• 제목/요약/키워드: C doping

검색결과 902건 처리시간 0.026초

펄스 레이저 방법으로 증착된 투명 산화물 전극용 인듐이 도핑된 ZnO:Al 박막 (Indium doped ZnO:Al thin films prepared by pulsed laser deposition for transparent conductive oxide electrode applications)

  • 함성길;이창현;이예나;성낙진;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.27-27
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    • 2008
  • The different concentration Indium doped ZnO:Al films were grown on glass substrates (Corning 1737) at $200^{\circ}C$ by pulsed laser deposition. The indium doping in AZO films shows the critical effect on the crystallinity, resistivity, and optical properties of the films. The AZO films doped with 0.3 atom % indium content exhibit the highest crystallinity, the lowest resistivity of $4.5\times10^{-4}\Omega$-cm, and the maximum transmittance of 93%. The resistivity of the indium doped-AZO films is strongly related with the crystallinity of the films. The carrier concentration in the indium doped-AZO films linearly increases with increasing indium concentration. The mobility of the AZO films with increasing indium concentration was reduced with an increase in carrier concentration and the decrease in mobility was attributed to the ionized impurity scattering mechanism. In an optical transmittance, the shift of the optical absorption edge to shorter wavelength strongly depends on the electronic carrier concentration in the films.

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광전소자 응용을 위한 Ga가 첨가된 ZnO 박막의 광학적 및 전기적 특성 연구 (A Study on the Optical and Electrical Properties of Ga-doped ZnO Films for Opto-electronic Devices)

  • 길병우;이성의;이희철
    • 한국전기전자재료학회논문지
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    • 제24권4호
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    • pp.303-308
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    • 2011
  • The Gallium-doped ZnO(GZO) film deposited at a temperature of $200^{\circ}C$ and a pressure of 10 mtorr has an optical transmittance of 89.0% and a resistivity of $2.0\;m{\Omega}{\cdot}cm$ because of its high crystallinity. Effect of $Al_2O_3$ oxide buffer layers on the optical and electrical properties of sputtered ZnO films were intensively investigated for developing the electrodes of opto-electronic devices which demanded high optical transmittance and low resistivity. The use of $Al_2O_3$ buffer layer could increase optical transmittance of GZO film to 90.7% at a wavelength of 550 nm by controlling optical spectrum. Resistivity of deposited GZO films were much dependent on the deposition condition of $O_2/(Ar+O_2)$ flow rate ratio during the buffer layer deposition. It is considered that the $Al_2O_3$ buffer layer could increase the carrier concentration of the GZO films by doping effect of diffused Al atoms through the rough interface.

Synthesis of Amorphous Er3+-Yb3+ Co-doped TiO2 and Its Application as a Scattering Layer for Dye-sensitized Solar Cells

  • Han, Chi-Hwan;Lee, Hak-Soo;Lee, Kyung-Won;Han, Sang-Do;Singh, Ishwar
    • Bulletin of the Korean Chemical Society
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    • 제30권1호
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    • pp.219-223
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    • 2009
  • $TiO_2$ doped with $Er^{3+\;and\;Yb^{3+}$ was used for fabricating a scattering layer and a nano-crystalline $TiO_2$ electrode layer to be used in dye-sensitized solar cells. The material was prepared using a new sol-gel combustion hybrid method with acetylene black as fuel. The $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide powder synthesized at 700oC had embossed structure morphology with a size between 27 to 54 nm that agglomerated to produce micron size particles, as observed by the scanning electron micrographs. The XRD patterns showed that the $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide had an amorphous structure, while using the same method without doping $Er^{3+}\;or\;Yb^{3+},\;TiO_2$ was obtained in the crystallite form with thea dominance of rutile phase. Fabricating a bilayer structure consisting of nano-crystalline $TiO_2$ and the synthesized $Er^{3+}$-$Yb^{3+}$ co-doped titanium oxide showed better scattering property, with an overall increase of 15.6% in efficiency of the solar cell with respect to a single nano-crystalline $TiO_2$ layer.

