• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.231-231
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• 2015

무전해 Ni의 Metal turnover (MTO)가 증가함에 따라, Ni과 Sn-Ag-Cu솔더간 계면 금속간화합물층의 두꺼워지고, Ni-Sn-P층에 형성된 Nano void의 수가 많아지게 되어 취성파괴가 증가한다.

• Journal of Welding and Joining
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• 제14권1호
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• pp.47-56
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• 1996

The purpose of this study is to develope an insert metal which can be brazed at lower temperature than the conventionally used insert metal and provide higher strength joint than base metal. In the review of binary phase diagram concerning Ti, Cu and Ni resulted in the discovery of Si having eutectic composition with them. The microstructure and the distribution of elements in reaction zone between CP Ti and insert metal were investigated by Optical Microscopy, SEM/EDX, EPMA, X-RAY. The newly developed insert metal is Ti-15wt%Cu-18wt%Ni-2wt%Si, which can yield the lower brazing temperature(1183K) compared with the conventional Ti-Cu-Ni system insert metal. The joints with this insert metal had tensile strength of 385MPa in the bonding temperature range of 1183K to 1243K.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2004년도 춘계 학술발표대회 개요집
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• pp.45-47
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• 2004

We have investigated the microstructures and the mechanical properties of TiA1/Cerameti1721 (Ag-Cu-Ti insert metal)/AISI4140 joints at 800$^{\circ}C$ for 60 to 300s using induction brazing method. Two continuous reaction layers of AICuTi and AICu$_2$Ti were formed at the interface between the braze and TiAl, whose thickness increased with the brazing time. The braze consisted of Ag-rich, Ti-rich, CuTi and CuTi$_2$ phases. The maximum tensile strength achieved 296MPa, which was 71% of that of TiAl base metal, for the specimen bonded at 800$^{\circ}C$. Further increase of the brazing temperature and time resulted in constant deterioration of its bonding strength due to large amount of brittle IMC.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2006년도 춘계 학술대회 개요집
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• pp.21-23
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• 2006

The microstructural investigation and thermo-mechanical reliability evaluation of the Sn-3.0Ag-0.5Cu solder bumped flip chip package were carried out during the thermal shock test of the package. In the initial reaction, the reaction product between the solder and Cu mini bump of chip side was Cu6Sn5 layer, while the two phases which were (Cu,Ni)6Sn5 and (Ni,Cu)3Sn4 were formed between the solder and Ni-P layer of the package side. The cracks were occurred at the corner solder joints after the thermal shocks of 400 cycles. The primary failure mechanism of the solder joints in this type of package was confirmed to be thermally activated solder fatigue failure.

• 한국분말재료학회지
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• 제4권3호
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• pp.196-204
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• 1997

Joining of AIN ceramics to W and Cu by active-metal brazing method was tried with use of (Ag-Cu)-Ti alloy as insert-metal. Joints were produced under various conditions of temperature, holding time and Ti-content in (Ag-Cu) alloy Reaction and microstructural development in bonded interface were investigated through observation and analysis by SEM/EDS, EPMA and XRD. Joint strengths were measured by shear test. Bonded interface consists of two layers: an insert-metal layer of eutectic Ag- and Cu-rich phases and a reaction layer of TiN. Thickness of reaction layer increases with bonding temperature, holding time and Ti-content of insert-metal. It was confirmed that the growth of reaction layer is a diffusion-controlled process. Activation energy for this process was 260 KJ/mol which is lower than that for N diffusion in TiN. Maximum shear strength of 108 MPa and 72 MPa were obtained for AIN/W and AIN/Cu joints, respectively. Relationship between processing variables, joint strength and thickness of reaction layer was also explained.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 1995년도 특별강연 및 춘계학술발표 개요집
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• pp.91-93
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• 1995

A study was made to examine the effects of post-weld heat treatment (PWHT) on the toughness and microstructures in the weld heat-affacted zone(HAZ) of Cu-bearing HSLA-100 steel. The Gleeble thermal/mechanical simulator was used to simulate the weld HAZ. The behavior of Cu-precipitates in HAZ is similar to that in base plate. PWHT at 55$0^{\circ}C$ shows highest hardness and lowest toughness, whereas PWHT at $650^{\circ}C$ shows reasonable toughness. Cu precipitated during agcing for increasing the strength of base metal is dissolved during single thermal cycle to 135$0^{\circ}C$ and is precipitated little on cooling and heating during subsequent weld thermal cycle. It precipitates by introducing PWHT.

