• Title/Summary/Keyword: CVD(chemical vapor deposition)

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Research on the Development of Microneedle Arrays Based on Micromachining Technology and the Applicability of Parylene-C (미세가공 기술 기반의 마이크로니들 어레이 개발 및 패럴린 적용 가능성에 관한 연구)

  • Dong-Guk Kim;Deok-kyu Yoon;Yongchan Lee;Min-Uk Kim;Jihyoung Roh;Yohan Seo;Kwan-Su Kang;Young Hun Jeong;Kyung-Ah Kim;Tae-Ha Song
    • Journal of Biomedical Engineering Research
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    • v.44 no.6
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    • pp.404-413
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    • 2023
  • In this research, we studied the development of a SUS304 microneedle array based on microfabrication technology and the applicability of Parylene-C thin film, a medical polymer material. First of all, four materials commonly used in the field of medical engineering (SUS304, Ti, PMMA, and PEEK) were selected and a 5 ㎛ Parylene-C thin film was deposited. The applicability of Parylene-C coating to each material was confirmed through SEM analysis, contact angle measurement, surface roughness(Ra) measurement, and adhesion test according to ASTM standards for each specimen. Parylene-C thin film was deposited based on chemical vapor deposition (CVD), and a 5 ㎛ Parylene-C deposition process was established through trial and error. Through characteristic experiments to confirm the applicability of Parylene-C, SUS304 material, which is the easiest to apply Parylene-C coating without pretreatment was selected to develop a microneedle array based on CNC micromachining technology. The CNC micromachining process was divided into a total of 5 steps, and a microneedle array consisting of 19 needles with an inner diameter of 200 ㎛, an outer diameter of 400 ㎛, and a height of 1.4 mm was designed and manufactured. Finally, a 5 ㎛ Parylene-C coated microneedle array was developed, which presented future research directions in the field of microneedle-based drug delivery systems.

A Study on the Optimum coating thickness of $TiC-A1_2O_3$ coated cemented carbide tool ($TiC-A1_2O_3$ 피복초경공구의 최적피복두께에 관한 연구)

  • 김정두
    • Journal of the Korean Professional Engineers Association
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    • v.21 no.1
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    • pp.5-12
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    • 1988
  • The purpose of this paper is to investigate on the optimum coating thickness layer of TiC-Al$_2$O$_3$ coated cemented carbide tool. Chemical Vapor Deposition (CVD) of a thick film of TiC-A1$_2$O$_3$ on a cemented carbide produces an intermediate layer, $1.5mutextrm{m}$, 4.5${\mu}{\textrm}{m}$, 7.5${\mu}{\textrm}{m}$ 10.5${\mu}{\textrm}{m}$, 4 kind of TiC between the substrate and the $1.5mutextrm{m}$ constant thick A1$_2$O$_3$ coating. Experiments were carried out with the test relationship between coating thickness and shear angle, surface roughness, cutting force, microphotograph of crater wear, flank wear, tool life. From the experimental results, it was found that the optimum coating thickness of TiC-A1$_2$O$_3$ is 6${\mu}{\textrm}{m}$. Although the coating thickness layer 9${\mu}{\textrm}{m}$. 12${\mu}{\textrm}{m}$ have a much loger tool wear than an 3${\mu}{\textrm}{m}$, 6${\mu}{\textrm}{m}$ coating tool in cutting condition feed 0.05mm/rev, and the condition of feed 0.2mm/rev, 0.3mm/rev has upon in the shot time phenomenon of chipping.

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SAW Filter Made of ZnO/Nanocrystalline Diamond Thin Films (ZnO/나노결정다이아몬드 적층 박막 SAW 필터)

  • Jung, Doo-Young;Kang, Chan-Hyoung
    • Journal of the Korean institute of surface engineering
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    • v.42 no.5
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    • pp.216-219
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    • 2009
  • A surface acoustic wave (SAW) filter structure was fabricated employing $4{\mu}m$ thick nanocrystalline diamond (NCD) and $2.2{\mu}m$ thick ZnO films on Si wafer. The NCD film was deposited in an $Ar/CH_4$ gas mixture by microwave plasma chemical vapor deposition method. The ZnO film was formed over the NCD film in an RF magnetron sputter using ZnO target and $Ar/O_2$ gas. On the top of the two layers, copper film was deposited by the RF sputter and inter digital transducer (IDT) electrode pattern (line/space : $1.5/1.5{\mu}m$) was defined by the photolithography including a lift-off etching process. The fabricated SAW filter exhibited the center frequency of 1.66 GHz and the phase velocity of 9,960 m/s, which demonstrated that a giga Hertz SAW filter can be realized by utilizing the nanocrystalline diamond thin film.

