• Journal of the Korean Magnetics Society
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• v.4 no.1
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• pp.20-24
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• 1994

The read/write characteristics of CoCr/NiFe double layered media are strongly affected by the magnetic properties of NiFe magnetic soft layer as well as those of CoCr recording layer. Modification of the permalloy layer by NiFe/Ge multilayer scheme resulted in the higher recording sensitivity and the higher reproduced voltage of CoCr/NiFe medium and this is attributed to the higher permeability of the back layer and high perpendicular anisotropy of the CoCr recording layer. Although higher permeability of back layer results in higher recording sensitivity, the increment of the reproduced voltage was not remarkable, which can be confirmed in the FEM numerical analysis. On the contrary, peak shift characteristics of the CoCr/NiFe medium with the NiFe multi back layer was deteriorated compared to that of the CoCr/NiFe medium with NiFe single back layer. Insertion of ferromagnetic thin CoZrNb intermediate layer between CoCr and NiFe layer was effective to ensure large reproduced voltage and low peak shift. These recoridng characteristics were also discussed in connection with microstructural characteristics.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.173-173
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• 2015

고온에서 우수한 기계적 물성을 보이는 CrZrSiN 코팅은 공구분야에 적용 가능성이 크지만, 공구의 수명과 밀접한 연관이 있는 밀착력에 대한 연구는 보고된 바가 없다. 본 연구에서는 텅스텐 카바이드(WC) 모재와 CrZrSiN 코팅 사이의 밀착력을 향상시키기 위해 다양한 중간층이 합성되었으며, 중간층의 경도와 탄성계수 비율(H/E ratio)이 코팅의 밀착 특성에 영향을 미치는 것으로 판단되었다.

• Korean Journal of Materials Research
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• v.7 no.1
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• pp.69-75
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• 1997

Thin films of $Si0_2(1000{\AA})/CoNiCr(400{\AA})/Cr$ were fabricated as a function of Cr thickness by KF magnetron sputtering. The saturation magnetization, coercive force and squareness with annealing temperature for these films were investigated. The values of saturation magnetization of $SiO_2/CoNiCr/Cr$ thin films decreased as the thickness of Cr underlayer increased, whereas coercive force increased as the thickness of Cr underlayer increased. The value of Ms was 600 emu/cc and the maximum value of Hc was 550 Oe. Especially, the value of saturation magnetization was rapidly decreased $SiO_2/CoNiCr/Cr(1700{\AA})$ thin films as the annealing temperature increased And the coercive force increased as the annealing temperature increased When annealing temperature was $650^{\circ}C$, the Ms was reduced to 90 % of the as-deposited film. And the Hc was showed maximum 1600 Oe. It was thought that Cr diffusion into CoNiCr layer reduced the magnetic moment of CoKiCr layer. In addition. Hc might he increased due to grain growth perpendicular to the film plane.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.154-154
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• 2015

현재 액체로켓 엔진 연소기 내벽은 bonding layer NiCrAlY과 Top layer $ZrO_2$가 플라즈마 용사 방식으로 형성 된다. 이는 뛰어난 열 차폐 특성과 작업시간이 짧은 장점이 있지만, bonding layer와 Top layer 사이의 열팽창 계수 차이로 인한 균열 발생 가능성이 내재 되어 있고, 연소실 내벽에 균일한 두께의 코팅층을 형성하기 어렵고 설비가 비싸다는 단점으로 인하여 세라믹 코팅 층을 금속 코팅 층으로 대체 하고자 한다. 금속 코팅층은 모재와의 밀착성이 높고, 우수한 산화 및 부식방지 기능을 가지며 저렴하다는 장점이 있다. 또한 코팅 후 연마 작업이 가능해 연소실 내부형상을 설계조건 대로 유지 할 수 있는 특징이 있다. 따라서 본 연구에서는 연소실 내벽에 적용할 모재, 무전해 Ni-P 도금과 전해 Cr 도금층 사이의 밀착력 향상을 위한 방법에 대한 연구를 하였다. 밀착력 향상을 위한 요소로 전처리 용액과 열처리 시간에 따른 영향을 알아보고자 하였으며, 이를 위해서 5가지의 산세 용액으로 각 시편을 산세 한 후, 6시간, 12시간, 18시간 열처리 하여 단면을 비교하여 열처리에 영향을 알아보고자 하였다. 연구 결과 산세 용액의 영향은 크게 나타나지 않았으며, 열처리 시간이 길수록 Ni-P/Cr의 확산이 더 잘 일어나 확산층이 더 넓어지면서 밀착력이 더 좋아 진 것으로 판단되어 진다.

• Journal of the Korean Magnetics Society
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• v.20 no.1
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• pp.8-12
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• 2010

The magnetostriction and stress of multilayer $NiFeCr/(Cu/Co_{90}Fe_{10}){\times}N/NiFeCr$ films were investigated. As the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers was increased, the saturation magnetostriction decreased from $-5.6\times10^{-6}$ at 2 bilayers to $-8.5\times10^{-6}$ at 20 bilayers. A change of CoFe thickness from 10 to $20{\AA}$ caused a decrease in the magnitude of tensile stress from 980MPa to 590MPa as the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers increased from 2 to 20. The maximum magnetostrictive anisotropy field that could be developed due to nonzero magnetostriction and stress is calculated to be 135.7 Oe when the number of Cu $15{\AA}$/CoFe $15{\AA}$ bilayers is 10.

