• Title/Summary/Keyword: Co interlayer

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Experimental investigation of multi-layered laminated glass beams under in-plane bending

  • Huang, Xiaokun;Liu, Qiang;Liu, Gang;Zhou, Zhen;Li, Gang
    • Structural Engineering and Mechanics
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    • v.60 no.5
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    • pp.781-794
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    • 2016
  • Due to its relatively good safety performance and aesthetic benefits, laminated glass (LG) is increasingly being used as load-carrying members in modern buildings. This paper presents an experimental study into one applicational scenario of structural LG subjected to in-plane bending. The aim of the study is to reveal the in-plane behaviors of the LG beams made up of multi-layered glass sheets. The LG specimens respectively consisted of two, three and four plies of glass, bonded together by two prominent adhesives. A total of 26 tests were carried out. From these tests, the structural behaviors in terms of flexural stiffness, load resistance and post-breakage strength were studied in detail, whilst considering the influence of interlayer type, cross-sectional interlayer percentage and presence of shear forces. Based on the test results, analytical suggestions were made, failure modes were identified, corresponding failure mechanisms were discussed, and a rational engineering model was proposed to predict the post-breakage strength of the LG beams. The results obtained are expected to provide useful information for academic and engineering professionals in the analysis and design of LG beams bending in-plane.

Study on the Abrasive Capsulation Pad in Interlayer Dielectric Chemical Mechanical Polishing (층간절연막 화학기계연마에서 입자코팅패드에 관한 연구)

  • Kim, Ho-Yun;Park, Jae-Hong;Jeong, Hae-Do;Seo, Hyeon-Deok;Nam, Cheol-U;Lee, Sang-Ik
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.11
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    • pp.168-173
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    • 2001
  • The chemical mechanical polishing (CMP) is generally consisted of pad, slurry including abrasives and so on. However, there are some problems in a general CMP: defects, a high Cost of Consumable (CoC), an environmental problem. The slurry including abrasives especially gives rise to not only increase a CoC, but also prohibition from achieving an eco-process. This paper introduces an abrasive capsulation pad to achieve an eco-process decreasing abrasives used is CMP. The binder wth a water a water swelling and a water soluble characteristic is used for an auto-conditioning, and the $CeO_2$abrasive is selected for an abrasive capsulation pad. Comparing with a conventional CMP, an abrasive capsulation pad appears good characteristics in ILD CMP and is able to achieve an eco-process decreasing wasted slurry.

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Effect of Co Interlayer on the Interfacial Reliability of SiNx/Co/Cu Thin Film Structure for Advanced Cu Interconnects (미세 Cu 배선 적용을 위한 SiNx/Co/Cu 박막구조에서 Co층이 계면 신뢰성에 미치는 영향 분석)

  • Lee, Hyeonchul;Jeong, Minsu;Kim, Gahui;Son, Kirak;Park, Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.3
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    • pp.41-47
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    • 2020
  • The effect of Co interlayer on the interfacial reliability of SiNx/Co/Cu thin film structure for advanced Cu interconnects was systematically evaluated by using a double cantilever beam test. The interfacial adhesion energy of the SiNx/Cu thin film structure was 0.90 J/㎡. This value of the SiNx/Co/Cu thin film structure increased to 9.59 J/㎡.Measured interfacial adhesion energy of SiNx/Co/Cu structure was around 10 times higher than SiNx/Cu structure due to CoSi2 reaction layer formation at SiNx/Co interface, which was confirmed by X-ray photoelectron spectroscopy analysis. The interfacial adhesion energy of SiNx/Co/Cu structure decreased sharply after post-annealing at 200℃ for 24 h due to Co oxidation at SiNx/Co interface. Therefore, it is required to control the CoO and Co3O4 formation during the environmental storage of the SiNx/Co/Cu thin film to achieve interfacial reliability for advanced Cu interconnections.

The Characterization of Mn Based Self-forming Barriers on low-k Samples with or without UV Curing Treatment

  • Park, Jae-Hyeong;Han, Dong-Seok;Gang, Min-Su;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.352.2-352.2
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    • 2014
  • In this present work, we report a Cu-Mn alloy as a materials for the self-forming barrier process. And we investigated diffusion barrier properties of self-formed layer on low-k dielectrics with or without UV curing treatment. Cu alloy films were directly deposited onto low-k dielectrics by co-sputtering, followed by annealing at various temperatures. X-ray diffraction revealed Cu (111), Cu (200) and Cu (220) peaks for both of Cu alloys. The self-formed layers were investigated by transmission electron microscopy. In order to compare barrier properties between Mn-based interlayer interlayer, thermal stability was measured with various low-k dielectrics. X-ray photoelectron spectroscopy analysis showed that chemical compositions of self-formed layer. The compositions of the Mn based self-formed barriers after annealing were determined by the C concentration in the dielectric layers.

