• Title/Summary/Keyword: Dark Current

Search Result 369, Processing Time 0.029 seconds

Hydrogen-Dependent Catalytic Growth of Amorphous-Phase Silicon Thin-Films by Hot-Wire Chemical Vapor Deposition (HWCVD를 이용한 Amorphous Si 박막 증착공정에서 수소량에 따른 박막성장 특성)

  • Park, Seungil;Ji, Hyung Yong;Kim, MyeongJun;Kim, Keunjoo
    • Current Photovoltaic Research
    • /
    • v.1 no.1
    • /
    • pp.27-32
    • /
    • 2013
  • We investigated the growth mechanism of amorphous-phase Si thin films in order to improve the film characteristics and circumvent photo-degradation effects by implementation of hot-wire chemical vapor deposition. Amorphous silicon thin films grown in a silane/hydrogen mixture can be decomposed by a resistive heat filament. The structural properties were observed by Raman spectroscopy, FTIR, SEM, and TEM. The electrical properties of the films were measured by photo-conductivity, dark-conductivity, and photo-sensitivity. The contents of Si-H and $Si-H_n$ bonds were measured to be 19.79 and 9.96% respectively, at a hydrogen flow rate of 5.5 sccm, respectively. The thin film has photo-sensitivity of $2.2{\times}10^5$ without a crystalline volume fraction. The catalyst behavior of the hot-wire to decompose the chemical precursors by an electron tunneling effect depends strongly on the hydrogen mixture rate and an amorphous Si thin film is formed from atomic relaxation.

Fabrication of the Optical Fiber-Photodiode Array Module Using Si v-groove (실리콘 v-groove를 이용한 광섬유-광검출기 어레이 모듈 제작)

  • 정종민;지윤규;박찬용;유지범;박경현;김홍만
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.31A no.6
    • /
    • pp.88-97
    • /
    • 1994
  • We describe the design, fabrication, and performance of the optical fiber-photodiode 1$\times$12 arry module using mesa-type InS10.53T GaS10.47TAS/INP 1$\times$12 PIN photodiode array. We fabricated the PIN PD array for high-speed optical fiber parallel data link optimizing quantum efficiency, operating speed sensitivity from the PIN-FET structure, and electrical AC crosstalk. For each element of the array, the diameter of the photodetective area is 80 $\mu$m, the diameter of the p-metal pad is 90 $\mu$m, and the photodiode seperation is 250 $\mu$m to use Si v-groove. Ground conductor line is placed around diodes and p-metal pads are formed in zigzag to reduce Ac capacitance coupling between array elements. The dark current (IS1dT) is I nA and the capacitance(CS1pDT) is 0.9 pF at -5 V. No signifcant variations of IS1dT and CPD from element to element in the array were observed. We calulated the coupling efficiency for 10/125 SMF and 50/125 GI MMF, and measured the responsivity of the PD array at the wavelength is 1.55 $\mu$ m. Responsivities are 0.93 A/W for SMF and 0.96 A/W for MMF. The optical fiber-PD array module is useful in numerous high speed digital and analog photonic system applications.

  • PDF

Study on the MgO Passivated PM-OLED using the Tilt & Rotate Technique (경사증착법을 이용한 PM-OLED용 무기박막형 보호층 연구)

  • Kim, Kwang-Ho;Kim, Hoon;Kim, Jae-Kyung;Do, Lee-Mi;Han, Jeong-In;Ju, Byeong-Kwon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.16 no.9
    • /
    • pp.812-815
    • /
    • 2003
  • In this study, the MgO thin-film passivation layer was adopted to protect passive matrix organic light emitting diode(PMOLED) with the cathode separator from moisture and oxygen. Using the substrate rotate and tilt technique during the deposition, the organic and cathode layers were perfectly covered with MgO. And then, we analyzed the difference of the current-voltage and luminescence characteristics between passivated OLED of the MgO and non-passivated OLED. It was found that the number of dark spot generated from the degradated pixel was decreased owing to the Mgo thin-film passivation layer using the tilt & rotate technique. And the half-life time passivated OLED was improved two times more. Thus, the MgO could be vaccum-deposited under the low temperature and had a merit that the organic layer was not much affected. We can consider that MgO thin film passivation method can be adopted to protect the OLED from moisture and oxygen and can offer the enhancement of lifetime.

