• 제목/요약/키워드: CFUBM sputtering

검색결과 12건 처리시간 0.037초

CFUBM Sputtering법으로 증착시킨 티타늄이 첨가된 비정질 탄소 박막의 기계적 특성 연구 (Mechanical Properties of Ti doped Amorphous Carbon Films prepared by CFUBM Sputtering Method)

  • 조형준;박용섭;김형진;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.706-710
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    • 2007
  • Ti-containing amorphous carbon (a-C:Ti) films shows attractive mechanical properties such as low friction coefficient, good adhesion to various substrate and high wear resistance. The incorporation of titanium in a-C films is able to improve the electrical conductivity, friction coefficient and adhesion to various substrates. In this study, a-C:Ti films were depositied on Si wafer by closed-field unbalanced magnetron (CFUBM) sputtering system composed two targets of carbon and titanium. The tribological properties of a-C:Ti films were investigated with the increase of DC bias voltage from 0 V to - 200 V. The hardness and elastic modulus of films increase with the increase of DC bias voltage and the maximum hardness shows 21 GPa. Also, the coefficient of friction exhibites as low as 0.07 in the ambient. In the result, the a-C:Ti film obtained by CFUBM sputtering method improved the tribological properties with the increase of DC bias volatage.

비대칭 마그네트론 스퍼터링으로 합성된 비정질 탄소박막의 물리적, 구조적 특성에서 타겟 파워 밀도의 영향 (The effect of target power density on physical and structural properties of amorphous carbon films prepared by CFUBM sputtering)

  • 이재희;박용섭;박재욱;홍병유
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.366-366
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    • 2008
  • Amorphous carbon (a-C) is an interesting materials and its characteristics can be varied by tuning it $sp^3$ fractions. The $sp^3$ fraction in a-C films depends on the kinetic energy of the deposited carbon ions. In this work, a-C films was synthesized on Si(100) and glass substrates at room temperature by closed-field unbalanced magnetron (CFUBM) sputtering with the increase of graphite target power density. The structural and physical properties of films were investigated by using Raman spectroscopy, X-ray photoelectron spectrometer (XPS), nano- indentation, atomic force microscope (AFM) and contact-angle measurement. We obtained the good tribological properties, such as high hardness up to 26 GPa., friction coefficient lower than 0.1 and the smooth surface (rms roughness: 0.12 nm). The increase of the physical properties with the increase of target power density are related to the increase of nano-clusters in the carbon network. Also, these results might be due to the increase of the subplantation and resputtering by the increase of ions density in the plasma.

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비대칭 마그네트론 스퍼터링법으로 성장된 a-C:H의 물리적 특성 (Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method)

  • 박용섭;홍병유
    • 한국전기전자재료학회논문지
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    • 제17권3호
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    • pp.278-282
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    • 2004
  • The Hydrogenated amorphous carbon(a-C:H) thin films are deposited on silicon with a close field unbalanced magnetron(CFUBM) sputtering systems. The experimental data are obtained on the depositon rate and physical properties of a-C:H films using DC bias voltage and Ar/C$_2$H$_2$ pressure. The depostion rate and the surface roughness decrease with DC bias voltage, but the hardness of the thin films increases with DC bias voltage. And the position of G-peak moves to lower wavenumber indicating an increase in diamond-like carbon characteristics with the lower Ar/C$_2$H$_2$ pressure.

비대칭 마그네트론 스퍼터링법에 의한 비정질 질화탄소 박막의 합성 및 윤활 특성 (Synthesis and Lubricant Properties of Nitrogen doped Amorphous Carbon (a-C:N) Thin Films by Closed-field unbalanced Magnetron Sputtering Method)

  • 박용섭;조형준;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.701-705
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    • 2007
  • The incorporation of N in a-C film is able to improve the friction coefficient and the adhesion to various substrates. In this study, a-C:N films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system in $Ar/N_2$ plasma. The lubricant characteristics was investigated for a-C:N deposited with total working pressure from 4 to 7 mTorr. We obtained high hardness up to 24GPa, friction coefficient lower than 0.1 and the smooth surface of having the extremely low roughness (0.16 nm). The physcial properties of a-C:N thin film are related to the increase of cross-linked $sp^2$ bonding clusters in the film. However, the decrease of hardness, elastic modulus and the increase of surface roughness, friction coefficient with the increase of $N_2$ partial pressrue might be due to the effect of energetic ions as a result of the increase of ion bombardment with the increase of ion density in the plasma.

