• Journal of Welding and Joining
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• 제33권2호
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• pp.1-7
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• 2015

This article describes the basic technical concepts for applying the friction stir welding (FSW) process to titanium and its alloys. Titanium and its alloys are demanding applications of FSW. During FSW, a protective atmosphere is needed at the welding region to prevent the joints from oxidation due to the absorption of interstitial elements (O, N, and H) at high temperature. The process parameters for FSW have great influence on the microstructure and properties of the joints. No phase transformation occurred in CP Ti because FSW was achieved below the ${\beta}$-transus temperature. Therefore, the mechanical properties of the joints with CP Ti were governed by recrystallization and grain refinement. Furthermore, the strong crystallographic texture indicating <0001>//ND formed in the stir zone. On the other hands, the phase transformation occurred in Ti-6Al-4V alloy because the process temperature reached above ${\beta}$-transus temperature. For this reason, the mechanical properties of the joints with Ti-6Al-4V alloy were altered by not only recry stallization and grain refinement but also phase transformation during FSW. Engineers who want to get sound FSW joints with Ti-6Al-4V alloy have to pay attention to the control about process conditions.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2006년도 추계학술발표회 초록집
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• pp.67-68
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• 2006

• 한국재료학회지
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• 제13권11호
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• pp.761-768
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• 2003

The corrosion resistance and cytotoxicity behavior of Ti alloys were studied as a function of Nb contents(3wt.%Nb, 20wt.%Nb, 40wt.%Nb). Ti-Nb alloys were melted by vacuum arc furnace and then rolled to 50% reduction ratio after homogenized at 105$0^{\circ}C$ for 24hrs. The corrosion resistance of Ti-Nb alloys were investigated by potentiodynamic polarization test in the 0.9% NaCl and 5% HCI solution. Biocompatibility of Ti-Nb alloys was evaluated by cytotoxicity test. The results can be summarized as follows 1) The microstructure change from equiaxial to acicular and the increased $\beta$ phase in Ti-Nb alloys were obtained as the Nb content increased. 2) For the corrosion test in the solution of 0.9% NaCl and 5% HCI, the corrosion behavior of Ti-Nb alloys was similar to ASTM grade 2 CP Ti. 3) For the cytotoxicity test, Ti-Nb alloys showed excellent biocompatibility compared to ASTM grade 2 CP Ti, 316L STS and Co-Cr alloys.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.130-130
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• 2000

타이타늄(CP Ti)과 타？늄합금은 인체의 골격을 구성하고 있는 물질과 가장 흡사한 물리적 성질과 우수한 생체적합성으로 인해 임플란트용 재료로 많이 사용되고 있으며, 최근에 인공관절이나 치근으로의 사용이 증가하고 있다. 그러나 교합면에서의 취약한 마모특성으로 인해 wear debris에 의한 골 흡수 및 이완 등을 야기하는 문제점으로, 이의 개선에 관한 연구가 활발히 진행되어 왔다. 다이아몬드상 카본 (Diamond-Like-Carbon) 박막은, 다이아몬드와 유사한 높은 경도, 내마모성 그리고 화학적 안정성 등의 매우 우수한 물리화학적 특성을 가지고 있는 박막재료로 고체 윤활박막으로서 hard disk나 VCR head drum의 보호막, 우주항공기의 bearing 재료코팅 등으로의 적용이 최근에 급격히 증가하고 있다. 본 연구에서는 이와 같은 특성을 지닌 다이아몬드상 카본 박막의 생체재료로의 적용을 위해, CP Ti과 Ti-6Al-4V에 13.56MHz를 사용하는 r.f PACVD법으로 DLC를 증착하여 생체적합적 특성을 조사하였다. C6H6 가스를 사용하여 1$\mu\textrm{m}$의 두께로 DLC 박막을 증착하였으며, 기판과의 밀찰력 향상을 위해 Si을 증간층으로 합성하였다. 마모특성은 pin-on-disk type wear tester을 사용하였으며 직경 5mm의 ruby ball로 실험을 수행하였다.

• Bulletin of the Korean Chemical Society
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• 제15권8호
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• pp.658-662
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• 1994

Ab initio and extended Huckel calculations have been applied to discuss the electronic structure, ring inversion barrier, and geometry of the $Cp_2TiS_3$ compound. The deformation of four membered ring in the planar geometry is originated from a second-order Jahn-Teller distortion due to the small energy gap between HOMO and LUMO on the basis of extended Huckel calculations. The puckered $C_s$ geometry is stabilized by the interaction of the $x^2-y^2$ metal orbital with the hybrid orbital in sulfur. Ab initio calculations have been carried out to explore the ring inversion process for the model $Cl_2TiS_3$ compound. We have optimized $C_s$ and $C_{2v}$ structures of the model compound at the RHF level. The energy barriers for the ring inversion are sensitive to the used basis set. With 4-31$G^*$ for the Cl and S ligands, the barriers are computed to be 8.41 kcal/mol at MP2 and 8.02 kcal/mol at MP4 level.

