• 제목/요약/키워드: Bonding adhesion layer

검색결과 77건 처리시간 0.027초

Ni 본드코팅이 Al 기지에 고온 용사 코팅된 Fe 코팅층의 접합특성에 미치는 영향 (Effect of Ni Bond Coat on Adhesive Properties of Fe Coating Thermal Sprayed on Al Substrate)

  • 권의표;김대영;이종권
    • 한국재료학회지
    • /
    • 제26권10호
    • /
    • pp.542-548
    • /
    • 2016
  • The influence of NiCrAlY bond coating on the adhesion properties of an Fe thermal coating sprayed on an Al substrate was investigated. By applying a bond coat, an adhesion strength of 21MPa was obtained, which was higher than the 15.5MPa strength of the coating without the bond coat. Formation of cracks at the interface of the bond coat and the Al substrate was suppressed by applying the bond coat. Microstructural analysis of the coating interface using EBSD and TEM indicated that the dominant bonding mechanism was mechanical interlocking. Mechanical interlocking without crack defects in the coating interface may improve the adhesion strength of the coating. In conclusion, the use of an NiCrAlY bond coat is an effective method of improving the adhesion properties of thermal sprayed Fe coatings on Al substrates.

Ar/N2 2단계 플라즈마 처리에 따른 저온 Cu-Cu 직접 접합부의 정량적 계면접착에너지 평가 및 분석 (Effects of Ar/N2 Two-step Plasma Treatment on the Quantitative Interfacial Adhesion Energy of Low-Temperature Cu-Cu Bonding Interface)

  • 최성훈;김가희;서한결;김사라은경;박영배
    • 마이크로전자및패키징학회지
    • /
    • 제28권2호
    • /
    • pp.29-37
    • /
    • 2021
  • 3 차원 패키징을 위한 저온 Cu-Cu직접 접합부의 계면접착에너지를 향상시키기 위해 Cu박막 표면에 대한 Ar/N2 2단계 플라즈마 처리 전, 후 Cu표면 및 접합계면에 대한 화학결합을 X-선 광전자 분광법(X-ray photoelectron spectroscopy)을 통해 정량화한 결과, 2단계 플라즈마 처리로 인해 Cu표면에 Cu4N이 형성되어 Cu산화를 효과적으로 억제하는 것을 확인하였다. 2단계 플라즈마 처리하지 않은 Cu-Cu시편은 표면 산화막의 영향으로 접합이 제대로 되지 않았으나 2단계 플라즈마 처리한 시편은 효과적인 표면 산화방지효과로 인해 양호한 Cu-Cu접합을 형성하였다. Cu-Cu직접접합 계면의 정량적 계면접착에너지를 double cantilever beam 시험방법 및 4점 굽힘(4-point bending, 4-PB) 시험방법을 통해 비교한 결과, 각각 1.63±0.24, 2.33±0.67 J/m2으로 4-PB 시험의 계면접착에너지가 더 크게 측정되었다. 이는 계면파괴역학의 위상각(phase angle)에 따른 계면접착에너지 증가 거동으로 설명할 수 있는데 즉, 4-PB의 계면균열선단 전단응력성분 증가로 인한 계면거칠기의 효과에 기인한 것으로 판단된다.

Titanium thin film modified silica substrate to enhance the bonding properties of nanosilver

  • Lin, H.M.;Liu, Y.T.;Lin, K.N.;Chang, W.S.;Wu, C.Y.;Liu, P.Y.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
    • /
    • pp.1733-1736
    • /
    • 2006
  • Nanosilver has intrinsic problem to adhesion on the surface of silica. To improve interfacial properties between nanosilver and silica substrate, a thin titanium film is introduced in this study. The titaniumcoated silica substrates are prepared by sputter technique. The commercial silver nanopaste with size around 3-7nm is used in this study. The results indicate thin layer of titanium can improve the bonding properties of nanosilver and expect to be used in fabrication of TFT display panel.

  • PDF

탄소복합재 접착공정을 위한 CFRP의 레이저 표면처리 기법의 적용 (Application of Laser Surface Treatment Technique for Adhesive Bonding of Carbon Fiber Reinforced Composites)

