• Title/Summary/Keyword: Clean tube

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Wafer Position Sensing and Control in the Clean Tube System (클린 튜브 시스템에서 웨이퍼의 위치 인식 및 정지 제어)

  • Kim, Yu-Jin;Shin, Dong-Hun
    • Journal of Institute of Control, Robotics and Systems
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    • v.12 no.11
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    • pp.1095-1101
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    • 2006
  • The clean tube system was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. This paper presents a wafer position sensing method in the clean tube system, where the photo proximity sensors are used. The first presented method uses the two positions sensed lately in order to compute the wafer center position. The next method uses the latest sensed position and the next latest position compensated with the information of the wafer velocity. The third method uses the kalman filter, which enable us to use all the previous sensing information. The simulation results are compared to show results of the presented method. In addition, the paper presents a control method to stop the wafer at the center of the unit in the clean tube system. The experimental clean tube system worked successfully with the applying the both presented methods of sensing and control.

Floated Wafer Motion Modeling of Clean Tube system

  • Shin, Dong-Hun;Yun, Chung-Yong;Jeong, Kyoo-Sik;Choi, Chul-Hwan
    • 제어로봇시스템학회:학술대회논문집
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    • 2004.08a
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    • pp.1264-1268
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    • 2004
  • This paper presents a wafer motion modeling of the transfer unit and the control unit in the clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean airs. The motion in the transfer unit is modeled as a mass-spring-damper system where the recovering force by air jets issued from the perforated plate is modeled as a linear spring. The motion in the control unit is also modeled as another mass-spring-damper system, but in two dimensional systems. Experiments with a clean tube system built for 12-inch wafers show the validity of the presented force and motion models.

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Wafer Motion Control of Clean Tube System (클린튜브 시스템의 웨이퍼 운동 제어)

  • 신동헌;최철환;정규식
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.16 no.5
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    • pp.475-481
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    • 2004
  • This paper presents a force model of the clean tube system, which was developed as a means of transferring air-floated wafers inside a closed tube filled with super clean air. The recovering force from the holes for floating wafers is modeled as a linear spring and thus the wafers motion is modeled as a mass-spring-damper system. The propelling forces are modeled as linear along with the wafer location. The paper also proposes a control method to emit and stop a wafer at the center of a control unit. It reveals the minimum value of the propelling force to leave from the control unit. In order to stop the wafer, it utilizes the exact time when the wafer arrives at the position to activate the propelling force. Experiments with the clean tube system built for the 12 inch wafer shows the validity of the proposed model and the algorithm.

Wafer Motion Control of a Clean Tube System (클린튜브 시스템의 웨이퍼 정지 제어)

  • 신동헌;최철환
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.459-462
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    • 2003
  • This paper presents a force model of the clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean air. The recovering force from the holes for floating wafers is modeled as a linear spring and thus the wafer motion is modeled as a mass-spring-damper system. The propelling forces are modeled as linear along with the wafer location. The paper also proposes the control method to emit and stop a wafer at the center of a control unit. It shows the minimum value of the propelling force to leave from the control unit. In order to stop the wafer, it utilizes the exact time when a wafer arrives at the position to activate the propelling force. Experiments with the clean tube system built for 12 inch wafer shows the validity of the proposed model and the algorithm.

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Wafer Motion Modeling of Transfer Unit in Clean Tube System (클린 튜브 시스템 이송 유닛의 웨이퍼 운동 역학 모델링)

  • 신동헌;정규식;윤정용
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.3
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    • pp.66-73
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    • 2004
  • This paper presents wafer motion modeling of transfer unit in clean tube system, which was developed as a means for transferring the air-floated wafers inside the closed tube filled with the super clean airs. When the wafer is transferred in x direction with an initial velocity the motion along x direction can be modeled as a simple decaying motion due to viscous friction of the fluid. But, the motion in y direction is modeled as a mass-spring-damper system where the recovering force by air jets issued from the perforated is modeled as a linear spring. Experiments with a clean tube system built fur 12 wafer show the validity of the presented force and motion models.

