• Journal of the Microelectronics and Packaging Society
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• v.19 no.2
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• pp.55-59
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• 2012

Defects such as voids or seams are frequently found in TSV via filling process. To achieve defect-free copper via filling, organic additives such as suppressor, accelerator and leveler were necessary in a copper plating bath. However, by-products stemming from the breakdown of these organic additives reduce the lifetime of the devices and plating solutions. In this research, the effects of levelers on copper electrodeposition were investigated without suppressor and accelerator to lower the concentration of additives. Threelevelers(janus green B, methylene violet, diazine black) were investigated to study the effects of levelers on copper deposition. Electrochemical behaviors of these levelers were different in terms of deposition rate. Filling performances were analyzed by cross sectional images and its characteristics were different with variations of levelers.

• Journal of the Korean institute of surface engineering
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• v.46 no.4
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• pp.153-157
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• 2013

The defect like the void or seam is frequently generated in the PCB (Printed Circuit Board) Via-Filling plating inside via hole. The organic additives including the accelerating agent, inhibitor, leveler, and etc. are needed for the copper Via-Filling plating without this defect for the plating bath. However, the decomposition of the organic additive reduces the lifetime of the plating bath during the plating process, or it becomes the factor reducing the reliability of the Via-Filling. In this paper, the interaction of each organic additives and the decomposition of additive were discussed. As to the accelerating agent, the bis (3-sulfopropyl) disulfide (SPS) and leveler the Janus Green B (JGB) and inhibitor used the polyethlylene glycol 8000 (PEG). The research on the interaction of the organic additives and decomposition implemented in the galvanostat method. The additive decomposition time was confirmed in the plating process from 0 Ah/l (AmpereHour/ liter) to 100 Ah/l with the potential change.

• Transactions on Electrical and Electronic Materials
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• v.8 no.6
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• pp.246-249
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• 2007

A triple-band antenna was developed and fabricated by LDS(Laser Direct Structuring) process. The effects of the plating rate and heat treatment condition were investigated and the gains of fabricated antennas were measured at various frequencies. The laser irradiated surface shows clearly that there are prominence and depression. It shows anchoring effect between a plating material and ablation surface. The plating rate was decreased when the plating material is exhausted in the solution. This solution needs to refreshed by the new aid solution. The copper plating thickness is decreased with the increase of heat treatment temperature in the same time but it does not change other condition. The gain of LDS antenna showed higher than the generally processed antenna. This result was related with practical use of the dimension and effective dielectric constant.

• Corrosion Science and Technology
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• v.16 no.5
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• pp.227-234
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• 2017

Reference electrodes are generally implemented for the purpose of monitoring the cathodic protection potentials of buried or immersed metallic structures. In the market, many types of reference electrodes are available for this purpose, such as saturated calomel, silver/silver chloride and copper/copper sulfate. These electrodes contain a porous ceramic junction plate situated in the cylindrical body bottom to permit ionic flux between the internal electrolyte (of the reference electrode) and the external electrolyte. In this work, the copper/copper sulfate reference electrode was modified by replacing the porous ceramic junction plate for a metallic platinum wire. The main purpose of this modification was to avoid the ion copper transport from coming from the inner reference electrode solution into the surrounding electrolyte, and to mitigate the copper plating on the coupon surfaces. Lab tests were performed in order to compare the performance of the two mentioned reference electrodes. We verified that the experimental errors associated with the measurements conducted with developed reference electrode would be negligible, as the platinum surface area exposed to the surrounding electrolyte and/or to the reference electrolyte are maintained as small as possible.

• Tribology and Lubricants
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• v.12 no.2
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• pp.32-40
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• 1996

The tribological role of copper alloy fine particles in an additive is not well known compared to solid lubricants such as $MoS_{2}$ and PTFE. In this experimental investigation, a series of friction and wear test was undertaken to gain a better understanding of an additive containing copper alloy fine particles and to identify the effectiveness of copper alloy particles in improving tribological performance of the lubricant. Friction and wear of specimens under lubricated contact condition were studied and the worn surfaces were characterized by AES (Auger Electron Spectroscopy), SEM (Scanning Electron Microscopy) and optical microscopy. It was revealed that a copper-contained layer was formed and this layer resulted in considerable reduction in both friction and wear due to its lubricity and anti-wear property. The analysis of worn surface revealed that copper of the fine alloy particles in the additive helps healing the worn surface by plating and filling wear pits.

• Journal of the Korean institute of surface engineering
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• v.37 no.1
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• pp.22-27
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• 2004

Copper electroforming process has been applied to duplicate Koryo Tripitaka (Taejang'kyong), wooden printing block. Thin copper replica printing plates of 1 mm thickness was successfully manufactured from the printing face (54.5${\times}$25.5 cm) of wooden printing plate. Major processes are (1) silicon rubber replication of the master (2) silvering on silicon rubber (3) copper electroforming (4) separation of copper from the silicon mandrel (5) final coloring by brass plating and trimming. This process has various Potential applications in making thin metallic objects such as plaques, statues, bust and hollow metal objects for jewelry.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2002.05a
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• pp.29-30
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• 2002

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.05a
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• pp.60-60
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• 2000

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.11a
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• pp.77-78
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• 2000

• Macromolecular Research
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• v.10 no.2
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• pp.103-107
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• 2002

High purity water soluble chitosans (WsCs) were employed as a flocculant to remove heavy metal ions from wastewater of industrial plating wastewater treatment complex. Their weight average molecular weights and polydispersities were 272,000~620,000 g/mol and 1.4~1.9 range, respectively and were readily soluble in water in the pH range of 3~11. Heavy metal ions such as chromium, iron and copper were removed well by WsCs. When WsCs was blended with either sodium N, N-diethyldithiocarbamate trihydrate (SDDC$_{T}$) or sodium salicylate (SSc), the removal efficiency was further increased primarily due to the excess amount of hydrophilic sulfonic and carboxylic groups. Especially, in the case of WsCs-SSc the remaining chromium and copper concentrations were 0.1 mg/L and 9.5 mg/L, which are 1/15 and 1/3 compared with that of pure WsCs, respectively. The former is within the acceptable limit, but the latter is not. Therefore, the effective copper flocculant remains to be studied.d.