• Title/Summary/Keyword: CVD(chemical vapor deposition)

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Process Control for the Synthesis of Ultrafine Si3N4-SiC Powders by the Hybrid Plasma Processing (Hybrid Plasma Processing에 의한 Si3N4-SiC계 미립자의 합성과정 제어)

  • ;吉田禮
    • Journal of the Korean Ceramic Society
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    • v.29 no.9
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    • pp.681-688
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    • 1992
  • Ultrafine Si3N4 and Si3N4+SiC mixed powders were synthesized through thermal plasma chemical vapor deposition(CVD) using a hybrid plasma, which was characterized by the supersposition of a radio-frequency plasma and arc jet. The reactant SiCl4 was injected into an arc jet and completely decomposed in a hybrid plasma, and the second reactant CH4 and/or NH3 mixed with H2 were injected into the tail flame through double stage ring slits. In the case of ultrafine Si3N4 powder synthesis, reaction efficiency increased significantly by double stage injection compared to single stage one, although crystallizing behaviors depended upon injection speed of reactive quenching gas (NH3+N2) and injection method. For the preparation of Si2N4+SiC mixed powders, N/C composition ratio could be controlled by regulating the injection speed of NH3 and/or CH4 reactant and H2 quenching gas mixtures as well as by adjusting the reaction space.

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A Comparative Study on the Characteristics of TiN Films Deposited by Plasma-Assisted CVD, Ion Plating and Reactive Sputtering (플라즈마 화학증착법, 이온 플레이팅법 및 반응성 스퍼터링법에 의해 증착된 TiN 박막의 특성 비교 연구)

  • 안치범;정병진;이원종;천성순
    • Journal of the Korean Ceramic Society
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    • v.31 no.7
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    • pp.731-738
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    • 1994
  • TiN films were deposited on high speed steels by plasma assisted chemical vapor deposition (PACVD), cathode arc ion plating (CAIP) and reactive magnetron sputtering (RMS). The properties of the films deposited by the three different methods were compared. The preferred oriented plane of PACVD-TiN is (200) and those of CAIP-TiN and RMS-TiN are (111). PACVD-TiN shows a dome surface and a microstructure having small grains. CAIP-TiN shows the highest microhardness and the best adhesion strength of the three because it has a dense microstructure and an ill-defined interface. But is shows the greatest surface roughness due to the Ti droplet created by the arc. RMS-TiN shows a microstructure having large voids so that its properties in microhardness and adhesion are the worst of the three.

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Effect of CNT Diameter on Physical Properties of Styrene-Butadiene Rubber Nanocomposites

  • Park, Young-Soo;Huh, Mong-Young;Kang, Sin-Jae;Yun, Seok-Il;Ahn, Kay-Hyeok
    • Carbon letters
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    • v.10 no.4
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    • pp.320-324
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    • 2009
  • We investigated the effect of diameter and content of carbon nanotubes (CNTs) on the physical properties of styrenebutadiene rubber (SBR)/CNTs nanocomposites. CNTs-reinforced SBR nanocomposites were prepared by the melt mixing process. CNTs with different diameters were synthesized by the chemical vapor deposition method (CVD). In this work, the mechanical property and other physical properties of SBR/CNTS nanocomposites were discussed as a function of the content and diameter of CNTs.

Low Temperature Growth of High-Quality Carbon Nanotubes by Local Surface Joule Heating without Heating Damage to Substrate

  • Heo, Sung-Taek;Lee, Dong-Gu
    • Carbon letters
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    • v.10 no.3
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    • pp.230-233
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    • 2009
  • In this study, a low temperature growth of high-quality carbon nanotubes on glass substrate using a local surface heating without heating damage to substrate was tried and characterized. The local joule heating was induced to only Ni/Ti metal film on glass substrate by applying voltage to the film. It was estimated that local surface joule heating method could heat the metal surface locally up to around $1200^{\circ}C$ by voltage control. We could successfully obtain high-quality carbon nanotubes grown at $300^{\circ}C$ by applying 125 V for joule heating as same as carbon nanotubes grown at $900^{\circ}C$.

The uniform polycrystalline 3C-SiC thin film growth by the gas flow control (가스흐름 제어에 의한 균일한 다결정 3C-SiC 박막 성장)

  • Yoon, Kyu-Hyung;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.92-92
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    • 2008
  • The surface flatness of heteroepitaxially grown 3C-SiC thin films is a key factor affecting electronic and mechanical device applications. This paper describes the surface flatness of polycrystalline 3C-SiC thin films by the gas flow control according to the location change of geometric structure. The polycrystalline 3C-SiC thin film was deposited by APCVD(Atmospheric pressure chemical vapor deposition) at $1200^{\circ}C$ using HMDS(Hexamethyildisilane : $Si_2(CH_3)_6)$ as single precursor, and 5 slm Ar as the main flow gas. According to the location of geometric structure, surface fringes and flatness changed. It shows the distribution of thickness is formed uniformly in the specific location of the geometric structure.

