• 제목/요약/키워드: Clean tube

검색결과 73건 처리시간 0.029초

클린 튜브 시스템에서 웨이퍼의 위치 인식 및 정지 제어 (Wafer Position Sensing and Control in the Clean Tube System)

  • 김유진;신동헌
    • 제어로봇시스템학회논문지
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    • 제12권11호
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    • pp.1095-1101
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    • 2006
  • The clean tube system was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. This paper presents a wafer position sensing method in the clean tube system, where the photo proximity sensors are used. The first presented method uses the two positions sensed lately in order to compute the wafer center position. The next method uses the latest sensed position and the next latest position compensated with the information of the wafer velocity. The third method uses the kalman filter, which enable us to use all the previous sensing information. The simulation results are compared to show results of the presented method. In addition, the paper presents a control method to stop the wafer at the center of the unit in the clean tube system. The experimental clean tube system worked successfully with the applying the both presented methods of sensing and control.

Floated Wafer Motion Modeling of Clean Tube system

  • Shin, Dong-Hun;Yun, Chung-Yong;Jeong, Kyoo-Sik;Choi, Chul-Hwan
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2004년도 ICCAS
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    • pp.1264-1268
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    • 2004
  • This paper presents a wafer motion modeling of the transfer unit and the control unit in the clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean airs. The motion in the transfer unit is modeled as a mass-spring-damper system where the recovering force by air jets issued from the perforated plate is modeled as a linear spring. The motion in the control unit is also modeled as another mass-spring-damper system, but in two dimensional systems. Experiments with a clean tube system built for 12-inch wafers show the validity of the presented force and motion models.

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클린튜브 시스템의 웨이퍼 운동 제어 (Wafer Motion Control of Clean Tube System)

  • 신동헌;최철환;정규식
    • 설비공학논문집
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    • 제16권5호
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    • pp.475-481
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    • 2004
  • This paper presents a force model of the clean tube system, which was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. The recovering force from the holes for floating wafers is modeled as a linear spring and thus the wafers motion is modeled as a mass-spring-damper system. The propelling forces are modeled as linear along with the wafer location. The paper also proposes a control method to emit and stop a wafer at the center of a control unit. It reveals the minimum value of the propelling force to leave from the control unit. In order to stop the wafer, it utilizes the exact time when the wafer arrives at the position to activate the propelling force. Experiments with the clean tube system built for the 12 inch wafer shows the validity of the proposed model and the algorithm.

클린튜브 시스템의 웨이퍼 정지 제어 (Wafer Motion Control of a Clean Tube System)

  • 신동헌;최철환
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.459-462
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    • 2003
  • This paper presents a force model of the clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean air. The recovering force from the holes for floating wafers is modeled as a linear spring and thus the wafer motion is modeled as a mass-spring-damper system. The propelling forces are modeled as linear along with the wafer location. The paper also proposes the control method to emit and stop a wafer at the center of a control unit. It shows the minimum value of the propelling force to leave from the control unit. In order to stop the wafer, it utilizes the exact time when a wafer arrives at the position to activate the propelling force. Experiments with the clean tube system built for 12 inch wafer shows the validity of the proposed model and the algorithm.

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클린 튜브 시스템 이송 유닛의 웨이퍼 운동 역학 모델링 (Wafer Motion Modeling of Transfer Unit in Clean Tube System)

  • 신동헌;정규식;윤정용
    • 한국정밀공학회지
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    • 제21권3호
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    • pp.66-73
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    • 2004
  • This paper presents wafer motion modeling of transfer unit in clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean airs. When the wafer is transferred in x direction with an initial velocity the motion along x direction can be modeled as a simple decaying motion due to viscous friction of the fluid. But, the motion in y direction is modeled as a mass-spring-damper system where the recovering force by air jets issued from the perforated is modeled as a linear spring. Experiments with a clean tube system built fur 12 wafer show the validity of the presented force and motion models.

