• Korean Journal of Materials Research
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• v.23 no.9
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• pp.537-542
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• 2013

Two types of Tb- and Na-substituted green phosphors $Ca_{(1-1.5x)}WO_4:Tb_x^{3+}$: and $Ca_{(1-2x)}WO_4:Tb_x^{3+},Na_x^+$ were synthesized with various x values, using a solid-state reaction. The former phosphors contained both substitutional and vacancy point defects, while the later had only substitutional defects. X-ray diffraction results showed that the main diffraction peak, (112), was centered at $2{\theta}=28.72^{\circ}$ and indicated that there was no basic structural deformation caused by substitutions or vacancies. The photoluminescence emission and photoluminescence excitation spectra revealed the optical properties of trivalent terbium ions, $Tb^{3+}$. Typical transitions, $^5D_3{\rightarrow}^7F_6,\;^7F_5,\;^7F_4$ and $^5D_4{\rightarrow}^7F_6,\;^7F_5,\;^7F_4,\;^7F_3$, and cross relaxations were observed. Subtle differences in the photoluminescence of green phosphors were observed as a result of the point defects. The FT-IR spectra indicated that some of the ungerade vibrational modes had shifted positions and changed shapes, spreading out over a wide range of frequencies. This change can be attributed to the different masses of $Tb^{3+}$ and $Na^+$ ions and $V_{Ca}$" vacancies compared to $Ca^{2+}$ ions. The gerade normal modes of the Raman spectra exhibited subtle differences resulting from point defects in $Ca_{(1-1.5x)}Tb_xWO_4$ and $Ca_{(1-2x)}Tb_xNa_xWO_4$.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.276-277
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• 2006

In order to accelerate the sintering of Al-Bronze powder covered with passive oxide film, we focused on the way to add Al-Ca fluoride consisting of $AlF_3$ and $CaF_2$, examined the effect of the $CaF_2$ mixing rate in Al-Ca fluoride, the amount of the added Al-Ca fluoride and the sintering temperature on sintering properties of Al-Bronze powder and considered the mechanism of the sintering acceleration. Al-Bronze powder was sintered most effectively by adding Al-Ca fluoride with the $CaF_2$ mixing rate of 20mass%. If the amount of added fluoride was over 0.05mass% and the sintering temperature was over 1123K, the sintering acceleration of the Al-Bronze powder appears. Regarding the mechanism of the sintering acceleration, it was presumed that $Al_2O_3$ film on the surface of the Al-Bronze particles was removed in the process of the formation of gaseous AlOF by the reaction with $AlF_3$, and the reaction was accelerated further by the presence of the liquid phase which is formed in Al-Ca fluoride.

• Korean Journal of Materials Research
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• v.9 no.6
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• pp.622-629
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• 1999

Effects of the fluorination in the $K_2$TiF\ulcorner solution and in-situ KF+ KOH electrolyte on the electrochemical charge-discharge properties of CaNi\ulcorner and the Mg-CaNi\ulcorner electrodes were investigated. In-situ fluorination in the KF+ KOH electrolyte compared with pre-fluorination in the$ K_2$TiF\ulcorner solution could improve the electrochemical cycling durability of CaNi\ulcorner and MG-CaN\ulcorner electrodes. The fluorinated layer on the alloy surface by pre-fluorination to improve the activity and anti-corrosion of the electrodes was dissolved in the pure KOH electrolyte during the cycling. The fluorinated layer was formed continuously on the surface of the electrode by thee2N KF addition in the 6N KOH electrolyte. The excess F\ulcorner ion addition in KOH electrolyte could improve the electrochemical cycling durability of CaNi\ulcorner and Mg-CaNi\ulcorner electrode. But, in case of MG-CaNi\ulcorner electrode, the discharge capacity of the electrode was reduced and the poor cycling property was shown with increasing of the MG process times.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.06a
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• pp.239-242
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• 1998