  • 황문영;강래형;허몽영
    • Composites Research
    • /
    • 제33권6호
    • /
    • pp.371-376
    • /
    • 2020
  • 접착강도는 표면처리 기술을 통해 향상시킬 수 있다. 가장 일반적인 방법은 기계적인 결합력을 향상시킬 수 있는 접착 표면의 변화이다. 본 연구는 접착면의 레이저 표면 처리가 기계적 결합력에 미치는 영향과 탄소섬유 강화 복합재료(CFRP)의 접착 결합에 대해 설명한다. 1064 nm의 레이저를 활용하여 표면 조도를 패턴화했다. 레이저 샷의 수, 패턴의 방향, 길이가 CFRP/CFRP 단일 조인트의 접착력에 미치는 영향을 인장 시험을 통해 조사했다. ASTM D5868에 따른 시험을 수행하였으며, 파단 후 손상된 표면을 분석하여 결합 메커니즘을 결정했다. 접착 강도의 증가를 위해서는 CFRP 표면에 최적화된 레이저 샷의 수와 조도 깊이가 구성되어야 한다. 인장방향에서의 전단응력을 고려할 때, 접착층의 파단 경로를 길어지게 하는 45°의 방향의 조도가 접착강도의 증가를 야기했다. 그러나 레이저에 의한 조도의 길이는 접착 강도에 크게 영향을 주지 못했다. 레이저를 이용한 접착면의 표면처리는 기계적 결합 메커니즘을 확보하고 CFRP 접착 조인트의 접착 강도를 향상시키는 적합한 방법이라는 결론을 도출할 수 있다. 레이저 처리를 이용한 이점을 완전히 이용하기 위해서는 최적화된 레이저 공정 변수에 대한 연구가 반드시 필요하다.

가변 적층 쾌속 조형 공저 개발을 위한 발포 폴리스티렌폼의 선형 열선 절단시스템 절단 특성 및 접착강도 특성에 대한 연구 (Investigation of Cutting Characteristics of Linear Hotwire Cutting System and Bonding Characteristics of Expandable Polystyrene Foam for Variable Lamination Manufacturing(VLM) Process)

  • 안동규;이상호;양동열;신보성;이용일
    • 한국정밀공학회지
    • /
    • 제17권12호
    • /
    • pp.185-194
    • /
    • 2000
  • Rapid Prototyping(RP) techniques have their unique characteristics according to the working principles: stair-stepped surface of parts due to layer-by-layer stacking, low build speed caused by line-by-line solidification to build one layer, and additional post processing to improve surface roughness, so it is required very high cost to introduce and to maintain of RP apparatus. The objective of this study is to develop a new RP process, Variable Lamination Manufacturing using linear hotwire cutting technique and expandable polystyrene foam sheet as part material(VLM-S), and to investigate characteristics of part material, cutting characteristics by using linear hotwire cutting system and bonding. Experiments were carried out to investigate mechanical properties of part material such as anisotropy and directional tensile strength. In order to obtain optimal dimensional accuracy, surface roughness, and reduced cutting time, addition experiments were performed to find the relationship between cutting speed and cutting offset of hotwire, and heat generation of hotwire per unit length. So, adhesion strength tests according to ASTM test procedure showed that delamination did not occur at bonded area. Based on the data, a clover-shape was fabricated using unit shape part(USP) it is generated hotwire cutting. The results of present study have been reflected on the enhancement of the VLM-S process and apparatus.

  • PDF

이상적인 열방산 효과를 위한 GaN on Diamond 구조의 제안과 접합매개층 종류에 따른 열전달 시뮬레이션 비교 (Suggestion and Design of GaN on Diamond Structure for an Ideal Heat Dissipation Effect and Evaluation of Heat Transfer Simulation as Different Adhesion Layer)

  • 김종철;김찬일;양승한
    • 한국전기전자재료학회논문지
    • /
    • 제30권5호
    • /
    • pp.270-275
    • /
    • 2017
  • Current progress in the development of semiconductor technology in applications involving high electron mobility transistors (HEMT) and power devices is hindered by the lack of adequate ways todissipate heat generated during device operation. Concurrently, electronic devices that use gallium nitride (GaN) substrates do not perform well, because of the poor heat dissipation of the substrate. Suggested alternatives for overcoming these limitations include integration of high thermal conductivity material like diamond near the active device areas. This study will address a critical development in the art of GaN on diamond (GOD) structure by designing for ideal heat dissipation, in order to create apathway with the least thermal resistance and to improve the overall ease of integrating diamond heat spreaders into future electronic devices. This research has been carried out by means of heat transfer simulation, which has been successfully demonstrated by a finite-element method.

Solid Lubrication Characteristics of DLC Coated Alumina Seals in High Temperature

  • 옥철호
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
    • /
    • pp.356-356
    • /
    • 2007
  • Plasma immersion ion beam deposition (PIIBD) technique is a cost-effective process for the deposition of diamond like carbon thin film, the possible solid lubricant on large surface and a complex shape. We used PIIB process for the preparation of DLC thin film on $Al_2O_3$ with deposition conditions of deposition temperature range $200^{\circ}C$, working gas pressure of 1.310-1Pa. DLC thin films were coated by $C_2H_2$ ion beam deposition on $Al_2O_3$ after the ion bombardment of SiH4 as the bonding layer. Energetic bombardment of $C_2H_2$ ions during the DLC deposition to ceramic materials generated mixed layers at the DLC-Si interface which enhanced the interface to be highly bonded. Wear test showed that the low coefficient of friction of around 0.05 with normal load 2.9N and proved the advantage of the low energy ion bombardment in PIIBD process which improved the tribological properties of DLC thin film coated alumina ceramic. Furthermore, PIIBD was recognized as a useful surface modification technique for the deposition of DLC thin film on the irregular shape components, such as molds, and for the improvement of wear and adhesion problems of the DLC thin film, high temperature solid lubricant.

