• Food Science of Animal Resources
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• v.30 no.3
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• pp.359-364
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• 2010

Lactobacillus acidophilus A12 was isolated from chicken feces for use as an immunostimulating livestock probiotic. The purpose of this study was to optimize the production of L. acidophilus A12 using response surface methodology (RSM). Initially, the influence of growth medium was studied in terms of carbon sources (glucose, fructose, lactose, glycerol, sucrose, ethanol, and mannitol), nitrogen sources (beef extract, yeast extract, malt extract, and tryptone), and inorganic salts ($CaCl_2$, $MgSO_4$, $KH_2PO_4$, $(NH_4)_2SO_4$, $FeSO_4$, and NaCl). Through one factor-at-a time experiment, lactose, yeast extract, and $CaCl_2$ were determined to be the best sources of carbon, nitrogen, and inorganic salt, respectively. The optimum composition was found to be 17.7 g/L lactose, 18.6 g/L yeast extract, and 0.9 g/L $CaCl_2$. Under these conditions, a maximum cell density of 9.33 Log CFU/mL was produced, similar to the predicted value.

• Journal of Surface Science and Engineering
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• v.51 no.6
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• pp.354-359
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• 2018

NaCl-induced hot corrosion behavior of ASTM T22 (Fe-2.25Cr-1Mo), T91 (Fe-9Cr-1Mo), T92 (Fe-9Cr-1.8W-0.5Mo), 347HFG (Fe-18-Cr-11Ni), and 310H (Fe-25Cr-19Ni) steels was studied after spraying NaCl on the surface. During corrosion at $600-800^{\circ}C$ for 50-100 h, thick, non-adherent, fragile, somewhat porous oxide scales formed. All the alloys corroded fast with large weight gains owing to fast scaling and destruction of protective oxide scales. Corrosion rates increased progressively as the corrosion temperature and time increased. Corrosion resistance increased in the order of T22, T91, T92, 347HFG, and 310H, suggesting that the alloying elements of Cr, Ni, and W beneficially improved the corrosion resistance of steels. Basically, Fe oxidized to $Fe_2O_3$, and Cr oxidized to $Cr_2O_3$, some of which further reacted with FeO to form $FeCr_2O_4$ or with NiO to form $NiCr_2O_4$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.62-65
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• 2001

$SrBi_2Ta_2O_{9}$ thin films were etched in inductively coupled $Cl_{2}$/$CF_{4}$/Ar plasma. The maximum etch rate was 1060 $\AA\textrm{m}$/min in $Cl_{2}$/$CF_{4}$/Ar (80). The chemical reactions on the etched surface were studied with x-ray photoelectron spectroscopy. The etching of SBT thin films in $Cl_{2}$/$CF_{4}$/Ar were etched by chemically assisted reactive ion etching. The small addition of $Cl_2$ into $CF_4$(20)/Ar(80) plasma will decrease the fluorine radicals and the increase Cl radical.

• Applied Chemistry for Engineering
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• v.20 no.4
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• pp.381-385
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• 2009

A basic objective is the preparation and surface studies of supported molten salt catalysts because molten salts can stay as the liquid phase in the range of the ordinary reaction temperature. Many kinds of metal salt mixtures for the formation of molten salt phase are appliable but CuCl and KCl were selected in this study because Cu is considered catalytically reactive in many reactons. The loading of the molten salt was selected as 25 vol% of the total pore volume of ${\gamma}-alumina$ to provide reasonable exposed surface area. The surface structure of catalysts containing molten salts in the ${\gamma}-alumina$ was studied using scanning electron microscopy (SEM) and energy-dispersive spectroscopy (EDS). CuCl and KCl were added into the ${\gamma}-alumina$ using concentrated hydrochloric acid solution by the impregnation technique. The surfaces of the prepared catalysts before and after heat treatments were compared and they suggested that the heat treatment of catalysts helped the formation of molten-salt although the surface compositions of CuCl and KCl were not uniform.

• Journal of Korean Society of Environmental Engineers
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• v.29 no.5
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• pp.571-576
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• 2007

Manganese-Coated Sand(MCS) prepared with three different methods were applied in the treatment of soluble $Mn^{2+}$ in batch and column experiments. In the bench-scale MCS preparation, the coating efficiency of manganese on the surface of sand increased as the dosage of initial Mn(II) increased. The removed amount of the soluble $Mn^{2+}$ by MCS increased as the solution pH increased, following a typical anionic-type adsorption. The removed amounts of the soluble $Mn^{2+}$ through adsorption was quite similar over the entire pH range, without depending on the contents of Mn on the surface of sand as well as coating methods. When NaClO was used an oxidant, the removed amount of the soluble $Mn^{2+}$ by MCS increased as the concentration of NaClO increased, This trend might be explained by the increased removal efficiency through coating of manganese oxides produced from oxidation of the soluble $Mn^{2+}$ by NaClO on the surface of MCS. From the bench-scale column experiments, the breakthrough of $Mn^{2+}$ occurred after 4,100 bed volume without presence of NaClO while 1.6-times delayed breakthrough of $Mn^{2+}$ was observed in the presence of NaClO. This result also supports that the removal efficiency of the soluble $Mn^{2+}$ could be enhanced by using NaClO.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.15 no.6
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• pp.234-238
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• 2005

