A study on etch Characteristics of $CeO_2$ thin Film in an $Ar/CF_{4}/Cl_{2}$ Plasma
($Ar/CF_{4}/Cl_{2}$ 플라즈마에 의한 $CeO_2$ 박막의 식각 특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2001.11b
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- pp.217-220
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- 2001