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The Characteristic of Prepared Electrode Catalyst and MEA using CNF and CNT (CNT 및 CNF를 이용하여 제조된 전극 촉매 및 막 전극 접합체의 특성)

  • 임재욱;최대규;류호진
    • Journal of the Microelectronics and Packaging Society
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    • v.11 no.1
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    • pp.59-64
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    • 2004
  • The performance of fuel cell electrode depends on the characteristics of the catalyst support material. This paper deals with the use of CNF(carbon nanofibre) and CNT(carbon nanotube) as platinum catalyst support. The CNF and CNT were synthesized with catalyst treated by mechanochemical process and were prepared by chemical vapor deposition (CVD) method. The platinum supported on CNF and CNT for polymer electrolyte membrane fuel cell (PEMFC) application. In result, the best I-V characteristic was verified by the prepared MEA(membrane electrode assembly) from twisted CNF that had a diameter of 65 nm.

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Selectrive chemical vapor deposition of aluminum for the metallization of high level IC (고집적회로 금속선 형성을 위한 화학증작 알루미늄의 선택적 증착)

  • 이경일;김영성;주승기
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.12
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    • pp.31-37
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    • 1994
  • Aluminum films were deposited by the pyrolysis of triisobutylaluminum(TIBA) in a cold wall LPCVD system for the metallization of high level IC. the selectivity on Si/SiO2 substrate and the contact resistance on submicron contacts were investigated. The carbon free aluminum film could be obtained when the aluminum film was deposited at low substrate temperature. Contact resistances of CVD Al/n+ Si contacts whose contact size was 0.5 .mu.m werre as low as 20~40.OMEGA./ea, which is 30~50% of contact resistance obtained by sputtering technique.

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Growth of Carbon Nanotubes on Different Catalytic Substrates (촉매금속(Ni-Cu)의 적층 증착법에 의한 탄소나노튜브의 성장)

  • 배성규;이세종;조성진;이득용
    • Journal of the Korean Ceramic Society
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    • v.41 no.3
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    • pp.247-252
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    • 2004
  • 노튜브의 길이는 급격히 증가하였지만 촉매금속의 적층방법에 따른 탄소나노튜브의 성장 형태는 큰 차이가 없었다. 특히, ICBD 방법에 의해 Ni 촉매금속을 증착한 경우 다른 방법에 비하여 직선적인 탄소나노튜브가 관찰되었다. ^x Carbon nanotubes were grown on SiO$_2$/Si substrates by applying $C_2$H$_2$ gas through chemical vapor deposition process. It was found that carbon nanotubes were grown successfully on the substrates with catalytic films under 20 $\AA$ total thickness. The increase in reaction temperature from 50$0^{\circ}C$ to 80$0^{\circ}C$ resulted in longer carbon nanotube, but there was no clear tendencies with different types of catalytic layers. It was evident that carbon nanotubes became more straight on the substrate with Ni catalytic film produced by ICBD method.

Electrical Properties of Yarned Carbon Nanotube Fiber Resistors (Yarned CNT Fiber 저항체의 전기적 특성)

  • Lim, Youngtaek;Lee, Sunwoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.1
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    • pp.59-62
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    • 2017
  • CNT (carbon nanotube) resistors with low resistance and negative TCR (temperature coefficient of resistance) were fabricated with yarned CNT (carbon nanotube) fibers. The CNT fibers were prepared by yarning CNTs grown on the silicone substrate by CVD (chemical vapor deposition) method. The CNT resistors were fabricated by winding CNT fibers on the surface of ceramic rod. Both metal terminals were connected with the CNT fiber wound on the ceramic rod. We measured electrical resistance and thermal stability with the number of CNT fibers wound. The CNT resistor system shows linearly decreased resistance with the number of CNTs wound on the ceramic rod and saturated at 20 strands. The CNT resistor system has negative TCR between $-1,000{\sim}-2,000ppm/^{\circ}C$ and stable frequency properties under 100 kHz.

The effect of plasma treatment on the $SiO_2$ film fabricated without substrate heating for flexible electronics (플라스틱 기판 사용을 위해 기판을 가열하지 않고 증착한 $SiO_2$ 절연막의 플라즈마 처리 효과)

  • Kuk, Seung-Hee;Kim, Sun-Jae;Han, Sang-Myeon;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1203-1204
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    • 2008
  • 본 논문에서는 ICP-CVD(Inductively Coupled Plasma Chemical Vapor Deposition)를 이용해 기판을 가열하지 않고 증착한 $SiO_2$ 절연막의 플라즈마 처리 효과를 분석하였다. 플라즈마 처리를 하지 않은 $SiO_2$ 절연막의 경우 평탄화 전압이 -7.8V, 유효 전하 밀도가 $4.77{\times}10^{13}cm^2$로 열악한 특성을 보였다. 이를 개선하기 위해 헬륨 플라즈마 전처리(Pre-treatment)와 수소 플라즈마 후처리(Post-treatment)를 통해서 $SiO_2$ 절연막의 전기적인 특성을 개선하였다.

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