• Title/Summary/Keyword: Carrier Barrier

Search Result 155, Processing Time 0.024 seconds

Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Concentration (채널도핑강도에 대한 이중게이트 MOSFET의 DIBL분석)

  • Jung, Hak-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.16 no.3
    • /
    • pp.579-584
    • /
    • 2012
  • In this paper, drain induced barrier lowering(DIBL) has been analyzed as one of short channel effects occurred in double gate(DG) MOSFET. The DIBL is very important short channel effects as phenomenon that barrier height becomes lower since drain voltage influences on potential barrier of source in short channel. The analytical potential distribution of Poisson equation, validated in previous papers, has been used to analyze DIBL. Since Gaussian function been used as carrier distribution for solving Poisson's equation to obtain analytical solution of potential distribution, we expect our results using this model agree with experimental results. The change of DIBL has been investigated for device parameters such as channel thickness, oxide thickness and channel doping concentration.

Analysis of Drain Induced Barrier Lowering for Double Gate MOSFET According to Channel Doping Intensity (채널도핑강도에 대한 DGMOSFET의 DIBL분석)

  • Jung, Hak-Kee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 2011.10a
    • /
    • pp.888-891
    • /
    • 2011
  • In this paper, drain induced barrier lowering(DIBL) has been analyzed as one of short channel effects occurred in double gate(DG) MOSFET. The DIBL is very important short channel effects as phenomenon that barrier height becomes lower since drain voltage influences on potential barrier of source in short channel. The analytical potential distribution of Poisson equation, validated in previous papers, has been used to analyze DIBL. Since Gaussian function been used as carrier distribution for solving Poisson's equation to obtain analytical solution of potential distribution, we expect our results using this model agree with experimental results. The change of DIBL has been investigated for device parameters such as channel thickness, oxide thickness and channel doping intensity.

  • PDF

Liquid Crystal Emulsions Containing High Content Ceramides for Improved Skin Barrier Functions

  • Lee, Jun Bae;Noh, Minjoo;Kim, Su Ji;Jang, Jihui
    • Korea Journal of Cosmetic Science
    • /
    • v.1 no.1
    • /
    • pp.19-29
    • /
    • 2019
  • In this work, we fabricated liquid crystal (LC) emulsions with fatty alcohol in order to stabilize high content ceramide in cosmetic formulation. We investigated the role of fatty alcohol and surfactant in the formation of higher order structure. As a result, we found that they play a crucial role to form higher order structure. SAXS study shows that ceramide can be incorporated up to 3% in cosmetic formulation with higher order structure and its stability was maintained up to 12 weeks at room temperature. According to WAXS study, the higher order structure can suppress the re-crystallization of ceramide in cosmetic formulation. Finally, we performed in vivo skin barrier recovery test for the damaged skin. LC emulsions with ceramide and O/W emulsions show significant effect in skin barrier recovery at D 1, D 2 and D 6 compared to the untreated condition. While only LC emulsions show significant skin recovery effect at D 14. We expect that LC emulsions are the promising skin carrier to stabilize ceramide and LC emulsions with ceramide can improve the skin barrier function.

Visualization and classification of hidden defects in triplex composites used in LNG carriers by active thermography

  • Hwang, Soonkyu;Jeon, Ikgeun;Han, Gayoung;Sohn, Hoon;Yun, Wonjun
    • Smart Structures and Systems
    • /
    • v.24 no.6
    • /
    • pp.803-812
    • /
    • 2019
  • Triplex composite is an epoxy-bonded joint structure, which constitutes the secondary barrier in a liquefied natural gas (LNG) carrier. Defects in the triplex composite weaken its shear strength and may cause leakage of the LNG, thus compromising the structural integrity of the LNG carrier. This paper proposes an autonomous triplex composite inspection (ATCI) system for visualizing and classifying hidden defects in the triplex composite installed inside an LNG carrier. First, heat energy is generated on the surface of the triplex composite using halogen lamps, and the corresponding heat response is measured by an infrared (IR) camera. Next, the region of interest (ROI) is traced and noise components are removed to minimize false indications of defects. After a defect is identified, it is classified as internal void or uncured adhesive and its size and shape are quantified and visualized, respectively. The proposed ATCI system allows the fully automated and contactless detection, classification, and quantification of hidden defects inside the triplex composite. The effectiveness of the proposed ATCI system is validated using the data obtained from actual triplex composite installed in an LNG carrier membrane system.

Study on GZO Thin Films as Insulator, Semiconductor and Conductor Depending on Annealing Temperature (열처리 온도에 따라서 절연체, 반도체, 전도체의 특성을 갖는 GZO 박막의 특성연구)

  • Oh, Teresa
    • Korean Journal of Materials Research
    • /
    • v.26 no.6
    • /
    • pp.342-346
    • /
    • 2016
  • To observe the bonding structure and electrical characteristics of a GZO oxide semiconductor, GZO was deposited on ITO glasses and annealed at various temperatures. GZO was found to change from crystal to amorphous with increasing of the annealing temperatures; GZO annealed at $200^{\circ}C$ came to have an amorphous structure that depended on the decrement of the oxygen vacancies; increase the mobility due to the induction of diffusion currents occurred because of an increment of the depletion layer. The increasing of the annealing temperature caused a reduction of the carrier concentration and an increase of the bonding energy and the depletion layer; therefore, the large potential barrier increased the diffusion current dna the Hall mobility. However, annealing temperatures over $200^{\circ}C$ promoted crystallinity by the defects without oxygen vacancies, and then degraded the depletion layer, which became an Ohmic contact without a potential barrier. So the current increased because of the absence of a potential barrier.

