• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.127-127
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• 2003

전자종이에 대한 관심이 높아지면서 전자잉크의 pigment 소재에 대한 연구가 최근 활발하게 이루어지고 있다. 많은 재료 중 TiO$_2$는 비표면적이 크고 열적안정성 및 명암도가 뛰어나 전자잉크 재료로 많은 장점을 지닌다. TiO$_2$ 나노 입자를 전자종이에 적용할 경우 우수한 디스플레이 구현을 위해 높은 전기영동 특성 및 분산 안정성이 요구되어진다 이를 위해 표면 개질된 나노 크기의 루틸상 TiO$_2$ 입자의 제조 및 분산에 대한 최적의 공정조건에 대해 연구하였다. 10$0^{\circ}C$ 이하의 저온에서 가열하여 균일하게 침전시키는 저온균일침전법(HPPLT)으로 루틸 결정상의 TiO$_2$ 나노입자를 제조하였다. 제조된 TiO$_2$ 나노 입자와 용매의 비중을 맞추기 위해 비중이 낮은 투명성 polymer로 코팅을 한 후 비중병을 이용해 비중을 확인하였다. 그 후 copolymer block을 가지는 분산제를 TiO$_2$ 입자 기준 0.5-5wt% 범위에서 저유전율을 가지는 다양한 유기용매에 첨가하여 최적의 분산 및 전기영동 조건을 찾았다. 실험을 통한 분산안정성 및 전기영동 특성 평가를 위해 ζ-potential analyzer와 입도 분석기를 이용하였고 코팅된 입자의 표면상태는 FT-IR을 통해 측정하였다.

• Journal of Advanced Marine Engineering and Technology
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• 제36권4호
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• pp.484-489
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• 2012

본 논문은 선박의 주 추진기관으로 사용가능한 육상 운송수단에 탑재되어있는 대형 디젤엔진에서 배출되는 입자상 물질과 질소산화물의 배출특성을 ESC mode에 적용시켜 분석하는데 초점을 두었다. 입자상 물질은 엔진의 고부하 영역에서 다량으로 배출되는 특성을 확인 할 수 있었으며 질소산화물의 경우 배기가스 온도 측정형태와 동일한 경향으로 배출되었다. 매연여과장치를 부착하여 입자상 물질의 배출특성을 분석한 결과 mode별 1/100~1/1,000배까지 저감되었다. 그러나 급격한 엔진 부하 변동 시 저감효과는 떨어졌으며 고속-고부하 영역에서는 매연여과장치내부의 온도상승으로 일부 재생현상이 발생하여 입자상 물질의 배출 증가 결과를 초래하는 현상이 발생하였다. 시험엔진에서 배출되는 입자상 물질의 입경분포를 분석한 결과 대부분 100nm 이하의 크기를 가지는 나노 입자가 배출되었으며 매연여과장치를 부착 및 탈착하여 측정한 결과 배출수준에는 차이가 있지만 입자상 물질의 입경분포는 비슷한 경향으로 분석되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• 전기화학회지
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• 제5권2호
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• pp.52-56
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• 2002

졸-겔법을 이용하여 주석산화물을 흑연입자 표면에 도포하고 $400-600^{\circ}C$에서 열처리하여 미세결정구조를 갖는 리튬이온 전지용 주석산화물 전극을 제조하였다. 도포 된 주석산화물의 양은 $2.25 wt\%\~11.1 wt\%$로 조절하여 실험한 결과 주석산 화물의 함량에 따라 방전용량이 증가하고 또한 초기의 비가역 용랑도 증가함을 알 수 있었다. 싸이클에 따른 주석 산화물 전극의 방전용량은 propylene carbonate(PC) 계 전해액에서도 초기 싸이클에서 350mAh/g 이상, 30 싸이클 후 에서는 300mAh/g을 나타낸 반면, 표면개질이 되지 않은 흑연전극의 경우에는 140mAh/g의 방전용량을 나타내었다. 충방전 속도를 C/5에서 C/2로 빠르게 했을 때 주석산화물 전극과 흑연전극의 방전용량은 초기 용량의 $92\%,\;77\%$로 각각 나타났다. 이러한 전극 특성의 향상은 주석산화물이 리튬이온과 반응하여 형성된 리튬 옥사이드$(Li_2O)$부동태 피막이 흑연전극의 탈리 현상을 막고 또한 환원된 주석이 흑연입자간의 전기전도를 원활하게 하여 전극의 전류분포를 향상시키기 때문인 것으로 해석되었다.