• Korean Journal of Materials Research
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• v.8 no.6
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• pp.560-564
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• 1998

CoPtCr magnetic layer was fabricated on the Cr underlayer by RF magnetron sputtering and the protective $SiO_2$ layer was deposited at room temperature. As the thickness of Cr underlayer increased, the coercive force of magnetic layer increased, then saturated slightly further increasing Cr underlayer thickness. Maximum coercive force was 860 Oe. It is thought that in-plane arrangement of magnetic phase and magnetic decoupling between the magnetic crystallites could lead to the increase of the coercive force. Post-annealing raised the coercive force exceedingly. and maximum coercive force value was 1650 Oe which was acquired from the sample annealed at 55$0^{\circ}C$ for 1hr.

• Journal of the Microelectronics and Packaging Society
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• v.26 no.4
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• pp.133-140
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• 2019

The effects of thermal cycle conditions on the bonding strength and crack propagation behaviors in electroplated Cr/electroplated Ni-P coatings were systematically evaluated. 1^st heat treatment was performed at 500℃ for 3 hours after electroplating Ni-P, and then, 2^nd heat treatment was performed at 750℃ for 6 hours after electroplating Cr. The measured bonding strength by ASTM C633 were around 25.6 MPa before thermal cycling, while it increased to 47.6 MPa, after 1,000 cycles. Increasing thermal cycles led to dominant fail mode with cohesive failure inside adhesive, which seemed to be closely related to the increasing bonding strength possibly not only due to higher Cr surface roughness, but also to penetrated channeling crack density. Also, increasing density of penetrated channeling cracks in electroplating Cr layer led to slightly stronger bonding strength due to mechanical interlocking effects of adhesive inside channeling cracks.

• The Journal of the Korea Contents Association
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• v.15 no.11
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• pp.359-373
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• 2015

Cognitive reserve(CR) is the ability to optimize or maximize performance through complementary brain networks. CR is relevant to normal aging in cognitive-linguistic abilities. There are few domestic systematic reviews or meta-analyses that analyze the relationships between multiple CR and cognitive-linguistic domains in healthy older people. This meta-analysis included 32 studies published since 2000. In result, education level topped the list, followed by the occupation, cognitively stimulating activities, and the multilingualism. Most studies were related to memory, global cognition, and language. CR had a modest positive association with cognitive-linguistic performance. Multiple domains including memory and language also showed the significant correlations across most measures of CR. This study provides evidence-based information to support cognitive-linguistic ability in normal aging.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.8 no.4
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• pp.821-825
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• 2004

The a-Si：H TFTs decreasing parasitic capacitance of source-drain is fabricated on glass. The structure of a-Si：H TFTs is inverted staggered. The gate electrode is formed by patterning with length of 8 ${\mu}m∼16 ${\mu}m. and width of 80∼200 ${\mu}m after depositing with gate electrode (Cr) 1500 under coming 7059 glass substrate. We have fabricated a-SiN：H, conductor, etch-stopper and photoresistor on gate electrode in sequence, respectively. The thickness of these thin films is formed with a-SiN：H (2000 ), a-Si：H(2000 ) and n+a-Si：H (500). We have deposited n+a-Si：H ,NPR(Negative Photo Resister) layer after forming pattern of Cr gate electrode by etch-stopper pattern. The NPR layer by inverting pattern of upper gate electrode is patterned and the n+a-Si：H layer is etched by the NPR pattern. The NPR layer is removed. After Cr layer is deposited and patterned, the source-drain electrode is formed. The a-Si：H TFTs decreasing parasitic capacitance of source-drain has channel length of 8 ~20 ${\mu}m and channel width of 80∼200 ${\mu}m. And it shows drain current of 8 ${\mu}A at 20 gate voltages, Ion/Ioff ratio of 108 and Vth of 4 volts.

• Journal of the Korean Magnetics Society
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• v.27 no.2
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• pp.41-48
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• 2017

Recent study shows that ordered alloy of $L1_2$ $XPt_3$ (M = V, Cr, Mn, Co, and Fe) exhibits various magnetic phases such as ferromagnetic-to-antiferromagnetic transition at the $MnPt_3$ surface. Moreover, it has been argued that $CrPt_3$, in particular, possess large magnetocrystalline anisotropy and Kerr rotation with possible violation of Hund's rule. As such, we extend our work to thickness dependence of the magnetic structure of $CrPt_3$ thin film using density functional theory. Magnetic ground state of the bulk $CrPt_3$ turns out to be ferromagnetic (FM), where other magnetic phases such as A-type (A-AF), C-type (C-AF), and G-type antiferromagnetic (G-AF) state have higher total energies than FM by 0.517, 0.591, and 0.183 eV, respectively, and magnetic moments of Cr in bulk are respectively 2.807 (FM), 2.805 (A-AF), 2.794 (C-AF) and $2.869_{{\mu}_B}$ (G-AF). We extend our study to $CrPt_3$(001) thin films with CrPt-and Pt-termination. The thickness and surface-termination dependences of magnetism are investigated for 3-9 monolayers (ML), where different magnetic phases from bulk emerge: C-AF for CrPt-terminated 3 ML and G-AF for Pt-terminated 5 ML have energy difference relative to FM by 8 and 54 meV, respectively. Furthermore, thickness- and surface-termination-dependent magnetocrystalline anisotropies of the $CrPt_3$(001) films are discussed.