Etching characteristics of gold thin films using inductively coupled Ar/$CF_4/Cl_2$ plasma
(Ar/$CF_4/Cl_2$ 유도 결합 플라즈마에 의한 gold 박막의 식각특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2002.11a
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- pp.190-194
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- 2002