New Graphene Electronic Device Structure for High Ion/Ioff Ratio

  • Jeong, Hyeon-Jong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.112-112
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    • 2012
  • Graphene has been considered as one of the potential post Si-materials due to its high mobility. [1] However, since graphene is semi-conductor with zero band gap, it is difficult to achieve high Ion/Ioff ratio, one of the most important requirements for commercial devices. There have been many attempts to open its band gap for high Ion/Ioff ratio, but most of them end up lowering the mobility. [2-5] Thus, we proposed and demonstrated a new device structure for graphene transistor based on one of the unique properties of graphene for high Ion/Ioff: using this approach, we were able to achieve the ratio over $10^5$. [6] Our device has several major advantages over previously proposed graphene based electronic devices. Since our device does not alter the given properties of graphene, such as opening the band gap, it has no fundamental issues on mobility degradations. In addition, our device is fully compatible with current Si technology and we were able to fabricate the devices with 6 inch wafer scale with CVD (Chemical Vapor Deposition) grown graphene. In this presentation, we will discuss about the details of our graphene device including the device structure and the detailed understanding of working mechanism. We will present device characteristics including I-V curves with $10^5$ on/off ratio. We will also present the performance of an inverter based on our devices. Finally, we will discuss the current issues and their potential solutions.

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ZnO blocking layer를 이용한 염료감응형 태양전지의 특성 연구

  • Lee, Sang-Hyeon;Wi, Jin-Uk;Seo, Byeong-Chan;Sin, Tae-Ho;Hong, Byeong-Yu;No, Yong-Han
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.258.2-258.2
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    • 2015
  • 염료감응형 태양전지(Dye-Sensitized Solar Cells; DSSC)는 공정비용과 재료가 저렴하여 차세대 태양전지로 각광받고 있다. 특히 투명한 재료를 사용하므로 flexible한 기판을 이용하여 그 적용범위가 넓다. DSSC는 상부전극인 FTO와 전해질의 접촉으로 인해 일부 FTO의 전자가 외부로 나가지 못하고 산화환원 반응에 의해 도로 전해질로 들어갈 확률이 있다. 이로 인해 효율 감소문제를 야기 할 수 있다. 이를 해결하기 위해 FTO위에 여러 물질들을 증착하거나 코팅 등의 많은 연구가 이루어져 왔다. ZnO를 DSSC로 적용한 연구는 많이 이루어졌지만 대부분 공정이 Chemical Vapor Deposition (CVD)으로 진행 되어왔다. 본 연구에서는 FTO위에 ZnO를 진공 공정에 비해 저렴하고 간단한 spin-coating으로 blocking layer를 형성하였다. 그 후 염료에서 여기 된 전자를 FTO로 전달해 주는 역할을 하는 TiO2를 doctor blade방법으로 형성하였다. ZnO는 TiO2하고 전도대와 가전자대의 에너지 준위 차이가 거의 없고, ZnO의 전자 이동도가 TiO2보다 높기 때문에 FTO로 전자를 큰 저항 없이 전달 할 수 있다. 또한 투과율이 좋아 염료까지의 빛의 투과성도 뛰어나다. ZnO blocking layer를 형성하여 FTO에서 전해질로의 전자이동을 막아주는 역할을 하여 DSSC의 performance 향상을 확인하였다. Field Emission Scanning Electron Microscope(FE-SEM)을 통해 FTO/ZnO/TiO2의 계면 및 두께를 확인하였고. DSSC의 특성 분석을 위해 I-V curve, Power conversion efficiency, Impedance spectroscopy를 측정 하였다.

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Raman Scattering Investigation of Polycrystalline 3C-SiC Thin Films Deposited on $SiO_2$ by APCVD using HMDS (CVD로 성장된 다결정 3C-SiC 박막의 라만특성)

  • Yoon, Kyu-Hyung;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.197-198
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    • 2009
  • This paper describes the Raman scattering characteristics of polycrystalline (poly) 3C-SiC films, which were deposited on the thermally oxidized Si(100) substrate by the atmosphere pressure chemical vapor deposition (APCVD) method according to growth temperature. TO and LO phonon modes to 2.0m thick poly 3C-SiC deposited at $1180^{\circ}C$ were measured at 794.4 and $965.7\;cm^{-1}$ respectively. From the intensity ratio of $I_{(LO)}/I_{(TO)}$ 1.0 and the broad full width half maximum (FWHM) of TO modes, itcan be elucidated that the crystallinity of 3C-SiC forms polycrystal instead of disordered crystal and the crystal defect is small. At the interface between 3C-SiC and $SiO_2$, $1122.6\;cm^{-1}$ related to C-O bonding was measured. Here poly 3C-SiC admixes with nanoparticle graphite with the Raman shifts of D and G bands of C-C bonding 1355.8 and $1596.8\;cm^{-1}$. Using TO mode of 2.0 m thick poly 3C-SiC, the biaxial stress was calculated as 428 MPa.

