• Title/Summary/Keyword: Cr 층

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Sputtering Pressures Dependence on Magnetic Switching Volumes of CoSm/Cr Magnetic Thin Films (스퍼터링 압력에 따른 CoSm/Cr자성 박막의 Magnetic Switching Volumes)

  • 정순영;김성봉
    • Journal of the Korean Magnetics Society
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    • v.10 no.5
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    • pp.232-236
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    • 2000
  • CoSm thin films with a Cr underlayer have received continuous attention as a potential material for a high density longitudinal magnetic recording media. In this study the Ax gas sputtering pressure effects on the magnetic properties of CoSm thin films, which were fabricated by using a dc magnetron sputtering machine, were investigated. The magnetic switching volume is especially important parameter to understand the thermal stability of the written information, magnetization reversal process and media noise. Therefore, in this paper the effects of sputtering pressure on the magnetic switching volume of CoSm thin films grown on Cr underlayer with the same sputtering conditions was studied. As the Ar sputtering pressure during sputtering of the CoSm magnetic layer increases from 5 to 30 mTorr, the measured switching volumes decreased from 9.0 to 5.2$\times$10$^{-18}$ cm$^3$. The calculated diameter of switching unit from V* was less than 22 nm, which satisfies the Sharrock's requirement on the thermal stability of the high density longitudinal magnetic recording media.

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A Method for Calculating Ms in Multicomponent Steels and its Application to Heat Treatment (다성분 강의 Ms 온도계산 방법 및 열처리에서의 응용)

  • Lee, L.W.
    • Journal of the Korean Society for Heat Treatment
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    • v.3 no.1
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    • pp.65-69
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    • 1990
  • Gas침탄질화처리 후 20Cr-2Ni-4A, 25Mn-Ti-B-Re, 20Cr-Mn-Ti 3가지 다성분강에서의 Ms온도를 계산하는 방법이 개발되어 왔으며, 결과적으로 각각의 gas 침탄질화층에 있는 잔류 austenite의 양이 계산될 수 있다. 이렇게 계산된 결과는 전형적인 실험 결과와 좋은 일치를 보이며, 그 예로서 En 354 강에서 침탄층을 통한 Ms 온도 분포가 계산되어진다.

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Fabrication of Chromium-based Double Layered Deposit (크롬계 이중도금층 제조 및 특성평가)

  • Park, Sang-Eon;Kim, Dong-Su;Kim, Man;Jang, Do-Yeon;Gwon, Sik-Cheol
    • 연구논문집
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    • s.31
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    • pp.127-133
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    • 2001
  • In chromium electrodeposition, crack is inevitably accompanied by chromium layer. Behavior of crack formation and crack density were different from the plating conditions such as current density, temperature, waveform of applied current and so on. And cracks have an influence on the corrosion resistance of chromium deposit, because corrosion occurs through the network of cracks between deposit and substrate. Therefore, many researches have been achieved in order to remove the cracks in chromium deposit. Formation of double layers, Cr/Cr and Ni/Cr were investigated to increase corrosion resistance of chromium deposit in this study. As pretreatment prior to outer chromium coating, acid pickling and current control method were examined. Cracks in cross-section of each sample were observed with SEM and CASS(Copper modified acetic acid salt spray) test was performed to evaluate corrosion resistance. It was found that corrosion resistance of Cr/Cr and Ni/Cr double layers were superior to Cr or Ni single layer from the results of CASS test.

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Effect of Nb, V and Cr on the High Temperature Oxidation of Ti-(42, 44)% Al Alloys (Ti-(42, 44)%Al 합금의 고온내산화성에 미치는 Nb, V 및 Cr의 영향)

  • Lee, Yeong-Chan;Kim, Mi-Hyeon;Kim, Seong-Hun;Lee, Won-Uk;Baek, Jong-Hyeon;Lee, Dong-Bok
    • Korean Journal of Materials Research
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    • v.9 no.10
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    • pp.1025-1031
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    • 1999
  • Alloys of TiAl with six different compositions. i. e., Ti-(42, 44)Al-2Nb-4V. Ti-(42, 44)Al-4Nb-2V and Ti -(42, 44)Al-4Nb-2Cr, were manufactured by arc-melting. and their oxidation behavior was studied. Both isothermal and cyclic oxidation tests were performed at 700, 800 and $900^{\circ}C$ in air for 50hr. The oxidation resistance increased in the order of Ti-(42, 44)Al-2Nb-4V, Ti-(42, 44)Al-4Nb-ZV and Ti-(42, 44)Al-4Nb-2Cr. It was found that V was a deleterious element, while Cr was a beneficial element in terms of oxidation resistance. During oxidation, a simultaneous interdiffusion was observed. All the constituent elements in the base alloys diffused outward. whereas oxygen from the atmosphere diffused inward, to form triple oxide layers composed of an outermost $\textrm{TiO}_2$ layer. upper ($\textrm{TiO}_2+\textrm{Al}_2\textrm{O}_3$) mixed layer, and lower $\textrm{TiO}_2$-rich layer.

