• 제목/요약/키워드: Chelating solution

검색결과 107건 처리시간 0.022초

Interlayered colored iron compounds prepared by reactions of nanoirons with bidentate chelating ligands in laponite

  • Kim, Dong Hwan;Kim, Youhyuk
    • 한국결정성장학회지
    • /
    • 제31권2호
    • /
    • pp.69-72
    • /
    • 2021
  • The reaction of ammonium ferric sulfate with sodium borohydride in laponite sol yields nanoiron colloidal solution. This solution in air forms transparent yellow brown solution. The resulting solution reacts with bidentate chelating ligands. The reaction products are characterized by UV-Vis absorption spectroscopy and X-ray diffraction. All compounds show metal to ligand charge transfer band in the region of 400~650 nm in UV-Vis absorption spectra. This indicates the formation of iron-ligand complex by air oxidation of nanoiron. Also, XRD patterns exhibit that the iron-ligand complex is intercalated in the interlayer of laponite.

상아질 치관 치료를 위한 EDTA Na염의 킬레이션 (The chelation of EDTA sodium salts solution for the root canal dentin treatment)

  • 송근호;장화익;이광래
    • 산업기술연구
    • /
    • 제31권A호
    • /
    • pp.59-62
    • /
    • 2011
  • The demineralizing effect of chelating agents(Maleic acid solution, EDTA salts solutions; disodium-, trisodium- and tetrasodium-EDTA) on hydroxyapatite(HA) for the root canal dentin treatment was investigated. Dissolution of Ca from HA was increased with increasing immersion time in chelating solutions. Among the EDTA salts solutions, tetrasodium-EDTA was least effective in dissolving Ca out from HA, and trisodium-EDTA was the most effective. Trisodium-EDTA solutionmight be more effective in removing the smear layer compared to tetrasodium-EDTA solution.

  • PDF

착화제 첨가에 따른 웨이퍼 세정 용액 특성 분석 및 금속 용해 거동 (Analysis of Wafer Cleaning Solution Characteristics and Metal Dissolution Behavior according to the Addition of Chelating Agent)

  • 김명석;류근혁;이근재
    • 한국분말재료학회지
    • /
    • 제28권1호
    • /
    • pp.25-30
    • /
    • 2021
  • The surface of silicon dummy wafers is contaminated with metallic impurities owing to the reaction with and adhesion of chemicals during the oxidation process. These metallic impurities negatively affect the device performance, reliability, and yield. To solve this problem, a wafer-cleaning process that removes metallic impurities is essential. RCA (Radio Corporation of America) cleaning is commonly used, but there are problems such as increased surface roughness and formation of metal hydroxides. Herein, we attempt to use a chelating agent (EDTA) to reduce the surface roughness, improve the stability of cleaning solutions, and prevent the re-adsorption of impurities. The bonding between the cleaning solution and metal powder is analyzed by referring to the Pourbaix diagram. The changes in the ionic conductivity, H2O2 decomposition behavior, and degree of dissolution are checked with a conductivity meter, and the changes in the absorbance and particle size before and after the reaction are confirmed by ultraviolet-visible spectroscopy (UV-vis) and dynamic light scattering (DLS) analyses. Thus, the addition of a chelating agent prevents the decomposition of H2O2 and improves the life of the silicon wafer cleaning solution, allowing it to react smoothly with metallic impurities.

자외선 흡수대를 이용한 Chelated Ti Alkoxide의 수화반응 연구 (Hydrolysis Rate Study of Chelated Ti Alkoxide by Using U.V. Spectrophotometer)

  • 김선욱;윤만순;송인호
    • 한국세라믹학회지
    • /
    • 제28권12호
    • /
    • pp.975-980
    • /
    • 1991
  • Chelated titanium alkoxides are hydrolysed showly and stable enough to prepare multicomponent gels of titania without its precipitation due to the fast hydrolysis of Ti alkoxide. The alkoxy groups of chelated titanium alkoxide are hydrolysed as fast as that of titanium alkoxide but the chelating groups are stable even in aqueous solution. The chelating groups showed different rates of hydrolysis in aqueous ammonia solution and water added one. Those rates were monitored with UV-VIS spectrophotometer by using their unique absorption bands before and after hydrolysis.