Novel Activation by Electrochemical Potentiostatic Method

  • 이학형;이준기;정동렬;권광우;김익현
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.29.1-29.1
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    • 2009
  • Fabrication of good quality P-type GaN remained as a challenge for many years which hindered the III-V nitrides from yielding visible light emitting devices. Firstly Amano et al succeeded in obtaining P-type GaN films using Mg doping and post Low Energy Electron Beam Irradiation (LEEBI) treatment. However only few region of the P-GaN was activated by LEEBI treatment. Later Nakamura et al succeeded in producing good quality P-GaN by thermal annealing method in which the as deposited P-GaN samples were annealed in N2 ambient at temperatures above $600^{\circ}C$. The carrier concentration of N type and P-type GaN differs by one order which have a major effect in AlGaN based deep UV-LED fabrication. So increasing the P-type GaN concentration becomes necessary. In this study we have proposed a novel method of activating P-type GaN by electrochemical potentiostatic method. Hydrogen bond in the Mg-H complexes of the P-type GaN is removed by electrochemical reaction using KOH solution as an electrolyte solution. Full structure LED sample grown by MOCVD serves as anode and platinum electrode serves as cathode. Experiments are performed by varying KOH concentration, process time and applied voltage. Secondary Ion Mass Spectroscopy (SIMS) analysis is performed to determine the hydrogen concentration in the P-GaN sample activated by annealing and electrochemical method. Results suggest that the hydrogen concentration is lesser in P-GaN sample activated by electrochemical method than conventional annealing method. The output power of the LED is also enhanced for full structure samples with electrochemical activated P-GaN. Thus we propose an efficient method for P-GaN activation by electrochemical reaction. 30% improvement in light output is obtained by electrochemical activation method.

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$Tb^{3+}$$Eu^{3+}$로 활성화된 $Al_3GdB_4O_{12}$ 형광체의 발광특성 (Photoluminance Properties of $Al_3GdB_4O_{12}$ Phosphors Activated by $Tb^{3+}$and $Eu^{3+}$)

  • 김기운;김성우;이임렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.594-597
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    • 1999
  • The new green and red phosphors for PDP application activated by T $b^{3+}$ and E $u^{3+}$ were synthesized, and their photoluminance properties were investigated. It was found that the brightness of $Al_3$Gd $B_4$ $O_{12}$ :T $b^{3+}$ green phosphor under 147nm VUV irradiation was higher than that of commercial Z $n_2$ $SiO_4$:M $n^{2+}$ phosphor. But the emitting intensity of A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ red phosphor was inferior to the commercial (Y,Gd)B $O_3$:E $u^{3+}$. $Al_3$Gd $B_4$ $O_{12}$ Phosphor had a strong excitation band at 160nm associated with the host absorption, and also the photoluminance excitation intensity of $Al_3$Gd $B_4$ $O_{12}$ :T $b^{3+}$ was higher than that of Z $n_2$ $SiO_4$:M $n^{2+}$, but the intensity of $Al_3$Gd $B_4$ $O_{12}$ :E $u^{3+}$ phosphor was smaller than (Y,Gd)B $O_3$:E $u^{3+}$ phosphor In the VUV range. C $e^{3+}$ co-doping in A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ and substitution of $Al^{3+}$ by G $a^{3+}$ A1$_3$Gd $B_4$ $O^{12}$ :E $u^{3+}$ phosphor were tried, but they did not improved the optical property .d the optical property .ty .

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Yb2O3가 첨가된 (Ba1Sr1Ca)TiO3후막의 치밀화와 유전특성 (Densification and Dielectric Properties of Yb2O3 doped (Ba1Sr1Ca)TiO3 Thick Films)

  • 박상만;이영희;남성필;이성갑
    • 한국전기전자재료학회논문지
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    • 제20권7호
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    • pp.581-586
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    • 2007
  • [ $(Ba_{0.57}Sr_{0.33}Ca_{0.10})TiO_3$ ] (BSCT) powders, prepared by sol-gel method, were mixed with organic vehicle and the BSCT thick films were fabricated by the screen printing method. The structural and dielectric properties were investigated as a function of the $Yb_2O_3$ doping contents. As a result of the TG-DTA, exothermic peak was observed at around $670^{\circ}C$ due to the formation of the polycrystalline perovskite phase. All BSCT thick films showed the typical XRD patterns of a cubic polycrystalline structure. The average thickness of all BSCT thick films was about $70{\mu}m$. The grain size of the BSCT thick film doped with 0.7 mol% $Yb_2O_3$ was approximately $6.2{\mu}m$. The Curie temperature and relative dielectric constant at room temperature decreased with increasing $Yb_2O_3$ amount. Relative dielectric constant and dielectric loss of the specimen doped with 0.1 mol% $Yb_2O_3$ were 4637 and 19 % at Curie temperature, respectively.