온도와 반응 시간에 따른 세라믹 튜브 내 메탄 열분해 반응의 메탄 전환율과 선택도 분석 (Analysis of Methane Conversion Rate and Selectivity of Methane Pyrolysis Reaction in Ceramic Tube According to Temperature and Reaction Time)

  • 이동근;김영상;안국영
    • 한국수소및신에너지학회논문집
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    • 제33권1호
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    • pp.1-7
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    • 2022
  • Interest in hydrogen productions that do not emit carbon dioxide and can produce hydrogen at a low price is increasing. Reforming and electrolysis are widely used, but they have limitations, such as carbon dioxide problems and costs. The methane can be decomposed as hydrogen and solid carbon without carbon dioxide emission at high temperatures. In this research, the methane pyrolysis experiment was conducted at 1,200℃ and 1,400℃ in a ceramic tube. The composition of the produced gas was measured by gas chromatography before carbon blocked the tube. The methane conversion rate and hydrogen selectivity were calculated based on the results. The hydrogen selectivity was derived as 60% and 55% at the highest point at 1,200℃ and 1,400℃, respectively. The produced solid carbon was expected to be carbon black and was analyzed using scanning electron microscope.

반도체 제조 설비용 전해 연마된 STS316L 용접강관의 표면 성질 - 전해 조건과 표면 성상의 관계를 중심으로 - (Surface Properties of Electrolytic-Polished 316L Stainless Steel Welding Tube for Semi-Conductor Fab. - As the Relation of Electrolysis Conditions with Surface Characteristics -)

  • 김기호;조보연
    • 한국표면공학회지
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    • 제41권1호
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    • pp.38-42
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    • 2008
  • 316L stainless steel welding tube was electrolytically polished and the inner surface characteristics of the tube were tested. Electro-polishing variables such as current, voltage, concentration of electrolyte and electropolishing time were changed to seek for optimum condition. These makes a optimum conditions for the electro-polishing as 4000 A, 9 V, 1.7 specific gravity of electrolyte, and 30 minute of electro-polishing time. It makes the surface roughness as Ra < $0.25{\mu}m$. XPS test resulted as the ratio of CrO/FeO equals or more to 3/1. AES test resulted as the thickness of CrO film of $38{\AA}$. DTA test resulted as the tube did not react with $N_2,\;H_2\;and\;O_2$ gas below 1073K. As summarize above results, the electro- polished 316L stainless steel welding tube satisfied the conditions to apply as a pipeline for semi- conductor production facility and clean room.

대용량 청정 공기 가열 장치 설계 (Design of Large Capacity Clean Air Heater)

  • 김정우;정광수;전민준;이규준
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2010년도 제35회 추계학술대회논문집
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    • pp.115-118
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    • 2010
  • 공기 가열 장치는 크게 연소식과 열교환식 2가지가 있으며, 본 논문은 공기를 오염시키지 않은 열교환 방식인 청정 공기 가열 장치의 설계 방법을 기술하였다. 가열 장치는 크게 연소기 (Burner), 가열로 (Furnace), 열교환기 (Heat Exchanger), 배기구로 구성되어 되며, 가열되는 공기 유량과 입/출구 온도값으로부터 가열원인 연소기의 열용량과 연소기 연료인 LNG의 소요량을 구한다. 열교환기 내부에서 연소기의 뜨거운 연소가스와 가열되는 차가운 공기간의 열매체를 통한 간접 열교환이 이루어지므로, 가열되는 공기의 입/출구 온도에서 열교환기의 용량, 크기, 작동 최대 온도를 얻을 수 있게 된다.

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에어샤워부품의 용출 가스 중 유기화합물의 반 정량적 Headspace GC-MS 분석 (Semiquantitative Dynamic Headspace GC-MS Analysis for Organic Compounds Outgassed from FAB Materials of Air Shower)

  • 박현미;백승우;김영만;이강봉
    • 분석과학
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    • 제13권4호
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    • pp.412-422
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    • 2000
  • 실리콘 웨퍼 산업계의 청정실에서 사용되는 에어샤워기중 고분자로 제작된 부품들을 $100^{\circ}C$에서 30분간 다이나믹 해드 스페이스에서 가스로 용출한 후 GC-MS로 분석 하였다. 에어샤워기가 가동중인 청정실의 대기를 흡착관 튜브방식으로 채취하였고, 이러한 흡착관 튜브에 흡착된 유기화합물은 쏙시렛 용출법을 이용하여 용출한 후 GC-MS로 분석하였다. 에어샤워기의 제조 부품(electric over current relay, acryl plate. polycarbonate window, filter, fan housing, steel galvanized cold plate and canvas buffer)들로 부터의 분석결과 대부분의 성분들은 제조부품의 고분자 성분들에서 유래되었음을 확인 할 수 있었으며, 에어샤워기가 가동중인 청정실의 대기분석 결과와 비교 분석되었다. 이러한 분석결과의 비교 연구는 청정실내에서의 유기오염물질이 에어샤워기의 고분자 제조부품으로부터 유래 되었는지를 확인하게 해준다.

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