• 한국결정성장학회지
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• 제27권1호
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• pp.18-21
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• 2017

본 연구에서는 homogeneous precipitation method를 통하여 구형의 단분산(monodispersed) YAG : $Ce^{3+}$를 합성했다. 단분산 YAG : $Ce^{3+}$의 전구체를 합성하는 과정에서 aluminum ion들이 먼저 석출되어 aluminum 화합물을 형성하고 후에 yttrium 화합물들이 aluminum 화합물들의 표면에서 석출된다. 합성된 전구체를 파우더형태로 얻기 위해 건조과정을 거치는데, oven에서 건조했을 때 보다 동결건조기에서 건조했을 때 비교적 구형의 단분산 YAG : $Ce^{3+}$ 입자를 얻을 수 있었다. 하소 과정에서 공정을 진행하는 온도로서 $1100^{\circ}C$와 $1200^{\circ}C$를 비교해 보았다. 실험 결과 $1200^{\circ}C$의 온도로 상압에서 6시간 동안의 하소 과정을 진행하였을 때 400~500 nm 입자크기를 가진 단분산된 구형의 나노 YAG : $Ce^{3+}$ 입자가 합성되었다.

• Journal of Electrochemical Science and Technology
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• 제10권1호
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• pp.22-28
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• 2019

To maximize the oxygen evolution reaction (OER) in the electrolysis of water, nano-grade $IrO_2$ powder with a low specific surface was prepared as a catalyst for a solid polymer electrolyte (SPE) system, and a membrane electrode assembly (MEA) was prepared with a catalyst loading as low as $2mg\;cm^{-2}$ or less. The $IrO_2$ catalyst was composed of heterogeneous particles with particle sizes ranging from 20 to 70 nm, having a specific surface area of $3.8m^2g^{-1}$. The anode catalyst layer of about $5{\mu}m$ thickness was coated on the membrane (Nafion 117) for the MEA by the decal method. Scanning electron microscopy (SEM) and electrochemical impedance spectroscopy (EIS) confirmed strong adhesion at the interface between the membrane and the catalyst electrode. Although the loading of the $IrO_2$ catalyst was as low as $1.1-1.7mg\;cm^{-2}$, the SPE cell delivered a voltage of 1.88-1.93 V at a current density of $1A\;cm^{-2}$ and operating temperature of $80^{\circ}C$. That is, it was observed that the over-potential of the cell for the oxygen evolution reaction (OER) decreased with increasing $IrO_2$ catalyst loading. The electrochemical stability of the MEA was investigated in the electrolysis of water at a current density of $1A\;cm^{-2}$ for a short time. A voltage of ~2.0 V was maintained without any remarkable deterioration of the MEA characteristics.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.441-442
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• 2008

For this study, Yttrium aluminum garnet (YAG) particles co-doped with $Ce^{3+}$ and $Eu^{3+}$ were prepared via the combustion process using the 1:1 ratio of metal ions to reagents. The characteristics of the synthesized nano powder were investigated by means of X-ray diffraction (XRD), Scanning Electron Microscope (SEM), and photoluminescence (PL). The various YAG peaks, with the (420) main peak, appeared at all Eu concentrationin XRD patterns. The YAG phase crystallized with results that are in good agreement with the JCPDS diffraction file 33-0040. The SEM image showed that the resulting YAG:Ce,Eu powders had uniform sizes and good homogeneity. The grain size was about 50nm. The photoluminescence spectra of the YAG:Ce,Eu nanoparticles were investigated to determine the energy level of electron transition related to luminescence processes. It was composed a broad band of $Ce^{3+}$ activator into the weak line peak of $Eu^{3+}$ in YAG host. The PL intensity of $Ce^{3+}$ has the wavelengths of 480-650 nm and The PL intensity of $Eu^{3+}$ has main peak at 590nm.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.155-155
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• 2017