• 한국분말재료학회지
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• 제17권5호
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• pp.365-372
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• 2010

The evolution of sinterability, microstructure and mechanical properties for the spark plasma sintered(SPS) Ti from commercial pure titanium(CP-Ti) was studied. The densification of titanium with 200 mesh and 400 mesh pass powder was achieved by SPS at $750{\sim}1100^{\circ}C$ under 10 MPa pressure and the flowing $H_2$+Ar mixed gas atmosphere. The microstructure of Ti sintered up to $800^{\circ}C$ consisted of equiaxed grains. In contrast, the growth of large elongated grains was shown in sintered bodies at $900^{\circ}C$ with the 400 mesh pass powder and the lamella grains microstructure had been developed by increasing sintering temperature. The Vickers hardness of 240~270 HV and biaxial strength of 320~340 MPa were found for the specimen prepared at $950^{\circ}C$.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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• pp.237-239
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• 2002

The effect of particle sizes of the metal matrix composites containing 10 wt.%SiCp was investigated with using various tools. The results showed that tool life decreased considerably with increasing particle size and cutting speed. The wear resistance of TiC-coated tools was considerably higher than that of the other tools. It was observed that abrasive wear was the main responsible mechanism for wear of the tool thermal cracks were at high speed while a built-edge formation was also evident at lower speed.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.223-223
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• 2006

A Suzuki-coupling route is developed for preparation of ortho-phenylene-bridged Cp/amido complexes, one of which shows higher activity, higher 1-hexene incorporation, and higher molecular weight than the silylene-bridged standard CGC $[Me_{2}Si({\eta}^{5}-Me_{4}Cp)(N^{t}Bu)]TiCl_{2}$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.77-77
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• 2000

Titanium oxide (TiO2) thin films have valuable properties such as a high refractive index, excellent transmittance in the visible and near-IR frequency, and high chemical stability. Therefore it is extensively used in anti-reflection coating, sensor, and photocatalysis as electrical and optical applications. Specially, TiO2 have a high dielectric constant of 180 along the c axis and 90 along the a axis, so it is highlighted in fabricating dielectric capacitors in micro electronic devices. A variety of methods have been used to produce patterned self-assembled monolayers (SAMs), including microcontact printing ($\mu$CP), UV-photolithotgraphy, e-beam lithography, scanned-probe based micro-machining, and atom-lithography. Above all, thin film fabrication on $\mu$CP modified surface is a potentially low-cost, high-throughput method, because it does not require expensive photolithographic equipment, and it produce micrometer scale patterns in thin film materials. The patterned SAMs were used as thin resists, to transfer patterns onto thin films either by chemical etching or by selective deposition. In this study, we deposited TiO2 thin films on Si (1000 substrateds using titanium (IV) isopropoxide ([Ti(O(C3H7)4)] ; TIP as a single molecular precursor at deposition temperature in the range of 300-$700^{\circ}C$ without any carrier and bubbler gas. Crack-free, highly oriented TiO2 polycrystalline thin films with anatase phase and stoichimetric ratio of Ti and O were successfully deposited on Si(100) at temperature as low as 50$0^{\circ}C$. XRD and TED data showed that below 50$0^{\circ}C$, the TiO2 thin films were dominantly grown on Si(100) surfaces in the [211] direction, whereas with increasing the deposition temperature to $700^{\circ}C$, the main films growth direction was changed to be [200]. Two distinct growth behaviors were observed from the Arhenius plots. In addition to deposition of THe TiO2 thin films on Si(100) substrates, patterning of TiO2 thin films was also performed at grown temperature in the range of 300-50$0^{\circ}C$ by MOCVD onto the Si(100) substrates of which surface was modified by organic thin film template. The organic thin film of SAm is obtained by the $\mu$CP method. Alpha-step profile and optical microscope images showed that the boundaries between SAMs areas and selectively deposited TiO2 thin film areas are very definite and sharp. Capacitance - Voltage measurements made on TiO2 films gave a dielectric constant of 29, suggesting a possibility of electronic material applications.

• 한국재료학회지
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• 제14권4호
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• pp.293-299
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• 2004

Transition metal ions doped $TiO_2$ nanostructured powders were prepared with simply heating aqueous $TiOCl_2$ solutions, contained various metal ions (Ni, Al, Fe, Zr, and Nb) of 1.47 mol% added as metal-chlorides, at $100^{\circ}C$ for 4 hrs by homogeneous precipitation process under suppressing conditions of water vaporization. The characterizations for prepared $TiO_2$ powders were carried out to observe doping of metal ions, their concentrations and microstructures using XRD, UV-VIS (DRS), XPS, SEM, TEM and ICP. Also, photo-oxidative abilities were evaluated by decomposition of 4-chlorophenol (4CP) under ultraviolet light irradiations. No secondary oxide phases were formed in all the $VTiO_2$ powders, showing doping with various transition metal ions. When adding ions ($Ni^{2+}$ or$ Al^{3+ }$ and $Zr^{4+}$ ) having valance states or ionic radii greatly different from those of $Ti^{4+}$ , the $TiO_2$ powders of mixed anatase and rutile phases were formed, whereas in the case of additions of $^Fe{3+ }$ and $Nb^{ 5+}$ as well as no addition of metal ion the powders with pure rutile phase alone were formed. Among the prepared $TiO_2$ powders, Ni$^{2+}$ doped $TiO_2$ powders, containing a small amount of anatase phase, showed excellent photo-oxidative ability in 4CP decomposition because of relative decreases in electron-hole recombination and poisoning of $TiO_2$ surface during the photoreaction.n.