• 한국재료학회지
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• 제17권5호
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• pp.256-262
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• 2007

Effects of interlayer and the combination of different coating methods on the mechanical and corrosion behaviors of TiN and CrN coated on 420 stainless steel have been studied. STS 420 specimen were tempered at $300^{\circ}C$ for 1 hr in vacuum furnace. The TiN and CrN thin film with 2 ${\mu}m$ thickness were coated by arc ion plating and DC magnetron sputtering following the formation of interlayer for pure titanium and chromium with 0.2 ${\mu}m$ thickness. The microstructure and surface analysis of the specimen were conducted by using SEM, XRD and roughness tester. Mechanical properties such as hardness and adhesion also were examined. XRD patterns of TiN thin films showed that preferred TiN (111) orientation was observed. The peaks of CrN (111) and $Cr_2N$ (300) were only observed in CrN thin films deposited by arc ion plating. Both TiN and CrN deposited by arc ion plating had the higher adhesion and hardness compared to those formed by magnetron sputtering. The specimen of TiN and CrN on which interlayer deposited by magnetron sputtering and thin film deposited by arc ion plating had the highest adhesion with 22.2 N and 19.2 N. respectively. TiN and CrN samples shown the most noble corrosion potentials when the interlayers were deposited by using magnetron sputtering and the metal nitrides were deposited by using arc ion plating. The most noble corrosion potentials of TiN and CrN were found to be approximately -170 and -70 mV， respectively.

• 한국표면공학회지
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• 제43권6호
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• pp.260-265
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• 2010

STD 61 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness, and creep strength as well as excellent oxidation resistance. The STD 61 tool steel coated with TiN and ZrN by sputtering results in improvement of wear and corrosion resistance. In this study, surface characteristics of TiN and ZrN film coated STD 61 by sputtering were studied by using FE-SEM, EDS, XRD, and XRR and nanoindentation tests. From the results of surface characteristics of coated specimen, the ZrN coated surface showed finer granular than that of TiN coated surface. The coated layer structures of ZrN and TiN were grown to (111) and (200) preferred orientation. From the results of XRR test for surface roughness, density and growth rate of coating film, surface roughness and growth rate of ZrN coated film revealed lower values those of TiN coated film, whereas density of ZrN coated film showed higher values than that of TiN coated film. From the nanohardness and elastic modulus test, nanohardness value and elastic modulus of ZrN coated film became higher than those of TiN coated film.

• 한국전기전자재료학회논문지
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• 제21권7호
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• pp.660-664
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• 2008

Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.

• 한국광학회지
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• 제13권3호
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• pp.209-214
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• 2002

기판의 표면거칠기가 반사경의 산란에 미치는 영향을 조사하였다. 기판의 표면거칠기가 다른 다섯 종류의 기판에 이온빔 스퍼터링 방법과 전자총 증착 방법으로 각각 반사율이 1에 가까운 고반사율 박막을 증착하고 산란을 TIS 방법으로 측정하였다. 기판의 표면거칠기가 2$\AA$ 이상인 경우의 기판의 산란에 대한 반사경 산란 비율은 표면거칠기가 2$\AA$ 미만인 경우의 산란 비율에 비하여 급격한 증가를 나타냄을 알 수 있었으며, 기판의 표면거칠기가 낮은 경우 반사경의 산란은 기판의 표면거칠기보다 반사경을 구성하는 박막의 미세구조에 의존하는 것으로 판단되었다. 한편 반사경 중에서 가장 작은 산란은 2.1 ppm이었고, 이것은 표면거칠기 0.23$\AA$인 기판에 이온빔 스퍼터링 방법으로 제작되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.190-190
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• 2011

일반적으로 TiO2와 WO3는 광촉매 작용으로 인하여 살균력을 보이며, 친수성으로 인해 자가 세정 능력을 가져 유리 및 건축자재의 표면처리, 전자제품의 마감처리 용도로 많이 사용하고 있다. 현재 Sol-gel, CVD, Sputter, Spin-coating 방법 등으로 많은 연구가 진행되어 오고 있다. 이에 본 실험에서는 박막의 두께를 균일하게 만들 수 있는 RF-magnetron sputtering 방법을 이용하여 표면 경도와 부착력이 우수한 TiO2에 열적 특성과 화학적 특성이 안정한 WO3를 Double Layer 방식으로 증착하여 박막을 제작하였다. 광학적 특성을 알아 본 결과 가시광 영역에서 TiO2 / WO3 Double Layer 박막이 80% 이상의 높은 투과율을 나타내었으며, 박막의 표면을 확인 한 결과 TiO2 / WO3 Double Layer 박막이 더 조밀한 표면을 보였다. 또한 접촉각을 측정을 통하여 TiO2박막보다 TiO2 / WO3 double layer박막이 낮은 접촉각을 나타내었다. 이는 TiO2 표면은 소수성이나 WO3로 인해 광촉매 기능이 향상되어 공기 중의 물 분자가 해리 흡착되면서 친수성이 향상되는 것으로 사료된다. 이러한 박막은 건물의 외벽이나 자동차의 내 외장재 전자기기용 광학 필름에 자가세정, 내반사 코팅소재로 활용 가치가 높을 것으로 예상된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.273-273
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• 2012