Ca $F_2$ films have superior gate insulator properties than conventional gate insulator such as $SiO_2$, Si $N_{x}$, $SiO_{x}$, and T $a_2$ $O_{5}$ to the side of lattice mismatch between Si substrate and interface trap charge density( $D_{it}$). Therefore, this material is enable to apply Thin Film Transistor(TFT) gate insulator. Most of gate oxide film have exhibited problems on high trap charge density, interface state in corporation with O-H bond created by mobile hydrogen and oxygen atom. This paper performed Ca $F_2$ property evaluation as MIM, MIS device fabrication. Ca $F_2$ films were deposited at the various substrate temperature using a thermal evaporation. Ca $F_2$ films was grown as polycrystalline film and showed grain size variation as a function of substrate temperature and RTA post-annealing treatment. C-V, I-V results exhibit almost low $D_{it}$(1.8$\times$10$^{11}$ $cm^{-1}$ /le $V^{-1}$ ) and higher $E_{br}$ (>0.87MV/cm) than reported that formerly. Structural analysis indicate that low $D_{it}$ and high $E_{br}$ were caused by low lattice mismatch(6%) and crystal growth direction. Ca $F_2$ as a gate insulator of TFT are presented in this paper paperaper

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.36 no.2
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• pp.197-202
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• 2023

Calcium fluoride (CaF₂) single crystal is applied to numerous industrial applications, especially for optical uses. To have excellent optical transmission properties, however, CaF₂ crystals should be carefully fabricated through liquid-phase crystal growth techniques. In this study, as one of the early stage research activities to grow CaF₂ crystals with a good transmittance at the ultraviolet wavelength range, computational thermodynamic models were provided to deepen the understanding of the crystal growing processes of CaF₂ under various conditions. To remove point defects and oxygen impurities in the grown CaF₂ crystals, the system was thermodynamically evaluated to get optimal process conditions. From the reviews of previous experimental studies, computational thermodynamic approaches were found to be an effective and powerful tool to understand the meaning of the crystal growth processes and to obtain optimal process conditions.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.06a
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• pp.145-148
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• 1998

Fluoride({{{{ { CaF}_{2 } }}}}) films exhibited a cubic structure with similar lattice constant to that of Si and have sufficient breakdown electric field as gate dielectric material. Therefore, {{{{ { CaF}_{2 } }}}} are expected to replace conventional insulator such {{{{ { SiO}_{ 2},{Ta}_{2}{O}_{ 2} and{Al}_{2}{O}_{5}. However, {CaF}_{2}}}}} films showed hystereisis properties due to mobile charges in the film. To solve this problem we performed thermal treatment and achieves field. C-v results indicate a reduced hystereisis window of {{{{ }}}}ΔV =0.2v, LOW INTERFACE STATE {{{{{D}_{it}=2.0 TIMES {10}^{11}{cm}^{-1}{eV}^{-1}}}}} in midgap, and good WIS diode properties. We observed a preferential crystallization of(200) plane from XRD analysis. RTA treatment effects on various material properties of {{{{{CaF}_{2}}}}} are presented in this paper.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2002.11a
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• pp.59-63
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• 2002

Zinc-Magnesium borosilicate 유리에 CaF$_2$입자를 충진재로 첨가하여 혼합체의 소결거동, 결정화 거동 및 최종 소결체의 마이크로파 유전특성을 측정하였다. CaF$_2$첨가는 유리의 점도를 감소 시켜 결정화 및 수축개시온도를 감소시켰다. 이러한 CaF$_2$의 최대 첨가량은 주어진 유리조성에 있어서 15 vol. % 이었다. 이러한 소결성 및 결정화 개시온도의 변화는 모 유리와 CaF$_2$의 반응에 의한 결과로 보여지며 이 반응은 결정상의 변화나 이차상의 형성에는 영향을 미치지 않았다. 따라서 유전율 6.1에 품질계수가 40000GHz 인 CaF$_2$입자를 15 vol.% 첨가시 유전상수는 7.1에서 5.6로 품질계수는 2200에서 5000GHz로 유전특성이 향상되었고 소결온도는 75$0^{\circ}C$이었다.

