• Title/Summary/Keyword: Carbon ion beam

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A New Method for Measuring Residual Stress in Micro and Nano Films (마이크로 및 나노 박막의 잔류응력을 측정하기위한 새로운 방법)

  • Kang, Ki-Ju;Evans, Anthony G.
    • Proceedings of the KSME Conference
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    • 2003.04a
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    • pp.438-444
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    • 2003
  • A new method to measure residual stress in micron and nano scale films is described. In the theory it is based on Linear Elastic Fracture Mechanics. And in the techniques it depends on the combined capability of the focused ion beam (FIB) imaging system and of high-resolution digital image correlation (DIC) software. The method can be used for any film material (whether amorphous or crystalline) without thinning the substrate. In the method, a region of the film surface is highlighted and scanning electron images of that region taken before and after a long slot, depth a, is introduced using the FIB. The DIC software evaluates the displacement of the surface normal to the slot due to the stress relaxation by using features on the film surface. To minimize the influence of signal noise and rigid body movement, not a few, but all of the measure displacements are used for determining the real residual stress. The accuracy of the method has been assessed by performing measurements on a nano film of diamond like carbon (DLC) on glass substrate and on micro film of aluminum oxide thermally grown on Fecrally substrate. It is shown that the new method determines the residual stress ${\sigma}_R=-1.73$ GPa for DLC and ${\sigma}_R=-5.45$ GPa for the aluminum oxide, which agree quite well with ones measured independently.

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Electrical Properties and Synthsis of Large Area Conductive Nano Carbon Films by Linear Ion Beam Source

  • Yeo, Gi-Ho;Sin, Ui-Cheol;Yu, Jae-Mu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.220.1-220.1
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    • 2014
  • 본 연구에서는 PECVD 공법 중에 이온화 에너지가 높은 선형이온빔 소스를 이용하여 고온에서 전도성 카본박막을 코팅하였다. 카본 박막 코팅을 위한 Precursor는 $C_2H_2$ gas를 이용하였으며, 온도에 따른 카본 박막의 전기적 특성 및 두께에 따른 카본 박막 성장 구조를 분석하였다. 카본 박막의 전기적 특성은 Interfacial contact resistance (ICR) 방법으로 측정하였으며, 접촉 저항 측정을 위한 모재는 SUS316L stainless steel을 사용하였고 카본 박막 성장 구조 분석을 위해서는 폴리싱된 Si-wafer를 사용하였다. 선형이온빔 소스를 이용하여 상온에서 증착한 카본 코팅의 접촉저항 값은 50 nm 코팅 두께에서 $660m{\Omega}cm^2@10kgf/cm^2$으로 비정질상의 특성을 나타냈으며, 고온에서는 $14.8m{\Omega}cm^2@10kgf/cm^2$으로 온도가 증가함에 따라 비정질상의 카본 박막이 전도성을 가지는 카본박막으로의 성장을 확인할 수 있었다. 또한 전도성 카본 박막의 성장 구조 분석은 FE-SEM 및 Raman spectrum 분석을 통해 확인하였으며, 그 결과 코팅 두께가 증가할수록 카본 입자들은 수nm에서 약 150 nm의 카본 cluster를 형성하며 성장하였다. 이때 전도성 카본 박막의 두께에 따른 접촉저항의 값은 고온 조건에서 카본 박막의 두께가 약 100 nm일 때, $12.1m{\Omega}cm^2@10kgf/cm^2$의 가장 낮은 값을 가졌다. 위의 결과를 경제성이 아주 우수한 대면적 전도성 나노 카본 박막의 상용화 가능성이 높아질 것으로 기대된다.