Electrical Properties of Pr-doped ZnO Varistors (Pr-첨가 ZnO 바리스터의 전기적 특성)

  • 곽민환;이상기;조성걸
    • Journal of the Korean Ceramic Society
    • /
    • v.34 no.12
    • /
    • pp.1275-1281
    • /
    • 1997
  • ZnO varistors containing 5.0 at% Co3O4 and Pr6O11, ranging from 0.1 to 1.0 at%, were sintered at 130$0^{\circ}C$ and 135$0^{\circ}C$. The I-V characteristics and nonlinear coefficients of the specimens were investigated with respect to Pr addition and sintering temperature. In general the specimens sintered at 130$0^{\circ}C$ showed better varistor characteristic than those fired at 135$0^{\circ}C$, which seemed to be related with the liquid phase formation during sintering. The barrier heights obtained from C-V relations, 0.29-1.36 eV, were different from those acquired using resistivity-temperature plots measured at low voltage per grain boundary. Therefore the estimation of potential barrier heights using C-V relations is better suited for the specimens prepared in this study. The carrier densities obtained using C-V relations were ~1018 cm-3.

  • PDF

Capacitance-Voltage (C-V) Characteristics of Cu/n-type InP Schottky Diodes

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
    • /
    • v.17 no.5
    • /
    • pp.293-296
    • /
    • 2016
  • Using capacitance-voltage (C-V) and conductance-voltage (G/ω-V) measurements, the electrical properties of Cu/n-InP Schottky diodes were investigated. The values of C and G/ω were found to decrease with increasing frequency. The presence of interface states might cause excess capacitance, leading to frequency dispersion. The negative capacitance was observed under a forward bias voltage, which may be due to contact injection, interface states or minority-carrier injection. The barrier heights from C-V measurements were found to depend on the frequency. In particular, the barrier height at 200 kHz was found to be 0.65 eV, which was similar to the flat band barrier height of 0.66 eV.

Computer Analysis of Semiconductor Barrier Characteristics(I) (반도체 접촉장벽 특성의 컴퓨터해석(I))

  • 박종우;황금찬;박창엽
    • The Transactions of the Korean Institute of Electrical Engineers
    • /
    • v.32 no.6
    • /
    • pp.205-210
    • /
    • 1983
  • This paper presents a steady-state computer solution of the fundamental semiconductor one-dimensional transport equations, describing a single (metal-semiconductor) contact device, involving only one type of charge carrier. The computations are conveniently made by the

  • PDF

Approaches to Reduce the Contact Resistance by the Formation of Covalent Contacts in Graphene Thin Film Transistors

  • Na, Youngeun;Han, Jaehyun;Yeo, Jong-Souk
    • Applied Science and Convergence Technology
    • /
    • v.26 no.4
    • /
    • pp.55-61
    • /
    • 2017
  • Graphene, with a carrier mobility achieving up to $140,000cm^2/Vs$ at room temperature, makes it an ideal material for application in semiconductor devices. However, when the metal comes in contact with the graphene sheet, an energy barrier forms at the metal-graphene interface, resulting in a drastic reduction of the carrier mobility of graphene. In this review, the various methods of forming metal-graphene covalent contacts to lower the contact resistance are discussed. Furthermore, the graphene sheet in the area of metal contact can be cut in certain patterns, also discussed in this review, which provides a more efficient approach to forming covalent contacts, ultimately reducing the contact resistance for the realization of high-performance graphene devices.

THE EFFECT OF DOPANT OUTDIFFUSION ON THE NEUTRAL BASE RECOMBINATION CURRENT IN Si/SiGe/Si HETEROJUNCTION BIPOLAR TRANSISTORS

  • Ryum, Byung-R.;Kim, Sung-Ihl
    • ETRI Journal
    • /
    • v.15 no.3
    • /
    • pp.61-69
    • /
    • 1994
  • A new analytical model for the base current of Si/SiGe/Si heterojunction bipolar transistors(HBTs) has been developed. This model includes the hole injection current from the base to the emitter, and the recombination components in the space charge region(SCR) and the neutral base. Distinctly different from other models, this model includes the following effects on each base current component by using the boundary condition of the excess minority carrier concentration at SCR boundaries: the first is the effect of the parasitic potential barrier which is formed at the Si/SiGe collector-base heterojunction due to the dopant outdiffusion from the SiGe base to the adjacent Si collector, and the second is the Ge composition grading effect. The effectiveness of this model is confirmed by comparing the calculated result with the measured plot of the base current vs. the collector-base bias voltage for the ungraded HBT. The decreasing base current with the increasing the collector-base reverse bias voltage is successfully explained by this model without assuming the short-lifetime region close to the SiGe/Si collector-base junction, where a complete absence of dislocations is confirmed by transmission electron microscopy (TEM)[1].The recombination component in the neutral base region is shown to dominate other components even for HBTs with a thin base, due to the increased carrier storage in the vicinity of the parasitic potential barrier at collector-base heterojunction.

  • PDF