• 제목/요약/키워드: CFUBMS

검색결과 15건 처리시간 0.019초

CFUBMS을 이용한 ZrCrAIN 나노복합 박막의 구조와 기계적 특성 (Structure and Mechanical Characteristics of ZrCrAIN Nanocomposite Thin Films by CFUBMS)

  • 김연준;이호영;신경식;정우성;한전건
    • 한국표면공학회지
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    • 제38권5호
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    • pp.183-187
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    • 2005

  • The quaternary ZrCrAIN nanocomposite thin films are synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS). Microstructure and mechanical properties of ZrCrAIN nanocomposite thin films are studied. Grain refinement of ZrCrAIN nanocomposite thin film is occurred by controlling $N_{2}$ partial pressure. Maximum hardness value according to the various $N_{2}$ partial pressures is obtained at 45 GPa. It is also conformed that critical value of the grain size (d) needs to achieve the maximum hardness.

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CFUBMS을 이용한 TiZrAlN 나노복합 박막의 미세 구조와 기계적 특성 (Microstructural and Mechanical Characteristics of TiZrAlN Nanocomposite Thin Films by CFUBMS)

  • 김연준;이호영;김용모;김갑석;한전건
    • 한국표면공학회지
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    • 제40권1호
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    • pp.1-5
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    • 2007

  • Quaternary TiZrAlN nanocomposite thin films were synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS), and their microstructure and mechanical characteristics were examined. The grain refinement of the TiZrAlN nanocomposite thin films was controlled by adjusting the $N_2$ partial pressure. The hardness of the film varied with the $N_2$ partial pressure and the maximum value was obtained approximately 47 GPa. It was also confirmed that there is a critical value of the grain size($d_c$) to need maximum hardness.

  • https://doi.org/10.5695/JKISE.2007.40.1.001 인용 PDF KSCI

TiZrAlN의 500-$700^{\circ}C$ 사이에서 공기 중 산화 (Oxidation of TiZrAlN nanocomposite thin films in air at temperatures between 500 and $700^{\circ}C$)

  • 김민정;봉성준;이동복
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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    • pp.167-170
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    • 2011

  • Quaternary TiZrAlN nanocomposite thin films with a composition of 20.7Ti-22.2Zr-2.7Al-54.4N (at.%) were deposited by the closed-field unbalanced magnetron sputtering (CFUBMS) method and oxidized in air at temperatures between 500 and $700^{\circ}C$. The oxides formed were $TiO_2$, $ZrO_2$, and $Al_2O_3$. The films had inferior oxidation resistance because the amounts of $ZrO_2$ and $TiO_2$ were large while the amount of $Al_2O_3$ was small. The oxidation progressed primarily by the inward diffusion of oxygen and the outward diffusion of nitrogen.

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