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Modulated Sputtering System (MSS)의 특성 분석 및 박막 증착

  • Kim, Dae-Cheol;Kim, Tae-Hwan;Kim, Yong-Hyeon;Han, Seung-Hui;Kim, Yeong-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.488-488
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    • 2013
  • 일반적으로 sputtering 방식을 이용한 박막 증착 방법은 장치가 간단하고 고품질의 박막이나 균일한 박막을 만들 수 있는 장점이 있어 널리 사용된다. 본 연구에서는 기존의 sputtering 방식에 Modulation technology를 적용하고자 한다. Modulation technology를 이용하여 전원의 pulse on 시에는 일반적인 sputter 방식으로 기판에 박막을 증착하고 pulse off 시에는 양의 전압을 인가하여 이온빔을 발생시킨 후 기판에 입사시키는 방식을 적용하여 박막 형성의 특성을 향상시키고자한다. 이는 고온의 heater 및 이온빔이나 레이저, 플라즈마 소스 등의 추가적인 에너지원의 장치가 필요 없이 고품질의 박막의 특성을 향상시키는 기대 효과가 있다. Modulated Sputtering System (MSS)에 인가되는 전압과 전류의 특성을 관찰하였으며 MSS에 인가하는 전압과 frequency, 그리고 duty cycle 변화에 따른 이온 에너지 분포를 에너지 분석기를 통해 측정하였다. 또한 Langmuir probe를 이용한 afterglow plasma 상태에서의 이온전류를 측정하였다. 그리고, MSS 이용하여 Ti 박막을 증착하였으며 박막의 특성을 분석하기 위하여 a-step, SEM, XRD, AFM을 이용하여 두께, 결정성장면, 표면 거칠기를 측정하였다. 측정 결과 기판에 입사되는 양이온의 에너지가 증가함에 따라 (002) 결정면 방향에서 (100) 결정면 방향으로 증착되고 표면 거칠기가 낮아짐을 측정하였다. 또한 Graphite 타겟을 이용한 carbon 박막을 증착하였으며 박막의 특성을 분석하기 위하여 Raman을 이용한 분석 결과 양이온의 에너지가 증가함에 따라 박막내의 sp3 함유량이 변화함을 측정하였다.

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Measurement of hydrogen content in a-C:H films prepared by ECR-PECVD (ECR-PECVD 방법으로 증착된 a-C:H 박막의 수소함량 측정)

  • 손영호;정우철;정재인;김인수;배인호
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.119-126
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    • 2001
  • Hydrogenated amorphous carbon (a-C:H) films were deposited by ECR-PECVD (electron cyclotron resonance-plasma enhanced chemical vapor deposition) method with deposition conditions such as ECR plasma source power, gas composition of methane and hydrogen, deposition time and substrate bias voltage. The hydrogen content in the films has been measured by ERDA (elastic recoil detection analysis) using 2.5 MeV $He^{++}$ ion beam. From the results of AES (Auger electron spectroscopy), RBS (Rutherford backscattering spectrometry) and ERDA, the composition elements of deposited film were confirmed the carbon atom and the hydrogen atom. It was observed by FTIR (Fourier transform infrared) that the hydrogen contents in the film varied according to the deposition conditions. In deposition condition of substrate bias voltage, the hydrogen contents were decreased remarkably because the amount of dehydrogenation in films was increased as the substrate bias voltage increased. In the rest deposition conditions, the hydrogen contents in the film were measured in the range 45~55%.

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Increased Sensitivity of Carbon Nanotube Sensors by Forming Rigid CNT/metal Electrode

