• Title/Summary/Keyword: Co-Mo

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The Effect of Si Underlayer on the Magnetic Properties and Crystallographic Orientatation of CoCr(Mo) Thin Film (CoCr(Mo) 박막의 자기적 특성 및 미세구조에 미치는 Si 하지층의 영향)

  • 이호섭;남인탁
    • Journal of the Korean Magnetics Society
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    • v.9 no.5
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    • pp.256-262
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    • 1999
  • Sputter deposited CoCr(Mo)/Si film were studied with emphasis on the correlation between magnetic properties and crystallographic orientation. The perpendicular coercivities of CoCr films decreased with Si underlayer thickness, whereas those of CoCrMo films increased with Si underlayer thickness. It has been explained that additions of the larger atomic radius Mo atoms in CoCr films impedes crystal growth resulting in a decrease in grain size, thus this small grain size may induce high perpendicular coercivity. The c-axis alignment of CoCrMo film was improved due to addition of 2at.%Mo. It means CoCrMo layer grow self-epitaxial directly from orientation and structure of Si underlayer when the main layer grow on underlayer.

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The Effect of Sputter-textured Mo Thin Film on Magnetic properties of CoCrTa/Cr Magnetic Recording Media (Sputter-textured Mo 박막이 CoCrTa/Cr 자기기록매체의 자기적 성질에 미치는 영향)

  • Jo, Sung-Mook;Nam, In-Tak
    • Journal of Industrial Technology
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    • v.21 no.A
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    • pp.221-229
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    • 2001
  • The effect of Mo underlayer on the magnetic properties of CoCrTa/Cr films deposited on glass substrates were investigated. The coercivity increased and the coercivity squareness decreased by introducing Mo underlayer. The coercivity increase was attributed to the increase of in-plane c-axis orientation and magnetic isolation of Co grains deposited on Cr/Mo underlayer. The decrease of coercivity squarenesses seemed to be caused by the increase of magnetic isolation. The increase of magnetic isolation of Co grains was attributed to the diffusion of Mo atoms into grain boundaries of Co films and the physical isolation of Co grains. The coercivity of CoCrTa/Cr/Mo showed maximum values at Mo thickness of $400{\AA}$. The appearance of the maximum coercivity at that thickness was attributed to the development of strong $Co(10{\bar{1}}0)$ and $Co(10{\bar{1}}1)$ preferred orientation.

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Assessment of Tribological Characteristics of CoCrW and CoCrMo Alloys (CoCrW와 CoCrMo 합금의 트라이볼로지 특성 평가)

  • Kwon, Dong-Gyun;Oh, Se-Jin;Chung, Koo-Hyun
    • Tribology and Lubricants
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    • v.38 no.4
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    • pp.162-169
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    • 2022
  • Cobalt-chromium (CoCr)-based alloys have been used for wear applications because of their excellent mechanical properties and wear resistance. With growing concern over environmental problems, CoCr alloys are expected to be used for various tribological applications in degraded lubrication states. To expand the applicability of the materials, data should be accumulated across a broad spectrum of experimental parameters. In this work, the friction and wear characteristics of cobalt-chromium-tungsten (CoCrW) and cobalt-chromium-molybdenum (CoCrMo) alloys are investigated experimentally. The tests are conducted using a pin-on-reciprocating-plate tribotester in dry lubrication. CoCrW and CoCrMo are used as pin and plate materials to investigate the effect of the counter material. The results show that the friction coefficients between CoCrW and CoCrMo generally range from 0.4 to 0.5. The friction coefficient between the CoCrW pin and plate is found to be slightly small. However, the total wear between the CoCrW pin and plate is found to be the largest. In contrast, the total wear between the CoCrW pin and plate is relatively small. Furthermore, CoCrW may cause a faster wear progression of CoCrMo, especially for the case in which CoCrMo is used as the pin material. The results of this work provide a better understanding of the tribological properties of CoCrW and CoCrMo alloys. In addition, this work provides a practical guideline for the use of CoCrW and CoCrMo from the tribological design viewpoint.