Surface modifications are commonly utilized to adjust the properties of the titanium and its alloy surface to the specific needs of the medical applications, but there are disadvantages such as poor osteoconductive properties and low adhesion of bone cell to implant surface. In order to improve these disadvantages, changes in surface properties have an important effect on osseointegration during implantation. In this paper we applied new technological method for improving a unique surface modification using the characteristic of an electrolytic Solution. Thus, in the electrolyte containing NaF in Na2SO4, TiO2 nanoporous was uniformly formed, and HAp nanoparticles were electrodeposited around the TiO2 nanopores, but in the electrolyte containing NH4F in (NH4)H2PO4, the coarse protrusions including HAp nano particles were regularly deposited onto the TiO2 barrier layer. The surface characteristics and the distributed elements and have been investigated by EDS analysis, and ultra-fine structure of surface are carried out using FE-SEM. To investigate the behavior of the anion, the analysis of chemical states was performed by XPS, and the narrow spectrums for Ti2P, Ca 2p, and P 2p seems to be almost similar depending on the characteristics of the electrolyte solution respectively. In addition, Ca 2p spectrum could be resolved into two peaks for Ca 2p3/2 and 2p1/2 at 347.4 and 351.3 eV, which are related to hydroxyapatite. And, the P peak can also be deconvoluted into two peaks for P1/2 and P3/2 levels with binding energy 134.2 and 133.4 eV, respectively. From the result of soaking test, the apatite morphologys were well-formed onto the modified surface according to the different conditions.

• 대한치과보철학회지
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• 제45권6호
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• pp.795-804
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• 2007

Statement of problem. Nano-scale calcium-phosphate coating on the anodizing titanium surface using ion beam-assisted deposition (IBAD) has been recently introduced to improve the early osseointegration. However, not much is known about their surface characteristics that have influence on tissue-implant interaction. Purpose. This study was aimed to investigate microtopography, surface roughness, surface composition, and wettability of the titanium surface modified by the anodic oxidation and calcium phosphate coating using IBAD. Material and methods. Commercially pure titanium disks were used as substrates. The experiment was composed of four groups. Group MA surfaces represented machined surface. Group AN was anodized surface. Group CaP/AN was anodic oxidized and calcium phosphate coated surfaces. Group SLA surfaces were sandblasted and acid etched surfaces. The prepared titanium discs were examined as follows. The surface morphology of the discs was examined using SEM. The surface roughness was measured by a confocal laser scanning microscope. Phase components were analyzed using thin-film x-ray diffraction. Wettability analyses were performed by contact angle measurement with distilled water, formamide, bromonaphtalene and surface free energy calculation. Results. (1) The four groups showed specific microtopography respectively. Anodized and calcium phosphate coated specimens showed multiple micropores and tiny homogeneously distributed crystalline particles. (2) The order of surface roughness values were, from the lowest to the highest, machined group, anodized group, anodized and calcium phosphate deposited group, and sandblasted and acid etched group. (3) Anodized and calcium phosphate deposited group was found to have titanium and titanium anatase oxides and exhibited calcium phosphorous crystalline structures. (4) Surface wettability was increased in the order of calcium phosphate deposited group, machined group, anodized group, sandblasted and acid etched group. Conclusion. After ion beam-assisted deposition on anodized titanium, the microporous structure remained on the surface and many small calcium phosphorous crystals were formed on the porous surface. Nanoscale calcium phosphorous deposition induced roughness on the microporous surface but hydrophobicity was increased.

• Composites Research
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• 제31권3호
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• pp.111-116
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• 2018

본 논문에서는 그래핀 표면에 무전해 도금을 통해 FeCoNi 자성 나노입자를 환원 성장시킨 후 이를 다양한 계면 활성제로 분산시켜 고분자 복합필름을 제조하였다. Pyridine 계면 활성제로 분산 시킨 후 제조한 복합필름은 가장 높은 분산성과 낮은 표면저항 값(351 Ohm/sq) 및 10 GHz 주파수에서 90% 이상의 전자파 차폐 능력을 보였다. 특히, 건조과정에서 pyridine의 증발은 내부 전도체 네트워크 형성과 분산성이 높은 필름 형성을 형성 할 수 있는 것으로 확인되었다.