  • Park, Dae-Hyeon;Jeon, Dong-Ryeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.348-348
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    • 2011
  • Carbon nanotube (CNT) field effect transistors and sensors use CNT as a current channel, of which the resistance varies with the gate voltage or upon molecule adsorption. Since the performance of CNT devices depends very much on the CNT/metal contact resistance, the CNT/electrode contact must be stable and the contact resistance must be small. Depending on the geometry of CNT/electrode contact, it can be categorized into the end-contact, embedded-contact (top-contact), and side-contact (bottom-contact). Because of difficulties in the sample preparation, the end-contact CNT device is seldom practiced. The embedded-contact in which CNT is embedded inside the electrode is desirable due to its rigidness and the low contact resistance. Fabrication of this structure is complicated, however, because each CNT has to be located under a high-resolution microscope and then the electrode is patterned by electron beam lithography. The side-contact is done by depositing CNT electrophoretically or by precipitating on the patterned electrode. Although this contact is fragile and the contact resistance is relatively high, the side-contact by far has been widely practiced because of its simple fabrication process. Here we introduce a simple method to embed CNT inside the electrode while taking advantage of the bottom-contact process. The idea is to utilize a eutectic material as an electrode, which melts at low temperature so that CNT is not damaged while annealing to melt the electrode to embed CNT. The lowering of CNT/Au contact resistance upon annealing at mild temperature has been reported, but the electrode in these studies did not melt and CNT laid on the surface of electrode even after annealing. In our experiment, we used a eutectic Au/Al film that melts at 250$^{\circ}C$. After depositing CNT on the electrode made of an Au/Al thin film, we annealed the sample at 250$^{\circ}C$ in air to induce eutectic melting. As a result, Au-Al alloy grains formed, under which the CNT was embedded to produce a rigid and low resistance contact. The embedded CNT contact was as strong as to tolerate the ultrasonic agitation for 90 s and the current-voltage measurement indicated that the contact resistance was lowered by a factor of 4. By performing standard fabrication process on this CNT-deposited substrate to add another pair of electrodes bridged by CNT in perpendicular direction, we could fabricate a CNT cross junction. Finally, we could conclude that the eutectic alloy electrode is valid for CNT sensors by examine the detection of Au ion which is spontaneously reduced to CNT surface. The device sustatined strong washing process and maintained its detection ability.

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Controlled Formation of Surface Wrinkles and Folds on Poly (dimethylsiloxane) Substrates Using Plasma Modification Techniques

  • Nagashima, So;Hasebe, Terumitsu;Hotta, Atsushi;Suzuki, Tetsuya;Lee, Kwang-Ryeol;Moon, Myoung-Woon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.223-223
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    • 2012
  • Surface engineering plays a significant role in fabricating highly functionalized materials applicable to industrial and biomedical fields. Surface wrinkles and folds formed by ion beam or plasma treatment are buckling-induced patterns and controlled formation of those patterns has recently gained considerable attention as a way of creating well-defined surface topographies for a wide range of applications. Surface wrinkles and folds can be observed when a stiff thin layer attached to a compliant substrate undergoes compression and plasma treatment is one of the techniques that can form stiff thin layers on compliant polymeric substrates, such as poly (dimethylsiloxane) (PDMS). Here, we report two effective methods using plasma modification techniques for controlling the formation of surface wrinkles and folds on flat or patterned PDMS substrates. First, we show a method of creating wrinkled diamond-like carbon (DLC) film on grooved PDMS substrates. Grooved PDMS substrates fabricated by a molding method using a grooved master prepared by photolithography and a dry etching process were treated with argon plasma and subsequently coated with DLC film, which resulted in the formation of wrinkled DLC film aligning perpendicular to the steps of the pre-patterned ridges. The wavelength and the amplitude of the wrinkled DLC film exhibited variation in the submicron- to micron-scale range according to the duration of argon plasma pre-treatment. Second, we present a method for controlled formation of folds on flat PDMS substrates treated with oxygen plasma under large compressive strains. Flat PDMS substrates were strained uniaxially and then treated with oxygen plasma, resulting in the formation of surface wrinkles at smaller strain levels, which evolved into surface folds at larger strain levels. Our results demonstrate that we can control the formation and evolution of surface folds simply by controlling the pre-strain applied to the substrates and/or the duration of oxygen plasma treatment.