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Surface morphology, Glossiness and Hardness of Zn-Cr and Zn-Cr-X ternary alloy Electrodeposits (고속도금된 Zn-Cr 및 Zn-Cr-X 3원합금 도금층의 표면조직, 광택도 및 경도)

  • 예길촌;김대영;서경훈
    • Journal of the Korean institute of surface engineering
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    • v.36 no.5
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    • pp.379-385
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    • 2003
  • The surface morphology, the glossiness and the hardness of Zn-Cr and Zn-Cr-X(X:Co, Mn) alloy electrodeposits were investigated by using chloride bath with EDTA additive and flow cell system. The surface morphology of Zn-Cr alloy and Zn-Cr-Mn alloy changed from fine needle shape crystalline structure to colony structure of fine granular crystallites with increasing current density in the range of 20-100 $A/dm^2$. The surface morphology of Zn-Cr-Co alloy deposited from low Co concentration bath(2.5-10 g/$\ell$) was similar to that of Zn-Cr alloy, while that of Zn-Cr-Co alloy deposited from high cobalt concentration bath was fine granular crystalline structure in the same range of current density. The glossiness of Zn-Cr and Zn-Cr-Mn alloy increased noticeably with increasing current density, while that of Zn-Cr-Mn alloy decreased with increasing Mn concentration of bath in high current density region. The glossiness of Zn-Cr-Co alloy deposited from low Co concentration bath increased with current density while that of the alloy from high Co concentration bath decreased with increasing current density. The hardness of Zn-Cr and Zn-Cr-X alloy increased noticeably with current density.

Effect of Composition of Bond Coating on the Durability of the Plasma Sprayed $\textrm{ZrO}_2$-$\textrm{CeO}_2$-$\textrm{Y}_2\textrm{O}_3$ Thermal Barrier Coating (금속결합층의 조성이 $\textrm{ZrO}_2$-$\textrm{CeO}_2$-$\textrm{Y}_2\textrm{O}_3$ 단열층의 내구성에 미치는 영향)

  • Kim, Hye-Seong;Kim, Byeong-Hui;Seo, Dong-Su
    • Korean Journal of Materials Research
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    • v.9 no.1
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    • pp.73-80
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    • 1999
  • The effect of alloy compositions of the bond coating on the plasma sprayed-thermal barrier coatings was investigated. The performance of the coating composed of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ and Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$was evaluated by isothermal and thermal cyclic test in an ambient atmosphere at 115$0^{\circ}C$. The failure of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ coatings was occurred at the bond coating/ceramic coating interface while Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$ coating was failed at the substrate/bond coating interface after thermal cyclic test. The lifetime of Rene80/NiCrAl/ZrO$_2$-CeO$_2$-Y$_2$O$_3$coatings was longer than Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$coating. The oxidation rate of the NiCrAl bond coating examined by TGA was lower than CoNiCrAlY bond coatings. In summary, these results suggest that Rene80/CoNiCrAlY/ZrO$_2$-CeO$_2$-Y$_2$O$_3$system as thermal barrier coating be not suitable considering the durability of the coating layer for high temperature oxidation and thermal stress.

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Development of Ni/Cr Plating Process for LRE Thrust Chamber (액체로켓엔진 연소기용 니켈/크롬 코팅의 공정 개발)

  • Cho, Hwang-Rae;Bang, Jeong-Suk;Rhee, Byung-Ho;Lee, Kwang-Jin;Lim, Byoung-Jik;Han, Yeoung-Min;Choi, Hwan-Seok
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2009.11a
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    • pp.603-607
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    • 2009
  • A Ni/Cr plating process has been developed for applying to inner wall of liquid rocket engine(LRE) thrust chamber. Ni plating conditions were selected through thermal shock test and endurance verification of the plating layers was performed through hot firing test of a subscale thrust chamber with Ni/Cr plating. Test results showed that a crack or separation of the plating layers was not found. Judging from the results, Ni/Cr plating could be applied to LRE thrust chamber as a substitute of air plasma sprayed ceramic coating which is presently being used.

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Computer Simulation for the Growth of Cr-nitride Formed on Electroplated Cr during ion-Nitriding (이온 질화에 의해 크롬 도금 층 위에 형성된 크롬 질화물의 성장에 관한 전산 모사)

  • 엄지용;이병주;남기석;권식철;권혁상
    • Journal of the Korean institute of surface engineering
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    • v.34 no.3
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    • pp.231-239
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    • 2001
  • The structure and composition of Cr-nitrides formed on an electroplated hard Cr layer during an ionnitriding process was analyzed, and the growth kinetics of the Cr-nitrides was examined as a function of the ion-nitriding temperature and time in order to establish a computer simulation model prediction the growth behavior of the Cr-nitride layer. The Cr-nitrides formed during the ion-nitriding at $550~770^{\circ}C$ were composed of outer CrN and inner $Cr_2$N layers. A nitrogen diffusion model in the multi-layer based on fixed grid FDM (Finite Difference Method) was applied to simulate the growth kinetics of Cr-nitride layers. By measuring the thickness of each Cr-nitride layer as a function of the ion-nitriding temperature and time, the activation energy for growth of each Cr-nitride was determined; 82.26 KJ/mol for CrN and 83.36 Kj/mol for $Cr_2$N. Further, the nitrogen diffusion constant was determined in each layer; $9.70$\times$10^{-12}$ /$m^2$/s in CrN and $2.46$\times$10^{-12}$ $m^2$/s in $Cr_2$N. The simulation on the growth kinetics of Cr-nitride layers was in good agreements with the experimental results at 550~72$0^{\circ}C$.

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The Oxidation of CrN Films Arc-ion Plated on a Steel Substrate (강 기판위에 아크이온 플레이팅된 CrN박막의 산화)

  • Lee, Dong-Bok;Lee, Yeong-Chan
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.324-328
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    • 2001
  • CrN films were deposited onto STD61 steel substrates using an arc-ion plating apparatus, with and without ion-nitriding pretreatment, and their oxidation was studied between 700 and $900^{\circ}C$ for 40hr in air. The oxidation behavior was examined by thermogravimetric analyses, X-ray diffraction. EDS and SEM. The deposited CrN films consisted of CrN and $Cr_2$N phases. The CrN films increased the oxidation resistance of the substrate by forming a protective $Cr_2$$O_3$ layer. The ion-nitriding pretreatment has not affected the oxidation resistance of the CrN film.

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