NEW DIGITAL H$\alpha$ OBSERVATION BY SOLAR FLARE TELESCOPE AT BOAO

  • LEE C.-W.;MOON Y.-J.;PARK Y.D.;JANG B.-H.;KIM KAP-SUNG
    • Journal of The Korean Astronomical Society
    • /
    • v.34 no.2
    • /
    • pp.111-117
    • /
    • 2001
  • Recently, we have set up a new digital CCD camera system, MicroMax YHS-1300 manufactured by Roper Scientific for Ha observation by Solar Flare Telescope at Bohyunsan Optical Astronomy Observatory. It has a 12 bit dynamic range, a pixel number of 1300$\times$1030, a thermoelectric cooler, and an electric shutter. Its readout speed is about 3 frames per second and the dark current is about 0.05 e-/p/s at $-10^{\circ}C$. We have made a system performance test by confirming the system linearity, system gain, and system noise that its specification requires. We have also developed a data acquisition software which connects a digital camera con-troller to a PC and acquires H$\alpha$ images via Microsoft Visual C++ 6.0 under Windows 98. Comparisons of high quality H$\alpha$ images of AR 9169 and AR 9283 obtained from SOFT with the corresponding images from Learmonth Solar Observatory in Australia confirm that our H$\alpha$ digital observational system is performed properly. Finally, we present a set of H$\alpha$ images taken from a two ribbon flare occurred in AR 9283.

  • PDF

Progress Report on Development of the MIRIS, the Main Payload of STSAT-3

  • Park, Youngsik;Han, Wonyong;Lee, Dae-Hee;Jeong, Woong-Seob;Moon, Bongkon;Park, Kwijong;Pyo, Jeonghyun;Lee, Duk-Hang;Nam, Uk-Won;Park, Jang-Hyun;Seon, Kwang-Il;Yang, SunChoel;Park, Jong-Oh;Rhee, Seung-Wu;Lee, Hyung Mok;Matsumoto, Toshio
    • The Bulletin of The Korean Astronomical Society
    • /
    • v.37 no.2
    • /
    • pp.205.2-205.2
    • /
    • 2012
  • MIRIS (Multipurpose Infra-Red Imaging System), the main payload of STSAT-3 (Science and Technology Satellite-3), is the first Korean Infrared Space Telescope developed by KASI (Korea Astronomy and Space Science Institute). The FM (fight model) of MIRIS has been recently completed, and various performance tests have been made to measure system parameters such as readout noise, system gain, linearity, and dark current. The MIRIS FM has been integrated to the satellite system for the environment tests scheduled in September 2012. The MIRIS is expected to be launched in November 2012.

  • PDF

Dependance on Metal Electrode of Poly(3-hexylthiophene) EL Device (Poly(3-hexylthiophene) 발광소자의 금속전극 의존성)

  • 서부완;김주승;김형곤;이경섭;구할본
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2000.11a
    • /
    • pp.162-165
    • /
    • 2000
  • To investigate the effect of metal electrode in electroluminescent[EL] devices, we fabricated EL devices of ITO/P3HT/Al, ITO/P3HT/LiF/Al and ITO/P3HT/Mg:In structure. In current-voltage-light power characteristics, turn-on voltage of EL devices using LiF insulating layer and Mg:In(2.8V) metal electrode is lower than EL device using Al(4.2V). Besides the external quantum efficiency is improved also. The reason is related to carrier mobility and carrier injection, which would affect the hole-electron balance. In the device with Al electrode, holes injected from indium-tin-oxide[ITO] to poly(3-hexylthiophene)[P3HT] might reach the Al electrode without interacting with injected electrons, because the electron injection efficiency was very low for this electrode. Besides oxidation of the Al electrode is likely due to holes reaching the cathode without meeting injected electrons. Another possible reason for the higher EL efficiency may be the insulating layer playing the role of a tunneling barrier for holes to the Al electrode. In all EL devices, the orange-red light was clearly visible in a dark room. Maximum peak wavelength of EL spectrum emitted at 640nm in accordance with photon energy 1.9eV

  • PDF

Fabrication and Characteristics of a-Si : H Photodiodes for Image Sensor (영상센서를 위한 a-Si : H 광다이오드의 제작 및 특성)

  • Park, Wug-Dong;Kim, Ki-Wan
    • Journal of Sensor Science and Technology
    • /
    • v.2 no.1
    • /
    • pp.29-34
    • /
    • 1993
  • a-Si : H photodiodes for image sensor have been fabricated and characterized. Photosensitivity of a ITO/a-Si : H/Al photodiode without blocking layer was 0.7 under the applied voltage of 5 V and peak spectral sensitivity in visible region was found at 620 nm. Dark current of ITO/a-SiN : H/a-Si : H/p-a-Si : H/Al photodiode was suppressed by hole blocking layer and electron blocking layer at the value of lower than 1.5 pA to the applied voltage of 10 V. Also maximum photosensitivity was about 1 under the applied voltage of 3 V and peak spectral sensitivity was found at 540 nm.