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Fabrication of Photo Sensitive Graphene Transistor Using Quantum Dot Coated Nano-Porous Graphene

  • ;Lee, Jae-Hyeon;Choe, Sun-Hyeong;Im, Se-Yun;Lee, Jong-Un;Bae, Yun-Gyeong;Hwang, Jong-Seung;Hwang, Seong-U;Hwang, Dong-Mok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.658-658
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    • 2013
  • Graphene is an attractive material for various device applications due to great electrical properties and chemical properties. However, lack of band gap is significant hurdle of graphene for future electrical device applications. In the past few years, several methods have been attempted to open and tune a band gap of graphene. For example, researchers try to fabricate graphene nanoribbon (GNR) using various templates or unzip the carbon nanotubes itself. However, these methods generate small driving currents or transconductances because of the large amount of scattering source at edge of GNRs. At 2009, Bai et al. introduced graphene nanomesh (GNM) structures which can open the band gap of large area graphene at room temperature with high current. However, this method is complex and only small area is possible. For practical applications, it needs more simple and large scale process. Herein, we introduce a photosensitive graphene device fabrication using CdSe QD coated nano-porous graphene (NPG). In our experiment, NPG was fabricated by thin film anodic aluminum oxide (AAO) film as an etching mask. First of all, we transfer the AAO on the graphene. And then, we etch the graphene using O2 reactive ion etching (RIE). Finally, we fabricate graphene device thorough photolithography process. We can control the length of NPG neckwidth from AAO pore widening time and RIE etching time. And we can increase size of NPG as large as 2 $cm^2$. Thin CdSe QD layer was deposited by spin coatingprocess. We carried out NPG structure by using field emission scanning electron microscopy (FE-SEM). And device measurements were done by Keithley 4200 SCS with 532 nm laser beam (5 mW) irradiation.

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A Study on the Formation of Detection Electrode for the IED Removal Robot by Using A Photosensitive CNT Paste (감광성 CNT 페이스트를 이용한 IED 폭발물 제거로봇 탐지전극 형성에 관한 연구)

  • Kwon, Hye Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.4
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    • pp.231-237
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    • 2018
  • In this study, two important requirements for the home production of a robot to detect and remove improvised explosive devices (IEDs) are presented in terms of the total cost for robot system development and the performance improvement of the mine detection technology. Firstly, cost analyses were performed in order to provide a reasonable solution following an engineering estimate method. As a result, the total cost for a mass production system without the mine detection system was estimated to be approximately 396 million won. For the case including the mine detection system, the total cost was estimated to be approximately 411 million won, in which labor costs and overhead charges were slightly increased and the material costs for the mine detection system were negligible. Secondly, a method for fabricating the carbon nanotube (CNT) based gas detection sensor was studied. The detection electrodes were formed by a photolithography process using a photosensitive CNT paste. As a result, this method was shown to be a scalable and expandable technology for producing excellent mine detection sensors. In particular, it was found that surface treatments by using adhesive taping or ion beam bombardment methods are effective for exposing the CNTs to the ambient air environment. Fowler-Nordheim (F-N) plots were obtained from the electron-emission characteristics of the surface treated CNT paste. The F-N plot suggests that sufficient electrons are available for transport between CNT surfaces and chemical molecules, which will make an effective chemiresistive sensor for the advanced IED detection system.

Dosimetric effects of couch attenuation and air gaps on prone breast radiation therapy (Prone Breast Phantom을 이용한 couch 산란영향 평가)