결정질 실리콘 태양전지 표면 조직화 형상이 효율에 미치는 영향 분석

  • 변성균;김준희;박주억;조해성;김민영;임동건
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.315.1-315.1
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    • 2013
  • 표면 조직화의 목적은 태양전지 표면에서의 입사되는 빛의 반사율을 감소 시키고, 웨이퍼 내에서 빛의 통과 길이를 길게 하며, 흡수되는 빛의 양을 증가시키는 것이다. 본 연구에는 습식, 건식 표면조직화 방법에 따른 표면 형상과 표면 반사도를 분석 하였으며, 셀을 제작하여 전기적 특성과 광학적 특성의 상관관계를 분석하였다. 표면 조직화 공정은 염기성 용액인 KOH를 이용한 식각 방법과 Ag를 이용한 metal-assisted 식각, 산증기를 이용한 식각, 플라즈마를 이용한 반응성 이온식각을 적용하여 제작하였다. 표면 반사율을 400~1000 nm 사이의 파장에서 측정하였으며 KOH를 이용하여 식각한 샘플이 9.11%의 표면 반사율을 가졌으며 KOH를 이용하여 식각한 표면에 추가로 metal-assisted 식각을 한 샘플이 2%로 가장 낮은 표면 반사율을 보였다. 표면 조직화 후 동일 조건으로 셀을 제작 하여 효율 측정 결과 Ag를 이용한 2단계 metal-assisted chemical 식각이 15.83%의 가장 낮은 광변환 효율을 보였으며 RIE를 이용한 2단계 반응성 이온 식각공정이 17.78%로 가장 높은 광변환 효율을 보였다. 이 결과는 반사도 결과와 일치 하지 않았다. 표면 조직화 모양에 따른 셀 효율의 변화는 도핑 프로파일과 표면 재결합 속도의 변화 때문이라 생각되며 더 명확한 분석을 위해 양자 효율을 측정하여 분석을 시도하였다. 측정 결과 단파장 대역에서 낮은 응답특성을 가지는 것을 확인 할 수 있었는데 그 이유는 낮은 반사도를 가지는 표면조직화 공정의 경우 나노사이즈의 구조를 갖기 때문에 균일한 도핑 프로파일을 얻지 못해 전자 정공의 분리가 제대로 이루어지지 못하였고 표면 재결합 속도증가의 원인으로 단락전류와 개방전압이 낮아져 효율이 떨어진 것으로 판단된다. 실험 결과 도핑 프로파일의 균일성은 셀 효율 개선을 위해 낮은 표면 반사율 만큼 중요하다는 점을 알게되었다. 낮은 반사율을 갖는 표면조직화 공정도 중요하지만 표면에 따른 균일한 도핑 프로파일을 갖는 공정을 개발한다면 단파장 응답도가 향상되어 단락전류밀도의 상승효과를 얻을 수 있을 것이라 판단된다.

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준귀금속 전이원소, Pt, Pd를 이용한 p-InGaAs의 오믹 접촉저항 특성 연구 (Ohmic Contact Characteristics of p-InGaAs with Near-Noble Transition Metals of Pt and Pd)

  • 박영산;류상완;유준상;김효진;김선훈;김진혁
    • 한국재료학회지
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    • 제16권10호
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    • pp.629-632
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    • 2006
  • Electrical characteristics of Pt/Ti/Pt/Au and Pd/Zn/Pd/Au contacts to p-type InGaAs grown on an InP substrate have been characterized as a function of the doping concentration and the annealing temperature. The Pt/Ti/Pt/Au contacts produced the specific contact resistance as low as $2.3{\times}10^{-6}{\Omega}{\cdot}cm^2$, when heat-treated at an annealing temperature of $400^{\circ}C$. Comparison of the Pt/Ti/Pt/Au and Ti/Pt/Au contacts showed that the first Pt layer plays an important role in reducing the contact resistivity probably by lowering energy barrier at the metal-semiconductor interface. For the Pd/Zn/Pd/Au contacts, the contact resistivity remained virtually unchanged with increasing annealing temperature. The specific contact resistivity as low as $4.7{\times}10^{-6}{\Omega}{\cdot}cm^2$ was obtained. The results indicate that the Pt/Ti/Pt/Au and Pd/Zn/Pd/Au schemes could be potentially important for the fabrication of InP-based optoelectronic devices, such as photodetector and optical modulator.