  • PDF

Evaluation of Distribution Coefficient of a Metal Ion in the Presence of n Chelating Agent

  • Baik, Min-Hoon;Lee, Kun-Jai
    • 에너지공학
    • /
    • 제1권1호
    • /
    • pp.97-101
    • /
    • 1992
  • A mathematical model has been developed for an analytical calculation of distribution coefficient (K$_1$) in the presence of a chelating agent, The newley formulated K$\_$D/ is given as a function of the mole fraction of a free metal ion in the solution, ${\beta}$, and will serve as an alternative for the tedious individual measurements of K$\_$D/. This formulation will be used to analyze the effects of the presence of chelating agents on the adsorption capacity of geologic media such as clay minerals and soils. The present method may be a significant progess for the evaluation of the transport phenomena and separation processes of metal ions (or radionuclides) in the presence of chelating agents.

  • PDF

Release of Cu from SDS micellar solution using complexing agents

  • 김호정;백기태;김보경;이율리아;양지원
    • 한국지하수토양환경학회:학술대회논문집
    • /
    • 한국지하수토양환경학회 2004년도 총회 및 춘계학술발표회
    • /
    • pp.307-310
    • /
    • 2004
  • Micellar enhanced ultrafiltration (MEUF) is a surfactant-based separation process and it can remove heavy metal ions from aqueous stream effectively. However, it is necessary to recover and reuse surfactants for economic feasibility because surfactant is expensive. Foam fractionation was investigated for both anionic and cationic surfactant recovery. Chelating agent such as ethylenediaminetetraacetic acid (EDTA) was studied for the separation of heavy metals from surfactant solution. Anionic surfactants bound with heavy metals can be recovered by lowering pH (acidification). In this study, citric acid and imminodiacetic acid (IDA) were applied to release copper from sodium dodecyl sulfate (SDS) micellar solution and compared with EDTA. Precipitation of copper by ferricynide and sodium sulfide were also investigated. As a result, ca. 100 % of copper was released from SDS micellar solution by 5 mM of EDTA and citric acid. And 3.3 mM of ferricyanide formed precipitate with 82.7 % of copper. 5 mM of IDA and sodium sulfide released or formed precipitate 82.5 % and 58.9 % of copper, respectively. Citric acid is harmless to environments and ferricyanide precipitates with Cu easily. Therefore, it is considered that citric acid and ferricyanide have competiveness over a famous chelating agent, EDTA, for the separation of Cu from SDS solution.

  • PDF

Resorcinol-formaldehyde 수지에 의한 중금속 이온의 흡착과 농축 (Adsorption and Preconcentration of Some Heavy Metals by Resorcinol-Formaldehyde Resin)

  • 박찬일;차기원
    • 분석과학
    • /
    • 제11권3호
    • /
    • pp.174-178
    • /
    • 1998
  • Formaldehyde와 resorcinol을 반응시켜 chelating 수지를 제조하였다. 이 수지는 Pb(II)나 Ni(II)와 같은 전이금속에 대해 높은 흡착능을 나타내었다. Pb(II), Ni(II), Co(II), Fe(II)와 Zn(II)의 흡착과 탈착율을 batch법으로 구하였다. 이 수지의 중요한 특성은 금속 이온과 수지의 수소 이온간의 교환과정이다. 금속이온의 흡착과 탈착의 메카니즘은 수지의 작용기인 수소 이온의 탈착과 금속 이온간의 교환반응으로 생각된다. 이 수지를 이용하여 전이금속을 농축시키고, 다른 이온들로부터 Pb(II)를 분리하는데 적용해 보았다.