  • PDF

Cu-Cr합금 박막의 구리 전기도금을 위한 전처리 및 에칭 특성에 관한 연구 (Pretreatment for Cu electroplating and Etching Property of Cu-Cr Film)

  • 김남석;강탁;윤일표;박용수
    • 한국표면공학회지
    • /
    • 제26권3호
    • /
    • pp.149-157
    • /
    • 1993
  • In the study of TAB(Tape Automated Bonding)technologies, Cu-Cr sputtered seed layer has been used to improve the adhesion between Polyimide and Cu film and electrical properties. But the Cu electrodeposit on Cu-Cr film had poor adhesion or powder-like form due to the surface Cr oxides on the Cu-Cr film. By means of activating the Cu-Cr film with the oxalic acid and phosphoric acid, the Cu film with the improved adhesion could be coated on the Cu-Cr sputtered film in CuSO4 solution. The etching rate was compared with increasing the Cr content of the sputtered Cu-Cr film, and anodic polarization curve in FeCl3 solution was investigated. With increasing the Cr content, the etching rate was reduced. The clean etching cross section could be obtained with increasing the concentration of FeCl3 solution. But above the 13 w/o Cr content, Cu-Cr sputtered film could not bed etched cleanly only with FeCl3 solution and additives were needed.

  • PDF

Fabrication of 6, 13-bis(triisopropylsilylethynyl) (TIPS) pentacene -Nanowire Arrays Using Nano Transfer Molding

  • Oh, Hyun-S.;Sung, Myung-M.
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
    • /
    • pp.284-284
    • /
    • 2010
  • We report a fabrication of 6, 13-bis(triisopropylsilylethynyl) (TIPS) pentacene nanowires that made on Si substrates by liquid bridge-nanotransfer molding (LB-nTM) with polyurethane acrylate (PUA) mold. LB-nTM is based on the direct transfer of various materials from a stamp to a substrate via a liquid bridge between them. In liquid bridge-transfer process, the liquid layer serves as an adhesion layer to provide good conformal contact and form covalent bonding between the TIPS-pentacene nanowire and the Si substrate. The patterned TIPS-Pentacene nanowires have been investigated by Atomic force microscopy (AFM), Transmission Electron Microscopy (TEM), Scanning Electron Microscopy (SEM) and electrical properties.

  • PDF

Ni-xCu 합금 UBM과 Sn-Ag계 솔더 간의 계면 반응 연구 (Interfacial Reactions of Sn-Ag-Cu solder on Ni-xCu alloy UBMs)

  • 한훈;유진;이택영
    • 한국마이크로전자및패키징학회:학술대회논문집
    • /
    • 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
    • /
    • pp.84-87
    • /
    • 2003
  • Since Pb-free solder alloys have been used extensively in microelectronic packaging industry, the interaction between UBM (Under Bump Metallurgy) and solder is a critical issue because IMC (Intermetallic Compound) at the interface is critical for the adhesion of mechanical and the electrical contact for flip chip bonding. IMC growth must be fast during the reflow process to form stable IMC. Too fast IMC growth, however, is undesirable because it causes the dewetting of UBM and the unstable mechanical stability of thick IMC. UP to now. Ni and Cu are the most popular UBMs because electroplating is lower cost process than thin film deposition in vacuum for Al/Ni(V)/Cu or phased Cr-Cu. The consumption rate and the growth rate of IMC on Ni are lower than those of Cu. In contrast, the wetting of solder bumps on Cu is better than Ni. In addition, the residual stress of Cu is lower than that of Ni. Therefore, the alloy of Cu and Ni could be used as optimum UBM with both advantages of Ni and Cu. In this paper, the interfacial reactions of Sn-3.5Ag-0.7Cu solder on Ni-xCu alloy UBMs were investigated. The UBMs of Ni-Cu alloy were made on Si wafer. Thin Cr film and Cu film were used as adhesion layer and electroplating seed layer, respectively. And then, the solderable layer, Ni-Cu alloy, was deposited on the seed layer by electroplating. The UBM consumption rate and intermetallic growth on Ni-Cu alloy were studied as a function of time and Cu contents. And the IMCs between solder and UBM were analyzed with SEM, EDS, and TEM.

  • PDF