  • PDF

X선 영상 검출기 적용을 위한 $HgI_2$ 필름의 누설전류 특성 향상에 관한 연구

  • Gwon, Cheol;Choe, Chi-Won;Son, Dae-Ung;Jo, Seong-Ho;Gang, Sang-Sik;Nam, Sang-Hui
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2007.06a
    • /
    • pp.345-345
    • /
    • 2007
  • 본 연구는 x선 영상검출기 적용을 위한 $HgI_2$ 필름의 누설전류 특성 향상을 위한 연구로서, $HgI_2$기반의 다양한 물질을 이용하여 다층구조 방식으로 제작된 필름의 누설전류 특성평가 및 제작된 다층구조의 상부전극물질의 변화에 따른 누설전류 특성을 평가하였다. $HgI_2$기반 다층구조의 제작 물질은 Parylene, $PbI_2$, a-Se을 사용하여 시편(parylene/ITO, ITO/$HgI_2/PbI_2$/ITO, ITO/$HgI_2$/a-Se/ITO)을 제작하였으며, 필름 제작공정은 Screen print, PVD공정으로 다층구조 필름을 제작하였다. 또 한, 다층구조로 제작된 필름에 상부 전극물질은 Au, In, ITO를 사용하여 누설전류의 특성을 평가하였다. 측정 장치로 DC Power Supply(556H. EG&G : 50~200V), X 선 발생장치(Toshiba KXO-50N), 차폐체 (Al 및 Cu), Oscilloscope (LeCroy, LC334AM, USA), Electrometer (Keithley, 6517), Ion chamber 2060 (Radical Co.)을 이용하여, 제작된 $HgI_2$기반 다층구조 sample의 누설전류 특성을 실험하였다. 이 결과로 다층구조에 제작된 물질 및 상부전극에 따른 누설전류의 특성을 평가하였다.

  • PDF

Reliability testing of InGaAs Waveguide Photodiodes for 40-Gbps Optical Receiver Applications (40-Gbps급 InGaAs 도파로형 포토다이오드의 신뢰성 실험)

  • Joo, Han-Sung;Ko, Young-Don;Yun, Il-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2004.07a
    • /
    • pp.13-16
    • /
    • 2004
  • The reliability of 1.550m-wavelength InGaAs mesa waveguide photodiodes(WGPDs), which developed for 40-Gbps optical receiver applications, fabricated by metal organic chemical vapor deposition is investigated. Reliability is examined by both high-temperature storage tests and the accelerated life tests by monitoring dark current and breakdown voltage. The median device lifetime and the activation energy of the degradation mechanism are computed for WGPD test structures. From the accelerated life test results, the activation energy of the degradation mechanism and median lifetime of these devices in room temperature are extracted from the log-normal failure model by using average lifetime and the standard deviation of that lifetime in each test temperature. It is found that the WGPD structure yields devices with the median lifetime of much longer than $10^6$ h at practical use conditions. Consequently, this WGPD structure has sufficient characteristics for practical 40-Gbps optical receiver modules.

  • PDF

Growth and Photoconductive Characteristics of $ZnGa_2Se_4$ Epilayers by the Hot Wall Epitaxy

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2004.07a
    • /
    • pp.263-266
    • /
    • 2004
  • The stochiometric mix of evaporating materials for the $ZnGa_2Se_4$ single crystal thin films were prepared from horizental furnace. The polycrystal structure obtaind from the power x-ray diffraction was defect chalcopyrite. The lattice costants $a_0\;and\;c_0\;were\;a_0=5.51\;A,\;c_0=10.98\;A$. To obtains the single crystal thin films, $ZnGa_2Se_4$ mixed crystal were deposited on throughly etched Si(100) by the Hot Wall Epitaxy (HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current(pc/dc), maximum allowable rower dissipation(MAPD), spectral response and response time.

  • PDF