Analysis of Methane Conversion Rate and Selectivity of Methane Pyrolysis Reaction in Ceramic Tube According to Temperature and Reaction Time (온도와 반응 시간에 따른 세라믹 튜브 내 메탄 열분해 반응의 메탄 전환율과 선택도 분석)

  • LEE, DONGKEUN;KIM, YOUNGSANG;AHN, KOOKYOUNG
    • Transactions of the Korean hydrogen and new energy society
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    • v.33 no.1
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    • pp.1-7
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    • 2022
  • Interest in hydrogen productions that do not emit carbon dioxide and can produce hydrogen at a low price is increasing. Reforming and electrolysis are widely used, but they have limitations, such as carbon dioxide problems and costs. The methane can be decomposed as hydrogen and solid carbon without carbon dioxide emission at high temperatures. In this research, the methane pyrolysis experiment was conducted at 1,200℃ and 1,400℃ in a ceramic tube. The composition of the produced gas was measured by gas chromatography before carbon blocked the tube. The methane conversion rate and hydrogen selectivity were calculated based on the results. The hydrogen selectivity was derived as 60% and 55% at the highest point at 1,200℃ and 1,400℃, respectively. The produced solid carbon was expected to be carbon black and was analyzed using scanning electron microscope.

Surface Properties of Electrolytic-Polished 316L Stainless Steel Welding Tube for Semi-Conductor Fab. - As the Relation of Electrolysis Conditions with Surface Characteristics - (반도체 제조 설비용 전해 연마된 STS316L 용접강관의 표면 성질 - 전해 조건과 표면 성상의 관계를 중심으로 -)

  • Kim, Ki-Ho;Cho, Bo-Yeon
    • Journal of the Korean institute of surface engineering
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    • v.41 no.1
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    • pp.38-42
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    • 2008
  • 316L stainless steel welding tube was electrolytically polished and the inner surface characteristics of the tube were tested. Electro-polishing variables such as current, voltage, concentration of electrolyte and electropolishing time were changed to seek for optimum condition. These makes a optimum conditions for the electro-polishing as 4000 A, 9 V, 1.7 specific gravity of electrolyte, and 30 minute of electro-polishing time. It makes the surface roughness as Ra < $0.25{\mu}m$. XPS test resulted as the ratio of CrO/FeO equals or more to 3/1. AES test resulted as the thickness of CrO film of $38{\AA}$. DTA test resulted as the tube did not react with $N_2,\;H_2\;and\;O_2$ gas below 1073K. As summarize above results, the electro- polished 316L stainless steel welding tube satisfied the conditions to apply as a pipeline for semi- conductor production facility and clean room.

Design of Large Capacity Clean Air Heater (대용량 청정 공기 가열 장치 설계)

  • Kim, Jeong-Woo;Jung, Kwang-Soo;Jeon, Min-Joon;Lee, Kyu-Joon
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2010.11a
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    • pp.115-118
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    • 2010
  • 2 Types of heater (Vitiated Type, Clean Air Type) in order to increase the temperature for a test are used for industry. In this report, large capacity clean air type heater was designed. Heater capacity and LNG consumption rate can be calculated by the air mass flow and heater inlet/outlet temperature. The heater is composed by Burner, Furnace, Heat Exchanger, and Stack. The hot air from the burner and cold air from the tube inlet exchange their heat indirectly in the heat exchanger, so the desired temperature can be achieved at the exit of the tube.

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Semiquantitative Dynamic Headspace GC-MS Analysis for Organic Compounds Outgassed from FAB Materials of Air Shower (에어샤워부품의 용출 가스 중 유기화합물의 반 정량적 Headspace GC-MS 분석)

  • Park, Hyun-Mee;Baig, Soung-Woo;Kim, Young-Man;Lee, Kang-Bong
    • Analytical Science and Technology
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    • v.13 no.4
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    • pp.412-422
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    • 2000
  • The polymeric FAB materials of air shower used in clean room of wafer industry have been outgassed with the dynamic headspace (ca.$100^{\circ}C$) for half an hour, and analyzed using GC-MS. The air in the clean room running air shower was sampled using sorbent tube method, and the organic compounds adsorbed in the sorbent tube were extracted using Soxhlet extraction method, and analyzed using GC-MS. The analytical results from FAB materials of air shower (electric over current relay, acryl plate. polycarbonate window, filter, fan housing, steel galvanized cold plate and canvas buffer) indicated that most of chemicals were originated from polymer fragments of FAB materials. Their analytical results have been compared with those from the air of clean room running air shower. These comparative results could lead to identify whether the sources of trace organic contaminants in clean room air are originated from the polymeric FAB material of air shower.

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