• The Journal of the Korea institute of electronic communication sciences
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• v.11 no.3
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• pp.293-302
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• 2016

In this paper we analyze the CA formed by combining the uniform 102 CA $\mathbb{C}_u$ and the m-cell 90/150 hybrid CA $\mathbb{C}_h$ whose characteristic polynomial is $(x+1)^m$. We analyze cycle structures of complemented group CA derived from $\mathbb{C}_u$ and propose a condition of complemented CA dividing the entire state space into smaller cycles of equal lengths. And we analyze the cycle structure of complemented group CA $\mathbb{C}^{\prime}$ derived from the CA $\mathbb{C}$ formed by combining $\mathbb{C}_u$ and $\mathbb{C}_h$ with complement vector F such that $(T+I)^{q-1}F{\neq}0$ where $(x+1)^q$ is the minimal polynomial of $\mathbb{C}$.

• Journal of the Korean Ceramic Society
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• v.34 no.2
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• pp.163-170
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• 1997

The retarding effects of MgSiF6.6H2O on the hydration of portland cement were studied. The setting time, flow value and compressive strength of mortar were measured and the mechanism of retardation was also studied by ion concentration in solution, SEM, BET, and X-ray diffraction. The results are as follows ; 1. Setting time was delayed by the addition of MgSiF6.6H2O. 2. The flow value of mortar decreases depending upon the amount of MgSiF6.6H2O. 3. The compressive strength was almost same or some increase on 28 days hydration. 4. The main retardation mechanism of MgSiF6 on the hydration of portland cement may be explained by the following hypothesis. MgSiF6 depressing the Ca++ and K+ ion concentration of cement paste solution be-cause of the recrystalization of K2SiF6 and CaF2 phase. The new products of K2SiF6 and CaF2 deposit on the surface of unhydrated cement powder and harzard the mass transfer through these layer. The low con-centration of Ca++, K+ ion in solution was decreasing the hydration rate of portland cement.

• Proceedings of the KIEE Conference
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• 1998.07d
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• pp.1355-1357
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• 1998

TFT의 게이트 절연막으로 사용되는 절연체는 우수한 절연특성과 낮은 계면포획전하밀도($D_{it}$)를 요구한다. 이에 본 연구에서는 우수한 절연특성을 가지며, 격자상수가 Si과 유사한 $CaF_2$의 증착 특성을 연구하였다. 진공증착법을 이용하여 p형 Si(100) 기판위에 $CaF_2$의 기판온도, 두께를 변화시켜 전기적, 구조적 특성을 평가하였다. 또한 Si 기판에 방향에 따른 박막의 특성을 조사하였다. 구조적 특성분석으로부터 Si(100) 기판의 경우 $CaF_2$는 (200)방향으로 주도적인 성장을 하였으며 기판온도를 상승시킴에 따라 (220)방향으로도 성장을 하는 것으로 나타났다. 열처리 전후의 구조적 특성은 SEM을 통해서 확인 할 수 있었다. 열처리 전후의 특성 변화로부터 저온($100^{\circ}C$이하)에서는 기판과의 성장방향과 동일하였으며 고온($200^{\circ}C$이상)에서는 기판방향과는 다른 방향 성장 결과를 얻었다. 전기적 특성평가를 위하여 C-V 특성을 평가하였다. C-V 특성으로부터 Si(100) 기판의 온도가 $100^{\circ}C$, $1455\AA$ 두께로 증착한$CaF_2$ 박막의 $D_{it}$는 $1.8{\times}10^{11}cm^{-1}eV^{-1}$로 낮은 값을 가지 고 있었으며 0.1MV/cm에서 누설전류밀도가 $10^{-8}A/cm^2$ 이었다.