Effects of plasma composition, ion flux and ion energy on the etch rate, surface morphology and near surface stoichiometry of a single crystalline $La_3Ga_5SiO_{14}$ wafer have been examined in $Cl_2/Ar$ inductively coupled plasma (ICP) discharges. Maximum etch rate ${\sim}1600{\AA}/min$ was achieved either at relatively high source power $({\sim}1000W)$ or high $Cl_2$ content conditions in $Cl_2/Ar$ discharges. The etched surfaces showed similar or better RMS roughness values than those of the unetched control sample and the near surface stoichiometry was found not to be affected by ICP etching.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.109-110
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• 2008

We have performed a density functional theory study to investigate the reaction of the $HfCl_4$ molecule on $H_2O$ terminated Si (001)-$(2\times1)$ surface. The reaction of the $HfCl_4$ molecule is more favorable on OH-terminated site than H-terminated site. The first $HfCl_4$ molecule is adsorbed on a OH-terminated site with 0.21 eV energy benefit. The second $HfCl_4$ molecule is adsorbed on the most adjacent OH-terminated site of the first molecule and the energy benefit is 0.28 eV. The third and forth molecules have same tendency with the first and second ones. The adsorption energies of the fifth and sixth $HfCl_4$ molecules are 0.01 eV, -0.06 eV respectively. Therefore, we find that the saturation Hf coverage is approximately 5/8 of the available hydroxyl site, which is $2.08\times10^{14}/cm^2$. Our model is well matched with an experimental study by reference.

• Journal of Korean Society on Water Environment
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• v.26 no.1
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• pp.35-43
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• 2010

This experimental design and response surface methodology (RSM) have been applied to the investigation of the electrocoagulation/flotation of dye wastewater. The electrocoagulation/flotation reactions were mathematically described as a function of parameters current (A), NaCl concentration (B), initial RhB concentration (C) and time (D) being modeled by use of the central composite design (CCD). The application of RSM using the CCD yielded the following regression equation, which is an empirical relationship between the RhB removal (%) and test variables in RhB removal (%) = $-300.42+129.21{\cdot}Current+46.99{\cdot}NaCl-0.11{\cdot}RhB-+43.71{\cdot}Time-5.67{\cdot}Current{\cdot}NaCl-3.18{\cdot}Current{\cdot}Time-2.41{\cdot}NaCl{\cdot}Time-19.79{\cdot}Current^2-2.27{\cdot}NaCl^2-1.59{\cdot}Time^2$. the model predictions agreed well with the experimentally observed result ($R^{2}=0.9728$). The estimated ridge of maximum response and optimal conditions for RhB removal (%) using canonical analysis was 99.4% (A: 1,77 A, NaCl concentration: 2.23 g/L, RhB concentration: 56.12 mg/L, Time: 9.98 min). To confirm this optimum condition, three additional experiments were performed and RhB removal (%) were within range of 86.87% (95% PI low)~111.93% (95% PI high) obtained.

• Nuclear Engineering and Technology
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• v.5 no.4
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• pp.310-320
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• 1973

The sorption and fixation of cesium in dilute solutions by vermiculite saturated with Na or K were studied in order to investigate any possibibty of its use in radioactive effluent treatment. The cesium sorbed by vermiculite with the increase in pH is attributed to the increase of sorption surface as a result of the dispersion. The increased cesium sorption by Na-vermiculite is due to the different sorption rates by the different exchange sites : external surface and internal surface. It is shown that the larger amount of sorbed cesium was extracted by KCI rather than with any other extractants. It is suggested that the fixation of cesium by vermiculite occurs at the crystal edge where Cs may replace K. Domestic vermiculite is a valuable material for use in the cesium sorption and fixation, and might be useful as a good packing material outside the tank of highly radioactive liquid waste. And from these results one could suggest that the artificial alteration of the biotite to vermiculite might be occurring by treating with NaCl.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.7-11
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• 2002

In this study, Au thin films were etched with a $Cl_2/Ar$ gas combination in an in an inductively coupled plasma. The etch properties were measured for different gas mixing ratios of $Cl_2/(Cl_2+Ar)$ while the other process conditions were fixed at rf power (700 W), dc bias voltage (150 V), and chamber pressure (15 mTorr). The highest etch rate of the Au thin film was 3500 $\AA/min$ and the selectivity of Au to $SiO_2$ was 4.38 at a $Cl_2/(Cl_2+Ar)$ gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is Au-Cl bonding by chemical reaction between Cl and Au. During the etching of Au thin films in $Cl_2/Ar$ plasma, Au-Cl bond is formed, and these products can be removed by the physical bombardment of Ar ions. In addition, Optical emission spectroscopy (OES) were investigated to analyze radical density of Cl and Ar in plasma. The profile of etched Au investigated with scanning electron microscopy (SEM).