A Study on the Etching Characteristics of $CeO_2$ Thin Films using inductively coupled $Cl_2$ /Ar Plasma
(유도 결합 플라즈마($Cl_2$ /Ar)를 이용한 $CeO_2$ 박막의 식각 특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2000.11a
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- pp.29-32
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- 2000