최근 스마트 윈도우, 자가세정(Self-Cleaning), 김서림방지(Anti-Fogging), 디스플레이 표시장치, 대전방지 코팅 등 다각적으로 활용이 가능한 PTFE (Ploytetrafluoroethylene)를 Sol-gel, Sputtering, Spin-Coating, CVD (Chemical vapor deposition)방법을 이용하여 낮은 표면에너지와 나노사이즈의 표면 거칠기를 가지는 $150^{\circ}$ 이상의 초-발수성 표면에 대한 많은 연구가 진행되고 있다. 본 실험에서는 영구자석을 이용한 고밀도 플라즈마로 높은 점착성과, 균일한 박막 및 대 면적 공정이 가능한 RF-magnetron sputtering방법을 이용하여 Plasma etching으로 표면적의 거칠기와 낮은 표면에너지를 만든 뒤, 발수특성을 가진 PTFE를 증착하여 접촉각 변화와 구조적 및 광학적 특성을 측정하였다. AFM (Atomic Force Microscope)측정결과 100 w에서 가장 높은 1.7 nm의 RMS(Root mean square)값이 측정되었고, 접촉각 측정결과 Plasma etched glass는 25 w에서 125 w로 증가함에 따라 친수성을 나타내었으며, 100 w에서 가장 낮은 $15^{\circ}$의 접촉각을 나타내었다. PTFE박막을 증착하였을 때는 100 w에서 $150^{\circ}$의 초발수 특성을 나타내었고, 투과율 측정 결과 85%이상의 높은 투과율을 나타내었다. Plasma etching을 이용한 PTFE 발수 특성은 비가 오면 자동으로 이물질이 씻겨 내리는 자동차 유리등의 개발이 가능하고, 높은 투과율이 요구되는 액정표시장치(LCD)같은 차세대 대형 디스플레이의 표면 코팅에 사용이 가능 할 것이라 사료된다. 본 연구는 중소기업청에서 지원하는 2011년도 산학연 공동기술개발 지원사업의 연구수행으로 인한 결과물임을 밝힙니다.

• 한국표면공학회지
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• 제36권2호
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• pp.148-154
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• 2003

Short ($\tau$=40 $mutextrm{s}$) and high-voltage ($U_{sub}$=2~8 kV) negative substrate bias pulses were used to assist pulsed magnetron sputtering DLC films deposition. Space- and time-resolved probe measurements of the plasma characteristics have been performed. It was shown that in case of high-voltage substrate bias spatial non-uniformity of the magnetron discharge plasma density greatly affected DLC deposition process. By Raman spectroscopy it was found that maximum percentage of s $p^3$-bonded carbon atoms (40 ~ 50%) in the coating was attained at energy $E_{c}$ ~700 eV per deposited carbon atom. Despite rather low diamond-like phase content these coatings are characterized by good adhesion due to ion mixing promoted by high acceleration voltage. Short duration of the bias pulses is also important to prevent electric breakdowns of insulating DLC film during its growth.wth.

• 한국표면공학회지
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• 제25권5호
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• pp.235-252
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• 1992

(Ti, Al)N films were deposited on 304 stainless steel sheet by D.C. magnetron sputtering using Al target and Ti plate. The high temperature oxidation of (T, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The high temperature oxidation test of (Ti, Al)N showed that (Ti, Al)N has better high temperature resistance than TiN and TiC films. TiC films were cracked at 40$0^{\circ}C$ in air TiN films quickly were oxidised at $600^{\circ}C$, were spalled more than $700^{\circ}C$. But (Ti, Al)N films are relatively stable to$ 900^{\circ}C$. The good resistance to high temperature oxida-tion of (Ti, Al)N films are due to the formation of dense Al2O3 and TiO2 oxide layer. Especially, Al2O3 oxide layer is more important. The results obtained from this study show, it is believe that the (Ti, Al)N film by D.C. magnetron sputtering is promising for the use of high temperature and wear resistance mate-rials.

• 한국산업융합학회 논문집
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• 제26권5호
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• pp.743-750
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• 2023

Aluminum alloy is a material widely used in the aircraft industry. However, since it has relatively low hardness, strength and tribological properties, it is necessary to improve these properties. In this paper, a TiN thin film was coated on the surface of AL7075-T7351 using DC magnetron sputtering. The coating was performed by setting different deposition pressure, deposition time, and applied power. Then, the tribological properties of the thin film were investigated. As a result of the experiment, the hardness of the thin film was higher than that of the base material, and the specimen with the highest hardness had excellent friction coefficient, wear amount, and adhesive strength characteristics. Through this study, it was confirmed that the tribological characteristics of aluminum alloy can be improved by depositing thin films using DC magnetron sputtering.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.331-331
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• 2008

Transparent conductive oxide (TCO) are necessary as front electrode or anti-reflecting coating for increasing efficiency of LED and Photodiode. In this paper, aluminum-doped Zinc oxide films(AZO) were prepared by RF magnetron sputtering on Si substrate at room temperature with application of substrate bias from -60 to 60 V. Then annealed at temperature of 200, 300 and $400^{\circ}C$ for 1hr in $H_2$ ambient. Structural and electrical property of AZO thin films were investigated.