A Study on Corrosion CoCrMo Magnetic Thin Films (CoCrMo 자성박막의 부식에 관한 연구)

  • 남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.3 no.3
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    • pp.221-228
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    • 1993
  • The general requirements of recording media include recording performance, environmental stability, runnability on the drive or deck, and manufacturability. CoCrMo thin films were prepared using RF sputtering system for a study on chemical stability. Surface degradation of the CoCrMo thin film was studied by SEM, XPS and AES. Surface degradation was found to be dependent of sputtering condition and Mo content. Addition of Mo to CoCr thin film improved dramatically its surface degradation resistance in dilute sulfuric acid, as indicated by active-passive transition appeared in electrochemical polarization curve. Futhermore, the passive current density was decreased with increasing Mo content. The reduction in a number density of corrosion sites by Mo addition vms observed, after accelerated corrosion test. AES survey indicated that corrosion occured on the site with Cr depletion and highly concentrated chloride ions.

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Electrochemical Stability of Co-Mo and Ni-Mo Intermetallic Compound Electrodes for Hydrogen Electrode of Alkaline Fuel Cell (알칼리형 연료전지의 수소극용 Co-Mo 및 Ni-Mo 금속간화합물 전극의 전기화학적 안정성)

  • Lee C. R.;Kang S. G.
    • Journal of the Korean Electrochemical Society
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    • v.2 no.3
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    • pp.150-155
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    • 1999
  • The Electrochemical stabilities of the Brewer-Engel type intermetallic compounds of Co-Mo $(35 wt\%)$ and Ni-Mo$(35 wt\%)$ manufactured by the arc-melting method for the hydrogen electrode of $H_2-O_2$ alkaline fuel cell were investigated. Effects of temperature and concentration on the electrochemical behavior of the electrodes in the $80^{\circ}C$ 6 N KOH solution deaerated with $N_2$ gas were studied by electrochemical methods. The effect of overpotential on the electrochemical stabilities of Co-Mo and Ni-Mo intermetallic compounds was also discussed under the normal operation condition of AFC. It was shown that Co-Mo electrode had lower electrochemical stability as compared to Ni-Mo. In the case of Co-Mo electrode, a simultaneous dissolution of cobalt and molybdenum has occurred at low anodic overpotential form equilibrium hydrogen electrode potential, but the dissolution of cobalt was serious, and Co(OH)l layer on the electrode surface formed at the high anodic overpotential. In contrast the Ni-Mo electrode had high electrochemical stability because formation of the dense and thin protective $Ni(OH)_2$ layer prevented the dissolution of molybdenum.

Mechanical Property Evaluation of WC-Co-Mo2C Hard Materials by a Spark Plasma Sintering Process (방전플라즈마 소결 공정을 이용한 WC-Co-Mo2C 소재의 기계적 특성평가)

  • Kim, Ju-Hun;Park, Hyun-Kuk
    • Korean Journal of Materials Research
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    • v.31 no.7
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    • pp.392-396
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    • 2021
  • Expensive PCBN or ceramic cutting tools are used for processing of difficult-to-cut materials such as Ti and Ni alloy materials. These tools have the problem of breaking easily due to their high hardness but low fracture toughness. To solve these problems, cutting tools that form various coating layers are used in low-cost WC-Co hard material tools, and research on various tool materials is being conducted. In this study, binderless-WC, WC-6 wt%Co, WC-6 wt%Co-1 wt% Mo2C, and WC-6 wt%Co-2.5 wt% Mo2C hard materials are densified using horizontal ball milled WC-Co, WC-Co-Mo2C powders, and spark plasma sintering process (SPS process). Each SPSed Binderless-WC, WC-6 wt%Co-1 wt% Mo2C, and WC-6 wt%Co-2.5 wt% Mo2C hard materials are almost completely dense, with relative density of up to 99.5 % after the simultaneous application of pressure of 60 MPa and almost no significant change in grain size. The average grain sizes of WC for Binderless-WC, WC-6 wt%Co-1 wt% Mo2C, and WC-6 wt%Co-2.5 wt% Mo2C hard materials are about 0.37, 0.6, 0.54, and 0.43 ㎛, respectively. Mechanical properties, microstructure, and phase analysis of SPSed Binderless-WC, WC-6 wt%Co-1 wt% Mo2C, and WC-6 wt%Co-2.5 wt% Mo2C hard materials are investigated.