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Pore Size Control of Silica-Coated Alumina Membrane for $CO_2$ Separation ($CO_2$ 선택투과 분리를 위한 Silica 코팅 Alumina 막의 세공 제어)

  • 서봉국;김성수;김태옥
    • Journal of Environmental Science International
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    • v.8 no.2
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    • pp.263-269
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    • 1999
  • For effective $CO_2$ separation using pore size controlled membrane, silica was deposited in the mesopores of a $\gamma$-alumina film by chemical vapor deposition of tetraethoxysilane (TEOS) and phenyl-substituted ethoxysilanes at 773-873K. The membranes prepared with phenyl-substituted ethoxysilanes were calcined to remove the phenyl group and control the pore size. The gas permaselectivity of prepared membranes was evaluated by using $H_2$, $CO_2$ $N_2$, $CH_2$ and $C_3H_8$ single component and a mixture of $CO_2$ and $N_2$. The membranes produced using TEOS contained micropores having permselectivity only to hydrogen, but the phenyl-subsitituted ethoxysilane derived membranes possessed micorpores which are recognizable molecules of $CO_2$, $N_2$ and $CH_4$. In the diphenyl-diethoxysilane-derived membrane, the $CO_2$ permeance and selectivity of $CO_2$/$CH_4$ were $10^{-6} m^3(STP) \cdot m^{-2} \cdot s^{-1} \cdot kPa^{-1}$ and 11, respectively. Therefore, the use of phenyl-substituted ethoxysilane was effective in controlling micropore size for $CO_2$ separation.

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Improved Contact Characteristics in a Single Tin-Oxide Nanowire Device by a Selective Reactive Ion Etching (RIE) Process (선택 건식에칭에 의한 단일 산화주석 나노와이어 소자의 접촉 특성 개선)

  • Lee, Jun-Min;Kim, Dae-Il;Ha, Jeong-Sook;Kim, Gyu-Tae
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.59 no.1
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    • pp.130-133
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    • 2010
  • Although many structures based on $SnO_2$ nanowires have been demonstrated, there is a limitation towards practical application due to the unwanted contact potential between the metal electrode and the $SnO_2$ nanowire. This is mostly due to the presence of the native oxide layer that acts as an insulator between the metal contact and the nanowire. In this study the contact properties between Ti/Au contacts and a single $SnO_2$ nanowire was compared to the electrical properties of a contact without the oxide layer. RIE(Reactive Ion Etching) is used to selectively remove the oxide layer from the contact area. The $SnO_2$ nanowires were synthesized by chemical vapor deposition (CVD) and dispersed on a $Si/Si_3N_4$ substrate. The Ti/Au (20nm/100nm) electrodes were formed bye-beam lithography, e-beam evaporation and a lift-off process.

Coating of amorphous nitrides on carbon nanotubes and field emission properties (탄소 나노튜브에 대한 비정질 질화막의 코팅 및 전계방출 특성)

  • Noh, Young-Rok;Kim, Jong-Pil;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1244_1245
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    • 2009
  • Coating of amorphous nitride thin layers, such as boron nitride (BN) and carbon nitride (CN), has been performed on carbon nanotubes (CNTs) for the purpose of enhancing their electron-emission performances because those nitride films have relatively low work functions and commonly exhibit negative electron affinity behavior. The CNTs were directly grown on metal-tip (tungsten, approximately 500 nm in diameter at the summit part) substrates by inductively coupled plasma-chemical vapor deposition (ICP-CVD). Sharpening of the tungsten tips were carried out by electrochemical etching. Morphologies and microstructures of BN and CN films were analyzed by field-emission scanning electron microscopy (FE-SEM), energy dispersive x-ray (EDX) spectroscopy, and Raman spectroscopy. The electron-emission properties (such as maximum emission currents and turn-on fields) of the BN-coated and CN-coated CNT-emitters were characterized in terms of the thickness of BN and CN layers.

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Synthesis and field emission of double-walled carbon nanotubes

  • Lee, S.H.;Jung, S.I.;Lee, T.J.;Kim, W.S.;Cho, J.H.;Kang, H.J.;Kwon, G.M.;Park, C.J.;Seo, S.H.;Jeon, K.Y.;Ha, B.;Lee, C.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1087-1090
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    • 2005
  • We have investigated the synthesis and field emission properties of high-quality double-walled carbon nanotubes (DWCNTs) using a catalytic chemical vapor deposition method and a hydrogen arc discharge method. The produced carbon materials using a catalytic CVD method indicated high-purity DWCNT bundles free of amorphous carbon covering on the surface. By adopting a hydrogen arc discharge method, we could obtained high-purity DWCNTs in large-scale. DWCNTs showed low turn-on voltage and higher emission stability compared with SWCNTs.

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