Synthesis and Photocatalytic Properties of SnO2-Mixed and Sn-Doped TiO2 Nanoparticles

  • Choi, Hong-Goo;Yong, Seok-Min;Kim, Do-Kyung
    • 한국재료학회지
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    • 제22권7호
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    • pp.352-357
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    • 2012
  • $SnO_2$-mixed and Sn-doped $TiO_2$ nanoparticles were synthesized via a hydrothermal process. $SnO_2$-mixed $TiO_2$ nanoparticles prepared in a neutral condition consisted of anatase $TiO_2$ nanoparticles(diamond shape, ~25 nm) and cassiterite $SnO_2$ nanoparticles(spherical shape, ~10 nm). On the other hand, Sn-doped $TiO_2$ nanoparticles obtained under a high acidic condition showed a crystalline phase corresponding to rutile $TiO_2$. As the Sn content increased, the particle shape changed from rod-like(d~40 nm, 1~200 nm) to spherical(18 nm) with a decrease in the particle size. The peak shift in the XRD results and a change of the c-axis lattice parameter with the Sn content demonstrate that the $TiO_2$ in the rutile phase was doped with Sn. The photocatalytic activity of the $SnO_2$-mixed $TiO_2$ nanoparticles dramatically increased and then decreased when the $SnO_2$ content exceeded 4%. The increased photocatalytic activity is mainly attributed to the improved charge separation of the $TiO_2$ nanoparticles with the $SnO_2$. In the case of Sn-doped $TiO_2$ nanoparticles, the photocatalytic activity increased slightly with the Sn content due most likely to the larger energy bandgap caused by Sn-doping and the decrease in the particle size. The $SnO_2$-mixed $TiO_2$ nanoparticles generally exhibited higher photocatalytic activity than the Sn-doped $TiO_2$ nanoparticles. This was caused by the phase difference of $TiO_2$.

Electrical Transport Properties and Magnetoresistance of (1-x)La0.7Sr0.3MnO3/xZnFe2O4 Composites

  • Seo, Yong-Jun;Kim, Geun-Woo;Sung, Chang-Hoon;Lee, Chan-Gyu;Koo, Bon-Heun
    • 한국재료학회지
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    • 제20권3호
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    • pp.137-141
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    • 2010
  • The $(1-x)La_{0.7}Sr_{0.3}MnO_3(LSMO)/xZnFe_2O_4$(ZFO) (x = 0, 0.01, 0.03, 0.06 and 0.09) composites were prepared by a conventional solid-state reaction method. We investigated the structural properties, magnetic properties and electrical transport properties of (1-x)LSMO/xZFO composites using X-ray diffraction (XRD), scanning electron microscopy (SEM), field-cooled dc magnetization and magnetoresistance (MR) measurements. The XRD and SEM results indicate that LSMO and ZFO coexist in the composites and the ZFO mostly segregates at the grain boundaries of LSMO, which agreed well with the results of the magnetic measurements. The resistivity of the samples increased by the increase of the ZFO doping level. A clear metal-to-insulator (M-I) transition was observed at 360K in pure LSMO. The introduction of ZFO further downshifted the transition temperature (350K-160K) while the transition disappeared in the sample (x = 0.09) and it presented insulating/semiconducting behavior in the measured temperature range (100K to 400K). The MR was measured in the presence of the 10kOe field. Compared with pure LSMO, the enhancement of low-field magnetoresistance (LFMR) was observed in the composites. It was clearly observed that the magnetoresistance effect of x = 0.03 was enhanced at room temperature range. These phenomena can be explained using the double-exchange (DE) mechanism, the grain boundary effect and the intrinsic transport properties together.