멤브레인 구조를 위한 DLC 박막의 특성에 관한 연구 (A study of properties of DLC films for membrane structure)

  • 이태용;김응권;박용섭;홍병유;송준태;박영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.748-752
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    • 2004
  • The Hydrogenated amorphous carbon (a-C:H) thin films are deposited to fabricate suppored layer on silicon substrate with a closed field unbalanced magnetron(CFUBM) sputtering system. This study focuses on the characteristic of Diamond like carbon (DLC) films and Pb(Zr,Ti)$O_3$ (PZT) films for membrane structure. The deposition rate and the surface roughness of DLC fims decrease with DC bias voltage. hardness is 26 GPa at -200 V. Interface of DLC/Si and Pt/DLC layers was excellent.

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A study of microstructure and physical properties of metal containing carbon films sythesized by magnetron sputtering

  • 김성일;변태준;이호영;김갑석;한전건
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 춘계학술발표회 초록집
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    • pp.63-64
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    • 2007
  • 수소가 포함 되지 않은 금속 도핑 나노결정 구조의 카본을 CFUBM으로 합성하였다. 이번 실험을 통하여 금속의 함유량에 따라 마이크로 구조와 물리적인 특성의 상관관계를 알아보았으며, 그 필름의 구조와 물리적인 특성을 XPS과 HRTEM과 4-point prove의 분석기구를 통하여 알아보았으며, 비정질 흑연 구조내의 Ti 도핑된 클러스터 양의 증가 그리고 도핑양의 증가에 따른 전기적 비저항의 감소를 알아보고자 한다.

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Microstructure and Physical Properties of Sputtered Metal Containing Nanocrystalline Structured Carbon Coatings

  • Kim, Sung-I.;Han, Jeon-G.
    • 한국표면공학회지
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    • 제40권2호
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    • pp.59-62
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    • 2007
  • Metal containing hydrogen free nanocrystalline structured carbon (Me:nc-C) films were synthesized by closed-field unbalanced magnetron sputtering system (CFUBM). The aim of this study was to determine the relationship between the microstructure and physical properties of Me:nc-C films as a function of the concentration of materials. The film structures were examined by x-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The physical properties of the Me:nc-C films were evaluated by using a 4-point probe. The fraction of graphite clusters was found to be increased by containing titanium and the electrical resistivity decreased with increasing amount of containing.

마그네트론 스퍼터링법에 의해 합성되어진 비정질 탄소박막들의 구조적, 물리적 특성 (Physical and Structural Properties of Amorphous Carbon Films Synthesized by Magnetron Sputtering Method)

  • 박용섭;조형준;홍병유
    • 한국진공학회지
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    • 제16권2호
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    • pp.122-127
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    • 2007
  • 본 연구에서는 비정질 탄소박막들(a-C, a-C:H, a-C:N)을 흑연타겟이 부착되어진 비대칭 마그네트론 스퍼터링법을 이용하여 증착하였으며, 음의 DC 바이어스 전압의 효과를 알아보기 위해 증착가스 압력내에서 200 V를 인가하여 탄소박막들을 제작하였다. 수소화된 비정질 탄소박막과 질화탄소박막은 각각 스퍼터링 가스로써 아세틸렌과 질소를 주입하여 제작하였다. 결과적으로 26.5 GPa의 높은경도와 0.1 nm의 낮은 거칠기 그리고 접착력은 30.5 N를 가지는 수소화된 비정질 탄소박막을 합성하였으며, 32 N의 좋은 접착 특성을 나타내는 질화 탄소 박막을 합성하였다. 본 논문에서는 아세틸렌과 질소 가스의 효과와 음의 DC 바이어스 전압에 따른 비정질 탄소박막들의 구조적 특성과 물리적 특성과의 관계를 규명하였다.

CFUBMS을 이용한 ZrCrAIN 나노복합 박막의 구조와 기계적 특성 (Structure and Mechanical Characteristics of ZrCrAIN Nanocomposite Thin Films by CFUBMS)

  • 김연준;이호영;신경식;정우성;한전건
    • 한국표면공학회지
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    • 제38권5호
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    • pp.183-187
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    • 2005
  • The quaternary ZrCrAIN nanocomposite thin films are synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS). Microstructure and mechanical properties of ZrCrAIN nanocomposite thin films are studied. Grain refinement of ZrCrAIN nanocomposite thin film is occurred by controlling $N_{2}$ partial pressure. Maximum hardness value according to the various $N_{2}$ partial pressures is obtained at 45 GPa. It is also conformed that critical value of the grain size (d) needs to achieve the maximum hardness.