• Korean Journal of Materials Research
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• v.17 no.12
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• pp.642-647
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• 2007

We investigated dry etching of acrylic (PMMA) in $O_2/N_2$ plasmas using a multi-layers electrode reactive ion etching (RIE) system. The multi-layers electrode RIE system had an electrode (or a chuck) consisted of 4 individual layers in a series. The diameter of the electrodes was 150 mm. The etch process parameters we studied were both applied RIE chuck power on the electrodes and % $O_2$ composition in the $N_2/O_2$ plasma mixtures. In details, the RIE chuck power was changed from 75 to 200 W.% $O_2$ in the plasmas was varied from 0 to 100% at the fixed total gas flow rates of 20 sccm. The etch results of acrylic in the multilayers electrode RIE system were characterized in terms of negatively induced dc bias on the electrode, etch rates and RMS surface roughness. Etch rate of acrylic was increased more than twice from about $0.2{\mu}m/min$ to over $0.4{\mu}m/min$ when RIE chuck power was changed from 75 to 200 W. 1 sigma uniformity of etch rate variation of acrylic on the 4 layers electrode was slightly increased from 2.3 to 3.2% when RIE chuck power was changed from 75 to 200 W at the fixed etch condition of 16 sccm $O_2/4\;sccm\;N_2$ gas flow and 100 mTorr chamber pressure. Surface morphology was also investigated using both a surface profilometry and scanning electron microscopy (SEM). The RMS roughness of etched acrylic surface was strongly affected by % $O_2$ composition in the $O_2/N_2$ plasmas. However, RIE chuck power changes hardly affected the roughness results in the range of 75-200 W. During etching experiment, Optical Emission Spectroscopy (OES) data was taken and we found both $N_2$ peak (354.27 nm) and $O_2$ peak (777.54 nm). The preliminarily overall results showed that the multi-layers electrode concept could be successfully utilized for high volume reactive ion etching of acrylic in the future.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.5
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• pp.29-35
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• 1999

Inductively coupled plsama etching of platinum thin film was studied using $O_2$ addition to $Cl_2$/Ar gas plasma. In this study, Pt etching mechanism was investigated with Ar/$Cl_2$ /$O_2$ gas plasma by using XPS and QMS. Ion current density was measured with Ar/$Cl_2$ /$O_2$ gas plasma by using single Langmuir probe. It was confirmed by using QMS and single Langmuir probe that Cl and Ar species rapidly decreased and ion current density was also decreased with increasing $O_2$ gas ratios. These results implied that the decrease of Pt etch rate is due to the decrease of reactive species ans ion current density with increasing $O_2$ gas mixing ratios. A maximum etch rate of 150nm/min and the oxide selectivity of 2.5 were obtained at Ar/$Cl_2$ /$O_2$ flow rate of 50 seem, RF power of 600 W, dc bias voltage of 125 V, and the total pressure of 10 mTorr.

• Journal of the Korean Society of Propulsion Engineers
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• v.20 no.3
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• pp.54-62
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• 2016

Micro plasma thruster (${\mu}PT$) was studied experimentally with a dual-stage micro-hollow cathode discharge (MHCD) plasma. Electrostatic-like acceleration exhibiting more directional and elongated exhaust plume was achieved by a dual layer MHCD at the total input power less than 10 W with argon flow rate of 40 sccm. V-I characteristic indicated that there was an optimal regime for dual-stage operation where the acceleration voltage across the second stage remained constant. Estimated exhaust plume length showed a similar trend to the analytic estimate of exhaust velocity which scales with an acceleration voltage. ${\mu}PT$ with multiple holes exhibited similar performance with single-hole thruster indicating that higher power loading is possible owing to decreased power through each hole. Boltzmann plot of atomic argon spectral lines showed average electron excitation temperature of about 2.6 eV (~30,170 K) in the exhaust plume.