  • PDF

CSD 방법을 이용한 $La_2T_2O_7$ 박막제조 (Fabrication of $La_2T_2O_7$ Thin Film by Chemical Solution Deposition)

  • 장승우;우동찬;이희영;정우식
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1998년도 추계학술대회 논문집
    • /
    • pp.339-342
    • /
    • 1998
  • Ferroelectric L $a_2$ $Ti_2$ $O_{7}$(LTO) thin films were prepared by chemical solution deposition processes. Acetylacetone was used as chelating agent and nitric acid was added in the stock solution to control hydrolysis and condensation reaction rate. The LTO thin films were spin-coated on Pt/Ti/ $SiO_2$/(100)Si and Pt/Zr $O_2$/ $SiO_2$/(100)Si substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. The role of acetylacetone in Ti iso-propoxide stabilization by possibly substituting $O^{i}$Pr ligand was studied by H-NMR. B site-rich impurity phase, i.e. L $a_4$ $Ti_{9}$ $O_{24}$, was found after annealing, where its appearance was dependent on process temperature indicating the possible reaction with substrate. Dielectric and other relevant electrical properties were measured and the results were compared between modified sol-gel and MOD processes.s.s.

  • PDF

Arsenazo I-XAD-2 킬레이트수지를 이용한 U(VI) 이온의 분리 및 농축에 관한 연구 (A Study on the Sorption Behavior of U(VI) ion by Arsenazo I-XAD-2 Chelating Resin)

  • 이창헌;이시은;임재희;엄태윤;김인환;강창희;이원
    • 분석과학
    • /
    • 제6권5호
    • /
    • pp.489-499
    • /
    • 1993
  • Aresenazo I-XAD-2 킬레이수지를 합성하고 이 수지에 대한 U(VI) 이온의 흡착 거동을 조사 검토하였다. 킬레이트수지는 Arsenazo I 킬레이트제와 Amberlite XAD-2의 디아조늄 짝지움 반응에 의해서 합성하였으며 원소 분석법과 적외선 분광법으로 확인하였다. U(VI) 이온 흡착의 최적 조건을 찾기 위해서 pH, U(VI) 이온농도와 진탕 시간에 관해서 조사하였다. U(VI) 이온에 대한 킬레이트수지의 전체 흡착능은 pH 4.0~4.5 범위에서 0.39mmol U(VI)/g resin이었고, pH값이 증가함에 따라 흡착능이 증가하였다. Aresenazo I-XAD-2 킬레이트 수지에 대한 U(VI) 이온의 흡착 메카니즘은 U(VI) 이온과 $H^+$ 이온 사이의 경쟁반응임을 확인하였다. 컬럼법으로 구한 U(VI) 이온의 돌파점 부피와 전체 흡착능은 각각 600ml, 0.38mmol U(VI)/g resin이었다. 3M $HNO_3$와 3M $Na_2CO_3$의 탈착용액을 사용하여 구한 회수율은 90~96%였다. 따라서 본 연구에서는 합성한 Arsenaso I-XAD-2 킬레이트수지는 자연수 바닷물 중에 함유된 U(VI) 이온의 분리와 농축에 매우 유용함을 알았다.

  • PDF

Chemical cleaning effects on properties and separation efficiency of an RO membrane

  • Tu, Kha L.;Chivas, Allan R.;Nghiem, Long D.
    • Membrane and Water Treatment
    • /
    • 제6권2호
    • /
    • pp.141-160
    • /
    • 2015
  • This study aims to investigate the impacts of chemical cleaning on the performance of a reverse osmosis membrane. Chemicals used for simulating membrane cleaning include a surfactant (sodium dodecyl sulfate, SDS), a chelating agent (ethylenediaminetetraacetic acid, EDTA), and two proprietary cleaning formulations namely MC3 and MC11. The impact of sequential exposure to multiple membrane cleaning solutions was also examined. Water permeability and the rejection of boron and sodium were investigated under various water fluxes, temperatures and feedwater pH. Changes in the membrane performance were systematically explained based on the changes in the charge density, hydrophobicity and chemical structure of the membrane surface. The experimental results show that membrane cleaning can significantly alter the hydrophobicity and water permeability of the membrane; however, its impacts on the rejections of boron and sodium are marginal. Although the presence of surfactant or chelating agent may cause decreases in the rejection, solution pH is the key factor responsible for the loss of membrane separation and changes in the surface properties. The impact of solution pH on the water permeability can be reversed by applying a subsequent cleaning with the opposite pH condition. Nevertheless, the impacts of solution pH on boron and sodium rejections are irreversible in most cases.