감소하여 태양전지 특성이 증가하는 측면도 있지만, 흡수층의 장벽 (barrier height)이 높아져 재결합을 더욱 감소시킴으로 인해 태양전지 특성이 증가함을 알 수 있었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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• pp.737-739
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• 1998

Gate insulators using various fluoride films were investigated for thin film transistor applications. Conventional oxide containing materials exhibited high interface states, high $D_{it}$ gives an increased threshold voltage and poor stability of TFT. To improve TFT performances, we must reduce interface trap charge density between Si and gate insulator. In this paper, we investigated gate insulators such as such as $CaF_2$, $SrF_2$, $MgF_2$ and $BaF_2$. These materials exhibited an improvement in lattice mismatch, difference in thermal expansion coefficient, and electrical stability MIM and MIS devices were employed for an electrical characterization and structural property examination. Among the various fluoride materials, $CaF_2$ film showed an excellent lattice mismatch of 0.737%, breakdown electric field higher than 1.7MV/cm and leakage current density of $10^{-6}A/cm^2$. This paper probes a possibility of new gate insulator material for TFT application.

• 한국전기전자재료학회논문지
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• 제25권4호
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• pp.304-308
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• 2012

Transparent thin film transistors (TTFT) were fabricated using the rf magnetron sputtered ZnO-$SnO_2$ films as active layers. A ceramic target whose Zn atomic ratio to Sn is 2:1 was employed for the deposition of ZnO-$SnO_2$ films. To study the post-annealing effects on the properties of TTFT, ZnO-$SnO_2$ films were annealed at $200^{\circ}C$ or $400^{\circ}C$ for 5 min before In deposition for source and drain electrodes. Oxygen was added into chamber during sputtering to raise the resistivity of ZnO-$SnO_2$ films. The effects of oxygen addition on the properties of TTFT were also investigated. 100 nm $Si_3N_4$ film grown on 100 nm $SiO_2$ film was used as gate dielectrics. The mobility, $I_{on}/I_{off}$, interface state density etc. were obtained from the transfer characteristics of ZnO-$SnO_2$ TTFTs.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.77.1-77.1
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• 2012

Zn 기반 산화물 반도체는 기존의 비정질 Si에 비해 저온공정에도 불구하고 높은 이동도, 투명하다는 장점으로 인해 차세대 디스플레이용 백플레인 소자로 주목받고 있다. 산화물 트랜지스터는 우수한 소자특성을 보여주고 있지만, 온도, 빛, 그리고 게이트 바이어스 스트레스에 의한 문턱전압의 불안정성이 문제의 문제를 해결해야한다. 산화물 반도체의 문턱전압의 불안정성은 유전체와 채널층의 계면 혹은 채널에서의 charge trap, photo-generated carrier, ads-/desorption of molecular 등의 원인으로 보고되고 있어, 고신뢰성의 산화물 채널층을 성장하기 위한 노력이 이루어지고 있다. 최근, 산화물 트랜지스터의 다양한 조건에서의 문턱전압의 불안정성을 해결하기 위해 산화물의 주된 결함으로 일컬어지고 있는 산소결핍을 억제하기 위해 성장공정의 제어 그리고, 산소와의 높은 binding energy를 같은 Al, Hf, Si 등과 같은 원소를 첨가하여 향상된 소자의 특성이 보고되고 있지만, 줄어든 산소공공으로 인해 이동도가 저하되는 문제점이 야기되고 있다. 이러한 문제점을 해결하기 위해, 최근에는 Buried layer의 삽입 혹은 bi-channel 등과 같은 방안들이 제안되고 있다. 본 연구는 atomic layer deposition을 이용하여 AZO bureid layer가 적용된 ZnO 트랜지스터의 특성과 안정성에 대한 연구를 하였다. 다결정 ZnO 채널은 유전체와의 계면에 많은 interface trap density로 인해 positive gate bias stress에 의한 문턱전압의 불안정성을 보였지만, AZO층이 적용된 ZnO 트랜지스터는 줄어든 interface trap density로 인해 향산된 stability를 보였다.

• 세라미스트
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• 제22권4호
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• pp.402-416
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• 2019

The development of next-generation secondary batteries, including lithium-ion batteries (LIB), requires performance enhancements such as high energy/high power density, low cost, long life, and excellent safety. The discovery of new materials with such requirements is a challenging and time-consuming process with great difficulty. To pursue this challenging endeavor, it is pivotal to understand the structure and interface of electrode materials in a multiscale level at the atomic, molecular, macro-scale during charging / discharging. In this regard, various advanced material characterization tools, including the first-principle calculation, high-resolution electron microscopy, and synchrotron-based X-ray techniques, have been actively employed to understand the charge storage- and degradation-mechanisms of various electrode materials. In this article, we introduce and review recent advances in in-situ synchrotron-based x-ray techniques to study electrode materials for LIBs during thermal degradation and charging/discharging. We show that the fundamental understanding of the structure and interface of the battery materials gained through these advanced in-situ investigations provides valuable insight into designing next-generation electrode materials with significantly improved performance in terms of high energy/high power density, low cost, long life, and excellent safety.

• 한국전기전자재료학회논문지
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• 제18권11호
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• pp.977-982
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• 2005

Al/AlN/n-type 6H-SiC (0001) MIS structures were prepared by AlN layers on vicinal 6H-SiC(0001) substrates with reactive RF magnetron sputtering method. The AlN films were annealed at $900^{\circ}C$, $N_2$ atmosphere lot 1 minutes showed the best result. With XRD analysis, AlN(0002) peak was clearly found. The typical dielectric constant value of the AlN film in the MIS capacitors was obtained as 8.4 from photo C-V. Also, the gate leakage current density of the MlS capacitor was $10^{-10}\;A/cm^2$ order within the electric field of 1.8 MV/cm. Finally, the amount of interface trap densities, $D_{it}$, was evaluated as $5.3\times10^{10}\;eV^{-1}cm^{-2}$ at (Ec-0.85) eV.