• Title/Summary/Keyword: CFUBM sputtering

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Mechanical Properties of Ti doped Amorphous Carbon Films prepared by CFUBM Sputtering Method (CFUBM Sputtering법으로 증착시킨 티타늄이 첨가된 비정질 탄소 박막의 기계적 특성 연구)

  • Cho, Hyung-Jun;Park, Yong-Seob;Kim, Hyung-Jin;Choi, Won-Seok;Hong, Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.8
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    • pp.706-710
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    • 2007
  • Ti-containing amorphous carbon (a-C:Ti) films shows attractive mechanical properties such as low friction coefficient, good adhesion to various substrate and high wear resistance. The incorporation of titanium in a-C films is able to improve the electrical conductivity, friction coefficient and adhesion to various substrates. In this study, a-C:Ti films were depositied on Si wafer by closed-field unbalanced magnetron (CFUBM) sputtering system composed two targets of carbon and titanium. The tribological properties of a-C:Ti films were investigated with the increase of DC bias voltage from 0 V to - 200 V. The hardness and elastic modulus of films increase with the increase of DC bias voltage and the maximum hardness shows 21 GPa. Also, the coefficient of friction exhibites as low as 0.07 in the ambient. In the result, the a-C:Ti film obtained by CFUBM sputtering method improved the tribological properties with the increase of DC bias volatage.

The effect of target power density on physical and structural properties of amorphous carbon films prepared by CFUBM sputtering (비대칭 마그네트론 스퍼터링으로 합성된 비정질 탄소박막의 물리적, 구조적 특성에서 타겟 파워 밀도의 영향)

  • Lee, Jae-Hee;Park, Yong-Seob;Park, Jae-Wook;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.366-366
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    • 2008
  • Amorphous carbon (a-C) is an interesting materials and its characteristics can be varied by tuning it $sp^3$ fractions. The $sp^3$ fraction in a-C films depends on the kinetic energy of the deposited carbon ions. In this work, a-C films was synthesized on Si(100) and glass substrates at room temperature by closed-field unbalanced magnetron (CFUBM) sputtering with the increase of graphite target power density. The structural and physical properties of films were investigated by using Raman spectroscopy, X-ray photoelectron spectrometer (XPS), nano- indentation, atomic force microscope (AFM) and contact-angle measurement. We obtained the good tribological properties, such as high hardness up to 26 GPa., friction coefficient lower than 0.1 and the smooth surface (rms roughness: 0.12 nm). The increase of the physical properties with the increase of target power density are related to the increase of nano-clusters in the carbon network. Also, these results might be due to the increase of the subplantation and resputtering by the increase of ions density in the plasma.

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Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method (비대칭 마그네트론 스퍼터링법으로 성장된 a-C:H의 물리적 특성)

  • 박용섭;홍병유
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.3
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    • pp.278-282
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    • 2004
  • The Hydrogenated amorphous carbon(a-C:H) thin films are deposited on silicon with a close field unbalanced magnetron(CFUBM) sputtering systems. The experimental data are obtained on the depositon rate and physical properties of a-C:H films using DC bias voltage and Ar/C$_2$H$_2$ pressure. The depostion rate and the surface roughness decrease with DC bias voltage, but the hardness of the thin films increases with DC bias voltage. And the position of G-peak moves to lower wavenumber indicating an increase in diamond-like carbon characteristics with the lower Ar/C$_2$H$_2$ pressure.

Synthesis and Lubricant Properties of Nitrogen doped Amorphous Carbon (a-C:N) Thin Films by Closed-field unbalanced Magnetron Sputtering Method (비대칭 마그네트론 스퍼터링법에 의한 비정질 질화탄소 박막의 합성 및 윤활 특성)

  • Park, Yong-Seob;Cho, Hyung-Jun;Choi, Won-Seok;Hong, Byung-You
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.8
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    • pp.701-705
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    • 2007
  • The incorporation of N in a-C film is able to improve the friction coefficient and the adhesion to various substrates. In this study, a-C:N films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system in $Ar/N_2$ plasma. The lubricant characteristics was investigated for a-C:N deposited with total working pressure from 4 to 7 mTorr. We obtained high hardness up to 24GPa, friction coefficient lower than 0.1 and the smooth surface of having the extremely low roughness (0.16 nm). The physcial properties of a-C:N thin film are related to the increase of cross-linked $sp^2$ bonding clusters in the film. However, the decrease of hardness, elastic modulus and the increase of surface roughness, friction coefficient with the increase of $N_2$ partial pressrue might be due to the effect of energetic ions as a result of the increase of ion bombardment with the increase of ion density in the plasma.