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The study of magnetoresistance and magnetic properties in [(CoO/NiO)/NiFe/Cu/NiFe] spin-valve thin films ([(CoO/NiO)/NiFe/Cu/NiFe] spin-valve 박막에서의 자기저항효과와 자기적 특성에 대한 연구)

  • 현준원
    • Electrical & Electronic Materials
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    • v.9 no.10
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    • pp.1060-1065
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    • 1996
  • We have studied the magnetoresistance phenomena on spin valve thin films of antiferromagnetic NiO/CoO. Interlayer coupling oscillates between the antiferrocoupling and ferrocoupling with the variation of Cu thickness. The exchange coupling strength between NiO (antiferromagnetic) and NiFe(ferromagnetic) as a function of NiO texture and interface roughness is investigated by CoO insertion. CoO has significantly higher anisotropy in the (111) plane and interface roughness. It seems that the MR-ratio is increased by CoO inserted films. From the AFM and XRD data, the increase of MR-ratio and exchange field is influenced by the roughness of CoO.

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Growth Behavior and Thermal Stability of CoSi2 Layer on Poly-Si Substrate Using Reactive Chemical Vapor Deposition (반응성 CVD를 이용한 다결정 실리콘 기판에서의 CoSi2 layer의 성장거동과 열적 안정성에 관한 연구)

  • Kim, Sun-Il;Lee, Heui-Seung;Park, Jong-Ho;Ahn, Byung-Tae
    • Korean Journal of Materials Research
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    • v.13 no.1
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    • pp.1-5
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    • 2003
  • Uniform polycrystalline $CoSi_2$layers have been grown in situ on a polycrystalline Si substrate at temperature near $625^{\circ}C$ by reactive chemical vapor deposition of cyclopentadienyl dicarbonyl cobalt, Co(η$^{5}$ -C$_{5}$ H$_{5}$ )(CO)$_2$. The growth behavior and thermal stability of $CoSi_2$layer grown on polycrystalline Si substrates were investigated. The plate-like CoSi$_2$was initially formed with either (111), (220) or (311) interface on polycrystalline Si substrate. As deposition time was increasing, a uniform epitaxial $CoSi_2$layer was grown from the discrete $CoSi_2$plate, where the orientation of the$ CoSi_2$layer is same as the orientation of polycrystalline Si grain. The interface between $CoSi_2$layer and polycrystalline Si substrate was always (111) coherent. The growth of the uniform $CoSi_2$layer had a parabolic relationship with the deposition time. Therefore we confirmed that the growth of $CoSi_2$layer was controlled by diffusion of cobalt. The thermal stability of $CoSi_2$layer on small grain-sized polycrystalline Si substrate has been investigated using sheet resistance measurement at temperature from $600^{\circ}C$ to $900^{\circ}C$. The $CoSi_2$layer was degraded at $900^{\circ}C$. Inserting a TiN interlayer between polycrystalline Si and $_CoSi2$layers improved the thermal stability of $CoSi_2$layer up to $900^{\circ}C$ due to the suppression of the Co diffusion.

Characterization of Layered Double Hydroxides(Mg-Al-$CO_3$ systems) and Rehydration Reaction of Their Calcined Products in Aqueous Chromate Solution (층상이중수산화물(Mg-Al-$CO_3$ 체계)의 물리 · 화학적 특성규명 및 소성된 시료의 크롬산이온 수용액에서 재수화반응)

