• 제어로봇시스템학회:학술대회논문집
• /
• 2001.10a
• /
• pp.97.1-97
• /
• 2001

One of the main problems to constitute control method on biologically oriented wastewater purification processes, e.g. activated sludge process, sequential batch reactor, rotating bio-disk contactor, etc. is that it is hard to control the target component directly. For instance, while biochemical oxygen demand, suspended solids, and chemical oxygen demand are the key components to check the process performance, one may not control them directly since they are the results of microbial activities related to numerous physiochemical factors. Therefore controllers for bioprocess should be designed to make favorable condition for microorganisms´ living, e.g. dissolved oxygen level favorable, mixed liquor suspended solids concentration suitable ...

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.20 no.4
• /
• pp.303-307
• /
• 2007

This paper investigated the effect of the pad buffing process on the material removal characteristics and pad stabilization during silicon chemical mechanical polishing. The pads surface were controlled by the buffing process using a buffer made by the sandpaper. The buffing process is based on abrasive machining by using a high speed sandpaper. The controlled pad by the buffing process show less deformation deviation and stable material removal rate during the CMP process. In addition, the controlled pad ensure better uniformity of removal rate than comparative pads. As a result of monitoring, the controlled pad by the buffing process demonstrated constant and stable friction force signals from initial polishing stage. Therefore, the tufting process could control the pad surface to be uniform and improve the performance of the polishing pad.

• Transactions on Control, Automation and Systems Engineering
• /
• v.4 no.2
• /
• pp.109-113
• /
• 2002

Van de Vusse reactor is known as a highly nonlinear chemical process and has been considered by a number of researchers as a benchmark problem for nonlinear chemical process. Various identification methods for nonlinear system are also verified by applying these methods to Van de Vusse reactor. From the point of view of identification, only the Volterra kernel of second order has been obtained until now. In this paper, the authors show that Volterra kernels of nonlinear Van de Vusse reactor of up to 3rd order are obtained by use of M-sequence correlation method. A pseudo-random M-sequence is applied to Van de Vusse reactor as an input and its output is measured. Taking the crosscorrelation function between the input and the output, we obtain up to 3rd order Volterra kernels, which is the highest order Volterra kernel obtained until now for Van de Vusse reactor. Computer simulations show that when Van de Vusse chemical process is identified by use of up to 3rd order Volterra kernels, a good agreement is observed between the calculated output and the actual output.

• Korean Journal of Materials Research
• /
• v.12 no.11
• /
• pp.850-855
• /
• 2002

Silica powders were prepared from $SiCl_4$-$H_2$O system by chemical vapor deposition process, and investigated on size control of the products with reaction conditions. The products were amorphous and nearly spherical particles with 130nm~50nm in size. The size distribution became narrow with the increase of [$H_2$O]/[SiCl$_4$] concentration ratio. The particle size decreased with the increase of reaction temperature, [$H_2$O]/[SiCl$_4$] concentration ratio and total flow rate. The specific surface area measured by BET method was about three times larger than that of electron microscope method.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2004.04b
• /
• pp.34-37
• /
• 2004

Recently advancing mobile communication tools and I.T industry, semiconductor device is requested more integrated, faster operation time and more scaled-down. Because of these reasons semiconductor device is requested multilayer interconnection. For the multilayer interconnection chemical mechanical polishing (CMP) becomes one of the most useful process in semiconductor manufacturing process. In this experiment, we focus on understand the characterize and improve the CMP technology by control of slurry flow rate. Consequently, we obtain that optimal flow rate of slurry is 170ml/min, since optimal conditions are less chemical flow and performance high with good selectivity to Ta. If we apply this results to copper CMP process. it is thought that we will be able to obtain better yield.

• 제어로봇시스템학회:학술대회논문집
• /
• 2004.08a
• /
• pp.1870-1873
• /
• 2004

The objective of this study is to investigate the possibility of chemical process synthesis purely based on mathematical programming when given an objective, feed conditions, product specifications, and model equations for available process units. A method based on a state space approach is proposed, and applied to an example problem with a reactor, a heat exchanger, and a separator. The results indicate that a computer can automatically synthesize an optimal process without any heuristics or expertise in process design provided that global optimization techniques are improved to be suitable for large problems.

• Journal of Institute of Control, Robotics and Systems
• /
• v.7 no.5
• /
• pp.427-431
• /
• 2001

An on-line refractometer made of easily obtainable materials is built to determine the concentration of an alcohol solution, and its performance is examined by applying to the system of ethanol and water. Since the refractive index and the temperature are measured simultaneously, it is possible to compensate the effect of temperature which is not available with an existing on-line refeactometer. Therefore, it can be implemented in the application of process control. The experimental outcome indicates that the home-made refractometer has satisfactory reproducibility and reasonable accuracy for the industrial application.

• 제어로봇시스템학회:학술대회논문집
• /
• 1996.10b
• /
• pp.282-285
• /
• 1996

In the water purification plant, the raw water is promptly purified by injecting chemicals. The amount of chemicals is directly related to water quality such as turbidity, temperature, pH and alkalinity. At present, however, the process of chemical reaction to the turbidity has not been clarified as yet. Since the process of coagulant dosage has no feedback signal, the amount of chemical can not be calculated from water quality data which were sensed from the plant. Accordingly, it has to be judged and determined by Jar-Test data which were made by skilled operators. In this paper, it is concerned to model and control the coagulant dosing process using jar-test results in order to predict optimum dosage of coagulant, PAC(Polymerized Aluminium Chloride). The considering relations to the reaction of coagulation and flocculation, the five independent variables(turbidity, temperature, pH, Alkalinity of the raw water, PAC feed rate) are selected out and they are put into calculation to develope a neural network model and a fuzzy model for coagulant dosing process in water purification system. These model are utilized to predict optimum coagulant dosage which can minimize the water turbidity in flocculator. The efficacy of the proposed control schemes was examined by the field test.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
• /
• 2005.05a
• /
• pp.157-162
• /
• 2005

The wafer's size has been increased up to 300mm according as the devices have been integrated sophisticatedly. For this process to make 300mm-wafer, it is required strict level which removes the particulates on the surface of wafer. Therefore we need new type wet-station which can reduce DI water and chemical in the cleaning process. Moreover, it is very important to control the temperature and the concentration of chemical wet-stat ion. The chemical supply system which is used currently is not only difficult to make a fit mixing rate of chemical in cleaning process, but also it is difficult to make fit quantity and temperature. We propose new chemical supply system, which overcomes the problems via analysis of fluid and thermal transfer on chemical supply system,

• Journal of Institute of Control, Robotics and Systems
• /
• v.9 no.10
• /
• pp.832-835
• /
• 2003

The objective of this study is to investigate the possibility of chemical process synthesis purely based on mathematical programming when given an objective, feed conditions, product specifications, and model equations for available process units. A method based on a state space approach is proposed, and applied to an example problem with a reactor, a heat exchanger, and a separator. The results indicate that a computer can automatically synthesize an optimal process without any heuristics or expertise in process design provided that global optimization techniques are improved to be suitable for large problems.