Effects of Mo and Si on the Coercivity of CoCrTa/CrMo and CoCrTa/CrSi Thin Film Media (CoCrTa/CrX (X=Mo, Si) 자성박막의 보자력에 미치는 Mo와 Si의 영향)

  • 조준식;남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.9 no.4
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    • pp.203-209
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    • 1999
  • Effects of Mo and Si addition in Cr underlayer on magnetic properties of CoCrTa/CrMo and CoCrTa/Si thin films media were investigated. Thin films were prepared with DC magnetron sputtering system. The thickness of CoCrTa magnetic layer and Cr underlayer were fixed at 300 $\AA$ and 700 $\AA$, respectively. The substrate heating temperature was kept constant at 26$0^{\circ}C$ for both magnetic layer and underlayer preparation. The coercivity increase of CoCrTa film was realized due to Mo addition in Cr underlayer. Si addition made a small decrease in coercivity. Coercivity increase seems to be attributed by the improvement of preferred orientation of Cr(200) plane. It is found that lattice fit between Cr(200) and CoCrTa(1120) of CrMo underlayer is better than that of CrSi underlayer. This small misfit may also contribute coercivity increase.

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The Effect of Sputtering Conditions on Magnetic Properties of CoCrMo/Cr Magnetic Thin Film (CoCrMo/Cr 자성박막의 제조조건이 자기적성질에 미치는 영향)

  • 박정용;남인탁;홍양기
    • Journal of the Korean Magnetics Society
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    • v.3 no.4
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    • pp.320-324
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    • 1993
  • The effect of sputtering conditions on magnetic properties of CoCrMo/Cr magnetic thin film was investigated. Substrate temperature were controlled from R. T to $250^{\circ}C$. The thickness changes of Cr underlayer and CoCrMo magnetic layer were in the range of $1000-2500\AA$ and $300-800\AA$, respectively. Grain size was found to be decreased with increasing magnetic layer thickness(from $500\AA$ to $800\AA$). CoCrMo magnetic layer microstructure showed relatively small dependence on Cr underlayer thickness, substrate temperature. Coercivity increased with increasing Cr underlayer, magnetic layer thickness and substrate temperature. CoCrMo/Cr thin film showed a coercivity of 880 Oe in $700\AA$ magnetic layer thickness and $1000\AA$ Cr underalyer thickness.

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Mirror Finishing of Co-Cr-Mo Alloy by Ultrasonic Elliptical Vibration Cutting Method (초음파타원진동절삭가공법에 의한 Co-Cr-Mo 합금의 경면가공)

  • Song, Young-Chan;Tanaka, Kenichi;Moriwaki, Toshinmichi
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.3
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    • pp.56-62
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    • 2008
  • The biocompatibility and the fatigue strength of Co-Cr-Mo alloy are excellent, so it is used well for the material of artificial joints. The head of artificial joint needs mirror surface for reduction of abrasive resistance. Mirror finishing of Co-Cr-Mo alloy with geometrically defined single crystal diamond cutting tools is handicapped by micro chipping of tool edge. In general, it is said that the micro chipping of diamond tool is caused by work hardening of Co-Cr-Mo alloy for the cut. In the present research, mirror finishing of Co-Cr-Mo alloy by applying ultrasonic elliptical vibration cutting was carried out. The experimental results show that the micro chipping of diamond tool was suppressed and the tool wear was remarkably reduced as compared with the ordinary diamond cutting without elliptical vibration motion. It was confirmed that the good mirror surface of maximum surface roughness of 25 nmP-V was obtained for the cutting length of about 14 m. It is expected that mirror finishing of Co-Cr-Mo alloy can be achieved by applying ultrasonic elliptical vibration cutting practically.

E-Beam Evaporated Co/Cr and Co/Mo Multilayer Thin Films

  • Lee, S.K;Nam, I.T;Hong, Y.K
    • Journal of Magnetics
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    • v.4 no.2
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    • pp.69-72
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    • 1999
  • Magnetic properties and crystallographic structure of e-beam evaporated Co/Cr and Co/Mo multilayer thin films were investigated using VSM and XRD. Co/Cr and Co/Mo multilayer thin films are confirmed as an alternating layered structure. The structure of films with thicker Co layers than Cr and Mo layers are found to be a hcp structure with the c-axis perpendicular to the film plane. The direction of the film plane is the easy magnetization one. There is a no significant difference in shape of hysteresis loops between Co/Cr and Co/Mo multilayer films. It is found that Mo layer is more effective than Cr for preparing Co layer with c-axis normal to the film plane.

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