• 한국재료학회지
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• 제17권8호
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• pp.402-407
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• 2007

In electronics manufacturing processes, soldering process has generally been used in surface mounting technology. Because of environmental restriction, lead free solders as like a SnAgCu ternary system are being used widely. After soldering process, the formation and growth of intermetalic compounds(IMCs) are formed in the interface between solder and Cu substrate as follows isothermal temperature and time. In this studies, therefore, we investigated the effects of the Cu substrate thickness on the IMC formation and growth of Sn-40Pb/Cu and Sn-3.0Ag-0.5Cu/Cu solder joints, respectively. The effect of the Cu thickness in PCB Cu pad and pure Cu plate was analyzed as measuring of thickness of each IMC. After solder was soldered on PCB and Cu plate which have different Cu thickness, we measured the IMC thickness in solder joints respectively. Also we compared with the effectiveness of Cu thickness on the IMC growth. From these results, we calculated the activation energy.

• 마이크로전자및패키징학회지
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• 제25권4호
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• pp.83-88
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• 2018

Cu/Ni/Sn-Ag 미세범프 접합 공정후 Ni/Sn-Ag접합계면에 잔류한 비전도성 필름(non-conductive film, NCF) trap 형성이 전기적 신뢰성에 미치는 영향을 분석하기 위해 온도 $150^{\circ}C$, 전류밀도 $1.5{\times}10^5A/cm^2$ 조건에서 electromigration (EM) 신뢰성 실험을 진행하였다. EM 신뢰성 실험 결과, NCF trap이 거의 없는 Cu/Ni/Sn-Ag 미세범프가 NCF trap이 형성된 미세범프 보다 약 8배 긴 EM 수명을 보여주고 있다. 저항 변화 및 손상계면에 대한 미세구조 분석결과, Ni/Sn-Ag접합계면에 공정 이슈에 의해 형성된 NCF trap이 Ni-Sn 금속간화합물/Sn-Ag솔더계면에 보이드를 유발하여 EM 원자 확산을 방해하기 때문에 빠른 보이드 성장에 의한 전기적 손상이 일찍 발생하는 것으로 판단된다.

• 마이크로전자및패키징학회지
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• 제15권4호
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• pp.31-39
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• 2008

캐비티 형성이 불필요한 MEMS 캡 본딩을 위해 전기도금법을 이용하여 Cu/Sn rim 구조를 형성하였으며, $25{\sim}400{\mu}m$ 범위의 rim 폭에 따른 본딩특성을 분석하였다. Cu/Sn rim의 폭이 증가함에 따라 rim 패키지 내부의 유효 실장면적비가 감소하는 반면에 파괴하중비가 증가하며, Cu/Sn rim 폭이 150 ${\mu}m$일 때 유효 실장면적비와 파괴하중비를 최적화할 수 있을 것으로 예측되었다. 폭 25 ${\mu}m$ 및 폭 50 ${\mu}m$인 Cu/Sn rim 접합부에서는 모든 계면에서 본딩이 이루어진 반면에, 100 ${\mu}m$ 이상의 폭을 갖는 rim 접합부에서는 Sn 도금표면의 거칠기에 의해 본딩이 이루어지지 않은 기공 부위가 관찰되었다.

• 마이크로전자및패키징학회지
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• 제15권4호
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• pp.17-24
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• 2008

열처리 및 electromigration에 따른 Cu pillar 범프 내 금속간화합물의 성장거동을 비교하기 위해서 각각 $150^{\circ}C$와 $150^{\circ}C,\;5{\times}10^4\;A/cm^2$의 조건에서 실험을 실시하였다. 또한 금속간화합물의 성장이 Cu pillar 범프 접합부의 기계적 신뢰성에 미치는 영향을 평가하기 위해 4점굽힘강도실험을 실시하여 열처리에 따른 계면접착에너지를 평가하였다. 리플로우 후에 Cu pillar/Sn 계면에서는 $Cu_6Sn_5$만이 관찰되었지만, 열처리 및 electromigration 실험 시간이 경과함에 따라 $Cu_3Sn$이 Cu pillar와 $Cu_6Sn_5$ 사이의 계면에서 생성되어 $Cu_6Sn_5$와 함께 성장하였다. 전체($Cu_6Sn_5+Cu_3Sn$)금속간화합물의 성장거동은 Cu pillar 범프 내 Sn이 모두 소모될 때 변화하였고, 이러한 금속간화합물 성장거동의 변화는 electromigration의 경우가 열처리의 경우보다 훨씬 빠르게 나타났다. 열처리 전 시편의 계면접착에너지는 $3.37J/m^2$이고, $180^{\circ}C$에서 24시간동안 열처리한 시편의 계면접착에너지는 $0.28J/m^2$로 평가되었다. 따라서 금속간화합물의 성장은 접합부의 기계적 신뢰성에 영향을 주는 것으로 판단된다.