• Journal of the Korean Vacuum Society
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• v.18 no.3
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• pp.164-175
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• 2009

CFD is used to analyze gas flow characteristics, power absorption, electron temperature, electron density and chemical species profile of an internal antenna type inductively coupled plasma system. An optimized grid generation technology is used for a complex real-scale models for industry. A bare metal antenna shows concentrated power absorption around rf a feeding line. Skin depth of power absorption for a system is modeled to 50 mm, which is reported 53 mm by experiments. For an application of bipolar plates for hydrogen fuel cells, multi-sheet loading ICP nitriding system is proposed using an internal ICP antenna. It shows higher atomic nitrogen density than reported simple pulsed dc nitriding systems. Minimum gap between sheets for uniform nitriding is modeled to be 39 mm.

• 제어로봇시스템학회:학술대회논문집
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• 2005.06a
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• pp.158-163
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• 2005

Competitive electricity markets necessitate equitable methods for allocating transmission usage in order to set transmission usage charges and congestion charges in an unbiased and an open-accessed basis. So in competitive markets it is usually necessary to trace the contribution of each participant to line usage, congestion charges and transmission losses, and then to calculate charges based on these contributions. A UPFC offers flexible power system control, and has the powerful advantage of providing, simultaneously and independently, real-time control of voltage, impedance and phase angle, which are the basic power system parameters on which sys-tem performance depends. Therefore, UPFC can be used efficiently and flexibly to optimize line utilization and increase system capability and to enhance transmission stability and dampen system oscillations. In this paper, a mathematical approach to allocate the contributions of system users and UPFCs to transmission system usage is presented. The paper uses a dc-based load flow modeling of UPFC-inserted transmission lines in which the injection model of the UPFC is used. The relationships presented in the paper showed modified distribution factors that modeled impact of utilizing UPFCs on line flows and system usage. The derived relationships show how bus voltage angles are attributed to each of changes in generation, injections of UPFC, and changes in admittance matrix caused by inserting UPFCs in lines. The relationships derived are applied to two test systems. The results illustrate how transmission usage would be affected when UPFC is utilized. The relationships derived can be adopted for the purpose of allocating usage and payments to users of transmission network and owners of UPFCs used in the network. The relationships can be modified or extended for other control devices.

• 한국신재생에너지학회:학술대회논문집
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• 2011.11a
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• pp.52.2-52.2
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• 2011

본 연구의 목적은 CIGS 태양전지의 두 가지 TCO층 중 AZO를 제외한 intrinsic ZnO의 전자빔 처리 영향에 대한 특성 분석을 하고자 함이다. 또한 추후 CIGS 태양전지를 제조하여 적용 시 전자빔 처리 전후의 특성이 어떻게 변하는지를 알아보기 위한 사전 실험이다. Intrinsic ZnO는 RF magnetron sputter 를 이용하여 약 100nm의 두께로 증착 하였다. 이때 공정 압력을 변수로 RF power는 80W로 설정 하였으며 Ar 분압은 10mtorr, 5mtorr, 1mtorr로 각각 달리 하며 증착 하였다. 이후 전자빔 처리를 위해 각각의 시편에 Argon flow 7sccm 상태에서 DC power 3kW, RF power 300W의 세기로 전자빔 처리를 실시 하였다. 전자빔 처리에 따른 전기적, 구조적 특성을 분석하기위해 Hall measurement와 SEM, XRD, UV-vis spectroscopy을 사용하였다. 먼저 Hall measurement 측정을 통한 전기적 분석 결과 비저항이 무한대에서 약 $40m{\Omega}{\cdot}cm$로 감소된 결과를 도출 할 수 있었으며, $2{\sim}3.4{\times}10^{18}/cm^3$ 이상의 carrier density 가 측정 되었다. UV-vis spectroscopy를 이용한 투과도 측정결과 모든 시편에서 Band gap이 감소하는 결과를 보였다. SEM, XRD를 이용한 분석결과 결정성 및 grain의 크기가 증가하는 결과를 얻을 수 있었다.

• KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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• v.28 no.2
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• pp.143-149
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• 2022

PCS needs to freely switch AC and DC to connect the battery, external AC loads and renewable energy in both directions for energy efficiency. Whenever converting happens, power loss inevitably occurs. Minimization of the power loss to save electricity and convert it for usage is a very critical function in PCS. PCS plays an important role in the ESS(Energy Storage System) but the importance of stabilizing semiconductors on PCB(Printed Circuit Board) should be empathized with a risk of failure such as a fire explosion. In this study, the temperature variation inside PCS was reviewed by cooling fan on top of PCS, and the vibration characteristics of PCS were analyzed during truck transportation for reliability of the product. In most cases, a cooling fan is mounted to control the inner temperature at the upper part of the PCS and components generating the heat placed on the internal aluminum cooling plate to apply the primary cooling and the secondary cooling system with inlet fans for the external air. Results of CFD showed slightly lack of circulating capacity but simulated temperatures were durable for components. The resonance points of PCS were various due to the complexity of components. Although they were less than 40 Hz which mostly occurs breakage, it was analyzed that the vibration displacement in the resonance frequency band was very insufficient. As a result of random-vibration simulation, the lower part was analyzed as the stress-concentrated point but no breakage was shown. The steel sheet could be stable for now, but for long-term domestic transportation, structural coupling may occur due to accumulation of fatigue strength. After the test completed, output voltage of the product had lost so that extra packaging such as bubble wrap should be considered.

• Journal of the Korean Society for Aeronautical & Space Sciences
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• v.38 no.12
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• pp.1240-1246
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• 2010

Enthalpy probe with the inner and outer diameters of 1.5 mm and 4.8 mm, respectively, is designed and used to measure the temperatures and velocities along the centerline of Ar arc plasma flow until the probe was destroyed. For this purpose, Ar arc plasma flow is generated by non-transferred type DC arc heater with the power level of 17 kW. From this experiment, it is shown that the designed enthalpy probe can measure the temperature and velocity of arc plasma flow up to 12,000 K and 600 m/s, respectively, without destroy of probe tip. In this extreme case, the arc plasma flow is calculated to transfer the heat flux of ${\sim}5{\times}10^7\;W/m^2$ to the probe based on the heat and thermal boundary equations near the forward stagnation point of a body immersed in arc plasma flow. Consequently, the designed enthalpy probe can measure the wide ranges of plasma temperatures, velocities and concentrations simultaneously, which are generated by various types of arc heaters within the heat flux ranges of $0{\sim}5{\times}10^7\;W/m^2$ on the probe tip.

• Proceedings of the KSME Conference
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• 2007.05b
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• pp.2200-2205
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• 2007

In order to investigate the variation on a heat transfer coefficient during evaporation of $CO_2$, basic experiment on the evaporation heat transfer characteristics in a horizontal micro-channel tube was performed. Hydraulic diameters of micro-channels were 0.68 and 1.46 mm. The experiment apparatus consisted of a test section, a DC power supply, a heater, a chiller, a mass flow meter, a pump and a measurement system. Experiments were conducted for various mass fluxes of 300 to 800 kg/$m^2s$, heat fluxes of 10 to 40 kW/$m^2$ and saturation temperatures of -5 to 5$^{\circ}C$. With the increase heat flux, the evaporation heat transfer coefficient increased. And the significantly change of the heat transfer coefficient was observed at any heat flux and mass flux. As the saturation temperature increased and the hydraulic diameter decreased, the heat transfer coefficient increased.

• Transactions on Electrical and Electronic Materials
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• v.9 no.1
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• pp.1-5
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• 2008

ZnS is an attractive material for future optical and electrical devices since it has a direct and wide band gap to provide blue emission at room temperature. In this study, inductively coupled $BCl_3/Ar$ plasma was used to etch ZnS:Mn thin films. The maximum etch rate of 164.2 nm/min for ZnS:Mn was obtained at a $BCl_3(20)/Ar(80)$ gas mixing ratio, an rf power of 700 W, a dc bias voltage of -200V, a total gas flow of 20 sccm, and a chamber pressure of 1Pa. The etch behaviors of ZnS:Mn thin films under various plasma parameters showed that the ZnS:Mn were effectively removed by the chemically assisted physical etching mechanism. The surface reaction of the ZnS:Mn thin films was investigated by X-ray photoelectron spectroscopy. The XPS analysis revealed that Mn had detected on the surface ZnS:Mn etched in $BCl_3/Ar$ plasma.