A study of properties of DLC films for membrane structure (멤브레인 구조를 위한 DLC 박막의 특성에 관한 연구)

  • Lee, Tae-Yong;Kim, Eung-Kwon;Park, Yong-Seob;Hong, Byung-You;Song, Joon-Tae;Park, Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.748-752
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    • 2004
  • The Hydrogenated amorphous carbon (a-C:H) thin films are deposited to fabricate suppored layer on silicon substrate with a closed field unbalanced magnetron(CFUBM) sputtering system. This study focuses on the characteristic of Diamond like carbon (DLC) films and Pb(Zr,Ti)$O_3$ (PZT) films for membrane structure. The deposition rate and the surface roughness of DLC fims decrease with DC bias voltage. hardness is 26 GPa at -200 V. Interface of DLC/Si and Pt/DLC layers was excellent.

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A study of microstructure and physical properties of metal containing carbon films sythesized by magnetron sputtering

  • Kim, Seong-Il;Byeon, Tae-Jun;Lee, Ho-Yeong;Kim, Gap-Seok;Han, Jeon-Geon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.63-64
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    • 2007
  • 수소가 포함 되지 않은 금속 도핑 나노결정 구조의 카본을 CFUBM으로 합성하였다. 이번 실험을 통하여 금속의 함유량에 따라 마이크로 구조와 물리적인 특성의 상관관계를 알아보았으며, 그 필름의 구조와 물리적인 특성을 XPS과 HRTEM과 4-point prove의 분석기구를 통하여 알아보았으며, 비정질 흑연 구조내의 Ti 도핑된 클러스터 양의 증가 그리고 도핑양의 증가에 따른 전기적 비저항의 감소를 알아보고자 한다.

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Microstructure and Physical Properties of Sputtered Metal Containing Nanocrystalline Structured Carbon Coatings

  • Kim, Sung-I.;Han, Jeon-G.
    • Journal of Surface Science and Engineering
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    • v.40 no.2
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    • pp.59-62
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    • 2007
  • Metal containing hydrogen free nanocrystalline structured carbon (Me:nc-C) films were synthesized by closed-field unbalanced magnetron sputtering system (CFUBM). The aim of this study was to determine the relationship between the microstructure and physical properties of Me:nc-C films as a function of the concentration of materials. The film structures were examined by x-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The physical properties of the Me:nc-C films were evaluated by using a 4-point probe. The fraction of graphite clusters was found to be increased by containing titanium and the electrical resistivity decreased with increasing amount of containing.

Physical and Structural Properties of Amorphous Carbon Films Synthesized by Magnetron Sputtering Method (마그네트론 스퍼터링법에 의해 합성되어진 비정질 탄소박막들의 구조적, 물리적 특성)

  • Park, Yong-Seob;Cho, Hyung-Jun;Hong, Byung-You
    • Journal of the Korean Vacuum Society
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    • v.16 no.2
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    • pp.122-127
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    • 2007
  • In this research, amophous carbon films (a-C, a-C:H, a-C:N) were synthesized by closed-field unbalanced magnetron (CFUBM) sputtering using graphite target. We also fabricated amorphous carbon films with applying negative DC bias voltage of 200 V in during the deposition in working pressure. Also, a-C:H and a-C:N films was synthesized by adding acethylene($C_{2}H_{2}$) and nitrogen(N) gases of 4 and 3 sccm into Ar pressure. The a-C:H film synthesized at -200 V exhibited the maxumum hardness of 26.3 GPa, the smooth surface of 0.1 nm and the good adhesion of 30.5 N. And a-C:N film synthesized at -200 V exhibited at -200 V exhibited the best adhesion of 32 N. This paper examined the effect of $C_{2}H_{2}$ gas, $N_{2}$ gas and negative DC bias voltage as the parameter for improving the physical properties and the relation between structral and physical properties of carbon films.

Structure and Mechanical Characteristics of ZrCrAIN Nanocomposite Thin Films by CFUBMS (CFUBMS을 이용한 ZrCrAIN 나노복합 박막의 구조와 기계적 특성)

  • Kim Youn J.;Lee Ho Y.;Shin Kyung S.;Jung Woo S.;Han Jeon G.
    • Journal of Surface Science and Engineering
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    • v.38 no.5
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    • pp.183-187
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    • 2005
  • The quaternary ZrCrAIN nanocomposite thin films are synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS). Microstructure and mechanical properties of ZrCrAIN nanocomposite thin films are studied. Grain refinement of ZrCrAIN nanocomposite thin film is occurred by controlling $N_{2}$ partial pressure. Maximum hardness value according to the various $N_{2}$ partial pressures is obtained at 45 GPa. It is also conformed that critical value of the grain size (d) needs to achieve the maximum hardness.