  • Rhee, Seog Woo;Kang, Mun-Ja;Moon, Hichung
    • Journal of the Korean Chemical Society
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    • v.39 no.8
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    • pp.627-634
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    • 1995
  • Layered double hydroxides ($Mg-Al-CO_3$ systems, LDH), which are hydrotalcite-like anionic clay minerals, having different $Mg^{2+}\;to\;Al^{3+}$ ratio were synthesized by coprecipitation method. The subsequent products were characterized by the following methods; elemental analysis, X-ray powder diffraction, thermal analysis (DSC and TGA), FT-IR and $^{27}$Al-MAS NMR. X-ray powder patterns showed that the products formed were layered structure materials. Two heat absorption peaks were observed around 20 ∼280$^{\circ}C$ (surface water and interlayer water) and 280∼500$^{\circ}C$ (water from lattice hydroxide and carbon dioxide from interlayer carbonate) in DSC diagrams, and they were quantitatively analyzed by TGA diagrams (in case LDH4 16.2% and 28.6% respectively). FT-IR spectra indicate that the interlayer carbonate ions occupied symmetrical sites between two adjacent layers in a parallel direction. $^{27}$Al-MAS NMR spectra show only single resonance (8.6 ppm) of the octahedrally coordinated aluminum similar magnesium. When LDH4 was calcined at 560$^{\circ}C$ for 3 hours in air, its layered structure was destroyed giving a mixed metal oxide. However it readily became rehydrated in aqueous chromate solution to its original structure.

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The Second Annealing Effect on Giant Magnetoresistance Properties of PtMn Based Spin Valve (이차 열처리가 PtMn계 스핀밸브의 거대자기저항 특성에 미치는 영향)

  • 김광윤;김민정;김희중
    • Journal of the Korean Magnetics Society
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    • v.11 no.2
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    • pp.72-77
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    • 2001
  • Top spin valve films with PtMn antiferromagnetic layers were deposited using a multi-target dc magnetron sputtering in (100)Si substrates overcoated with 500 $\AA$ of Al$_2$O$_3$. Firstly, the post-deposition annealing was performed at 270$\^{C}$ in a unidirectional magnetic field of 3 kOe to induce the crystallographic transformation of the PtMn layer from a fcc (111) to a fct (111) structure. Secondly, the spin valve films were annealed without magnetic fields and magnetic properties were measured. In Si/A1$_2$O$_3$ (500$\AA$)/Ta(50$\AA$)NiFe(40$\AA$)/CoFe(17$\AA$)/Cu(28$\AA$)/CoFe (30$\AA$)PtMn(200$\AA$)Ta(50$\AA$) top spin valve samples, the MR ratio decreased slowly with increasing annealing temperature up to 325$\^{C}$. But above 325$\^{C}$, the MR ratio decreased rapidly to 1%, due to a collapse of the exchange coupling between a antiferromagnetic layer and a pinned layer with increasing annealing temperature. Also above 325$\^{C}$, the exchange biased field rapidly decreased and the interlayer coupling field rapidly increased with increasing annealing temperature. A change in the interlayer coupling field was resulted from the increase in interface roughness due to Mn-interdiffusion through the grain boundaries. We confirmed the temperature in changing magnetic properties agreed well with the blocking temperature of PtMn based spin valve structure.

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Changes in Cobalt Adsorption Properties of Montmorillonite by Dehydration (탈수 작용에 따른 몬모릴로나이트의 코발트 흡착 특성 변화)

  • Yeongjun Jang;Yeongkyoo Kim
    • Korean Journal of Mineralogy and Petrology
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    • v.36 no.2
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    • pp.107-115
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    • 2023
  • Cobalt can be released into the natural environment as industrial waste from the alloying industry and as acid mine drainage, and it is also a radionuclide (60Co) that constitutes high-level radioactive waste. Smectite is a mineral that can be useful for adsorption and isolation of this element. In this study, Cheto-type montmorillonite (Cheto-MM), which is the source clays of The Clay Mineral Society (CMS) and already well-characterized, was used. The effect of the adsorption site affected by the presence of interlayer water on the adsorption of cobalt before and after dehydration by heating was evaluated and the adsorption mechanism of cobalt on Cheto-MM was studied by applying adsorption kinetics and adsorption isotherm models. The results showed that the adsorption characteristics changed with dehydration and subsequent shrinkage, and cobalt was found to be adsorbed at the edge of Cheto-MM for about 38% and adsorbed at the interlayer site for about 62%, suggesting that the cobalt adsorption of Cheto-MM is significantly influenced by the interlayer. By applying the adsorption kinetic models, the cobalt adsorption kinetics of Cheto-MM is explained by a pseudo-second-order model, and the concentration-dependent adsorption was best described by the Langmuir isotherm adsorption model. This study provides basic knowledge on the adsorption characteristic of cobalt on montmorillonite with different adsorption sites and is expected to be useful in predicting the adsorption behavior of smectite in high-level radioactive waste disposal sites in the future.