  • Kim, Min Seok;Jeon, Soo Dong;Bae, Sun Myeong;Baek, Geum Mun;Song, Heung Gwon
    • The Journal of Korean Society for Radiation Therapy
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    • v.29 no.2
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    • pp.43-51
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    • 2017
  • Purpose: The purpose of this study is to evaluate the dosimetric effects of couch attenuation and air gaps using 3D phantom for prone breast radiation therapy. Materials and method: A 3D printer(Builder Extreme 1000) and computed tomography (CT) images of a breast cancer patient were used to manufacture the customized breast phantom. Eclipse External Beam Planning 13.6 (Varian Medical Systems Palo Alto, CA, USA) was used to create the treatment plan with a dose of 200 cGy per fraction with 6 MV energy. The Optically Stimulated Luminescence Detector(OSLD) was used to measure the skin dose at four points (Med 1, Med 2, Lat 1, Lat 2) on the 3D phantom and ion-chamber (FC65-G) were used to perform the in-vivo dosimetry at the two points (Anterior, Posterior). The Skin dose and in-vivo dosimetry were measured with reference air gap (3 cm) and increased air gaps (1, 2, 3, 4, 5, 6 cm) from reference distance between the couch and 3D phantom. Results: As a result, measurement for the skin dose at lateral point showed a similar value within ${\pm}4%$ compared to the plan. While the air gap increased, skin dose at medial 1 was reduced. And it was also reduced over 7 % when the air gap was more than 3 cm compared to radiation therapy plan. At medial 2 it was reduced over 4 % as well. The changes of dose from variety of the air gap showed similar value within ${\pm}1%$ at posterior. As the air gap was increased, the dose at anterior was also increased and it was increased by 1 % from the air gap distance more than 3 cm. Conclusion: Dosimetrical measurement using 3D phantom is very useful to evaluate the dosimetric effects of couch attenuation and air gaps for prone breast radiation therapy. And it is possible to reduce the skin dose and increase the accuracy of the radiation dose delivery by appling the optimized air gap.

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The Removal of Organics and Nitrogen with Step Feed Ratio Change into the Anoxic and Anaerobic reactor in Advanced Sewage Treatment process Using Nonsurface-modified and Surface-modified Media Biofilm (비개질/개질 생물막을 이용한 오수고도처리공정에서 혐기조와 무산소조의 원수 분배율에 따른 유기물 및 질소 제거)

  • Seon, Yong-Ho
    • KSBB Journal
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    • v.20 no.4
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    • pp.253-259
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    • 2005
  • This study was accomplished using attached $A^2/O$ process that contains nonsurface-modified and surface-modified polyethylene media inside the Anaerobic/Anoxic, Oxic tank, respectively. We could make the hydrophobic polyethylene media have hydrophilic characteristics by radiating ion beam on the surface of the media. The objectives of this study is to investigate the removal efficiencies of the organics and nitrogen when the step feed ratio of raw wastewater into anaerobic and anoxic tank is changed. In this case, we assumed that the denitrification rate can be improved because the nitrifiers in anoxic tank can perform denitrification using RBDCOD instead of artificial carbon sources (for example, methanol, etc.). The wastewater injection rate into anaerobic/anoxic tank was set up by the ratio of 10 : 0, 9 : 1, 8 : 2, 6 : 4, and the results of BOD removal efficiency showed similar trends with $93.3\%,\;92.6\%,\;92.4\%\;and\;91.6\%$, respectively. But the BOD removal efficiency (utilization of the organics) in the anoxic tank was in the order of 9 : 1 $(84.8\%)$, 10 : 0 $(77.0\%)$, 8 : 2 $(75.3\%)$, and 6 : 4 $(61.1\%)$. The T-N removal efficiency was most high when the ratio is 9 : 1 $(67.4\%)$, and other conditions, 10 : 0, 8 : 2, 6 : 4, showed $61.3(\%),\;60.7\%,\;55.5\%$, respectively; the ratio 6 : 4 was found to be lowest T-N removal efficiency, lower than the ratio 9 : 1 by $12\%$. Though the nitrification rate of the ratio 10 : 0, 9 : 1, and 8 : 2 showed similar levels, the ratio 6 : 4 showed considerable inhibition of nitrification, ammonia was the great portion of the effluent T-N. The advantages of this process is that this process is cost-saving, and non-toxic methods than injecting the artificial carbon source.